Abstract: Household appliance for washing and/or drying clothes comprising an outer casing (2) provided with a worktop (3), and heating means (7) for drying garments laid upon the worktop (3), wherein the worktop (3) or the heating means (7) comprise sensor means (8) adapted to detect the moisture content of said garments, control means being provided for operating said heating means (7) in response to the moisture content being detected by said sensor means (8).

Abstract: A gas distribution system for improving asymmetric etching and deposition control over a substrate diameter in a plasma reactor including a plasma reactor chamber further including a substrate holder for holding a substrate surface disposed in a lower portion of said plasma reactor; at least one gas distributor disposed within the plasma reactor chamber for distributing reactant gases where at least one gas distributor including a plurality of gas feed zones in communication with at least one gas source for selectively delivering a gas flow independently to at least one of the plurality of gas feed zones.

Abstract: A process for the drying of woven glass fabric to be used in a reinforcing laminate in sensitive electronic equipment is disclosed. The process implements a drying technique utilizing microwave energy for drying.

Abstract: Methods and systems for extending the shelf life of produce are disclosed which provide an accelerated drying process for washed produce in order to further clean and fully crystallize a layer of solute-laden slurry that has been applied on the external surface of an item of produce (20). The drying process typical comprises three basic steps. The first step (10) is to mechanically remove excess moisture from the solute-laden slurry to form a moisture-reduced slurry layer (22) on the external surface of the item of produce (20). The second step (12) is to employ heat and/or light energy to accelerate the in-situ moisture removal process to create a protective stratum (24) on the external surface of the item of produce (20). The third step (14) is to further remove remaining moisture to permit the formation of crystalline structures (26) on the external surface of the item of produce (20).

Abstract: A process chamber 25 for processing a semiconductor substrate, comprises a support for supporting a substrate 50. A gas distributor 90 provided for introducing process gas into the chamber 25, comprises a gas nozzle for injecting process gas at an inclined angle relative to a plane of the substrate 50, into the chamber 25. Optionally, a gas flow controller 100 controls and pulses the flow of process gas through one or more gas nozzles 140. An exhaust is used to exhaust the process gas from the chamber 25.

Abstract: Physical effects produced within RMS resonators are utilized as a means to process materials within the resonator including for example one or more of comminution, converting liquids into vapors and gases, drying of powders, rapid mixing of gases and various materials, agglomeration, de-agglomeration, granulation, chemical reactions, stratification/separation, and the destruction of biological material.

Abstract: A drying apparatus for washed objects is capable of drying the objects in a reduced period of time, effectively preventing contamination of the objects during drying thereof, and attaining energy saving and a reduction in consumption of chemicals used. Mist of an organic solvent is generated by means of an ultrasonic wave in an organic solvent mist generating tank and the objects are immersed in a pure water tank, the pure water tank and organic solvent mist generating tank are then operated to communicate with each other to discharge pure water and place the objects in an atmosphere of the organic solvent mist, and then nitrogen gas is fed to the pure water tank to purge the organic solvent mist with the nitrogen gas.

Abstract: Dielectric heating is used to assist with the cleaning of sorbent materials contaminated with oils and the like and the recovery of the solvent. In particular, a pressurized system is used such that a pressurized solvent is circulated to remove the contaminants from the sorbent materials. The RF radiation is directed into the vessel to vaporize residual solvents associated with the sorbent materials. Solvent is separated from the removed contaminants for reuse. RF radiation can be used to complete the removal of volatile compounds from the reclaimed oil/contaminants.