Abstract: Disclosed is an aperture variable inspection optical system including a variable aperture unit 13 having a polygonal light transparent section and light collecting systems 12a, 12b for forming an irradiation spot U of light passing through the variable aperture unit 13 at the position of a sample S. The variable aperture unit 13 is capable of changing the shape/size of the polygon. The size of the irradiation spot U can be changed without rearranging the aperture unit.

Abstract: A system and method for automatically focusing an optical lens controls the light generated by a light-emitting device of an image measuring machine to penetrate a glass sheet, so as to project a picture of the glass sheet onto an object. The system and method further moves an optical lens along a Z-axis of the image measuring machine to capture one or more digital images of the object, and computes a definition value of each captured digital image. Furthermore, the system and method obtains a focus position corresponding to the highest definition value of the captured digital image.

Abstract: When detecting fluorescence of a bead chip array, reflected light from a bead is detected at the same time, so as to recognize the bead position. The reflected light can be detected in a similar manner for all beads, regardless of the presence or absence of a fluorescent substance. If the positions of all beads are detected, accurate detection can be achieved by quantifying only the fluorescence at the detected positions. The fluorescence wavelength alone is detected by a first detector using a wavelength selection filter. Other wavelengths are detected by a second detector, thereby obtaining the reflected light. Data on the reflected light is processed into an image for obtaining the bead profile, the bead position is recognized by detecting the center position based on the profile, and the fluorescence is quantified based on the bead position.

Abstract: A surface height and focus sensing system is provided. In one embodiment, an illumination focus sensor is used in combination with a collimation adjustment element which drives the system such that an illumination focus height matches the workpiece surface height, which produces a null output from the illumination focus sensor. Under the null condition, the amount of collimation adjustment is directly related to the workpiece surface height, and the resulting height determination is relatively insensitive to the workpiece surface optical properties. In one embodiment, the amount of collimation adjustment is determined according to the control signal for the collimation adjustment element. In another embodiment, a collimation adjustment sensor is utilized to measure the amount of collimation adjustment.

Abstract: To provide a bioassay system or the like, which can solve the problem of allocating spaces above detecting sections and can also stabilize servo-controlled operation of a disk-shaped plate.

Abstract: A method of measuring a front surface profile and a back surface profile of a target object includes: mounting the target object in such a posture that a first measuring surface (front surface) is measurable by a probe; first measuring a contour of the target object; measuring the first measuring surface of the target object; reversing the target object; second measuring the contour of the target object with the reversed posture of the target object being maintained; obtaining a measurement position of a second measuring surface by comparison of contour data obtained through the first and second measuring of the contour, the measurement position of the second measuring surface corresponding to a measurement position of the first measuring surface at which the measuring of the first measuring surface is conducted; and measuring a profile of the second measuring surface along the obtained measurement position of the second measuring surface.

Abstract: A method and system for measuring an optical property of a multi-focal lens are disclosed. One embodiment of the method comprises: filtering out light transmitted by all but one of a plurality of diffraction orders of the lens to provide an unfiltered light from a single diffraction order; receiving the unfiltered light at a wavefront detector; and analyzing the unfiltered light at the wavefront detector to measure the optical property. The multi-focal lens can be a multi-focal diffractive intra-ocular lens. The measured optical property can be a discontinuity in the lens surface. Filtering can comprise blocking all but the unfiltered light using an aperture operable to let through the unfiltered light from the single diffraction order, and/or blocking all but the unfiltered light using an opaque obstruction operable to let through only a selected amount of light corresponding to the light transmitted by the single diffraction order.

Abstract: A focal point detection apparatus enlarges a pull-in range of an auto-focus operation easily. The apparatus includes: illumination part illuminating an object plane via first visual field stop; first image-forming part forming an intermediate image of the first visual field stop on second visual field stop based on light from object plane, and transmitting intermediate image without blocking it with second visual field stop when object plane within a specified range contains a focused focal plane, and blocking a portion of intermediate image using second visual field stop when object plane is outside specified range, with remaining portion transmitted; second image-forming part dividing into two the final image of first visual field stop based on light from first image-forming part; and generating part detecting a gap between the divided final images and generating a focusing signal responsive to a locational relationship of object plane to focused focal plane.

Abstract: According to various illustrative embodiments, a device, method, and system for measuring optical fine structure of lateral modes of an optical cavity are described. In one aspect, the device comprises at least one photodetector arranged to detect an output of the optical cavity in a lateral direction thereof. The device also comprises an analyzer coupled to an output of the at least one photodetector and arranged to analyze at least a portion of signals produced in the at least one photodetector by at least a portion of the lateral modes of the optical cavity. The device also comprises a processor arranged to determine the optical fine structure of the at least the portion of the lateral modes of the optical cavity based on an output of the analyzer.

Abstract: An apparatus and a method are presented for detecting the focal position of an optical system (10) with a radiation source (12), a focusing imaging system (16), an at least partially reflective surface (18) on the focus (18a), a digital camera (24) for recording an image reflected by said surface (18), a computer (C) for evaluating the image recorded by the camera (24), and with an optical element (34; 36) in the beam path of the optical system (10) upstream of the focusing imaging system (16), which element influences said image depending on the focal position.

Abstract: The invention relates to a method and to apparatus for contactlessly measuring the curvature of an ophthalmic article (1) having a “front” face (1B) that presents said curvature. The method consists in: sequentially emitting at least two light beams (L1, L2) onto said front face, these two light beams being offset by a certain angle (?) and converging substantially onto said front face, one of said emitted light beams (L1) being substantially centered on said front face and being substantially normal to said front face; analyzing the wave fronts of the resulting reflected beams (L?1, L?2) in order to determine their respective focuses (F1, F2) therefrom; and deducing the radius of curvature of said face; said operations being performed in such a manner that said emitted beams are substantially not reflected by the rear face of said article.

Abstract: An apparatus and method for optically analyzing samples in a biological sample container containing samples arranged at different locations on the base of the container. An optical acquisition device is provided comprising a detector and an objective. The position of the upper and lower surfaces of the base at each of the sample locations is determined by a confocal polychromatic displacement sensor. Light is collected from each of the sample locations by adjusting the focal plane to be coincident with, or vertically offset from, the upper surface of the base, as determined from the displacement sensor. This allows for rapid scanning of large numbers of samples in a multi-well plate or other biological sample containers.

Abstract: A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis. Focus calibration is used to determine the optical response of the metrology device to the focus offset. The modeled data is adjusted based on the optical response to the focus offset and the model regression analysis fits for the focus offset as a variable parameter along with the sample characteristics that are to be measured. Once an adequate fit is determined, the values of the sample characteristics to be measured are reported. The adjusted modeled data may be stored in a library, or alternatively, modeled data may be adjusted in real-time.

Abstract: A focal position determining method determines a focal position of an objective lens focused on an observed target region in a specimen. The focal position determining method includes measuring any one of the focal position of the objective lens at a near point and the focal position of the objective lens at a far point or both so as to determine the focal position of the objective lens focused on the observed target region based on the measured focal position.

Abstract: A shape value of a pattern having a pivotal characteristic is measured (step S1), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of the measurement of the shape value (Step S2), an exposure energy is calculated (Step S3), a shape value of an isolated pattern is measured (Step S4), a second data base is accessed using a result of the measurement (Step S5), and a focal variation is determined using the calculated proper exposure energy (Step S6).

Abstract: A method is performed for determining a suitable workpiece processing focal position of a laser beam. The method includes adjusting one or more of a laser beam and a workpiece until a periphery of the laser beam contacts a lateral edge of the workpiece, determining, from at least a focal position of the laser beam associated with the peripheral beam contact with the workpiece, a suitable workpiece processing focal position of the laser beam, and then adjusting the laser beam to the suitable workpiece processing focal position.

Abstract: A testing table that allows testing lights along its length. The testing table can be used to convey lights along the direction, and to test the lights at different locations along the direction along the conveying. The lights can be cleaned and tested. Empty tubs can be returned.

Abstract: A measuring apparatus which applies light, emitted from a light source, to a sample contained in a container, and detects light emitted from the sample to measure physical or chemical properties of the sample, includes a measuring optical system which measures the sample, and a position detection optical system which detects the position of the bottom of the container.

Abstract: A surface height and focus sensing system is provided. In one embodiment, an illumination focus sensor is used in combination with a collimation adjustment element which drives the system such that an illumination focus height matches the workpiece surface height, which produces a null output from the illumination focus sensor. Under the null condition, the amount of collimation adjustment is directly related to the workpiece surface height, and the resulting height determination is relatively insensitive to the workpiece surface optical properties. In one embodiment, the amount of collimation adjustment is determined according to the control signal for the collimation adjustment element. In another embodiment, a collimation adjustment sensor is utilized to measure the amount of collimation adjustment.

Abstract: Within a lithography process having a critical dimension, a method, system and structure for determining a focus deviation value relative to an ideal focus position said is disclosed. By projecting a series of lines or spots characterized by the constant pitch size which is greater than the projection devise optical resolution and incrementally increasing widths onto the surface of the photoactive material, wherein the width of at least one of the lines or sports is substantially the same as the critical dimension, and the widths of the other lines or spots are substantially equally distributed around the critical dimension, approximate focus and exposure dose deviation values may be determined.

Abstract: The invention relates to an optical device in which a spherical aberration is detected. The optical device comprises means (206, 208) for focussing a first radiation beam (203) having a first numerical aperture and a second radiation beam (204) having a second numerical aperture lower than the first numerical aperture, on an information carrier (200). The optical device further comprises means (211) for detecting a first focus error signal corresponding to the first radiation beam and a second focus error signal corresponding to the second radiation beam. In order to measure the spherical aberration of the first radiation beam, due to a variation of the cover layer thickness of the information carrier, the optical device comprises means (212) for measuring a spherical aberration of the first radiation beam from the first and second focus error signals.

Abstract: A method of process variation compensation in step-and-scan lithography which comprises estimating a magnitude of a process error over a full imaged substrate surface and applying error correction during scan exposure over the full imaged substrate surface is provided in the disclosed embodiments.

Abstract: In an embodiment in accordance with the present invention, methods for dynamic detection and correction of focus and tilt variations that occur during a specific product layer exposure is by focus and tilt pre-compensation during wafer exposure. The method provides two spaced apart paths that provide both defocus and tilt measurements. A reference plane is defined by using three reference areas or fields. The data is fitted, using least squares or max/min error, to a “plane”, that is, to straight equidistant lines, the deviation from “plane” is computed as error from a set of straight equidistant lines. Lateral displacements of each band into focus error is converted using the formula: ?Z=?X*?.

Abstract: To measure or exert optically-induced forces on at least one particle in the focus of an optical cage, the following steps are taken: a) the focus is positioned in a microelectrode arrangement with a three-dimensional electrical field that has a field gradient which forms an electrical capture area, and the focus is at a distance from the capture are and b) the amplitude of the electrical field, the light power of the light beam forming the optical cage, and/or the distance of the capture area from the focus are varied to detect which varied field property moves the particle from the focus to the capture area or vice versa, or at least to temporarily move the particle into the capture area.

Abstract: An embodiment described herein provides a technique to determine a focus point of a lense. Light is directed from a light source through the lense and onto a target surface. The light source and target surface may be positioned on opposite sides of the lense. The target surface may correspond to the position of where a primary light source for the particular application is to be located. A reflection passing through the lense from the reflective target surface may be located. A determination is then made as to whether the position where the reflection was located also could also corresponds to a focus point for the lense, if the primary light source was to be located at or near the target surface.

Abstract: An electrostatic corrector with a rectilinear optical axis has two corrective parts, which are arranged one behind the other along the optical axis and which have respective quadrupole fields and superimposed circular lens fields. The astigmatic intermediate image of one cross-section that is created by an axis point lies in one corrective part and the astigmatic intermediate image of the other cross-section, which is perpendicular to the first cross-section, lies in the other corrective part. An object of the invention is to eliminate the chromatic aberration of particle lenses. To achieve this, an electrostatic corrector is used, which includes two corrector units having similar instrumental construction, with each of the two corrector units having input and output sides on which two additional electrostatic quadrupoles are located. The two corrector units represent the axial paths in a telescopic manner in a 1:1 representation.

Abstract: A projection exposure apparatus for imaging and printing a pattern, formed on a first object, upon a second object through a projection optical system. The projection exposure apparatus includes a storing device for storing information related to light intensity distribution on a pupil plane of the projection optical system in a reference state, and a detecting device for detecting a wavefront of the projection optical system in an arbitrary state, on the basis of the stored information.

Abstract: An enhanced dynamic range wavefront sensing system includes a light source disposed on a first side of an optically transmissive device, a wavefront sensor disposed on a second side of an optically transmissive device, a relay imaging system disposed between the optically transmissive device and the wavefront sensor, and means for adjusting a distance between the light source and the optically transmissive device. Beneficially, the relay imaging system includes a range-limiting aperture to insure that the wavefront sensor never goes out of range so that a feedback system can be employed to move the light source one focal length away from the optically transmissive device.

Abstract: Methods for determination of parameters in lithographic devices and applications by cross-section analysis of scatterometry models, including determination of center of focus in lithography devices and applications. Control methods are provided for process control of center of focus in lithography devices utilizing cross-section analysis.

Abstract: A device for the analysis of an optical wavefront includes an array (ML) of microlenses (Li), and signal processing elements. Each mircolens (Li) defines a subaperature (Spi), and focuses an elementary surface of the wavefront, intercepted by the subaperature, for forming a spot (Ti) on the detector. For each subaperature (Spi), a zone (Zi) of assumed localization of the spot is defined. The processing unit makes it possible to establish a measurement file associating to each subaperature the position of this spot. The structure of the array (ML) presents one or several local variations. By comparing the contribution of these local variations taken from the measurement file, with their contribution taken from a reference file, the displacement between the subaperature from which a detected spot is derived and the subaperature that defines the zone of assumed localization wherein the spot is located is measured.

Abstract: There is disclosed a dose monitor method comprising illuminating a mask with illumination light, which is disposed in a projection exposure apparatus and in which a dose monitor pattern is formed, passing only a 0th-order diffracted light through a pupil surface of the projection exposure apparatus in diffracted lights of the dose monitor pattern, and transferring a 0th-order diffracted light image of the dose monitor pattern onto a substrate to measure dose, wherein during the illuminating, a center of gravity of the 0th-order diffracted light image passed through the dose monitor pattern on the pupil surface of the projection exposure apparatus is shifted from an optical axis of the projection exposure apparatus.

Abstract: A mask having at least one pair of mutually parallel slit structures, separated from one another by a distance in an opaque layer, is introduced into a mask mount. The mask side having the layer is turned to the illumination source. During mask exposure, a far field interference pattern is produced on the opposite rear side of the mask through the slit structures and projected into the substrate plane through a lens system of the exposure apparatus. The interference pattern is recorded as an image signal through exposure of a photosensitive layer of a wafer or by sensors on a movable substrate holder. Through determination of the contrast and subsequent Fourier transformation thereof as a function of distance between slits, the light distribution of the illumination can be derived. An advantageous mask has a multiplicity of slit structure pairs disposed with different angles with respect to a preferred direction and different distances in matrix form thereon.

Abstract: A gemstone marking system includes a focus sensing unit sensing relative disposition between the marking surface of the gemstone and the focal plane of the laser beam. The focus sensing unit includes a light source emitting a collimated optical beam directed in parallel to the focal plane of the laser beam and overlapping regions positioned in close proximity to the focal plane of the laser beam, an optical detector measuring the power of the sensing optical beam (the power of the sensing optical beam depends on a relative disposition between the marking surface of the gemstone and the focal plane of the laser beam), and a signal processing unit operationally coupled to the output of the optical detector for receiving and processing data corresponding to the relative disposition of the marking surface of the gemstone and the focal plane of the laser beam. The signal processing unit, in response to the data obtained from the optical detector, automatically controls the position of the gemstone.

Abstract: Disclosed is a method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern, wherein the method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.

Abstract: The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.

Abstract: An vehicle lamp assembling apparatus including a jig which supports a lamp component, an apparatus main body having disposed thereon positioning and fastening mechanisms (plungers and engagement holes) for positioning and fastening the jig to the apparatus main body. Some equipment (contact units) is disposed on the apparatus main body, and/or on the jig, for carrying out a predetermined processing, such as working or inspection, on the lamp component supported by the jig. Further, a control part is disposed on the apparatus main body, for drive control of the equipment. An ID plate that stores processing information, such as driving procedures and driving amount of the equipment, is disposed on the jig, whereas a non-contact memory reader is disposed on the apparatus main body so as to oppose the ID plate when the jig is fastened to the apparatus main body. The control part drives the equipment based on the processing information read from the ID plate via the memory reader.

Abstract: A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern. The method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.

Abstract: An apparatus and a method adapted to be used in manufacturing an image scanning apparatus for calibrating a reflective lens on a carriage are disclosed. A calibrating device has thereon a first set of three projective points from three point light beams and a first set of three calibrating points corresponding to three point light sources. The calibrating device further includes thereon a second set of three projective points and a second set of three calibrating points for matching each of the projective points on the calibrating device with a corresponding one of the calibrating points by adjusting an angle and a position of the reflective lens on the carriage so as to achieve a calibrating function.

Abstract: An impurity doped SiC substrate 1 and SiC thin film 2 are irradiated with a laser light 5 having a wavelength longer than such a wavelength that a band edge absorption of a semiconductor is caused. The wavelength of the laser light 5 may be such a wavelength that an absorption is caused by a vibration by the bond of an impurity element and an element constituting the semiconductor, for example, a wavelength of 9 &mgr;m to 11 &mgr;m. Specifically, in the case where Al is doped in SiC, the wavelength of the laser light 5 may be within the range of 9.5 &mgr;m to 10 &mgr;m.

Abstract: An optical monitor includes a body having a first plurality of parallel, substantially opaque, spaced apart lines thereon, and the second plurality of parallel, substantially opaque, spaced apart lines thereon, with a relatively small angle between the first and second pluralities of lines. A an image of the lines of the first plurality thereof is provided on the semiconductor body, upon relative movement of the monitor toward and away from the semiconductor body, the line images move relative to the semiconductor body. The images of the lines of the second plurality thereof provided on the semiconductor body move in a different manner upon relative movement if the monitor toward and away from the semiconductor body: The moiré fringe formed on the semiconductor body from images of the first and second plurality of lines during such movement is analyzed in order to achieve proper focus of the image on the semiconductor body.

Abstract: A wavefront sensor includes a plurality of lenses disposed in the same plane, and an area sensor that receives a bundle of rays of light collected through each of the lenses as a luminous point. Each of the lenses comprises a plurality of concentric areas with different focal lengths, and the area sensor is located substantially halfway between a first position in which a plane wave forms an image after passing through one of the concentric areas with a minimum focal length, and a second position in which the plane wave fronts an image after passing through another area with a medium focal length. With the wavefront sensor thus arranged, the measurement can be always achieved with high accuracy without involving noticeable blurring of luminous points on the area sensor regardless of the wavefront shape of a light beam indent to the lenses.

Abstract: An optical system used in an optical measuring apparatus for measuring optical characteristics of, for example, a liquid crystal display panel (LCD panel) guides rays emitted from the LCD panel and having exit angles equal to or smaller than a predetermined maximum exit angle &agr;. A lens of the optical system satisfies the following two equations. f=|2·h/tan &agr;| L=(H−h)·f/H Hereupon, the symbol “f” designates a focal length of the lens; the symbol “h” designates the maximum height of the photosensitive plane of the photosensor from an optical axis of the lens on the photosensing plane; the symbol “L” designates a distance from a principal point of the lens in the image side to the photosensing plane; and the symbol “H” designates the maximum height of the object from the optical axis of the lens.

Abstract: A method and apparatus for autofocus on a target layer contained within a microplate well is provided. The instrument is capable of optically sensing a reference point on the underside of a microplate. This reference point is then used to focus light onto a target layer within the microplate well, the target layer having a location that is in defined relation to the reference point. The reference point is either a surface of the bottom of the microplate well or is an optically detectable mark on the underside of the microplate. In an alternate embodiment, a light position sensitive detector is used to enable deterministic autofocus for a plurality of wells on a microplate.

Abstract: A thin-film magnetic head wafer with a surface to be exposed by means of an optical stepper includes a plurality of thin-film magnetic head elements formed on the surface, and distance check regions that are flat in level and horizontal to the surface of the wafer, at least one of the distance check regions being formed on the surface within one exposure area of the optical stepper.

Abstract: A method for testing the reliability of fiber-optic laser modules by determining the change in position over time of the focal point of the fiber tip relative to the laser, wherein the coupling efficiency and influence coefficients of the laser module are used to determine whether the focal point of the fiber tip is moving relative to the laser at an unacceptable rate of displacement such that the laser module is likely to malfunction and is therefore unacceptable for use.

Abstract: The present invention is for a method for adjusting a focus of a multichannel printhead (500) for an imaging processing apparatus (10) performing the steps of establishing a home focus position and moving the printhead (500) in a first direction a predetermined number of coarse density. The printhead (500) is moved to the coarse focus position and then moved in a second direction a predetermined number of fine steps. A series of second test patches is printed on the media (32) at each of the fine steps. A fine focus position is determined by checking a fine density of each of the second test patches and selecting the fine focus position corresponding to the second test patch having a highest fine density.

Abstract: The spherical aberration of an optical beam is determined by focusing the beam, and dividing its cross-section in at least two concentric zones. The sub-beams passing through the zones are focused each on a focus-detection system. The distance between the positions of the two foci is a measure for the spherical aberration present in the beam.

Abstract: A system which determines one or more properties of a lens includes a light source and a target pattern illuminated by the light source illuminates and substantially positioned at a first conjugate position of the lens. A detector, including an active surface, is positioned at a second conjugate position of the lens such that an image of the target pattern is formed on the active surface. The detector generates an analog electrical signal based on the image and the a generator converts the electrical signal to a representative digital signal for processing. In the system, the detector is movable relative to the lens to test the lens at plural focus positions, and plural detector output signals correspond to a feature of the target pattern at plural focus positions.

Abstract: Electron-optical rotationally symmetrical lenses inevitably suffer from chromatic aberration which often determines the resolution limit at low acceleration voltages. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to improve the resolution nevertheless, it has already been proposed to correct the chromatic aberration by means of a corrector (28) provided with two correction elements (34, 40). Each correction element consists of a number of quadrupole fields. Using the known corrector, it has been found that the chromatic magnification error is inadmissibly high. In order to solve this problem, the correction elements in the corrector according to the invention are provided with at least five layers of electrodes (60-a, 60-b, 60-c, 60-d) which produce quadrupole fields.

Abstract: A non-contact type data symbol reader is provided which includes a light projecting system for projecting an optical image defining an area capable of being read onto a readout surface. When an infocus image is formed on the readout surface by the light projecting system, the data symbol reader is being held at a distance from the readout surface where an infocus image of the symbol to be read is obtained.