Abstract: Wood is disposed in a container having at least one flexible wall, and vacuum is applied to the container. The flexible wall presses against a surface of the wood. The container and wood are them immersed in a heated bath (e.g. comprising water, air, or other fluids). The wood is heated by conduction through the flexible wall, and maintained at accurate temperature by the bath. The wood is thereby rapidly dried by heat and vacuum. The present invention is energy efficient, and provides rapid, uniform drying of the wood without checking.

Abstract: A method for preparing a chamber prior to semiconductor processing includes the step of flowing a non-reactive gas, preferably argon, through the chamber at a pressure below 4 Torr to sweep contaminants from the chamber. The chamber pressure is reduced to less than 1 Torr prior to sweeping with argon, and the sweeping cycle is repeated as needed to remove contaminants. The chamber is heated during subsequent sweep cycles to enhance removal of contaminants. Following the sweep cycles, remaining contaminants are baked out at a chamber pressure less than 6.0×10−6 Torr. The method substantially bakes out moisture and other contaminants from the chambers in less than 8 hours, and prepares the chamber for processing in less than one day.

Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.

Abstract: A process and apparatus for removing moisture from a material, without spoiling the processed product, through the implementation of microwave irradiation heating, drying, dehydration, curing, disinfection, pasteurization, sterilization or vaporization or any combination thereof. The process and apparatus provide for a controlled processing of planar material, a combination of materials organic or inorganic, in natural or processed form, in sheet leaf, granular, prepared or transportable planar form.

Abstract: Wood is disposed in a container having at least one flexible wall, and vacuum is applied to the container. The flexible wall presses against a surface of the wood. The container and wood are them immersed in a heated bath (e.g. comprising water, air, or other fluids). The wood is heated by conduction through the flexible wall, and maintained at accurate temperature by the bath. The wood is thereby rapidly dried by heat and vacuum. The present invention is energy efficient, and provides rapid, uniform drying of the wood without checking.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.

Abstract: A method and apparatus for transferring a substrate that includes a cassette table capable of holding a plurality of cassettes, wherein the cassettes are capable of receiving a plurality of substrates. An atmospheric loader is arranged between the plurality of cassettes and two lock chambers, and an atmospheric transferring device is provided for transferring one of the plurality of substrates to or from a substrate process.

Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.

Abstract: A kiln chamber has an air moving device for circulating air in the chamber interior space along a flow path, and pipe banks positioned in the chamber interior space. Each pipe bank includes finned pipes for having a heated medium flow interiorly therethrough, and each pipe bank is positioned in the flow path so that air circulated by the air moving device flows exteriorly across the finned pipes. Each finned pipe has an elongate portion having opposite ends and extending in a longitudinal direction between the opposite ends, with the longitudinal direction being at least generally perpendicular to the portion of the flow path that is proximate the finned pipe. The pipe banks are spaced apart from one another and arranged side by side with respect to one another so that a portion of the flow path extends between adjacent ones of the pipe banks.

Abstract: The filter cake in a filter press is heated by direct contact with a heating plate opposite the pressing membrane so that a vapor phase is generated which moves uniformly in a planar pressure front through the filter cake to dry residual liquid therefrom. The filter cake is maintained under vacuum during the drying step.

Abstract: A method and apparatus for heating and cooling a substrate. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.

Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.

Abstract: A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled.

Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism. The heating mechanism preferably comprises a heated substrate support adapted to support a substrate and to heat the supported substrate to a predetermined temperature, and the cooling mechanism preferably comprises a cooling plate. The transfer mechanism may comprise, for example, a wafer lift hoop having a plurality of fingers adapted to support a substrate, or a plurality of wafer lift pins. A dry gas source may be coupled to the chamber and adapted to supply a dry gas thereto.

Abstract: The present invention relates to heating systems for drying wet coatings such as printing inks, paint, sealants, etc. applied to a substrate. In particular, the invention relates to a drying system in which a blower having an inlet directs a current of heated gas such as air towards a wet coating on a substrate to dry the coating and wherein the heated air is circulated back to the inlet of the blower once the air impinges the coating on the substrate. The present invention also relates to a drying system in which the substrate is supported about a thermally conductive roll having a plurality of energy emitters disposed within the conductive roll along a length of the conductive roll. The plurality of energy emitters are controlled to selectively emit energy along the length of the conductive roll.

Abstract: A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Abstract: The present invention provides method and apparatus for reducing particulate contamination during the processing of a substrate. In one embodiment, the step of preheating a substrate in a preheater to a desired temperature. The preheated substrate is transferred from the preheater to a buffer region having a pressure therein that is between about two (2) Torr and about seven hundred and sixty (760) Torr. The preheated substrate is transferred from the buffer region to a reaction chamber. Thermophoretic forces help repel particles away from the substrate surface during substrate transfer.

Abstract: An apparatus and method is provided for capturing, heating and degassing a wafer without using moving parts and without exposing the wafer to external stress. A degassing chamber is backfilled with a dry gas that improves wafer heating ramp rates and wafer heating uniformity. The backfilled gas efficiently conducts heat at relatively low pressures. Thus the degassing chamber may be evacuated via a cryo-pump without the need for an intermediate rough pumping step. Further, because the wafer is heated primarily by conduction, wafer temperatures are easily and precisely controlled independent of layers previously deposited on the wafer. Frontside heating elements such as heat generators and/or heat reflectors are provided that further improve wafer heating ramp rates and wafer heating uniformity by directing heat toward the front surface of the wafer. Preferably as heat radiates from the wafer it is reflected back to the wafer by a frontside reflector.

Abstract: A pass-through, wafer-processing tool for treating a moving semiconductor wafer with a process gas. The tool comprises an open-ended, non-isolated processing module having a wafer path through the module, vacuum manifolds mounted adjacent the wafer entry to and wafer exit from the module, and a gas manifold between the vacuum manifolds adapted to direct process gas onto the moving wafer. The gas manifold may deliver plasma ions generated by a remote plasma unit outside the module. Instead, a plasma may be generated inside the pass-through, wafer processing tool and, if so, the tool further comprises a top electrode mounted above the wafer passage. A wafer handler, which may be a robotic handler, carries the wafer through the wafer passage and serves as a bottom electrode.

Abstract: Medicinal plants are dried by applying microwave power to plant materials in a chamber under reduced pressure to reduce the moisture content of the plant materials without significantly reducing (oxidizing) the concentration of active medicinal component in the dried plant materials and thereby produce a dried medicinal plant product which more closely approaches the medicinal properties of the fresh plant than those of dried products produced by conventional air drying processes.

Abstract: A method of drying a coated monolithic substrate by imposing a vacuum at one end of the substrate to draw volatilized constituents out of the channels and by delivering a gas stream through the other end of the substrate during the drying process.

Abstract: A thermal desorption system for the treatment of contaminated solids.

Abstract: A process for manufacturing improved granulated fatty alcohol sulfates. The process includes slowly drying and mechanically mixing the fatty alcohol sulfate.

Abstract: A method for purging and passivating a vacuum chamber suitable for use in the production of integrated circuit structures on semiconductor wafers. The method includes flowing a heated, non-reactive gas, such as argon gas, through the chamber for purposes of decontaminating the chamber and subsequently filling the chamber with a selected gas such as nitrogen to passivate the chamber for storage or shipping purposes.

Abstract: Provided is a method for charging a powdery heat insulator into a thermally insulated, double-shelled tank between its inner vessel and outer vessel. The method comprises causing a powdery heat insulator to flow together with water into a space between the inner vessel and outer vessel of a thermally insulated, double-shelled tank, discharging the water in said space, and then drying the powdery heat insulator. The pressure in the space is then also reduced. The drying of the powdery heat insulator can be carried out by heating either the inner vessel or outer vessel, or both of these vessels, or by inert gas flow, such as nitrogen gas.

Abstract: A method is provided for the treatment of contaminated materials such as impounded sludges and contaminated soils by thermal desorption wherein a solid matrix is subjected to the action of superheated steam in a closed vessel, a gas stream comprising superheated steam is recirculated to the vessel and recirculation of the superheated steam is continued until organic constituents are separated therefrom to predetermined concentrations that are environmentally insignificant and within the limits prescribed by governmental regulations.

Abstract: Disclosed is a method for reducing the moisture content of a paper web in a papermaking process from in the range of 10% to 32% dry to the range of 33% to 50% dry wherein the embryonic web is supported on a knuckled through drier fabric and lightly pressed between the knuckled through drier fabric and a capillary membrane of a capillary dewatering roll. The capillary membrane has capillary pores therethrough which have a substantially straight through, non-tortuous path with a pore aspect ratio of from about 2 to about 20. A vacuum is drawn within the capillary dewatering roll which is not greater than the negative capillary suction pressure of the capillary pores.

Abstract: The invention relates to a one-pot mixer/granulator/dryer constituting a single step or one-pot production apparatus for successively mixing, moist-granulating and drying solid pharmaceutical products, for example in the manufacture of powdered products, pellets or granules. The dryer according to the invention has a substantially improved drying performance compared with conventional production equipment. The high efficiency of drying is achieved by the simultaneous use of four different drying mechanisms.

Abstract: A high speed negative pressure air stream from a sucking-out nozzle or a combination of a high speed negative pressure air stream from the sucking-out nozzle and a high speed air jet stream from a blowing nozzle are used for drying an article. Flanges can be installed at a tip end of the sucking-out nozzle and the blowing nozzle. The air jet stream can be injected obliquely to the surface of the article to be dried. Water adhered to an article to be dried, for example, a wet mat, is rapidly divided into minute water drops which are extracted. Vermin, lice and other contaminants are also removed. The article to be dried is rapidly dehydrated and dried in a low temperature. The sucking-out nozzle provided with a flange in a sucking-out pipe is placed so that it can slide on the surface of the article to be dried. A water drop separating vessel is installed between the sucking-out pipe and the inlet of a blower. A dehumidifier is installed between the outlet of the blower and the blowing pipe.

Abstract: A method for purging a vacuum chamber suitable for use in the production of integrated circuit structures on semiconductor wafers. The method comprises providing the chamber to be purged and flowing a heated, non-reactive gas, such as argon gas, through the chamber. The non-reactive gas is heated to a temperature of at least 90.degree. C. Further, the chamber is heated to maintain it at a temperature of at least 90.degree. C. while flowing the gas therethrough. Flowing the heated non-reactive gas through the chamber causes released impurities or contaminants to be efficiently swept from the chamber in the non-reactive gas flow. After flowing the heated gas through the heated chamber, the flow of gas is interrupted and the chamber, while still hot, is pumped down to a vacuum of about 5.times.10.sup.-7 to determine whether or not the chamber has a leakage problem.

Abstract: Fiber reinforced structural components, such as panels with honeycomb cores sandwiched between at least two outer skin layers are dried to remove moisture that may have entered into the interior of the structure. For this purpose the component is cooled in a cooling environment below the freezing point to about -5.degree. to -20.degree. C. and then exposed to a reduced pressure of less than 0.5 mbar. Under these drying conditions moisture is driven out of the component by sublimation so that the moisture does not pass through the liquid phase. The drying time may be reduced by a temperature increase to 80.degree.-100.degree. C. while maintaining the low pressure. The freezing increases the capillary action for the moisture removal. However, for an increased efficiency in the moisture removal small diameter holes, e.g. 0.1 mm bores, may be drilled into the component to facilitate the moisture escape. After drying is complete the holes are closed again e.g. by laminating further cover sheets to the component.

Abstract: An article is dried in a vacuum and sublimation is prevented by controlling both the heat applied to the article and the heat lost through evaporation. The article is placed in a vacuum chamber having a plurality of infrared lamps disposed around the interior of the chamber and the chamber is heated to a predetermined temperature prior to evacuation. Heat loss is controlled by maintaining the pressure above approximately 5 torr, which controls the rate of evaporation. The drying cycle also cleans the article.

Abstract: A vacuum drying apparatus characterized by a means for pre-heating a product by hot air, provided to a vacuum container having a heater housed therein.

Abstract: The invention relates to a process and an apparatus for drying sludge, in particular sewage sludge, or moist bulk material, wherein the material to be dried is heated by supplying energy by means of an electromagnetic alternating field generated between electrodes in a sealed pressurized vessel at an overpressure and the material moisture evaporated by the heating is used as heat transfer medium for heating the material to be dried in a step which is separate from the heating in the electromagnetic alternating field. In this process, the material to be dried is received with electrically insulated contiguous contact with the electrodes located in the pressurized vessel at least for a dwell time which is necessary for the heating and is then subjected to a flash drying.

Abstract: An apparatus and method are described for delivering hygroscopic, corrosive chemicals such as hydrogen chloride from a source such as a tube trailer to a use point such as a semiconductor fabrication tool minimizing infiltration of moisture, and entrainment of particulates, while still reducing moisture contents below 100 parts per billion and achieving appropriate pressure drops without two phase flow.

Abstract: The present invention provides a method for processing wastes containing a large amount of water and a method for processing leachate from industrial wastes. Specifically, the present invention provides a method which comprises maintaining reduced pressure in the dryer equipped with a stirring means, feeding wastes containing a large amount of water to the dryer, stirring the wastes while blowing refrigerated air at -20.degree. C..+-.5.degree. C. to the dryer, and drying the frozen moisture portion of the wastes by sublimation. Air heated at 80.degree. C.+10.degree. C. can be used instead of refrigerated air to dry water of the wastes by evaporation. The present invention also provides a method for processing leachate which comprises pooling leachate industrial wastes and burned ashes, and utilizing the leachate to absorb wet-type toxic gas, thereby confining the leachate within the waste treatment plant.

Abstract: The present invention discloses a method and an apparatus for drying granular materials by submitting them to dielectric heating by means of electromagnetic waves such as microwave, high frequency, etc. The granular materials to be dried are heated to the prescribed temperature with electromagnetic waves under a reduced pressure of a range not producing any glow discharge and then dried to the prescribed moisture percentage while passing through a pressure reducing process of a vacuum of higher degree. An apparatus for it is provided with a reduced pressure drying tank (1) having an electromagnetic wave generator (2), a main drying tank (30) communicated with said reduced pressure drying tank (1), and suction air sources (20), (20') which are provided respectively in the reduced pressure drying tank (1) and the main drying tank (30).

Abstract: In order to provide a vacuum degreasing-drying method by which extremely small, precision metal products can be degreased and dried quickly and completely without using organic solvents, according to the present invention, an object 112 to be rinsed is put in a vacuum drier 110 after being rinsed with a hydrocarbon cleaning agent and then the air in the vacuum drier 110 is evacuated so as to degrease and dry the object thus rinsed.

Abstract: The present invention relates to a closed sterilization system including an infeed device for receiving the toxic product, first preparing means for rendering the toxic or infectious product suitable for sterilization, sterilization means for sterilizing the product, combustion means for incinerating the sterilized product, and conveying means for conveying the sterilized product from the sterilizing means into the combustion means. The system further includes a first isolating means positioned between the first preparing means and the inlet of the sterilizing means for isolating the product in the sterilizing means from the product in the first preparing means. Second isolation means are also positioned between the outlet of the sterilizing means and the conveying means for isolating the sterilized product from the product in sterilizing means.

Abstract: In order to provide a vacuum degreasing-drying method by which extremely small, precision metal products can be degreased and dried quickly and completely without using organic solvents, according to the present invention, an object 112 to be rinsed is put in a vacuum drier 110 after being rinsed with a hydrocarbon cleaning agent and then the air in the vacuum drier 110 is evacuated so as to degrease and dry the object thus rinsed.