Including Addition Of Treating Agent Patents (Class 34/415)
  • Patent number: 8857075
    Abstract: The invention relates to a method for producing a smoking product from a tobacco material, wherein the tobacco material is treated using at least one extrusion process, which comprises compaction with an increase in pressure and temperature and a mechanical treatment and sudden flash drying of the material at an outlet of an extruder (1), wherein a heated process fluid (7) is supplied as a heat transfer medium to the tobacco material in the extruder (1) to supply process heat. The invention further relates to a device for producing a smoking product from a tobacco material using an extruder (1) which performs a compaction of a tobacco material with an increase in pressure and temperature and a mechanical treatment and sudden flash drying of the material at the extruder outlet, wherein the extruder (1) is associated with a heater (11), which heats a process fluid (7) that is supplied to the extruder (1) for supplying process heat as a heat transfer medium.
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: October 14, 2014
    Assignee: British American Tobacco (Germany) GmbH
    Inventors: Dietmar Franke, Gerald Schmekel
  • Publication number: 20120304485
    Abstract: A substrate processing method and apparatus which can remove an anti-drying liquid, which has entered a three-dimensional pattern with recessed portions formed in a substrate, in a relatively short time. The substrate processing method includes the steps of: carrying a substrate, having a three-dimensional pattern formed in a surface, into a processing container, said pattern being covered with an anti-drying liquid that has entered the recessed portions of the pattern; heating the substrate and supplying a pressurizing gas or a fluid in a high-pressure state into the processing container, thereby forming a high-pressure atmosphere in the processing container before the anti-drying liquid vaporizes to such an extent as to cause pattern collapse and bringing the anti-drying liquid into a high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter discharging a fluid in a high-pressure state or a gaseous state from the processing container.
    Type: Application
    Filed: May 29, 2012
    Publication date: December 6, 2012
    Applicants: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Hidekazu Hayashi, Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Kazuyuki Mitsuoka, Mitsuaki Iwashita, Takehiko Orii, Gen You, Hiroki Ohno, Takayuki Toshima
  • Patent number: 8021445
    Abstract: Disclosed are methods for upgrading carbonaceous materials. Also disclosed are apparatuses for upgrading carbonaceous materials. Also disclosed are systems for upgrading carbonaceous materials. Also disclosed are upgraded carbonaceous materials.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: September 20, 2011
    Assignee: Skye Energy Holdings, Inc.
    Inventor: David B. Shaffer
  • Patent number: 6920703
    Abstract: The object of the present invention is to provide a microstructure drying treatment method by which a substrate having a microstructure has a fine pattern of less than 30 nm and a large-caliber substrate of 100 mm or more can be dried uniformly and in a short time without generating pattern collapse, and its apparatus and its high pressure vessel. The present invention is a microstructure drying treatment method of introducing a fluid that is gas at normal temperature and pressure and is liquid under high pressure inside a high pressure vessel in which a substrate having a microstructure in a state immersed in or wet with a rinsing liquid in a liquid or supercritical state. The method forms a specific gravity difference between the rinsing liquid and fluid inside the high pressure vessel and collects the rinsing liquid to the upper side or lower side of the high pressure vessel by changing at least one side of the temperature and pressure of the fluid and changing the specific gravity of the fluid.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: July 26, 2005
    Assignee: Hitachi Science Systems, Ltd.
    Inventors: Hisayuki Taktsu, Toru Iwaya, Koichi Miyazawa, Sakae Koubori
  • Publication number: 20030088995
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Application
    Filed: December 30, 2002
    Publication date: May 15, 2003
    Applicant: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Publication number: 20030008238
    Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.
    Type: Application
    Filed: June 27, 2001
    Publication date: January 9, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Dario L. Goldfarb, Kenneth John McCullough, David R. Medeiros, Wayne M. Moreau, John P. Simons, Charles J. Taft
  • Publication number: 20020095816
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Application
    Filed: March 18, 2002
    Publication date: July 25, 2002
    Applicant: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6216363
    Abstract: A new method for treating the diapered area of a child's skin to prevent diaper dermatitis. The method features the use of a portable drying apparatus having a housing with an air admitting inlet and an air discharging outlet, a rotary impeller mechanism in the housing for creating a flow of air through the air outlet, and a handle mounted to the housing. The method employs the use of an air stream which is at or near air ambient temperature. Exposing the child's skin to air at such temperatures minimizes the risk of skin burn as a safe method for treating the diapered area. The present invention also includes an improved apparatus as referred to above.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: April 17, 2001
    Inventors: Sara Swansen, Matt Allison
  • Patent number: 5656178
    Abstract: A method is provided for the treatment of contaminated materials such as impounded sludges and contaminated soils by thermal desorption wherein a solid matrix is subjected to the action of superheated steam in a closed vessel, a gas stream comprising superheated steam is recirculated to the vessel and recirculation of the superheated steam is continued until organic constituents are separated therefrom to predetermined concentrations that are environmentally insignificant and within the limits prescribed by governmental regulations.
    Type: Grant
    Filed: April 29, 1993
    Date of Patent: August 12, 1997
    Assignee: American Color And Chemical Corp.
    Inventors: Primo Marchesi, George M. Goyak
  • Patent number: 5642671
    Abstract: A method of printing a material web includes the steps of applying ink to the material web, subsequently drying the material web with the use of heat and subsequently drying the material web, and, after cooling and prior to further processing, moistening the material web while simultaneously applying heat to the material web, and subsequently once again cooling the material web. An apparatus for carrying out the method includes, in a travel direction, a printing unit, a drying section following the printing unit, a cooling section following the drying section, a moistening section following the cooling section, and an after-cooling section following the moistening section.
    Type: Grant
    Filed: April 24, 1996
    Date of Patent: July 1, 1997
    Assignee: V.I.B. Apparatebau GmbH
    Inventor: Stefan Winheim
  • Patent number: 5569438
    Abstract: In an apparatus for treating, for purposes of sterilization, a continuous material web a first treatment station is provided and includes a device for bringing a material web into contact with liquefied hydrogen peroxide. A second treatment station is also provided in which the material web is simultaneously sterilized with hydrogen peroxide vapor and dried with heated air after treatment of the material web in the first treatment station. The second treatment station includes an elongate chamber having an inlet and outlet, the material web being dried and thereby generating hydrogen peroxide vapor as it is led through the elongate chamber from the inlet to the outlet. The second treatment station also includes an outer flow duct in flow communication with the inlet and outlet of the elongate chamber.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: October 29, 1996
    Assignee: Tetra Laval Holdings & Finance S.A.
    Inventor: Anders Hilmersson
  • Patent number: 5485685
    Abstract: There are available as chlorine base organic solvents for cleaning by vapor-defatting methylene chloride (CH.sub.2 Cl.sub.2), trichloro ethylene (CHCl.dbd.CCl.sub.2), perchloroethylene (CCl.sub.2 .dbd.CCl.sub.2), 1,1,1-trichloroethane (CH.sub.3 CCl.sub.3) and flon 113 (CCl.sub.2 FCClF.sub.2), etc., of which mainly used is a methylene chloride (CH.sub.2 Cl.sub.2) solvent. By vaporizing said methylene chloride solvent and permeating its vapor into the wood to be treated 10, to melt the tough lignin in the cell structure, thereby perforating the cell membranes, and undermine the valve action of portholes of the false vessels or vessels, fleeing of the cell water confined inside the cells and lumens is facilitated through said perforations and the porthole valves. By perforating the cells and undermining the valve action of the portholes, the fleeing of the free water confined therein, when drying the treated wood by hot air or sun's heat, is facilitated, for the benefit of very rapid drying.
    Type: Grant
    Filed: October 24, 1994
    Date of Patent: January 23, 1996
    Assignee: Eiwa Co., Ltd.
    Inventor: Yotaro Hashimoto
  • Patent number: 5473826
    Abstract: A process is disclosed for drying sol-gel derived porous wet bodies without inducing cracks therein. The wet gel preferably is immersed in a liquid solvent before being placed inside a drying chamber capable of withstanding relatively high pressures and temperatures. After the wet gel is loaded, the chamber is sealed from the outside environment, and then is heated from outside the chamber in a controlled manner until a prescribed subcritical pressure is reached. The final temperature and pressure are always lower than the critical temperature and pressure of the drying solvent. The solvent vapor is then evacuated from the chamber in a controlled fashion to decrease the pressure until ambient pressure is reached, while preferably maintaining the temperature inside the chamber at the prescribed level. Thereafter, the inside of the chamber is purged with an inert gas for a prescribed time period, after which the chamber is cooled to ambient temperature and the dry crack-free porous gel is removed.
    Type: Grant
    Filed: August 19, 1994
    Date of Patent: December 12, 1995
    Assignee: Yazaki Corporation
    Inventors: Fikret Kirkbir, Satyabrata Raychaudhuri
  • Patent number: 5424034
    Abstract: The disclosure relates to a method and an apparatus for treating, for purposes of sterilization, a continuous material web (16) by bringing the entire web or parts thereof intended for sterilization into contact with liquefied hydrogen peroxide and thereafter drying the web with the aid of a hot gaseous fluid.In order to improve the degree of destruction of micro-organisms present on the material web, the material web is dried, after contact with the liquefied hydrogen peroxide, with air which has been intentionally supplied with hydrogen peroxide.
    Type: Grant
    Filed: September 3, 1993
    Date of Patent: June 13, 1995
    Assignee: Tetra Laval Holdings & Finance SA
    Inventor: Anders Hilmersson