Abstract: The present disclosure relates to a drug delivery device for setting and injecting of a dose of an injectable medicament, the drug delivery device comprising: an elongated housing extending along a longitudinal axis and having a sidewall with at least a first aperture, at least one number sleeve rotatably supported inside the housing and comprising an outer surface, wherein a first portion of the outer surface is visible through the first aperture and wherein the number sleeve comprises a non-visible code in the region of the first portion.

Abstract: The present invention relates to a mobile terminal comprising a lighting device. The lighting device according to one embodiment of the present invention comprises multiple light-emitting elements and a diffractive optical element (DOE) for diffracting a part of the light which has been output from each of the multiple light-emitting elements, wherein the light, which has been output from the multiple light-emitting elements and has passed through the diffractive optical element, comprises multiple first kinds of light not diffracted by the diffractive optical element and multiple second kinds of light diffracted by the diffractive optical element, and the diffractive optical element diffracts the part of the light output from the multiple light-emitting elements such that at least some of the multiple second kinds of light is radiated into an area formed by connecting the multiple first kinds of light.

Abstract: An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a spatial light modulator which has a plurality of optical elements arrayed on a predetermined surface and individually controlled and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system; a divergence angle providing member which is arranged in a conjugate space including a surface optically conjugate with the predetermined surface and which provides a divergence angle to an incident beam and emits the beam; and a polarizing member which is arranged at a position in the vicinity of the predetermined surface or in the conjugate space and which changes a polarization state of a partial beam of a propagating beam propagating in an optical path.

Abstract: A method for operating a frequency converted laser source comprising at least one semiconductor laser and a wavelength conversion device optically coupled to at least one semiconductor laser may include operating the frequency converted laser source to produce a frequency converted output beam from the wavelength conversion device and intermittently heating the wavelength conversion device above a recovery threshold temperature TR of the wavelength conversion device. When the wavelength conversion device is heated above the recovery threshold temperature, the wavelength conversion device is held above the recovery threshold temperature TR for a period of time sufficient to restore output power lost to photo-degradation in the wavelength conversion device during operation of the frequency converted laser source.

Abstract: A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.

Abstract: Apparatus for projecting a pattern includes a first diffractive optical element (DOE) configured to diffract an input beam so as to generate a first diffraction pattern on a first region of a surface, the first diffraction pattern including a zero order beam. A second DOE is configured to diffract the zero order beam so as to generate a second diffraction pattern on a second region of the surface such that the first and the second regions together at least partially cover the surface.

Abstract: A method of forming an image comprising providing a device for imparting respective phase shifts to different regions of an incident wavefront, wherein the phase shifts give rise to an image in a replay field, and causing zero-order light to be focused into a region between the replay field and the device.

Abstract: A method and system for synthesizing controllable light beams includes a spatially modulated light source that generates electromagnetic radiation with a set of replicas of a predetermined symbol, s, positioned at desired positions (xs, ys) in an object plane o(x, y) intersecting, preferably perpendicular to, the direction of propagation of the electromagnetic radiation, and having spatial amplitudes a(x-xs, y-ys), spatial phases ?(x-xs, y-ys), and spatial polarisation vectors p(x-xs, y-ys), a Fourier transforming lens for Fourier transforming the electromagnetic radiation, a first spatial light modulator for phase shifting the transformed electromagnetic radiation with the phase ??(u, v) of S*, S* the complex conjugate of the transformed symbol, a Fourier transforming lens for Inverse Fourier transforming the spatially modulated radiation, a set of light beams are formed propagating through the inverse Fourier plane (x?, y?) at desired positions (x?s, y?s), and a controller for controlling the position of a

Abstract: An apparatus includes a reconfigurable spatial light modulator capable of spatially modulating an incident wavefront responsive to an image formed on the modulator. A light source is configured to direct a coherent illumination light beam towards the modulator such that the modulator produces a modulated outgoing light beam therefrom. A filter is configured to spatially filter a light pattern formed by the outgoing light beam on a plane to selectively transmit light from a plurality of diffraction peaks therein.

Abstract: The present invention relates to pigments comprising or consisting of a layer made of a material with an index of refraction that is higher than the index of refraction of the adjacent material by at least 0.25; whereas said layer has a zero-order diffractive micro-structure; whereas said layer acts as an optical waveguide and whereas said layer has a thickness between 50 nm and 500 nm; to processes for its manufacture and to its use. These pigments show a color effect upon rotation and/or tilting, and it is believed that this color effect is based on zero-order diffraction.

Abstract: A system and method for uniform light generation in projection display systems. An illumination source comprises a light source to produce colored light, and a scrolling optics unit optically coupled to the light source, the scrolling optics unit configured to create lines of colored light from the colored light, and to scroll the lines of colored light along a direction orthogonal to a light path of the illumination source. The scrolling optics unit comprises a single light shaping diffuser to transform the colored light into the lines of colored light, an optical filter positioned in the light path after the light shaping diffuser, and a scrolling optics element positioned in the light path after the optical filter. The single light shaping diffuser is capable of simultaneously transforming colored light into lines of colored light having substantially uniform intensity to provide uniform illumination.

Abstract: A method and system for synthesizing controllable light beams includes a spatially modulated light source that generates electromagnetic radiation with a set of replicas of a predetermined symbol, s, positioned at desired positions (xs, ys) in an object plane o(x, y) intersecting, preferably perpendicular to, the direction of propagation of the electromagnetic radiation, and having spatial amplitudes a(x-xs, y-ys), spatial phases ?(x-xs, y-ys), and spatial polarisation vectors p(x-xs, y-ys), a Fourier transforming lens for Fourier transforming the electromagnetic radiation, a first spatial light modulator for phase shifting the transformed electromagnetic radiation with the phase ??(u, v) of S*, S* the complex conjugate of the transformed symbol, a Fourier transforming lens for Inverse Fourier transforming the spatially modulated radiation, a set of light beams are formed propagating through the inverse Fourier plane (x?, y?) at desired positions (x?s, y?s), and a controller for controlling the position of a

Abstract: A photomask according to the invention provides selective regional optimization of illumination type according to the type of image being formed using the photomask. The photomask include a light polarizing structure which polarizes the light incident on the polarizing structure. Light of a first illumination type from a source in a photolithographic exposure system is incident on the photomask. A portion of the light is incident on the region of the photomask that includes the polarizing structure, and another portion of the light is incident on another region of the photomask that does not include a polarizing structure. The illumination type of the light incident on the polarizing structure is changed to a second illumination type such that light incident on a substrate such as an integrated circuit wafer from the region of the photomask that has the polarizing structure is of the second illumination type.

Abstract: Disclosed herein is a raster scanning-type display device using a diffractive optical modulator. The raster scanning-type display device includes an optical illumination unit, a diffractive optical modulator, and a projection unit. The optical illumination unit radiates light, which is emitted from a light source, in a spot beam form. The diffractive optical modulator causes an element to modulate the spot beam incident from the optical illumination unit, and generate diffracted light whose intensity is adjusted and which has a plurality of diffraction orders. The projection unit generates an image by projecting the diffracted light incident from the diffractive optical modulator onto a screen in a scanning spot beam form and performing raster scanning in which horizontal scanning and vertical scanning are alternated.

Abstract: Disclosed herein is an optical modulator module package structure. In the optical modulator module package structure, an optical modulator device and a drive integrated circuit device are flip-chip bonded to a substrate, and an opening of the substrate is blocked using a piece of glass.

Abstract: A diffraction grating generates even-order, odd-order, and 0th-order exit-pupil images. The even-order exit-pupil images have brightness levels within a first range and the odd-order exit-pupil images have brightness levels within a second range that is different from the first range. In one example, the even-order exit-pupil images are virtually invisible, i.e., missing, the odd-order exit-pupil images have the same or approximately the same intensities, and the 0th-order exit-pupil image has an intensity greater than the respective intensities of the odd-order exit-pupil images.

Abstract: A display system includes a diffraction grating that generates exit-pupil images, where one of the exit-pupil images has a first intensity and the remaining exit-pupil images each have or approximately have a second intensity that is less than the first intensity. The system also includes a filter that attenuates the intensity of the one exit-pupil image. In one example, the filter attenuates the 0th-order exit-pupil image so that all of the exit-pupil images have the same or approximately the same intensities.

Abstract: An imaging system is disclosed that includes an illumination source, a modulator and a variable Fourier diaphragm. The illumination source produces a first illumination field having a first frequency and a second illumination field having a second frequency. The modulator receives the first illumination field and the second illumination field, and produces a first modulated illumination field and a second modulated illumination fields. The variable Fourier diaphragm selectively passes one of the first modulated illumination field and the second modulated illumination field.

Abstract: A method and apparatus for transferring a fine pattern (12) on a mask (11) onto a substrate (17) by a projection exposure apparatus including an illumination optical system (1-10) for irradiating an illuminating light on the mask (11), and a projection optical system (13) for projecting an image of the fine pattern (12) on the illuminated mask onto the substrate (17).

Abstract: A method and a system for generating a beam of radiation in a target plane located in a near-filed region of a radiation emitting means. A beam of radiation having a substantially plane wavefront is emitted. A normal Bessel beam, having its transverse profile substantially in the form of a Bessel function, is produced from said emitted beam of radiation. The normal Bessel beam is produced in a first medium of a refraction index n1 and is directed towards the target plane located in a second medium having a refraction index n2, such that n2<n1. Passage of the normal Bessel beam from the first medium into the second medium results in the generation of an evanescent Bessel beam of radiation propagating in the second medium. The evanescent Bessel beam has a center lobe significantly smaller in size than the wavelength of radiation in the second medium, and basically retains its shape in the second medium.

Abstract: Disclosed is an illumination system using optical feedback to maintain a predetermined illumination output. The illumination system employs an electrically controllable optical filter for filtering light incident thereon. The illumination system also includes a light detector for detecting at least a portion of the light filtered by the electrically controllable optical filter. The light detector is in data communication with the electrically controllable optical filter. Some or all light filtered by the electrically controllable optical filter is detected by the light detector, which, in turn generates a corresponding signal that is compared to at least one predetermined value. If the signal generated by the light detector differs when compared to the at least one predetermined value, one or more filtering characteristics of electrically controllable optical filter are varied which, in turn, varies the amount of light filtered by the electrically controllable optical filter.

Abstract: A Fourier hologram with the distribution of a radial harmonic function creates, in the far field, a pseudo non-diffracting beam. The properties of this pseudo non-diffracting beam can be set by appropriate characterization of the radial harmonic function. Various operations can also be carried out to change the position of the beam relative to the focal point. The beam can be shifted in space, twisted, or tilted.

Abstract: A container for accommodating an optical article made of synthetic quartz glass includes synthetic resin as a base material, and a coating film provided on a substantially entire area of at least an inner surface thereof, the coating film being substantially impermeable to a gas evolved from the synthetic resin as the basic material of the container.

Abstract: A method for transferring an image to a medium includes: generating a substantially uniform line of radiation; producing diffractive light from the uniform line of radiation; passing zero order diffractive light to the medium in a telecentric fashion while blocking non-zero order diffractive light; adjusting image magnification on the medium independent of image focus in response to the zero order diffractive light; and adjusting image focus on the medium independent of image magnification in response to the zero order magnification-adjusted diffractive light.

Abstract: An off axis illumination stepper exposure system includes an illumination system with an aperture element and lenses. The aperture element comprises an array of electronically switchable pixels in a matrix. The aperture element can be a transmissive spatial light modulator. An annular pattern of transmissivity through an aperture element is provided by a spatial light modulator operated under computer control. The computer can select and provide variable dimensions of the pattern to optimize operation of the device. In addition to a first transmissive spatial light modulator providing an aperture in the illumination system with a pattern of transmissivity operated under computer control, a mask is provided in the form of a second transmissive spatial light modulator operated under computer control operating cooperatively to provide images projected through a projection system onto a workpiece supported upon a stepper tool.

Abstract: An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (110) through a reticle (160) onto the first image plane. The improved microlithographic imaging system has higher resolution and depth of focus than prior art imaging systems, due to the additional filtering performed by the filter (183). A filter in accordance with the invention can be fabricated easily and inexpensively, using conventional microlithography techniques. A filter in accordance with the invention can also be used to detect or correct flaws in the reticle (160).

Abstract: Disclosed is a tunable multispectral optical apparatus for forming a spectrally processed image of a scene having finite angular extent or alternatively a point source of light, both of which may include multispectral components. A spatial filter is selectively positioned between a hybrid fore-optic and a hybrid reimaging optic, both of which include a diffractive optic. Spectral selectivity is obtained by proper positioning of the spatial filter relative to the intermediate image formed by the hybrid fore-optic before impinging on the hybrid reimaging optic. The tunable multispectral optical apparatus of the present invention may take the form of a bandpass filter or a bandstop filter depending only on the choice of spatial filter--blocking or passing selective wavelength components of the intermediate image.

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+.first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.

Abstract: A superresolution scanning optical device has image forming means for forming the image of light from a coherent light source unit in the form of a fine spot on a conjugate face through an image forming optical system, and scanning means for scanning the fine spot formed on the conjugate face. The coherent light source unit has first and second light sources of which phases are reverse to each other. The first and second light sources have the relationship that the main lobe of the image of the second light source on the conjugate face is superposed on the lateral sides of the main lobe of the image of the first light source on the conjugate face.

Abstract: An optical system is provided with an adaptable window element at a Fourier plane for spatial filtering. Having a window element made up of individually addressable pixels provides a substantial improvement in the spatial filtering adaptability and precision. When combined with a computer and sensor, the window may become part of a negative feedback loop, thereby providing the optical system with more consistent reproducibility, higher reliability with graceful degradation, and more precise control over final results.

Abstract: A method and apparatus maps a Gaussian beam into a beam with a uniform irradiance profile by exploiting the Fourier transform properties of lenses. A phase element imparts a design phase onto an input beam and the output optical field from a lens is then the Fourier transform of the input beam and the phase function from the phase element. The phase element is selected in accordance with a dimensionless parameter which is dependent upon the radius of the incoming beam, the desired spot shape, the focal length of the lens and the wavelength of the input beam. This dimensionless parameter can also be used to evaluate the quality of a system. In order to control the radius of the incoming beam, optics such as a telescope can be employed. The size of the target spot and the focal length can be altered by exchanging the transform lens, but the dimensionless parameter will remain the same. The quality of the system, and hence the value of the dimensionless parameter, can be altered by exchanging the phase element.

Abstract: A method and apparatus for writing a Bragg grating in a photosensitive optical waveguide is disclosed. The novel method comprises an interferometer having precisely adjustable light collecting and directing components. A phase mask illuminated with ultraviolet light is used as the interferometer light source. The adjustability of the interferometer allows the writing of Bragg gratings for filtering wavelengths in the range 1275 nm to 1575 nm while adjusting the appropriate interferometer elements by only +/-0.75.degree. each.

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of -/+ first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.

Abstract: A system for creating a bright and uniform line of illumination. The "hot spot" of an arc lamp is imaged onto a narrow, circular pinhole aperture. Light passing through the pinhole aperture is collimated and passed through a second aperture (the apodizing aperture), before being focused to a line of illumination by a cylindrical lens. The spatial profile of the apodizing aperture is tailored to remove non-uniformities in the illumination source thereby allowing a highly uniform line of illumination to be created. Alternatively, the spatial profile of the apodizing aperture can be tailored to produce a line of illumination having a desired non-uniform intensity profile.

Abstract: A Fourier mask includes a base plate, an aperture plate having a pair of cross hairs fixedly mounded on the base plate and a pair of four bar linkages, each four bar linkage being made up of a pair of parallel cross bars and a pair of parallel mask bars pivotally interconnected end-to-end in a closed loop configuration. Each cross bar in each four bar linkage is pivotally mounted on the base plate, the four bar linkages being arranged on the base plate such that the mask bars in one four bar linkage are at right angles to the mask bar in the other four bar linkage and each pair of parallel mask bars is symmetrically disposed about one of the cross hairs. By pivotally moving either or both sets of cross bars on the base plate, the spacing between the parallel mask bars in either a both sets of mask bars can be changed as desired.

Abstract: An optical pickup apparatus includes a semiconductor laser generating a light having a short wavelength for reproduction of a high-density information recording medium and a semiconductor laser outputting a light for reproduction of an information recording medium with low recording density. A three-beam generating diffraction grating, a transmission type holographic optical element and a condenser lens are disposed in the light path in which the laser lights from the semiconductor lasers propagate toward the recording surface of an information recording medium. The laser light emitted from each semiconductor laser is transmitted through the three-beam generating diffraction grating and divided into three beams and then transmitted through the transmission type holographic optical element and passed through the condenser lens to reach the recording surface of the information recording medium.

Abstract: An artificial retina cell effectively used to recognize a plurality of objects from an image containing them with ease and at high speed. Also disclosed are an artificial retina and an artificial visual apparatus employing the same. The artificial visual apparatus includes an artificial eyeball (3) having a focusing means (2) and an artificial retina (1) including a first artificial retina cell disposed in a central visual field (1a) to detect a bright-dark boundary by optical filtering and a second artificial retina cell disposed in a peripheral visual field (1b) to detect an object position by optical filtering, and a neural network (4) for executing pattern recognition of an object on the basis of information detected by the first artificial retina cell.

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+. first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.

Abstract: A method and apparatus for transferring a fine pattern (12) on a mask (11) onto a substrate (17) by a projection exposure apparatus including an illumination optical system (1-10) for irradiating an illuminating light on the mask (11), and a projection optical system (13) for projecting an image of the fine pattern (12) on the illuminated mask onto the substrate (17). The illuminating light is irradiated at least in the form of a pair of light beams opposedly inclined with respect to the mask through a pair of transparent windows (6a, 6b) of a spatial filter (6) whereby either one of the .+-.

Abstract: An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

Abstract: In an optical projection system for use in projection printing of masks to wafers, comprising an illumination system including a light source and a mask positioned in the optical path of the illumination system, an optical phase structure is positioned in the optical path between the light source and the mask. The phase structure comprises a pattern of distributed transparent features having at least one refractive index, the transparent features of said phase structure being related in position and orientation to the opaque features of the mask.

Abstract: An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of -/+ first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.

Abstract: A diffraction light modulated by a plane type phase distribution display device is deflected by an image formation optical system and is formed as an image onto a cylindrical screen surface and is diffused in the vertical direction by a unidirectional light diffusing section such as a lenticular lens or the like, so that a stereoscopic image can be seen. As a phase distribution display device, a liquid crystal device having pixels on the order of the wavelength in the circumferential direction and having coarse pixels in the radial direction is used. Thus, it is equivalent to that the phase distribution display device is located on the cylindrical surface. A cylindrical stereoscopic display can be performed by using the plane phase distribution display device.

Abstract: A dummy mask used in the fabrication of semiconductor devices, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting off light components vertically incident on a mask formed with a pattern, thereby increasing the depth of focus and improving the resolution. The dummy mask includes a transparent substrate provided at its upper surface with a diffracting pattern for primarily diffracting light from a light source incident on the dummy mask and at its lower surface with a controlling pattern for removing vertically incident light not diffracted by the diffraction patterns.

Abstract: An image display apparatus includes an image display device such as, for example, a liquid crystal display panel, having a plurality of dot-shaped picture elements arranged in a two-dimensional pattern, and a diffraction grating disposed on an optical path through which imagewise rays of light emerging from the device travel. To minimize a reduction in quality and contrast of an image displayed by the device, the member has a spatial cut-off frequency chosen to be of a value lying between the sampling frequency, determined by the pitch between picture elements of the image display device, and the Nyquist frequency. For the same purpose, the intensity of .+-.1st order light relative to the intensity of 0-th order light in the diffraction grating is within the range of 60 to 80% at a center wavelength of the image display device, and the sum of the intensity of the 0-th order light and that of the .+-.

Abstract: A holographic optical element (HOE) includes a substrate structure having rotational symmetry with respect to a rotational axis for rotatively supporting at least two holograms. A first hologram on the substrate structure in the path of a normally incident beam diffracts the beam by a first acute angle and in a first radial direction from the rotational axis to a first redirected path. A second hologram on the substrate structure in the first redirected path diffracts the beam by a different second acute angle and in an opposite second radial direction from the rotational axis to a second redirected path. As a result, the two holograms may be used to achieve a second redirected path at an angle to the rotational axis that has a size which is the difference between the size of the first angle and the size of the second angle.

Abstract: A hyper-resolution optical device which can focus a beam of light to a diameter less than the diffraction limit. The optical device has an optical system disposed on a transmissive substrate. One component in the optical system is a hyper-resolution optical component which passes or reflects light and which has a central portion which does not pass or reflect light, respectively. The hyper-resolution optical component can be integrated with the transmissive substrate. Such optical devices are particularly suitable for optical pick-up devices, laser printers, sensors.

Abstract: An optical scanning system uses a stationary binary diffractive optical element and a rotating binary diffractive element to focus and scan a beam along the scan line.

Abstract: A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through a condenser lens. Zero-order diffracted light interferes destructively and the oblique component of .-+. first-order diffracted light, interferes constructively. The obliquely incident component light illuminates a mask having a pattern formed thereon. The vertical incident component of the light is removed by a phase difference of light due to a grating mask or a grating pattern formed on the back surface of the conventional mask. The resolution of a lithography process is improved due to the increased contrast, and the depth of focus is also increased. Thus, patterns for 64 Mb DRAMs can be formed using a conventional projection exposure system.