Abstract: A process for feeding a slurry of thermoplastic synthetic polymer particles such as polyethylene terephthalate homopolymers and copolymers in combination with a liquid such as water at a liquid temperature greater than the normal boiling point of the liquid, under a pressure greater than the vapor pressure of the liquid at the liquid temperature, into a separation zone such as a centrifugal dryer, and within the separation zone: a. separating the liquid from the particles, and b. drying the particles; while under a high pressure equal to or greater than the vapor pressure of the liquid. There is also provided a process for decoupling the dried particles from the separation zone to an atmosphere having a pressure less than the vapor pressure of the liquid while maintaining the vapor pressure of the particles prior to decoupling equal to or above the vapor pressure of the liquid at the liquid temperature.

Abstract: A centrifugal bowl separator, including a bowl, a source of pressurized gas in selective flow communication with the bowl and operable to selectively supply pressurized gas to an interior portion of the bowl, and first and second pressure seals selectively established to provide a zone within a portion of the bowl such that when the pressurized gas is introduced, pressure within the portion of the bowl increases for enhanced removal of moisture and drying of solids within the portion of the bowl.

Abstract: The combination washer/dryer and method for operating a combination washer/dryer. The washer/dryer has a containment drum which receives wash water, and includes a perforated clothes drum which rotates within the containment drum. A heat plenum is provided in heat transfer relationship with the containment drum, and a source of heat coupled to the heat plenum supplies heat for water in the containment drum. During a drying cycle, hot air from the heat source supplied from the fire box to the containment drum for heating wash water during a washing cycle, and for supplying hot air during a drying cycle. A drying air plenum is connected to receive drying air from the source of heat, delivering the drying air to the top of the containment drum, where it enters the rotating basket. An exhaust plenum discharges hot air laden with moisture from the containment drum through a lint filter.

Abstract: A method is described for evaporating liquid samples contained in sample holders mounted within a chamber and rotated by the rotor during an evaporation process in which the pressure in the chamber is reduced below atmospheric and the sample holders are rotated at high speed so as to exert centrifugal force on the contents of the holders. Heat is supplied to elevate the temperature of the liquid component of the samples to assist in the evaporation process. The temperature of the sample material is continuously or regularly monitored during the evaporation process and temperature signals are transmitted to a remote computing means which is programmed to generate a control signal for controlling the supply of heat to the samples and controlling the evaporation process. The temperature may be sensed by a probe in a sample holder containing an evaporating liquid sample, or in an adjoining sample holder containing a buffer liquid.

Abstract: A wafer dry cleaning method and apparatus capable of eliminating or suppressing adhesion of dust and particles on dried wafer surfaces while minimizing generation of water marks thereon. To achive this, the wafer dryer apparatus is configured including a surface cleaning/drying chamber structure which houses therein a set of spaced-apart silicon wafer workpieces. The dry chamber is operatively associated with a vacuum evacuation device for retaining the interior of this chamber at low pressures required. A water-drain device is provided for forcing water content separated off from the wafer surfaces to drain out of the drying vessel. During such wafer drying process, the wafers may be driven rotating at high speeds to thereby accelerate centrifugal spin-off of residual drops of water on wafer surfaces. Preferably, a chosen purge gas may be fed into the chamber during wafer rotation.

Abstract: Coal or other mineral slurry is dewatered by establishing a bed of the slurry and injecting a gas stream such as air into the bed to establish turbulent flow to strip moisture. This slurry may use particles in the range 0.5 mm to 30 mm with air injected at about 10 m/sec, and suitable novel apparatus includes a centrifuge or a vibratory conveyor with a closed tunnel and transverse air flow for stripping moisture.