Including Addition Of Treating Agent Patents (Class 34/415)
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Patent number: 8857075Abstract: The invention relates to a method for producing a smoking product from a tobacco material, wherein the tobacco material is treated using at least one extrusion process, which comprises compaction with an increase in pressure and temperature and a mechanical treatment and sudden flash drying of the material at an outlet of an extruder (1), wherein a heated process fluid (7) is supplied as a heat transfer medium to the tobacco material in the extruder (1) to supply process heat. The invention further relates to a device for producing a smoking product from a tobacco material using an extruder (1) which performs a compaction of a tobacco material with an increase in pressure and temperature and a mechanical treatment and sudden flash drying of the material at the extruder outlet, wherein the extruder (1) is associated with a heater (11), which heats a process fluid (7) that is supplied to the extruder (1) for supplying process heat as a heat transfer medium.Type: GrantFiled: September 17, 2009Date of Patent: October 14, 2014Assignee: British American Tobacco (Germany) GmbHInventors: Dietmar Franke, Gerald Schmekel
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Publication number: 20120304485Abstract: A substrate processing method and apparatus which can remove an anti-drying liquid, which has entered a three-dimensional pattern with recessed portions formed in a substrate, in a relatively short time. The substrate processing method includes the steps of: carrying a substrate, having a three-dimensional pattern formed in a surface, into a processing container, said pattern being covered with an anti-drying liquid that has entered the recessed portions of the pattern; heating the substrate and supplying a pressurizing gas or a fluid in a high-pressure state into the processing container, thereby forming a high-pressure atmosphere in the processing container before the anti-drying liquid vaporizes to such an extent as to cause pattern collapse and bringing the anti-drying liquid into a high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter discharging a fluid in a high-pressure state or a gaseous state from the processing container.Type: ApplicationFiled: May 29, 2012Publication date: December 6, 2012Applicants: Tokyo Electron Limited, Kabushiki Kaisha ToshibaInventors: Hidekazu Hayashi, Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Kazuyuki Mitsuoka, Mitsuaki Iwashita, Takehiko Orii, Gen You, Hiroki Ohno, Takayuki Toshima
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Patent number: 8021445Abstract: Disclosed are methods for upgrading carbonaceous materials. Also disclosed are apparatuses for upgrading carbonaceous materials. Also disclosed are systems for upgrading carbonaceous materials. Also disclosed are upgraded carbonaceous materials.Type: GrantFiled: July 9, 2008Date of Patent: September 20, 2011Assignee: Skye Energy Holdings, Inc.Inventor: David B. Shaffer
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Patent number: 6920703Abstract: The object of the present invention is to provide a microstructure drying treatment method by which a substrate having a microstructure has a fine pattern of less than 30 nm and a large-caliber substrate of 100 mm or more can be dried uniformly and in a short time without generating pattern collapse, and its apparatus and its high pressure vessel. The present invention is a microstructure drying treatment method of introducing a fluid that is gas at normal temperature and pressure and is liquid under high pressure inside a high pressure vessel in which a substrate having a microstructure in a state immersed in or wet with a rinsing liquid in a liquid or supercritical state. The method forms a specific gravity difference between the rinsing liquid and fluid inside the high pressure vessel and collects the rinsing liquid to the upper side or lower side of the high pressure vessel by changing at least one side of the temperature and pressure of the fluid and changing the specific gravity of the fluid.Type: GrantFiled: May 4, 2004Date of Patent: July 26, 2005Assignee: Hitachi Science Systems, Ltd.Inventors: Hisayuki Taktsu, Toru Iwaya, Koichi Miyazawa, Sakae Koubori
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Publication number: 20030088995Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.Type: ApplicationFiled: December 30, 2002Publication date: May 15, 2003Applicant: Semitool, Inc.Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
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Publication number: 20030008238Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.Type: ApplicationFiled: June 27, 2001Publication date: January 9, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dario L. Goldfarb, Kenneth John McCullough, David R. Medeiros, Wayne M. Moreau, John P. Simons, Charles J. Taft
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Publication number: 20020095816Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.Type: ApplicationFiled: March 18, 2002Publication date: July 25, 2002Applicant: Semitool, Inc.Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
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Patent number: 6216363Abstract: A new method for treating the diapered area of a child's skin to prevent diaper dermatitis. The method features the use of a portable drying apparatus having a housing with an air admitting inlet and an air discharging outlet, a rotary impeller mechanism in the housing for creating a flow of air through the air outlet, and a handle mounted to the housing. The method employs the use of an air stream which is at or near air ambient temperature. Exposing the child's skin to air at such temperatures minimizes the risk of skin burn as a safe method for treating the diapered area. The present invention also includes an improved apparatus as referred to above.Type: GrantFiled: January 31, 2000Date of Patent: April 17, 2001Inventors: Sara Swansen, Matt Allison
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Method for treatment of contaminated materials with superheated steam thermal desorption and recycle
Patent number: 5656178Abstract: A method is provided for the treatment of contaminated materials such as impounded sludges and contaminated soils by thermal desorption wherein a solid matrix is subjected to the action of superheated steam in a closed vessel, a gas stream comprising superheated steam is recirculated to the vessel and recirculation of the superheated steam is continued until organic constituents are separated therefrom to predetermined concentrations that are environmentally insignificant and within the limits prescribed by governmental regulations.Type: GrantFiled: April 29, 1993Date of Patent: August 12, 1997Assignee: American Color And Chemical Corp.Inventors: Primo Marchesi, George M. Goyak -
Patent number: 5642671Abstract: A method of printing a material web includes the steps of applying ink to the material web, subsequently drying the material web with the use of heat and subsequently drying the material web, and, after cooling and prior to further processing, moistening the material web while simultaneously applying heat to the material web, and subsequently once again cooling the material web. An apparatus for carrying out the method includes, in a travel direction, a printing unit, a drying section following the printing unit, a cooling section following the drying section, a moistening section following the cooling section, and an after-cooling section following the moistening section.Type: GrantFiled: April 24, 1996Date of Patent: July 1, 1997Assignee: V.I.B. Apparatebau GmbHInventor: Stefan Winheim
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Patent number: 5569438Abstract: In an apparatus for treating, for purposes of sterilization, a continuous material web a first treatment station is provided and includes a device for bringing a material web into contact with liquefied hydrogen peroxide. A second treatment station is also provided in which the material web is simultaneously sterilized with hydrogen peroxide vapor and dried with heated air after treatment of the material web in the first treatment station. The second treatment station includes an elongate chamber having an inlet and outlet, the material web being dried and thereby generating hydrogen peroxide vapor as it is led through the elongate chamber from the inlet to the outlet. The second treatment station also includes an outer flow duct in flow communication with the inlet and outlet of the elongate chamber.Type: GrantFiled: February 17, 1995Date of Patent: October 29, 1996Assignee: Tetra Laval Holdings & Finance S.A.Inventor: Anders Hilmersson
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Patent number: 5485685Abstract: There are available as chlorine base organic solvents for cleaning by vapor-defatting methylene chloride (CH.sub.2 Cl.sub.2), trichloro ethylene (CHCl.dbd.CCl.sub.2), perchloroethylene (CCl.sub.2 .dbd.CCl.sub.2), 1,1,1-trichloroethane (CH.sub.3 CCl.sub.3) and flon 113 (CCl.sub.2 FCClF.sub.2), etc., of which mainly used is a methylene chloride (CH.sub.2 Cl.sub.2) solvent. By vaporizing said methylene chloride solvent and permeating its vapor into the wood to be treated 10, to melt the tough lignin in the cell structure, thereby perforating the cell membranes, and undermine the valve action of portholes of the false vessels or vessels, fleeing of the cell water confined inside the cells and lumens is facilitated through said perforations and the porthole valves. By perforating the cells and undermining the valve action of the portholes, the fleeing of the free water confined therein, when drying the treated wood by hot air or sun's heat, is facilitated, for the benefit of very rapid drying.Type: GrantFiled: October 24, 1994Date of Patent: January 23, 1996Assignee: Eiwa Co., Ltd.Inventor: Yotaro Hashimoto
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Patent number: 5473826Abstract: A process is disclosed for drying sol-gel derived porous wet bodies without inducing cracks therein. The wet gel preferably is immersed in a liquid solvent before being placed inside a drying chamber capable of withstanding relatively high pressures and temperatures. After the wet gel is loaded, the chamber is sealed from the outside environment, and then is heated from outside the chamber in a controlled manner until a prescribed subcritical pressure is reached. The final temperature and pressure are always lower than the critical temperature and pressure of the drying solvent. The solvent vapor is then evacuated from the chamber in a controlled fashion to decrease the pressure until ambient pressure is reached, while preferably maintaining the temperature inside the chamber at the prescribed level. Thereafter, the inside of the chamber is purged with an inert gas for a prescribed time period, after which the chamber is cooled to ambient temperature and the dry crack-free porous gel is removed.Type: GrantFiled: August 19, 1994Date of Patent: December 12, 1995Assignee: Yazaki CorporationInventors: Fikret Kirkbir, Satyabrata Raychaudhuri
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Patent number: 5424034Abstract: The disclosure relates to a method and an apparatus for treating, for purposes of sterilization, a continuous material web (16) by bringing the entire web or parts thereof intended for sterilization into contact with liquefied hydrogen peroxide and thereafter drying the web with the aid of a hot gaseous fluid.In order to improve the degree of destruction of micro-organisms present on the material web, the material web is dried, after contact with the liquefied hydrogen peroxide, with air which has been intentionally supplied with hydrogen peroxide.Type: GrantFiled: September 3, 1993Date of Patent: June 13, 1995Assignee: Tetra Laval Holdings & Finance SAInventor: Anders Hilmersson