Abstract: A display device antireflection filter 100 formed on a glass base material is comprised of an antireflection layer 102 of at least one layer containing SiO2 and a material layer 103 made of composition produced by adding compound whose interaction with SiO2 is small to compound having alkoxysilane group at terminal and which has perfluoropolyether group. This device exhibits improved wear and abrasion resistance.

Abstract: An antireflection film containing a transparent substrate film, a hard coat layer on the substrate film, and first and second refractive index layers on the hard coat layer. The hard coat layer has a refractive index higher than the refractive index of the transparent substrate film; the first refractive index layer has a refractive index higher than the refractive index of the hard coat layer; the second refractive index layer has a refractive index lower than the refractive index of the hard coat layer.

Abstract: A temperature compensated optical filter assembly including a plurality of thin films having temperature dependent indices of refraction which are deposited on a glass substrate so as to form a conventional interference filter thereon. The glass substrate is adhesively coupled to a metal holder such that the deposited thin film interference filter is interposed between the glass substrate and an adhesive layer distributed along a mounting surface of the holder. Thus, a first thermal mismatch stress is applied by the glass substrate onto an inner layer of the interference filter and a second mismatch stress is applied by the holder onto an outer layer of the interference filter, wherein the first and second mismatch stresses depend on the temperature of the filter assembly.

Abstract: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

Abstract: The present invention is an anti-reflective transparent article which includes a transparent substrate. The article also includes a first coating of metal oxide applied over the substrate. The first coating of metal oxide has a reflective index of about 1.8 to about 2.6. The article further includes a second coating of a metal oxide applied over the first coating of metal oxide. The second coating has a refractive index of about 1.44 to about 1.6. The reflectivity of the article, when measured at an angle of at least 50 degrees from normal, is at least three percentage points less than the reflectivity of the uncoated substrate at the same angle.

Abstract: An anti-reflective composite is provided having very high visible light transmission and negligible visible reflectance over 400 nm-800 nm wavelengths. The composite of the invention includes (a) a light transmissive substrate; (b) a hard coat deposited onto the substrate; (c) a thin carbon layer having an average thickness between about 2 Å and about 100 Å; and (d) a plurality of transparent oxide layer pairs deposited onto the thin carbon layer, each transparent oxide layer pair comprising (i) a first transparent oxide having a refractive index between about 1.65 and about 2.65 and an average thickness between about 100 Å and about 3200 Å and (ii) a second transparent oxide layer having a refractive index between about 1.2 and about 1.85, and an average thickness between about 100 Å and about 3200 Å. The composite can also include an intermediate oxide layer disposed between the thin carbon layer and the first transparent oxide layer.

Abstract: There is provided a transparent laminate which comprises a transparent substrate, and four to five units each of a high refractive index transparent film and a silver type transparent electrical conductor film. The units are laminated successively on a surface of the transparent substrate, and one high refractive index transparent film is further disposed as an outermost layer. The high refractive index transparent film is an optically transparent film having a refractive index of from 1.5 to 2.7. The silver type transparent electrical conductor film has a thickness in a range of from 5 to 20 nm. A thickness of the silver type transparent electrical conductor film disposed in a first layer with reference to the transparent substrate is substantially equal to a thickness of the silver type transparent electrical conductor film in an outermost layer with reference to the transparent substrate. A thickness of the silver type transparent electrical conductor film in each of other layers is 3/2(1±0.

Abstract: A transparent conductive film having a transparent oxide layer and a metal layer containing Ag, laminated in this order from a substrate side in a total of (2n+l) layers), wherein n is an integer of at least 1, wherein the transparent oxide layer contains ZnO and further contains In within a range of from 9 to 98 atomic % based on the sum of Zn and In, and a process for forming a transparent electrode.

Abstract: The present invention discloses a method of optical correction for improving the pattern shrinkage caused by scattering of the light during photolithography processes, wherein the patterns on photomasks are corrected by providing aid patterns. Therefore, serifs or hammerheads are not necessary, and the costs can be decreased. According to the present invention, a chrome aid block is provided between the edges of the patterns. It is noted that the size of the chrome aid block is between ⅓ to ½ the wavelength of light used during exposure. Therefore, the pattern shrinkage caused by scattering of the light during exposure can be reduced, and there is no additional block formed on the photoresist layer. In addition, the standing wave effect can be prevented; thus, the pattern transfer is more accurate.

Abstract: The subject of the invention is a glazing panel comprising a transparent substrate (1), especially one made of glass, provided with at least one functional, conductive and/or low-emissivity, transparent thin film (3). In order to improve the optical and especially the calorimetric appearance of the glazing panel, at least one intermediate film (2) is placed between the substrate (1) and the functional film (3), this at least one intermediate film having a refractive index gradient decreasing through its thickness. The invention also relates to the device intended for manufacturing this type of glazing panel.

Abstract: An anti-reflection film includes a transparent support and a low refractive index layer. A refractive index of the low refractive index layer is lower than a refractive index of the transparent support. The low refractive index layer contains micro voids in an amount of 3 to 50 volume % of the low refractive index layer. The anti-reflection film further has an overcoating layer provided on the low refractive index layer. The overcoating layer contains a fluorine compound. The fluorine compound is not present in the micro voids, or an amount of the fluorine compound present in the micro voids is less than 70 volume % of the micro voids.

Abstract: An improvement is proposed relating to an optical isolator for bonding of the polarizer and analyzer of polarizing glass to the respective holder rings for position adjustment. The improvement comprises: (a) forming a metallized layer of a specific composition over at least two of the side surfaces of each of the polarizer and analyzer on the area of the surface excepting for the linear areas of 50 to 150 .mu.m width from the top and bottom surfaces of the polarizer or analyzer; and (b) bonding the polarizer and analyzer to the respective holder rings by soldering using a solder alloy with intervention of the metallized layer between the polarizer or analyzer and the holder ring. The invention further provides an optical part having, on at least one of the surfaces, a heat-resistant anti-reflection coating film which is a double-layered film consisting of a thin film of the titanium oxide TiO.sub.x (x=1.9 to 2.

Abstract: The invention relates to a transparent zero distortion photocatalytic dielectric combiner housing a series of hard durable thin films that reflect 98% of UV, with a plurality of dielectric layers having indices of refraction greater than 2.0 but otherwise is transmissive to light at all wavelengths. The photocatalytic dielectric combiner selectively reflects and concentrates UV from sources such as light fixtures or sunlight within a narrow range of wavelengths on the outer surface of the combiner element, promoting photocatalytic oxidation to decompose bacteria and contaminants, making surfaces the combiner is placed upon self-cleaning, self-sanitizing, and self-deodorizing. The invention is suitable for windows, counter tops, door hardware, plumbing fixtures, and the like.

Abstract: A composite optical film with a low refractive index mainly comprises calcium fluoride (CaF.sub.2), and silicon dioxide (SiO.sub.2) mixed with a specific composition ratio. The composite optical film is formed on a quartz substrate. The composite film is formed by using a coater, which accommodates two individual e-gun sources inside a cylindrical chamber. Oxygen is bled into the chamber. A heating process and plasma formation are performed to assist the process of forming the composite film. Additionally, a laser reflection lenses comprises an optical film with high refractive index and an optical film with low refractive index, which are alternately laminated onto a quartz glass substrate. The optical film with low refractive index uses a composite optical film mainly comprising calcium fluoride (CaF.sub.2) and silicon dioxide (SiO.sub.2) mixed with a fixed composition ratio.

Abstract: In an optical member having a coating for reducing a ray reflecting on the coating and for reducing an electromagnetic wave incident on the coating, the optical member includes: a transparent substrate; and the coating including, and formed on the transparent substrate in the order named from the transparent substrate, a first light transmitting thin layer having a high refractive index, a first light transmitting thin layer having a low refractive index, a second light transmitting thin layer having a high refractive index, a second light transmitting thin layer having a low refractive index. At least one of the first light transmitting thin layer having the high refractive index and the second light transmitting thin layer having the high refractive index is a transparent conductive layer having a sheet resistivity of 100 .OMEGA./.quadrature. or less.

Abstract: A antiglare layer 12 having a fine uneven surface is formed directly or through other layer(s) on a transparent substrate film 11, and a layer 13 having a low refractive index, which is lower than the refractive index of the antiglare layer 12, is formed thereon. The refractive index of the antiglare layer 12 is higher than the refractive index of a layer in contact with said antiglare layer 12 on its surface remote from the layer 13 having a low refractive index. An SiO.sub.x film may be used as the layer 13 having a low refractive index. The SiO.sub.x film per se has excellent gas barrier property and antifouling property as an optical functional membrane and is an optical functional material characterized by having excellent moistureproofness, scratch resistance, adhesion to a substrate, transparency, low refractive index, dye, deterioration preventive property, and other properties.

Abstract: A buffer-layer located between a substrate and a multilayer for counteracting stress in the multilayer. Depositing a buffer-layer having a stress of sufficient magnitude and opposite in sign reduces or cancels out deformation in the substrate due to the stress in the multilayer. By providing a buffer-layer between the substrate and the multilayer, a tunable, near-zero net stress results, and hence results in little or no deformation of the substrate, such as an optic for an extreme ultraviolet (EUV) lithography tool. Buffer-layers have been deposited, for example, between Mo/Si and Mo/Be multilayer films and their associated substrate reducing significantly the stress, wherein the magnitude of the stress is less than 100 MPa and respectively near-normal incidence (5.degree.) reflectance of over 60% is obtained at 13.4 nm and 11.4 nm. The present invention is applicable to crystalline and non-crystalline materials, and can be used at ambient temperatures.

Abstract: The optical properties (absorption, reflection, transmittance, transparency) and physical attributes (hardness, friction, durability, etc.) of metal oxides, nitrides, or films that combine these materials can be modified by adding fluorine to the deposition mixture. The extent of change in properties depends on the amount of fluorine incorporated. Contrary to previous information, the presence of fluorine does not prevent adhesion of overlayers such as hard carbon, hydrogenated carbon, or diamond-like carbon. Considering for example massive silicon oxynitride hardcoat layers which are part of wear resistant composite windows for visible spectral applications, preferably fluorine is incorporated in a relatively very thin surface-adjacent region or layer of the hardcoat on the side thereof on which a carbonaceous layer such as DLC is formed.

Abstract: A reflecting film has at least a transparent polymer film and a thin silver layer applied on the transparent polymer film to reflect light entered from a side of the transparent polymer film. The reflecting film retains a reflectance of at least 90% to visible light even after the reflector is exposed for 300 hours at a reflecting film temperature of 100.degree. C. and an exposure intensity of 500 mW/cm.sup.2 to artificial sunlight from which light of 390 nm and shorter in wavelength has been eliminated. For fabricating the reflecting film, a surface of the transparent polymer film is preferably treated with a metal-containing plasma, then the thin-silver layer is deposited on the treated surface. A reflector making use of the reflecting film is also disclosed.

Abstract: An ultraviolet curable clearcoat composition comprising (exclusive of any solvent present): (a) about 30% to about 90% by weight of an acrylated aliphatic urethane having a molecular weight of about 1200 to 2600 and formed by the reaction of a multifunctional acrylate with a molecular weight of between about 110 and about 500 with an aliphatic urethane based on a polyether and having a molecular weight of about 800 to about 2200; (b) about 15% to about 70% by weight of a multifunctional acrylate having a molecular weight of about 170 to about 1000 and containing at least two polymerizable unsaturated groups per molecule; and (c) a photopolymerization initiator and/or sensitizer. Also described are preferred processes and clearcoated articles involving preferred clearcoat compositions.

Abstract: An antireflection film is provided which is insoluble, wear-resistant, and weatherable, and simultaneously having non-fogging property. A non-fogging optical member employing the non-fogging antireflection film, and a process for producing the film are also provided. The non-fogging antireflection film is formed from a composition derived by polycondensation of a hydrolyzate of an inorganic alkoxide conducted in the presence of a polyacrylic acid compound.

Abstract: It has been discovered that control of the intra-layer stress in layers of high refractive index materials, such as zirconia and titania, permits low net stress multilayer thin film stacks comprising alternating layers of the high refractive index material and silica, a low refractive index material, to be sputter-deposited on glass substrates. In particular, a simple, cost-effective and readily reproducible post-deposition annealing process is used, i.e., an annealing process that can be effected within a broad temperature range and for a brief and substantially open-ended time period, to change the post-deposition microstructure of the high refractive index film layers and create a selected intra-layer tensile stress. The intra-layer tensile stress created during such an annealing process is largely dependent on the post-deposition microstructure of the high refractive index thin film layers.

Abstract: An anti-reflection film comprises a transparent support and a low refractive index layer. The low refractive index layer has a refractive index of not higher than 1.45. The low refractive index layer comprises a binder polymer and micro polymer particles. The micro polymer particles are superposed upon each other to form micro voids surrounded by the particles. The micro polymer particles have a mean particle size in the range of 5 to 200 nm. According to the first embodiment of the present invention, the particles comprise a cross-linked polymer. According to the second embodiment of the present invention, the particles comprise a polymer cross-linked to the binder polymer.

Abstract: A antiglare layer 12 having a fine uneven surface is formed directly or through other layer(s) on a transparent substrate film 11, and a layer 13 having a low refractive index, which is lower than the refractive index of the antiglare layer 12, is formed thereon. The refractive index of the antiglare layer 12 is higher than the refractive index of a layer in contact with said antiglare layer 12 on its surface remote from the layer 13 having a low refractive index. An SiO.sub.x film may be used as the layer 13 having a low refractive index. The SiO.sub.x film per se has excellent gas barrier property and antifouling property as an optical functional membrane and is an optical functional material characterized by having excellent moistureproofness, scratch resistance, adhesion to a substrate, transparency, low refractive index, dye deterioration preventive property, and other properties.

Abstract: The invention relates to a heat reflecting glass pane. This glass pane has a transparent glass plate and a multilayer coating formed on one side of the glass plate. The multilayer coating includes a first heat-reflecting layer formed on a surface of the glass plate, and a second layer formed on the first layer. The first layer has a first refractive index from 2.0 to 3.5, a first extinction coefficient from 0.2 to 1.5, and a first thickness from 20 to 80 nm. The second layer has a second refractive index from 1.6 to 2.3, a second extinction coefficient not higher than 0.03, and a second thickness from 10 to 100 nm. The second refractive index is smaller than the first refractive index. The heat reflecting glass pane does not so much reduce the reflectance of a visible light incident on the glass plate from the uncoated side, but substantially reduces the reflection of a visible light incident on the second layer from the coated side.

Abstract: An optical thin film for an optical element is disclosed, which includes at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. A material for use in evaporation coating to prepare a thin film includes a mixture of at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3 and another dielectric. A further optical thin film includes a substrate and superimposed thereon are alternate layers. One such alternative layer having a high refractive index, and composed of a material containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. Another of such alternative layers having a low refractive index, and composed of SiO.sub.2. Another thin film includes a substrate and, superimposed thereon, at least one dielectric layer. The at least one dielectric layer being at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.

Abstract: A protective composite thin film coating structure is disclosed which provides ultraviolet (UV)-protection to polymer components used in low earth orbit (LEO) environments. The structure protects such components from physical and optical degradation due to exposure to ultraviolet radiation and oxygen, in particular atomic oxygen.

Abstract: A reflection-preventing layer for a display device includes a transparent insulating substrate, at least one dielectric film formed on the transparent insulating substrate, and an amorphous carbon thin-film layer having a diamond-like carbon film on the uppermost dielectric layer of the dielectric films, so that the reflectance of the reflection-preventing layer is semi-permanently decreased while increasing the surface solidity thereof.

Abstract: A glass article having a solar control coating is disclosed for use in producing heat reducing glass for architectural windows. The coated article includes a glass substrate, an iridescence-suppressing interlayer deposited on and adhering to the surface of the glass substrate. At least a first transparent coating deposited on and adhering to the surface of the iridescence-suppressing coating and at least a second transparent coating deposited on and adhering to the surface of the first transparent coating. The first transparent coating and the second transparent coating have a difference in refractive indices in the near infrared region greater than a difference in the refractive indices in the visible region. The use of the article in architectural glazing results in a glazing that rejects solar energy in the near infrared region while permitting the transmittance of a high degree of visible light.

Abstract: A composite film that, when used as a protective film or an antireflection film for e.g., a polarizing film of a liquid crystal display, has a surface slip property good enough to be rolled and excellent mechanical and chemical resistance and optical properties. In one aspect, the composite film has a substrate film and a hard coat layer provided on the substrate film, the hard coat layer formed of an ionizing radiation-cured resin, the surface of the hard coat layer having fine irregularities serving to create a surface slip property. In another aspect, the composite film has a substrate film and a hard coat layer provided on the substrate film, the hard coat layer formed of a composition comprising an ionizing radiation-cured resin, fine particulates of inorganic and/or organic materials, and an organic silicone.

Abstract: A laminate which comprises a transparent substrate, a first oxide layer comprising ZnO which contains at least one metal, a first metallic layer comprising Pd-containing Ag and a second oxide layer comprising SnO.sub.2 or ZnO which contains at least one metal, wherein said layers are formed on the substrate in this order.

Abstract: The present invention relates to multilayered filter films, and in particular, a multilayered filter film not having a substrate and a method for making the same. The method for making the multilayered filter film not having a substrate includes a step for forming a filter frame layer having a window on the substrate, a step for forming a multilayered film on the substrate inside the window and on the filter frame layer, and a step for removing the substrate from the filter frame layer and the multilayered film.

Abstract: An antireflection film is procided on a plastic optical element as follows. An undercoat composed principally of unsaturated silicon exide SiO.sub.x (2>x>1) with a thickness within a range of 200 to 300 nm is formed on the optical element. A multi-layered film of a repeating structure is formed on the undercoat. The multi-layerd film has antireflective characteristics. The undercoat has a refractive index within a range of 1.49 to 1.59. The multi-layered film is composed of alternate lamination of a layer of a material which has a high refractive index and which is composed principally of TiO.sub.2, ZrO.sub.2 or a mixture thereof, and a layer of a material which has a low refractive index and which is composed principally of SiO.sub.x (2.gtoreq.x.gtoreq.1).

Abstract: In the method and apparatus of the present invention, a first optical element having a surface stressed by an optical coating is optically contacted with a second optical element. The first optical element is treated with a frequency or polarization selective coating which causes deformation of the treated surface. A pliable intermediate optical element is joined with the coated surface. The intermediate element is sufficiently pliable to substantially conform to the contour of the coated surface, providing optical contact therebetween. An opposite face of the intermediate element is polished and a second optical element is optically contacted to the intermediate element. This provides a precise and economical method for joining two optical elements, one of which is treated with an optical coating.

Abstract: An anti-reflection coating that is soil resistant and easy to maintain is provided. The coating includes a multilayer film having alternating layers of high and low refractive index materials that comprise electrically conductive metal oxides. The film is formed by reacting metal with non-stoichiometric amounts of oxygen such that the coating has one or more layers of electrically conductive metal oxide material. The coating is particularly suited for ophthalmic applications.

Abstract: The invention relates to an optical component consisting of transparent thin layers of differing thickness and refractive indices. Such optical components are used, for example, as interference filters and mirrors. Optical components made of layers with gradually changing refractive indices are also known as waveguides of anti-reflective coatings. The invention achieves the aim of using, instead of layers of ordinary materials, another material by means of a component in which the layers consist of porous silicon. The special advantages of porous silicon as a coating material arises not only from the ease and economy of manufacture, but also in the facility for obtaining gradual refractive index transitions. It is therefore very easily possible to make waveguides on a silicon chip.

Abstract: A fluorescent yellow article comprising polycarbonate polymer, perylene imide dye Chromophthal Red 6961A and at least one yellow-green dye selected from the group consisting essentially of Lumogen F Yellow 083, CI Solvent Yellow 98, CI Solvent Yellow 160:1, Oraset Yellow 8GF, CI Solvent Green 4, CI Solvent Green 5, CI Pigment Yellow 101, Golden Yellow D304 and CI Solvent Yellow 131 wherein the resultant article has chromaticity coordinates (x,y) within the area defined by (0.425,0.480), (0.465,0.535), (0.557,0.440), and (0.500,0.410) in terms of the CIE 1931 Standard Colorimetric System and measured using 0/45 geometry and evaluated with CIE Standard Illuminant D65.

Abstract: An arrangement is produced for protection against harmful effects of radiation and for indicating such radiation which can preferably be designed as a viewing window or as goggles and can be used for protecting the eyes from injury due to high-intensity electromagnetic radiation. It includes a transparent substrate and a sequence of thin optical layers which are applied to this substrate and are arranged according to the principle of an optical thin-film resonance absorber system.

Abstract: A nonlinear optical material includes nitride layers and non-nitride layers which are alternately deposited, wherein the non-nitride layers include at least one non-nitride selected from the group consisting of oxides, carbides and semiconductors and at least one type of semiconductor fine particles having a band gap smaller than a band gap of the nitride and the non-nitride, which particles are dispersed in the non-nitride layer.

Abstract: A formable multilayer reflective polymeric body which has a substantially uniform broad bandwidth reflectance over substantially the entire range of the visible spectrum to provide a substantially uniform reflective appearance is provided. The body includes at least first and second diverse polymeric materials, the body comprising a sufficient number of alternating layers of the first and second polymeric materials such that at least 40% of visible light incident on the body is reflected. A substantial majority of the individual layers of the body have optical thicknesses in the range where the sum of the optical thicknesses in a repeating unit of the polymeric materials is greater than about 190 nm, and the first and second polymeric materials differ from each other in refractive index by at least about 0.03.

Abstract: A faceplate for a touch-sensitive display includes, on an outermost surface, a pattern of electrode-regions separated by spaces. A base-coating is deposited on the surface and extends continuously over the surface. The electrode-regions are formed from a layer of a conductive transparent metal-oxide deposited on the base-coating. The electrode-regions and spaces are overcoated by a protective-layer of an insulating material. For light incident on the faceplate at about normal incidence photopic reflectivity in the protective-layer-overcoated electrode-regions is within plus or minus ten percent of photopic reflectivity in the protective-layer-overcoated spaces.

Abstract: Durable thorium fluoride, low reflectance, high transmittance coatings for germanium (zinc sulfide, zinc selenide, gallium arsenide) exterior window surfaces are replaced using magnesium fluoride, a material previously not considered applicable to the 8 to 12 .mu.m wavelength range. This is enabled by the use of argon ion bombardment of the growing film. This method reduces the intrinsic stress of deposited films and permits growth of magnesium fluoride films of sufficient thickness to be used on the exterior surface of IR windows.

Abstract: An optical structural element has a substrate and includes at least one wear protection system built up of one or several layers on the substrate. The layers are of at least one of the materials ZrO.sub.2, AlN,(Al,Cr).sub.2 O.sub.3, BN and diamond. A total thickness of the layers is more than about 100 nm and the mean transmission of the wear protection system is at least 10% in a spectral band of 10 nm within the visible light spectrum.

Abstract: A low emissivity film comprises a coating of an oxide film, a metal film, an oxide film and so on alternately formed on a substrate in this order in a total of (2n+1) layers where n is an integer being equal to or more than 1, wherein an oxide film (B) formed on the side opposite to a metal film (A) being most remote from the substrate in view from the substrate, contains at least one layer of a zinc oxide film doped with at least one selected from the group consisted of Si, Ti, Cr, B, Mg, Sn and Ga by 1 through 10 atomic % with respect to a total amount including Zn.

Abstract: A low emissivity film formed on a substrate, which comprises a coating of oxide films and films whose major component is Ag alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein an integral width .beta.i(.degree.) of (111) diffraction line of a cubic Ag in an X-ray diffraction diagram of the low emissivity film exists in a first range of 180.lambda./(d.pi.cos.theta.).ltoreq..beta.i.ltoreq.180.pi./(d.pi.cos.thet a.)+0.15, where d(.ANG.) designates a thickness of a film whose major component is Ag, .pi.(.ANG.), a wave length of an X-ray for measurement and .theta., Bragg angle.

Abstract: A low emissivity film which comprises: a substrate; and a coating of oxide and metallic films alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein the oxide film (B) formed on the outer side of the metallic film (A) being most apart from the substrate, has an internal stress which is equal to, or less than 1.1.times.10.sup.10 dyne/cm.sup.2.

Abstract: A multilayer optical interference filter having a controlled degree of diffuse reflection over a desired visible wavelength range, includes alternating layers of at least one high refractive index material and at least one low refractive index material, wherein at least one layer of the alternating layers is a light scattering layer comprised of titania which diffusely reflects light over a desired visible wavelength range. The multilayer optical interference filter may be provided by a process including sequentially applying the alternating layers by chemical vapor deposition from respective precursors at temperatures effective to pyrolytically decompose the respective precursors, wherein the precursor of the light scattering layer comprised of titania is at least one branched alkoxide of titania.

Abstract: Selective emissivity coatings are disclosed for temperature reduction of enclosures such as vehicles and building structures. The coating includes a selective emissivity material such as silicon-oxy-nitride having a desired thermal emissivity function which is high in the 8-13 micron wavelength region, and low elsewhere except in the visible wavelength region. The material provides a mechanism for radiative cooling of the enclosure by converting the blackbody radiation of the enclosure, which would be reflected by the earth's atmosphere, into far infrared radiation which is transmitted by the atmosphere. According to another aspect of the invention, the coating further comprises a semimetal which is reflective of radiation in the near infrared region, thereby reducing the solar heat load on the enclosure. One suitable semimetal is LaB.sub.6. The coating may be applied to the exterior surface of vehicle and building windows, or to the exterior, non-window surfaces of building structures.

Abstract: Thin film devices including a film of a functional organic material, inorganic material or mixtures which are either insoluble or sparingly soluble in water, and deposited by electroplating. Particles of the functional material are dispersed in a micelle solution of a surfactant which is oxidizable and reducible by electrolysis in a colloidal state. Thin film devices prepared include color filters, optical recording media, electrochemical photoreceptors, nonlinear switching elements, and other devices requiring thin films of materials which are substantially insoluble in water.

Abstract: A low emissivity film which comprises: a substrate; and a coating of oxide and metallic films alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein the oxide film (B) formed on the outer side of the metallic film (A) being most apart from the substrate, has an internal stress which is equal to, or less than 1.1×1010 dyne/cm2.