For Orientation Or Alignment Patents (Class 356/508)
  • Patent number: 10976151
    Abstract: An optical interferometer includes a beam splitter module and an optical sensor. The beam splitter module includes a lens assembly and a splitter cube. A light incident surface of the splitter cube is substantially orthogonal to an optical axis of the lens assembly. An acute angle is between the light incident surface and a light splitting surface of the splitter cube. A sampling surface of the splitter cube is substantially parallel to the light incident surface. A light reflecting surface of the splitter cube is substantially orthogonal to the light incident surface. The light incident surface is closer to the lens assembly than the sampling surface. A reference arm is defined between a splitter position on the light splitting surface and the light reflecting surface, a sample arm is defined between the splitter position and the sampling surface, and the reference arm is longer than the sample arm.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: April 13, 2021
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yuan Chin Lee, Ting Wei Chang, Chi Shen Chang, Chy Lin Wang
  • Patent number: 10585274
    Abstract: The invention relates to a method for capturing and compensating the influence of ambient conditions on an imaging scale (S) in a measuring microscope. Here, a modification of the optical properties in the measuring microscope that is caused by a change in the ambient conditions is measured by use of a reference measurement system, in particular an etalon, and, at the same time, an image of a reference structure with at least one reference length (L0) that is situated on a calibration mask is produced by use of a detector of the measuring microscope and a change (?L) of the reference length (L0) that is caused by the change in the ambient conditions is determined in the image of the reference structure. Subsequently, a correlation is established between the modification of the optical properties of the reference measurement system and the length change (?L) in the image, produced in the detector, of the reference structure of the calibration mask.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: March 10, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dirk Seidel, Carola Blaesing-Bangert, Oliver Jaeckel
  • Patent number: 10338481
    Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: July 2, 2019
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Patent number: 10018461
    Abstract: The invention provides a method and apparatus for applying spatial filtering the optical beam of a free space optical coherence tomography (OCT) system substantially without problematic reflections back to the optical source. The invention teaches spatially filtering the reference beam of the OCT system which is typically designed to provide isolation of the optical source from undesirable optical feed-back, thereby achieving spatial filtering without generating undesirable reflections back to the optical source. Various embodiments are taught.
    Type: Grant
    Filed: January 1, 2016
    Date of Patent: July 10, 2018
    Inventor: Joshua Noel Hogan
  • Patent number: 9982997
    Abstract: A laser measurement system for measuring up to 21 geometric errors, in which a six-degree-of-freedom geometric error simultaneous measurement unit and a beam-turning unit are mounted on either the clamping workpiece or the clamping tool, while an error-sensitive unit is mounted on the remaining one, the beam-turning unit has several switchable working postures and multi-component combinations in its installation state, it can split or turn the laser beam from the six-degree-of-freedom geometric error simultaneous measurement unit to the X, Y, and Z directions in a proper order, or the beam-turning unit can split or turn a beam from the error-sensitive unit to the six-degree-of-freedom geometric error simultaneous measurement unit. The present invention is of simple configuration and convenient operation. Up to 21 geometric errors of three mutual perpendicular linear motion guides are obtained by a single installation and step-by-step measurement.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: May 29, 2018
    Assignee: Beijing Jiaotong University
    Inventors: Qibo Feng, Bin Zhang, Cunxing Cui
  • Patent number: 9829718
    Abstract: The present disclosure provides a method for improving capability of resisting image noise of a co-phasing system of a dispersed fringe sensor. The method comprises the following steps: carrying out a coarse co-phasing adjustment by utilizing the dispersed fringe sensor until the coarse co-phasing is stabilized in a closed loop; collecting a two dimensional dispersed fringe image by the dispersed fringe sensor; superposing the dispersed fringe image along a dispersed direction so as to convert the two dimensional dispersed fringe image to a one dimensional image along an interferential direction; extracting peak values of the main peak, a left side lobe and a right side lobe of the one dimensional image along the interferential direction, and calculating corresponding piston error value of the image by carrying out a Left-subtracting-right LSR algorithm on these peak values.
    Type: Grant
    Filed: September 15, 2016
    Date of Patent: November 28, 2017
    Assignee: The Institute of Optics and Electronics, The Chinese Academy of Sciences
    Inventors: Changhui Rao, Yang Li, Shengqian Wang
  • Patent number: 9625368
    Abstract: An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: April 18, 2017
    Assignee: Nikon Corporation
    Inventors: Eric Peter Goodwin, David Michael Williamson, Daniel Gene Smith, Michel Pharand, Alexander Cooper, Alec Robertson, Brian L. Stamper
  • Patent number: 9506745
    Abstract: A method for measuring errors in the linear feed shafts of a multi-spindle machine tool having two or more rotating feed shafts in addition to three linear feed shafts, wherein: at least first through third reflecting mirrors are attached to a table of the machine tool; a laser length-measuring machine is attached to the tip of a principal shaft of the machine tool; the linear feed shafts are driven, and the laser length-measuring machine is moved to prescribed measuring points; the two or more rotating feed shafts are driven at each of the measuring points; the coordinates at each measuring point are calculated by measuring the distances between the first through third reflecting mirrors and the laser length-measuring machine; and errors in the linear feed shafts of the machine tool are obtained by comparing the machine coordinates of the machine tool.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: November 29, 2016
    Assignee: MAKINO MILLING MACHINE CO., LTD.
    Inventor: Tadashi Kasahara
  • Patent number: 9435991
    Abstract: System and method for correcting a topography of an object being imaged by a multi-array microscope system. The object is forced to conform to a surface of the substrate supporting the object with a suction force and the topography of the chosen object surface is determined. The supporting substrate is bent with the use of force applied to the substrate with at least one actuator such as to reduce the deviations of the determined topography of the object's surface from a pre-determined reference surface by transferring the changes in the curvature of the supporting substrate to the object. In particular, the chosen surface of the object can be substantially flattened for ease of simultaneous imaging of this surface with multiple objectives of the multi-array microscope.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: September 6, 2016
    Assignee: DMetrix, Inc.
    Inventors: Pixuan Zhou, Chen Liang
  • Patent number: 9163935
    Abstract: Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker.
    Type: Grant
    Filed: November 28, 2012
    Date of Patent: October 20, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Martin Jacobus Johan Jak, Michael Kubis
  • Patent number: 9052609
    Abstract: A projection exposure apparatus for microlithography includes: an illumination system configured to illuminate a mask in an object field with exposure light; and a projection objective comprising multiple optical elements configured to image the exposure light from the mask in the object field to a wafer in an image field. The projection exposure apparatus is a wafer scanner configured to move the wafer relative to the mask during an exposure of the wafer with the exposure light. The projection objective further includes at least one manipulator configured to manipulate at least one of the optical elements and a control unit configured to control the manipulator. The control unit is configured to manipulate the optical element with the manipulator during the exposure of the wafer with the exposure light.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: June 9, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Holger Walter, Matthias Roesch
  • Publication number: 20150109624
    Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
    Type: Application
    Filed: February 7, 2013
    Publication date: April 23, 2015
    Applicants: ASML Netherlands B.V.
    Inventors: Justin Lloyd Kreuzer, Arie Jeffrey Den Boef, Simon Josephus Mathijssen
  • Publication number: 20150098091
    Abstract: A system for positioning a tool relative to a workpiece includes a movable table for accommodating a workpiece, the table executing movements in two main moving directions during the processing of the workpiece, one or more planar measuring standards provided in stationary fashion about the tool and extend in the plane of the main moving directions, and scanning heads, mounted in at least three corners of the table, for detecting the position of the table relative to the measuring standards. The position of the table is determinable by the scanning heads in six degrees of freedom. In at least one of the corners, one or more scanning heads having a total of at least three measuring axes is/are provided for 3-D position detection in three independent spatial directions. The sensitivity vectors of the measuring axes for the 3-D position detection are neither parallel to the X-Z plane nor parallel to the Y-Z plane.
    Type: Application
    Filed: October 7, 2014
    Publication date: April 9, 2015
    Inventors: Wolfgang Holzapfel, Jörg Drescher, Katie Dodds-Eden, Bernhard Musch
  • Publication number: 20150070710
    Abstract: The present invention provides a measurement apparatus which obtains a measurement value with respect to a measurement surface based on an interference signal obtained by causing measurement light reflected from the measurement surface and reference light reflected from a reference surface to interfere with each other, the apparatus including a measurement head including an interference optical system configured to generate the interference signal, and a processor configured to obtain a position of an alignment target on the measurement surface based on the interference signal, and obtain the measurement value based on the position of the alignment target and the interference signal.
    Type: Application
    Filed: September 3, 2014
    Publication date: March 12, 2015
    Inventor: Hiroshi OSAWA
  • Publication number: 20150070680
    Abstract: A stage apparatus includes: a first blowing unit configured to blow out temperature-controlled gas to a measurement optical path of the first interferometer and a measurement optical path of a second interferometer; and a second blowing unit configured to blow out temperature-controlled gas to the measurement optical path of the second interferometer, wherein the first blowing unit blows out gas in a direction along an X-direction, and the second blowing unit blows out the gas obliquely with respect to a Y-direction from an upstream side to a downstream side of the gas blown out from the first blowing unit.
    Type: Application
    Filed: September 8, 2014
    Publication date: March 12, 2015
    Inventor: Hitoshi Nakano
  • Patent number: 8947670
    Abstract: A novel means of provided a hybrid flexure mounted moving mirror component in an interferometer is introduced herein. In particular, a linear bearing in combination with a novel flexure mounting having novel tilt and velocity control of the moving optical component is provided. Such an arrangement enables correction of the errors at the mirror itself while also solving the problem of isolating vibration and noise caused by the imperfections in the bearing surfaces used in many conventional interferometers. Using such a coupled flexure mounting of the present invention, in addition to the above benefits, also enhances velocity control because the resultant low mass of the moving mirror assembly enables the systems disclosed herein to respond faster than conventional mirror velocity controlled interferometer instruments and with a lower velocity error so as to provide a more stable and lower noise spectra from the analytical instrument.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: February 3, 2015
    Assignee: Thermo Electron Scientific Instruments Inc.
    Inventor: John Magie Coffin
  • Patent number: 8947796
    Abstract: The present disclosure provides a telecentric optical assembly comprising a first portion of a telecentric optical link including a first kinematic mount having alignment structures, where the first kinematic mount can be attached to a first substrate having a first array of active optical elements; and a second portion of the telecentric optical link including a second kinematic mount having recesses configured to mate with the alignment structures, where the second kinematic mount can be attached to a second substrate having a second array of active optical elements. Additionally, the first and second kinematic mounts, when mated, can align optical beams between the first array of active optical elements and the second array of active optical elements.
    Type: Grant
    Filed: May 7, 2010
    Date of Patent: February 3, 2015
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Sagi Varghese Mathai, Paul Kessler Rosenberg, Michael Renne Ty Tan
  • Patent number: 8818723
    Abstract: Localization and tracking system. The system includes at least one laser mounted for pointing its beam at arbitrary locations within a three-dimensional space. An object within the three-dimensional space supports a screen at its top for receiving the laser beam to create a shaped image on the screen. The shaped image on the screen is observed by a camera and computing apparatus determines the location of the object in the three-dimensional space from pointing parameters of the laser and from shape and center points of the shaped image on the screen.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: August 26, 2014
    Assignee: Massachusetts Institute of Technology
    Inventors: Andreas Schuh, Kamal Youcef-Toumi
  • Patent number: 8803055
    Abstract: A volumetric error compensation measurement system and method are disclosed wherein a laser tracker tracks an active target as the reference point. The active target has an optical retroreflector mounted at the center of two motorized gimbals to provide full 360 degree azimuth rotation of the retroreflector. A position sensitive detector is placed behind an aperture provided at the apex of the retroreflector to detect the relative orientation between the tracker laser beam and the retroreflector by measuring a small portion of the laser beam transmitted through the aperture. The detector's output is used as the feedback for the servo motors to drive the gimbals to maintain the retroreflector facing the tracker laser beam at all times. The gimbals are designed and the position of the retroreflector controlled such that the laser tracker always tracks to a pre-defined single point in the active target, which does not move in space when the gimbals and/or the retroreflector makes pure rotations.
    Type: Grant
    Filed: January 8, 2010
    Date of Patent: August 12, 2014
    Assignee: Automated Precision Inc.
    Inventors: Kam C. Lau, Yuanqun Liu, Guixiu Qiao, Liangyun Xie
  • Publication number: 20140198307
    Abstract: Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.
    Type: Application
    Filed: January 13, 2014
    Publication date: July 17, 2014
    Inventors: Zenichi Hamaya, Ryo Takai, Shinichiro Hirai, Takeshi Rokukawa, Takashi Miura
  • Publication number: 20140132962
    Abstract: Position detector for determining the rotation angle position of a rotatably supported object, comprising a light source for producing a light beam, a diffraction grating, a mirror which is connected with the object in a co-rotating manner in such a way that the light beam is reflected therefrom onto the diffraction grating and passes over the diffraction grating during a rotation of the mirror, thereby producing diffraction light, an interference device which is configured such as to be able to bring different diffraction orders of the diffraction light to interference, thereby producing an interference pattern, a light detector by means of which a brightness course, caused by the passing over of the diffraction grating with the reflected light beam, of the interference pattern can be detected, and an evaluation unit by which the rotation angle position of the object can be determined based on the brightness course.
    Type: Application
    Filed: May 2, 2012
    Publication date: May 15, 2014
    Applicant: SCANLAB AG
    Inventors: Norbert Petschik, Vladimir Ponkratov, Martin Valentin, Hans-Joachim Münzer
  • Patent number: 8724115
    Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.
    Type: Grant
    Filed: June 10, 2013
    Date of Patent: May 13, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Upendra Ummethala, Layton Hale, Josh Clyne, Samir Nayfeh, Mark Williams, Joseph A. DiRegolo, Andrew Wilson
  • Patent number: 8659763
    Abstract: A method for machine measurement for an NC processing machine is provided. The processing machine has a machine head, for example, a fork head and an associated mechanical and electrical spindle changing interface for holding a motor spindle. A laser interferometer with a beam generator and a beam detector is also provided and at least one measurement optic which interacts with the laser interferometer, for example, in the form of a reflector, and laser interference measurements, which are directed at a measurement optic, in particular distance measurements, carried out for machine measurement. The laser interferometer has an interface which corresponds to the spindle changing interface, and the laser interferometer is substituted for the motor spindle via the spindle changing interface for machine measurement, and is aligned by means of the machine axes for the laser interference measurements.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: February 25, 2014
    Assignee: Dorries Scharmann Technologie GmbH
    Inventors: Lüder Kahle, Reinhold Loose, Hermann J. Mirbach, Thomas Troup
  • Publication number: 20130286404
    Abstract: Methods and apparatus are provided for the alignment of an interferometric system. A spatial filter comprising a reflective pinhole is provided at the output of the interferometer, and tilt is measured by a tilt detection subsystem positioned to reimage the pinhole. A shear detection subsystem is positioned to image an offset of the interferometer beams. Tilt and shear offsets are determined by comparing measurements obtained from the tilt and shear subsystems with pre-recorded measurements obtained for an aligned state. The tilt and shear offsets are employed to realign the system using positioning controls corresponding a reduced number of dominant degrees of freedom of the system.
    Type: Application
    Filed: November 16, 2011
    Publication date: October 31, 2013
    Applicant: THUNDER BAY REGIONAL RESEARCH INSTITUTE
    Inventors: Andrew Cenko, Arsen Hajian, Jeff Meade
  • Patent number: 8571826
    Abstract: A method for correction of the measured values of optical alignment systems with at least two measurement planes which are located in succession in the beam path. From each measurement plane, the beam path to the light source is transformed back in order to compute new incidence points using a beam which has been corrected by taking into consideration imaging errors.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: October 29, 2013
    Assignee: Prüftechnik Dieter Busch AG
    Inventor: Heinrich Lysen
  • Publication number: 20130252146
    Abstract: A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 26, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Aksel Goehnermeier
  • Publication number: 20130182231
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: November 8, 2012
    Publication date: July 18, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
  • Patent number: 8489225
    Abstract: A system for performing alignment of two wafers is disclosed. The system comprises an optical coherence tomography system and a wafer alignment system. The wafer alignment system is configured and disposed to control the relative position of a first wafer and a second wafer. The optical coherence tomography system is configured and disposed to compute coordinate data for a plurality of alignment marks on the first wafer and second wafer, and send that coordinate data to the wafer alignment system.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: July 16, 2013
    Assignee: International Business Machines Corporation
    Inventors: Yongchun Xin, Xu Ouyang, Yunsheng Song, Tso-Hui Ting
  • Publication number: 20130176575
    Abstract: An image sensor for fringe images of interference fringes and the like in which the optical system has a simpler configuration than that of the conventional line image sensor, and faster detection becomes possible includes a light receiving plane on which two or more straight rows of pixels are disposed, and captures images of regular fringes generated from light reflected from an irradiated body in accordance with the amount of light received by each pixel; among the rows of pixels, at least two rows of pixels are disposed at right angles to each other, and acquires images of linear fringes crossing almost at right angles in two directions among the fringe projected onto the light receiving plane.
    Type: Application
    Filed: January 3, 2013
    Publication date: July 11, 2013
    Applicant: MITUTOYO CORPORATION
    Inventor: MITUTOYO CORPORATION
  • Publication number: 20130163004
    Abstract: A position detection apparatus that illuminates diffraction gratings formed on two objects with light from a light source and receives diffracted light from the diffraction gratings to acquire relative positions of the two objects includes: an optical system configured to cause plus n-th order diffracted light and minus n-th order diffracted light from each of the diffraction gratings to interfere with each other, where n is a natural number; a light receiving unit; and a processing unit, wherein the light receiving unit receives a two-beam interference light from each of the diffraction gratings, and wherein the processing unit acquires the relative positions of the two objects by using the two-beam interference light at an area where two-beam interference lights of the diffracted light from the respective diffraction gratings do not overlap each other among the two-beam interference lights of the diffracted light from each of the diffraction gratings.
    Type: Application
    Filed: December 18, 2012
    Publication date: June 27, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: CANON KABUSHIKI KAISHA
  • Publication number: 20130120733
    Abstract: A position measurement apparatus that measures a position of an object using a reference mark includes a first illumination optical system configured to illuminate the object using measurement light from a light source which emits light of a first wavelength band, a second illumination optical system configured to illuminate the reference mark using reference light of a second wavelength band, and a position measurement unit configured to detect light from the object and light from the reference mark and to obtain the position of the object based on the detection result, and the second wavelength band of the reference light is set between an upper limit and a lower limit of the first wavelength band of the measurement light from the light source.
    Type: Application
    Filed: November 8, 2012
    Publication date: May 16, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: CANON KABUSHIKI KAISHA
  • Patent number: 8379221
    Abstract: The present patent application provides an interference cavity for precisely controlling an optical path including a cavity formed by two equal distance arms, wherein a positive adjusting plate and a negative adjusting plate are disposed in the interference cavity for compensating the change of a cavity length with temperature and thereby ensuring that the interference cavity length is a constant. The present patent application utilizes the matching relationship between the change of the refractive index of the positive adjustment plate with the temperature and the change of the refractive index of the negative adjusting plates with the temperature to make the optical path difference OPL invariant with changes in the environment temperature and thereby to ensure the precision of the optical path.
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: February 19, 2013
    Assignee: O-Net Communications (Shenzhen) Limited
    Inventors: Zeqin Wang, Hong Xie
  • Publication number: 20130033709
    Abstract: The general field of the invention is that of optical systems for detection of the orientation of mobile objects in space. The main application is helmet posture detection inside of an aircraft cockpit. The system according to the invention operates by interferometry. It comprises a fixed electro-optical device comprising one or more collimated point-like emission sources and a detection assembly comprising one or more point-like photosensitive detectors. Two or more retro-reflecting devices referred to as “cube corner” are disposed on the mobile object. This system can be completed by optical means operating in polarized light mode allowing the direction of variation of the interference fringes to be determined and by other optical devices allowing an initial orientation to be measured.
    Type: Application
    Filed: August 3, 2012
    Publication date: February 7, 2013
    Inventors: Laurent POTIN, Bruno Barbier, Siegfried Rouzes
  • Patent number: 8355139
    Abstract: Provided is a semiconductor apparatus. The semiconductor apparatus includes a reference grating and a plurality of detectors. The reference grating diffracts an optical signal generated by being reflected from the alignment grating of a substrate to diffraction beams with different orders. The plurality of detectors measure intensities of a plurality of diffraction beams selected from the diffraction beams, respectively.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: January 15, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Seong-Bo Shim
  • Publication number: 20130010306
    Abstract: A method of measuring a phase difference between two regions in an aberration function: Reference structures are produced on a substrate using illumination that minimizes effects of phase aberration. A grating is produced on the substrate using a phase-shift grating reticle to produce, in the exit pupil, a pair of diffracted non-zero orders, while forbidding other diffracted orders and produces interference fringes formed by interference between the pair. The interference contributes to a first grating on the substrate. Overlay error is measured between the grating and the reference structure using diffraction-based or image-based overlay measurements. A phase aberration function for the exit pupil of the lithographic apparatus can then be determined from the measured overlay errors.
    Type: Application
    Filed: June 26, 2012
    Publication date: January 10, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Willem Marie Julia Marcel Coene, Sven Van Haver
  • Publication number: 20120286443
    Abstract: A detection apparatus determines an amount of relative rotational deviation between two different objects. Each of the objects has a respective grating mark which together form a pair of grating marks. The detection apparatus includes a detector that detects interference fringes produced by an overlap between the pair of grating marks. The detection apparatus also includes a calculation unit that determines the amount of relative rotational deviation between the two different objects from inclination of the interference fringes detected by the detector. The detection apparatus can be applied, for example, in controlling transfer of a pattern formed on a mold to a transfer material applied to a substrate.
    Type: Application
    Filed: April 20, 2012
    Publication date: November 15, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Sato
  • Publication number: 20120224186
    Abstract: A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S?). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S?) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.
    Type: Application
    Filed: February 6, 2012
    Publication date: September 6, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Jochen HETZLER, Ralf MUELLER, Wolfgang SINGER
  • Patent number: 8255181
    Abstract: A correction algorithm may be applied for correcting misalignment of a radially-aligned array of sensors. Due to the tilt, signals from sensors that are further away from the media, may become slightly attenuated, while signals from sensors that are closer to the media are slightly increased. The error appears periodic and largely sinusoidal in nature around the array given the circular nature of the array of sensor elements. The algorithm determines the magnitude and phase of a sinusoidal function that best fits the wavelength data. In one embodiment, a discrete Fourier transform may be performed at the ‘frequency’ equivalent to one period around the array to determine the magnitude and phase estimate thereof. Then, a sinusoidal correction function may be generated using the magnitude and the phase in order to correct the reflectance data.
    Type: Grant
    Filed: January 12, 2009
    Date of Patent: August 28, 2012
    Assignee: Xerox Corporation
    Inventor: Thomas Edward Higgins
  • Patent number: 8248617
    Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: August 21, 2012
    Assignee: Zygo Corporation
    Inventors: Peter De Groot, Jan Liesener, Xavier Colonna De Lega
  • Patent number: 8189202
    Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
    Type: Grant
    Filed: August 4, 2009
    Date of Patent: May 29, 2012
    Assignee: Zygo Corporation
    Inventors: Jan Liesener, Xavier Colonna de Lega, Peter de Groot
  • Publication number: 20120127479
    Abstract: While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved.
    Type: Application
    Filed: September 20, 2011
    Publication date: May 24, 2012
    Applicant: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20110304855
    Abstract: Through a first diffraction grating, two conical fluxes different in wavefront propagation angle relative to its optical axis are applied to a first surface. Through a second diffraction grating, two conical fluxes different in wavefront propagation angle relative to its optical axis are applied to a second surface. Two sets of interference fringes formed by the fluxes reflected from the first surface and a reference beam are analyzed to obtain surface misalignment and angular misalignment of the first surface relative to the optical axis. Similarly, two sets of interference fringes formed by the fluxes reflected from the second surface and the reference beam are analyzed to obtain surface misalignment and angular misalignment of the second surface relative to the optical axis. Surface misalignment and angular misalignment of a sample lens are obtained from the measurement results of the first and second surfaces.
    Type: Application
    Filed: June 10, 2011
    Publication date: December 15, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Nobuaki UEKI, Hideo KANDA
  • Patent number: 8076214
    Abstract: A display substrate includes a signal line, a thin-film transistor (“TFT”), a key pattern, a light-blocking pattern, a color filter, a pixel electrode and an alignment key. The signal line and the key pattern are formed on a substrate. The TFT is electrically connected to the signal line. The light-blocking pattern is formed on the substrate and covers the signal line, the TFT and the key pattern. The color filter is formed in a unit pixel area of the substrate. The pixel electrode is formed on the color filter and is electrically connected to the TFT. The alignment key is formed on the light-blocking pattern, and a position of the alignment key on the substrate corresponds to a position of the key pattern on the substrate.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: December 13, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sun-Young Chang, Byoung-Joo Kim, Sang-Hun Lee, Gwan-Soo Kim
  • Publication number: 20110292404
    Abstract: A method for machine measurement for an NC processing machine is provided. The processing machine has a machine head, for example, a fork head and an associated mechanical and electrical spindle changing interface for holding a motor spindle. A laser interferometer with a beam generator and a beam detector is also provided and at least one measurement optic which interacts with the laser interferometer, for example, in the form of a reflector, and laser interference measurements, which are directed at a measurement optic, in particular distance measurements, carried out for machine measurement. The laser interferometer has an interface which corresponds to the spindle changing interface, and the laser interferometer is substituted for the motor spindle via the spindle changing interface for machine measurement, and is aligned by means of the machine axes for the laser interference measurements.
    Type: Application
    Filed: May 27, 2011
    Publication date: December 1, 2011
    Applicant: Dörries Scharmann Technologie GmbH
    Inventors: Lüder Kahle, Reinhold Loose, Hermann J. Mirbach, Thomas Troup
  • Publication number: 20110228281
    Abstract: The present patent application provides an interference cavity for precisely controlling an optical path including a cavity formed by two equal distance arms, wherein a positive adjusting plate and a negative adjusting plate are disposed in the interference cavity for compensating the change of a cavity length with temperature and thereby ensuring that the interference cavity length is a constant. The present patent application utilizes the matching relationship between the change of the refractive index of the positive adjustment plate with the temperature and the change of the refractive index of the negative adjusting plates with the temperature to make the optical path difference OPL invariant with changes in the environment temperature and thereby to ensure the precision of the optical path.
    Type: Application
    Filed: March 2, 2010
    Publication date: September 22, 2011
    Inventors: Zeqin Wang, Hong Xie
  • Patent number: 8023117
    Abstract: A multi-aperture interferometric optical system collects light propagating from a source of light and develops overlapping diffraction patterns on an optical detector that produces output signals for processing to automatically focus the optical system and form an image corresponding to the diffraction patterns. A preferred embodiment of the invention is a large aperture orbiting, earth-watching ring interferometric optical system configured such that there is no macro-structure pointing. Four mirror-ring structures direct incoming light to a multi-spectral primary optical detector that acquires light-pattern information to focus the optical system and derive an image.
    Type: Grant
    Filed: October 14, 2008
    Date of Patent: September 20, 2011
    Assignee: Venture Ad Astra, LLC
    Inventor: Geoffrey B. Rhoads
  • Publication number: 20110211199
    Abstract: Device and method for acquiring position with a confocal Fabry-Perot interferometer. In a general aspect, the device for acquiring position may include an arrangement for acquiring position where the acquiring arrangement has a confocal Fabry-Perot interferometer. In another general aspect, a method for acquiring position may include generating an interference pattern dependent on a position of an object by a confocal Fabry-Perot interferometer; detecting the interference pattern to obtain a measuring signal; and evaluating the measuring signal.
    Type: Application
    Filed: February 8, 2011
    Publication date: September 1, 2011
    Applicant: attocube systems AG
    Inventors: Khaled KARRAI, Pierre-Francois Braun
  • Publication number: 20110188049
    Abstract: An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
    Type: Application
    Filed: April 11, 2011
    Publication date: August 4, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Ronald VAN DER HAM, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
  • Publication number: 20110157600
    Abstract: An optical telescope system, method of actively, adaptively providing optical control to an array of articulated mirrors in a sparse aperture in the optical telescope system and a computer program product therefor. Array apertures are selected sequentially for imaging. Each aperture is temporally modulating at a unique/different frequency and, simultaneously, focal plane images are detected for each array aperture with known and separable temporal dependencies. The images are processed for the current set of said focal plane images to detect an image wavefront. The feeding back wavefront errors are fed back to aperture actuators for controlling the array.
    Type: Application
    Filed: December 30, 2009
    Publication date: June 30, 2011
    Applicants: NASA
    Inventor: Richard G. Lyon
  • Patent number: 7929150
    Abstract: An alignment interferometer telescope apparatus comprises a coherent laser source, a first beam splitter, a reference spherical mirror, a light source, first and second reticles, and a second beam splitter. At an interference location within the apparatus, a reference laser wave and a test laser wave are allowed to interfere to produce a combined laser wave.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: April 19, 2011
    Assignee: Lockheed Martin Corporation
    Inventor: Paul F. Schweiger