Abstract: This exhalation measuring device is provided with a handle component, a chamber, a piezoelectric pump, and a drying mode controller. Exhalation is blown into the handle component. The chamber temporarily holds the exhalation that has been blown in. The piezoelectric pump supplies the exhalation held in the chamber to a measurement component. The dry mode controller executes a drying mode in which the piezoelectric pump is driven and outside air is drawn in from the handle component, after the measurement of exhalation by the measurement component.

Abstract: Methods of making polymeric devices, such as stents, using solvent based processes. More particularly, methods of making bioabsorbable stents.

Abstract: A compressor system and method for the isothermal compression of industrial gases includes a compression cylinder into which an industrial gas having impurities can be introduced and compressed via a displacement fluid, and an expansion space for the desorption of impurities from at least part of the displacement fluid after the displacement fluid sorbs impurities from the gas during compression in the compression cylinder. The displacement fluid may compress the gas and sorb contaminants from the gas, and following the compression, at least a portion of the displacement fluid may be conducted to an expansion chamber to desorb the impurities from the fluid and remove the impurities from the system.

Abstract: A substrate processing apparatus which holds and rotates a substrate substantially horizontally; having a control unit which controls a rinsing liquid supply mechanism for supplying a rinsing liquid onto the substrate; a gas knife mechanism that sprays gas onto the substrate to form a gas spraying zone and scans the entire substrate without rotating the substrate; a rinsing liquid mechanism for supplying a rinsing liquid onto the substrate at its area downstream from the gas spraying zone; and a drying unit for drying the substrate by rotating the substrate.

Abstract: A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid, includes a solvent vapor supply device for supplying the solvent vapor into a treating chamber, an exhaust device for exhausting gas from the chamber through an exhaust pipe, a drain pipe connected to the chamber for draining the treating liquid from the chamber, a gas-liquid separator at the other end of the exhaust pipe for receiving the gas from the exhaust device, and connected to the other end of the drain pipe for receiving the treating liquid from the drain pipe, the gas-liquid separator separating the gas and the liquid, and a mixer mounted on the exhaust pipe for mixing deionized water into the gas exhausted by the exhaust device.

Abstract: A substrate processing method comprising: holding a substrate substantially horizontally by a rotatable substrate holding mechanism; supplying a rinsing liquid onto the top of the substrate held by the substrate holding mechanism at the substrate holding step; after the rinsing liquid supply step, spraying a gas onto the top of the substrate held by the substrate holding mechanism, by a gas knife mechanism, to form a gas spraying zone on the substrate top, and unidirectionally scanning the substrate top in its entirety by this gas spraying zone, without rotating the substrate; replenishing the rinsing liquid by supplying, in parallel to the gas knife spraying step, a rinsing liquid onto the substrate top at its area downstream in the gas-spraying-zone scanning direction rather than the gas spraying zone formed by the gas knife mechanism; and drying the substrate surface after the gas knife spraying step and the rinsing liquid replenishing step.

Abstract: Disclosed is a method for drying a plate-like article; the method including rinsing with an aqueous rinsing liquid with subsequent rinsing with an organic solvent, wherein the organic solvent has a water content of below 20 mass-% wherein the organic solvent is supplied at a solvent temperature, which is at least 30° C. and not higher than 60° C.

Abstract: The present invention relates to a method of dehydrating pieces of intact plant or animal tissue, said pieces containing at least 30 wt. % of water, the method comprising (i) contacting the pieces of intact tissue with a pressurized gas to reduce the water content of the pieces by at least 50%, said pressurized gas having a pressure of at least 0.5×Pc and a temperature of at least Tc?60° C., Pc representing the critical pressure of the gas and Tc representing the critical temperature of the gas, and (ii) separating the pressurized gas from the dehydrated pieces, wherein at least 80 wt. %, preferably at least 90 wt. % of the matter removed by the gas from the pieces of intact plant or animal tissue is water. The invention also provides a method of dehydrating a material containing at least 30 wt.

Abstract: Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemical liquid. The control of the humidity is performed at least in a drying step that dries the substrate W. In one embodiment, the ambient humidity around the substrate is controlled when a fluid containing IPA as a drying fluid is supplied to the substrate W after processing the substrate W with the chemical liquid.

Abstract: A method for drying a wet semiconductor substrate includes the steps of immersing the substrate in a drying liquid in a drying chamber; removing the substrate from the drying liquid within the drying chamber; purging the drying chamber with inert gas; exposing the substrate to vacuum pressure within the drying chamber; and backfilling the drying chamber with the inert gas to substantially achieve atmospheric pressure. A system for drying a semiconductor substrate includes a drying chamber, a drying liquid reservoir in fluid communication with the drying chamber, a liquid pump, an inert gas supply in fluid communication with the drying chamber, and a vacuum pressure source in fluid communication with the drying chamber.

Abstract: A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid.

Abstract: The present invention relates to a process for drying protein crystals starting from an aqueous protein crystal suspension, which comprises drying the protein crystal suspension in a centrifugal dryer, where the protein crystals, after they have been filtered off from the protein crystal suspension, are brought into contact with a drying medium which consists of a mixture of water and a nonaqueous solvent which is miscible with water in any ratio and which has a lower vapor pressure than water. In the process, a drying gas which has been moistened with water is advantageously used. The protein crystal suspension is advantageously converted into a fluidized bed for the purpose of drying.

Abstract: Method for removing water from surfaces of various materials, comprising the steps of covering said surface with a composition having specific weight higher than that of water and subsequently removing water from the composition by skimming, wherein a composition essentially consisting of the following components is used:

Abstract: Methods for removing soluble material from confined spaces within substrates such as containers, capsules and porous powders comprising extraction with supercritical fluids, the pressure of which is preferably modulated between an upper level and a lower level within a relatively narrow range of fluid pressure and density. The method permits enhanced extraction efficiency, catalytic reaction rates and ability to maintain catalyst activity.

Abstract: Hard shelled capsules and dry, powdered pharmaceutical formulations are treated with supercritical fluids to remove impurities such as mold lubricants and moisture.

Abstract: There is provided a process for drying a fluidized reactor system comprising introducing a boiling point depressing agent into said system optionally while heating said system.

Abstract: An apparatus and method for drying single or multiple parts or objects wherein the apparatus uses a drying chamber for containing said object or objects, said drying chamber having a closeable entryway for providing access to said drying chamber, the use of a sonic head disposed in said drying chamber attached to a source of drying liquid and an adjustable supply and drain attached to said drying chamber for introducing and removing said drying fluid to and from said drying chamber.