Plural Treatments At Same Location Patents (Class 34/426)
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Publication number: 20130219740Abstract: A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv?, the projected discharge position Gfv? being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle ? formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle ?/2 to an angle determined by deducting the half contact angle ?/2 from 90°, the half contact angle ?/2 being a half of the contact angle ?.Type: ApplicationFiled: April 11, 2013Publication date: August 29, 2013Applicant: EBARA CORPORATIONInventor: EBARA CORPORATION
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Patent number: 7805857Abstract: A dual-purpose, cooling/drying apparatus comprising a rotatable cooling/drying cylinder wherein air, steam, and water supplied from sources external of the cooling/drying cylinder are selectively introducible into and removable from a space defined inside the cylinder. The apparatus includes a first flow path through which the water is selectively introducible into the cylinder space, and a second, separate flow path through which either of the air and steam are selectively introducible into the cylinder space. The apparatus is characterized by a cooling mode, in which the water and air are selectively introducible into the cylinder space through the first and second flow paths, respectively, and a drying mode, wherein the steam is selectively introducible into the cylinder space through the second flow path.Type: GrantFiled: December 28, 2006Date of Patent: October 5, 2010Assignee: Kadant Johnson, Inc.Inventor: Alan T. Ives
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Publication number: 20090272005Abstract: A drying apparatus includes a thermal roll for contacting and heating aluminum web in a continuous sheet form. The thermal roll includes a roll surface, having a static friction coefficient ? defined by contact with the web. The static friction coefficient ? satisfies a condition of: t+V?G wherein ? G = ? ? · ? A ? ? 1 = ? ? · t · sin ? ( ? / 2 ) where t is tension applied to the web; G is roll retaining force with which the roll surface frictionally retains the web; V is thermal expansion force generated by thermal expansion of the web retained on the roll surface; ?A1 is pressing force caused by the tension to the web and applied to the roll surface by the web; ? is a wrap angle at which the web contacts the roll surface. Thus, distortion of the web can be prevented even with a great difference in the temperature from the thermal roll.Type: ApplicationFiled: April 22, 2009Publication date: November 5, 2009Applicant: Fujifilm CorporationInventors: Kenji Hayashi, Toru Onogawa
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Patent number: 7162811Abstract: A method for completely drying polished nails without any smudging or nicking. The method utilizes first warm air and then very cold air followed by a brief return to warm air. The warm air of the inital step uses air at a temperature of approximately eighty-five degrees Farenhit for approximately four minutes. The very cold air has a temperature of approximately thirty-five degrees and is blown for approximately two minutes. The last step utilizes the intial heating temperature of eighty-five degrees Farenheit but for only fifteen seconds.Type: GrantFiled: June 16, 2003Date of Patent: January 16, 2007Inventors: Diane E. Delaney, Cornelia A. Arndt
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Patent number: 7146744Abstract: The present invention provides method and apparatus for surface treatment which, when employed in process steps of manufacturing semiconductor devices, can result in the final products having enhanced reliability. According to the surface processing method, an obeject to be processed W is introduced in a processing vessel 10, which is then supplied with ClF3 gas serving as cleaning gas from a supply unit 26. The ClF3 gas is bound to the surface of the object to be processed W, and although the supply of the gas to the processing vessel is interrupted, the ClF3 gas bound to the surface of the object to be processed W serves to clean the surface of the object to be processed. Next, reducing gas is introduced into the processing vessel W to remove chlorine from the object to be processed W, the chlorine being derived from the ClF3 gas. After that, the introduction of the reducing gas is interrupted, and the cleaned object to be processed W is exported from the processing vessel 10.Type: GrantFiled: April 27, 2004Date of Patent: December 12, 2006Assignee: Tokyo Electron LimitedInventor: Yasuo Kobayashi
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Patent number: 7017281Abstract: A first gas nozzle and a second gas nozzle are fixedly provided in the vicinity of the forward end of a nozzle arm. The nozzle arm is rotated along a locus R while a substrate rinsed with deionized water is rotated, for discharging nitrogen gas from the first and second gas nozzles. Visible moisture is loosely expelled from the upper surface of the substrate by spraying the nitrogen gas from the first gas nozzle, and moisture slightly remaining on a fine pattern or the like can also be completely removed by spraying the nitrogen gas from the second gas nozzle to the same region of the substrate as that sprayed with the nitrogen gas by the first gas nozzle. Consequently, the surface of the substrate can be stably and reliably dried. Thus, a substrate processing apparatus capable of stably and reliably drying the surface of the substrate is provided.Type: GrantFiled: August 5, 2003Date of Patent: March 28, 2006Assignee: Dainippon Screen Mfg. Co., Ltd.Inventor: Akira Izumi
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Patent number: 6962007Abstract: A device for drying substrates which stores a plurality of substrate (1) and which comprises a processing container (3) to which cleaning fluid (2) after cleaning the substrates (1) is drained and an injection nozzle (5) for injecting drying fluid located at the terminating part of a feed pipe (4) through which liquid drying fluid is supplied, whereby an exhaust equipment is eliminated or simplified, and the drying fluid is fed smoothly.Type: GrantFiled: August 10, 1999Date of Patent: November 8, 2005Assignees: Toho Kasei Ltd., Daikin Industries, Ltd.Inventors: Norio Maeda, Koji Sumi, Hiroshi Aihara, Masao Oono, Naoaki Izu Tani
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Patent number: 6910284Abstract: The objective of the present invention is an accelerated drying process for wood, capable of use with all species and of maintaining the quality of the dried wood intact, in which the temperature of the system is kept within the glass transition temperature range, for an appropriate period so as to attain the intended humidity ratio of the wood. It relates to an accelerated drying process for wood based on the rheological properties (hygro-thermalviscoelastic) of the latter, where the glass transition temperature of lignin is used as a relaxant or neutralization agent for the residual growth stress of trees, as well as those from the drying process. The process is controlled by monitoring the temperatures of the wood through the use of thermocouples placed along the length of the pieces. Furthermore, the use of the process of the present invention provides a significant reduction in the drying time and a reduction of the defects because molecular fluidity is maintained.Type: GrantFiled: December 20, 2001Date of Patent: June 28, 2005Assignees: Empresa Brasileira de Pesquisa Agropecuaria-Embrapa, Ecole Nationale du Genie Rural des Eaux et des Forets-EngrefInventors: Osmar José Romeiro de Aguiar, Patrick Perré
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Patent number: 6289603Abstract: A dryer for drying continuous strips of paper uses blowing and suction airflows. The temperature of the suction airflow is higher than the temperature of the blowing airflow. The dryer exchanges energy between the blowing and suction airflows.Type: GrantFiled: February 17, 2000Date of Patent: September 18, 2001Assignee: Solaronics Process SAInventors: Yannick Lescanne, Jean-Pierre Robin
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Patent number: 6263590Abstract: A method and apparatus for reducing byproduct induced defects in a processing tool is provided. A purge gas is introduced into a vessel of the processing tool. The vessel is heated to a temperature above a vaporization temperature of the byproduct. The temperature is maintained for a predetermined period of time. The vessel is purged to remove at least a portion of the byproduct.Type: GrantFiled: July 12, 1999Date of Patent: July 24, 2001Assignee: Advanced Micro Devices, Inc.Inventors: William A. Whigham, Mark E. Culp, Allan T. Nelson
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Patent number: 6061926Abstract: An effect is induced within a chemical system consisting of at least two substances having differing degrees of microwave transparency, by exposing the mixture to focused microwave energy having a generally uniform energy density level, and an energy density at a level exceeding the capacity of at least one of the substances to dissipate the energy as thermal energy. The treatment is carried out until the thermodynamic state of the system is in a non-equilibrium state. The rate at which the effect is carried out is substantially increased over that which would be expected under equilibrium thermodynamic conditions. The effect may consist of an exothermic or endothermic chemical reaction or a separation process including a volatilization process.Type: GrantFiled: November 5, 1998Date of Patent: May 16, 2000Assignee: Her Majesty the Queen in right of Canada, as represented by the Minister of the EnvironmentInventors: J. R. Jocelyn Pare, Jacqueline M. R. Belanger, Monique M. Punt
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Patent number: 6029368Abstract: The present invention is directed to a method for removal of VOCs from wood products prior to drying the wood products. The method of the invention includes the steps of providing a chamber having an opening for receiving wood and loading the chamber with green wood. The wood is loaded to an extent sufficient to provide a limited headspace in the chamber. The chamber is then closed and the wood is heated in the chamber for a time and at a temperature sufficient to saturate the headspace with moisture and to substantially transfer VOCs from the wood product to the moisture in the headspace.Type: GrantFiled: December 15, 1997Date of Patent: February 29, 2000Inventors: Sujit Banerjee, James Robert Boerner, Wei Su
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Patent number: 5884418Abstract: A process and system for impregnating garments with insect repellent, the ocess including the steps of placing the garments in a first machine and tumbling the garments therein, introducing into the first machine a mixture of liquid insect repellent and water so as to spray the mixture onto the tumbling garments, terminating the introduction of the mixture into the first machine and continuing the tumbling of the garments therein, terminating the tumbling of the garments in the first machine, and placing the garments in a second machine and tumble drying the garments therein; and the system comprising a reservoir for a mixture of the repellent in liquid form and water, a first machine for receiving and retaining the garments and tumbling the garments, a spray nozzle in the first machine for directing a spray of the mixture onto the garments during tumbling thereof, a conduit extending from the reservoir to the spray nozzle, and a pump in the conduit for flowing the mixture from the reservoir to the spray nozzType: GrantFiled: June 8, 1998Date of Patent: March 23, 1999Assignee: The United States of America as represented by the Secretary of the ArmyInventor: Bartley F. McNally
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Patent number: 5882381Abstract: A thermal desorption system for the treatment of contaminated solids.Type: GrantFiled: March 27, 1997Date of Patent: March 16, 1999Assignee: Modern Equipment Company, Inc.Inventors: Gunther Hauck, Lynwood L. Socks, Rodney H. Schueller, Robert Youmans, John W. Noland, Wayne L. Read
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Patent number: 5749159Abstract: This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N.sub.2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.Type: GrantFiled: May 22, 1997Date of Patent: May 12, 1998Inventor: Robert S. Schwenkler
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Patent number: 5623770Abstract: In order to dry and cure a coating based on a water dilutable system, heat is supplied to the coating using an infrared radiator (1). In order to accelerate evaporation of the water, an air flow aligned perpendicularly to the infrared radiation is produced between the article on which the coating is applied, and the infrared radiator (1), using a fan (2). The power of the infrared radiator (1) and/or that of blower (2) can be changed in the course of drying and curing.Type: GrantFiled: November 30, 1994Date of Patent: April 29, 1997Assignee: Peter Andreas HoffmanInventor: Friedrich Hoffmann
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Patent number: 5569438Abstract: In an apparatus for treating, for purposes of sterilization, a continuous material web a first treatment station is provided and includes a device for bringing a material web into contact with liquefied hydrogen peroxide. A second treatment station is also provided in which the material web is simultaneously sterilized with hydrogen peroxide vapor and dried with heated air after treatment of the material web in the first treatment station. The second treatment station includes an elongate chamber having an inlet and outlet, the material web being dried and thereby generating hydrogen peroxide vapor as it is led through the elongate chamber from the inlet to the outlet. The second treatment station also includes an outer flow duct in flow communication with the inlet and outlet of the elongate chamber.Type: GrantFiled: February 17, 1995Date of Patent: October 29, 1996Assignee: Tetra Laval Holdings & Finance S.A.Inventor: Anders Hilmersson
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Patent number: 5560122Abstract: The invention relates to a one-pot mixer/granulator/dryer constituting a single step or one-pot production apparatus for successively mixing, moist-granulating and drying solid pharmaceutical products, for example in the manufacture of powdered products, pellets or granules. The dryer according to the invention has a substantially improved drying performance compared with conventional production equipment. The high efficiency of drying is achieved by the simultaneous use of four different drying mechanisms.Type: GrantFiled: May 19, 1994Date of Patent: October 1, 1996Assignee: Dr. Karl Thomae GmbHInventors: Kurt Bauer, Wolfram Carius, Gerold Duschler
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Patent number: 5519948Abstract: A process for the production of pourable, free-flowing granules which are suitable for use as wetting agents, detergents or cleaning products from aqueous solutions or suspensions of such materials in a fluidized-bed spray granulation apparatus employing a hot fluidizing gas. The aqueous selections or suspensions are dried with superheated steam as the fluidizing and drying gas wherein the drying step is carried out in a closed-loop system comprising a steam circuit from which the water evaporated from the aqueous solutions or suspensions of starting materials is removed as a partial stream and the thermal energy released is returned to the steam circuit. The granules are discharged from the granulation apparatus before they can be damaged by heat.Type: GrantFiled: October 26, 1994Date of Patent: May 28, 1996Assignee: Henkel CorporationInventors: Wilfried Raehse, Johann Fues, Wilhelm Beck, Otto Koch
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Patent number: 5515621Abstract: The present invention disclosed and claimed herein comprises an apparatus and method for curing and drying coatings on nails of the human hand. A housing (12) is provided having two elongated solid sides (14), one elongated solid top (15), two solid ends (16), and an elongated underneath side (18) having a length. Restrictive air vents (22) are provided along the length of the elongated underneath side (18) of the housing (12), such that the housing (12) and air vents (22) define a substantially closed air pressure chamber (34). An ultraviolet light source (20) is disposed along the underneath side (18). A flat surface (26) running the length of the underneath side (18) is disposed a distance beneath the restrictive air vents (22) and the ultraviolet light source (20).Type: GrantFiled: June 23, 1994Date of Patent: May 14, 1996Assignee: ASR Affiliates, Inc.Inventor: Ira G. Bloom
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Patent number: 5495680Abstract: A continuous extrusion and curing line has a linear hot air curing furnace which includes at least one UHF module which is selectively linearly movable along a length of the furnace.Type: GrantFiled: January 21, 1994Date of Patent: March 5, 1996Assignee: The Standard Products CompanyInventor: Gerard Mesnel
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Patent number: 5424034Abstract: The disclosure relates to a method and an apparatus for treating, for purposes of sterilization, a continuous material web (16) by bringing the entire web or parts thereof intended for sterilization into contact with liquefied hydrogen peroxide and thereafter drying the web with the aid of a hot gaseous fluid.In order to improve the degree of destruction of micro-organisms present on the material web, the material web is dried, after contact with the liquefied hydrogen peroxide, with air which has been intentionally supplied with hydrogen peroxide.Type: GrantFiled: September 3, 1993Date of Patent: June 13, 1995Assignee: Tetra Laval Holdings & Finance SAInventor: Anders Hilmersson
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Patent number: RE37627Abstract: A centrifugal wafer drying apparatus comprises a rotor rotatably disposed in a container, a cradle mounted on the rotor, and a carrier mounted in the cradle and having grooves for receiving wafers. The carrier holds the wafers at an oblique angle with respect to a plane normal to the axis of rotation of the rotor, at least during rotation of the rotor.Type: GrantFiled: November 30, 1999Date of Patent: April 9, 2002Assignee: Oki Electric Industry Co., Ltd.Inventor: Yoshifumi Hirano