Abstract: A two-dimensionally periodic, color-filtering grating has a contiguous high-refractive. In an embodiment, the color-filtering grating includes a metallic ground layer defining a grating plane and above the ground layer a two-dimensionally regular pattern of individual high-refractive, such as metallic areal elements that respectively extend parallel to the grating plane and respectively are spaced apart from the ground layer through an intermediate dielectric by a distance that is greater than the thickness of the ground layer and of the areal elements. The regular pattern has in at least two directions, which run parallel to the grating plane, a periodicity between 100 nm and 800 nm, and preferably between 200 nm and 500 nm.
Abstract: Insulated-gate semiconductor devices, such as MOSFETs or IGTs, include an implant shorting region adjoining both base and source regions with the implant shorting region being conductively coupled to the source electrode so as to implement a base-to-source electrode short. The implant shorting region can be formed without a specially-aligned mask by utilizing the gate electrode as an implant mask.
Abstract: According to this process, a plurality of translucent monochrome supports of different colors are prepared. Each support is constituted by a transparent film coated on one side with a coloring matter. Then an elementary pattern is made by a selective scraping with a tool. By superimposing the engraved monochrome supports a final image is obtained by transparency which is the synthesis of the elementary patterns. The process lends itself particularly well to three-color or four-color printing.