Abstract: A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system (26) includes a layer (L) of material having a lower refractive index n1 at the operating wavelength, a layer (H) of material having a higher refractive index n2 at the operating wavelength and a layer (M) of material having a refractive index n3 at the operating wavelength, where n1<n3<n2. The layer (M) is arranged at at least one transition from a layer (L) to a layer (H) and/or from a layer (H) to a layer (L). The dielectric layer system has a four-layer sequence of (LMHM)m or (HMLM)m, where m is equal to the number of four-layer sequences in the dielectric layer system.

Abstract: An optical device is provided. The optical device includes a plurality of metal grids, a first patterned organic layer, and a second patterned organic layer. The first patterned organic layer includes a first portion having a first thickness, a second portion having a second thickness, a third portion having a third thickness, and a plurality of fourth portions. The first portion, the second portion and the third portion are respectively formed between the metal grids. The fourth portions are formed on the metal grids. The first thickness of the first portion is greater than the second thickness of the second portion. The second thickness of the second portion is greater than the third thickness of the third portion. The second patterned organic layer is formed on the fourth portions of the first patterned organic layer.

Abstract: Aspects and examples are generally directed to broadband optical systems and methods for collecting a wide spectral range of electromagnetic radiation with a single window optical assembly. In one example, a broadband optical system includes a segmented window positioned to receive electromagnetic radiation, the segmented window including at least a first segment formed from a first material and a second segment formed from a second material, the first segment being configured to transmit a first spectral band of the electromagnetic radiation along an optical path and the second segment being configured to transmit a second spectral band of the electromagnetic radiation along the optical path. The broadband optical system may include an optical de-multiplexer configured to spatially separate the first and second spectral bands, and foreoptics interposed between the segmented window and the optical de-multiplexer to direct the electromagnetic radiation from the segmented window to the optical de-multiplexer.

Abstract: A wavelength-division multiplexing (WDM) optical assembly with increased lane density is disclosed herein. The WDM optical assembly includes a WDM optical core subassembly including an optical signal router for routing an optical signal between a first side and a second side of a substrate. The WDM optical core subassembly further includes a first WDM filter having a first passband and a second WDM filter having a second passband. The WDM optical core subassembly forms a first optical path between a first common port, the first WDM filter, and a first channel port, and to form a second optical path between the second WDM filter, a second common port, and a second channel port. The WDM optical core subassembly increases lane density while decreasing size and complexity by including a plurality of common ports in optical communication with the same plurality of WDM filters.

Abstract: An optical multiplexer/demultiplexer includes: first to n-th demultiplexed light input/output portions; a multiplexed light input/output portion; second to n-th interference film filters; and first to n?1-th mirrors. The first to n-th demultiplexed light input/output portions are disposed on a single plane and correspond to light having a single wavelength. The second to n-th interference film filters are disposed in front of the second to n-th demultiplexed light input/output portions. The first to n?1-th mirrors are disposed in front of the first demultiplexed light input/output portion and in front of the n?1-th interference film filters. Light from the first demultiplexed light input/output portion strikes the first to n?1-th mirrors and the second to n-th interference film filters and is input to the multiplexed light input/output portion. Light output from the multiplexed light input/output portion strikes the second to n-th interference film filters and first to n?1-th mirrors.

Abstract: A multiplexer/demultiplexer is provided comprising a capillary filter block, a capillary adhesive, a signal-routing block, and an index-matching adhesive. The capillary adhesive resides in the capillary interstices of the capillary filter block and the index-matching adhesive forms an optical and mechanical interface between the signal-routing block and the capillary filter block. The layer thickness of the index-matching adhesive accommodates for extra-planar surface irregularities in the bonding face of the signal routing block and extra-planar variations along the proximal ends of the component filter blocks of the capillary filter block. The capillary filter block can be formed from a plurality of component filter blocks by dicing multiple component filter blocks from a filter block substrate, placing the component filter blocks adjacent to one another, and using capillary force to draw adhesive between adjacent sidewalls of component filter blocks.

Abstract: An optical demultiplexer that separates, for each signal wavelength, signal light a plurality of wavelengths of which is multiplexed, the optical demultiplexer including: an antireflection film disposed at on an incident surface of a glass block; filters disposed on an emission surface of the glass block, the filters transmit light of a wavelength predetermined for each signal wavelength included in the signal light and reflect light of a wavelength other than the transmitting wavelength toward the incident surface; and a reflection film disposed on the incident surface of the glass block, wherein processing to reduce reflection of the reflection light into the glass block is applied on an optical path of the reflection light reflected by the filter disposed at an end away from the antireflection film.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting electromagnetic radiation that is incident on the optical effective surface, and at least two piezoelectric layers (16a, 16b, 16c), which are arranged successively between the mirror substrate and the reflection layer stack in the stack direction of the reflection layer stack and to which an electric field can be applied to produce a locally variable deformation, wherein at least one intermediate layer (22a, 22b) made of crystalline material is arranged between the piezoelectric layers (16a, 16b, 16c), wherein the intermediate layer is designed to leave an electric field, which is present in the region of the piezoelectric layers (16a, 16b, 16c) that adjoin the intermediate layer (22a, 22b) in the stack direction of the reflection layer stack (21), substantially uninfluenced.

Abstract: A reflective mirror is provided with a base and a multilayer film including first layers and second layers laminated alternately on the base and capable of reflecting at least a portion of the incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion which has a second thickness different from the first thickness and which is provided at a position rotationally symmetric to that of the first portion about the optical axis of the reflective mirror relative.

Abstract: The present disclosure provides methods, systems and devices for a photonic crystal combinatorial sensor. The photonic crystal sensor may include an array of photonic crystal materials, wherein each photonic crystal material has a reflected wavelength in a respective initial wavelength range. At least one a first one of the photonic crystal materials may be configured to have a response to an external stimulus different from at least a second one of the photonic crystal materials, the different response resulting in a change in the reflected wavelength of the first photonic crystal material that is an optically detectable difference from the second photonic crystal material. The optically detectable difference may provide an optically detectable response pattern of reflected wavelengths in the array. The sensor may be reversible and reusable.

Abstract: An optical component includes: a multilayer inorganic thin-film on a substrate, wherein the inorganic thin-film is formed by laminating a plurality of layers made of silicon oxide and a plurality of layers made of metal oxide, the metal oxide is metal oxide containing any one of zirconium, tantalum, and titanium, the layers made of silicon oxide include a low-density silicon oxide layer and a high-density silicon oxide layer having a density higher than the low-density silicon oxide layer, the outermost layer of the inorganic thin-film is the low-density silicon oxide layer, and the surface roughness of the outermost layer of the inorganic thin-film is equal to or greater than 0.55 nm and equal to or smaller than 0.7 nm.

Abstract: An optical thin film can have a refractive index variation along a dimension that is perpendicular to its thickness. Two areas that have equal physical thicknesses can have different optical thicknesses. Including the thin film as a layer in a thin film optical filter can provide a corresponding variation in the filter's spectral properties. Dosing an optical thin film with ultraviolet light can cause the refractive index variation. Subjecting the film to hydrogen can increase the refractive index's response to the dose of light. Dosing a region of a thin film optical filter with ultraviolet light can change the spectral properties of the region, for example shifting an out-of-specification optical filter into specification thereby increasing manufacturing yield. An agent can promote the film's response to the dose.

Abstract: An optical filter for filtering an electromagnetic radiation of variable angle of incidence, includes a stack of at least one dielectric or semi-conductor layer arranged between two partially reflective layers, said stack defining a set of Fabry-Pérot cavities set to a predetermined wavelength. The average refractive index of the dielectric or semi-conductor layer is variable in a plane orthogonal to the direction of the stack so as to compensate the effects of the variation in the angle of incidence of the electromagnetic radiation on the transmission spectrum of the cavities.

Abstract: A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13.

Abstract: An interface between two different optical materials can comprise a stack of thin film layers that manage light incident on that interface. One of the optical materials can have a first composition and a first refractive index, while the other optical material can have a second composition and a second refractive index. The stack can comprise thin film layers of the first optical material interleaved between thin film layers of the second optical material. The layers of the stack can be configured to provide the stack with an aggregate composition of at least one of the optical materials that progressively varies from one end of the stack to the other end. To provide the progressive variation in composition, the layers of one of the optical materials can have a progressively increased thickness across the stack, or can progressively increase in number, for example.

Abstract: An optical device is provided. The optical device comprises a substrate having a coating region and a non-coating region. A first film is on the coating region, wherein the first film has a band edge structure extending to a portion of the non-coating region with an angle between a surface of the band edge structure and a surface of the first film to diminish the attenuation of an incident light beam.

Abstract: The invention relates to an optical filter structure composed of at least two adjacent elementary optical filters, an elementary optical filter being centred on an optimum transmission frequency, characterised in that it comprises a stack of n metallic layers (m1-m3) and n?1 dielectric layers (d2-d3), each metallic layer alternating with a dielectric layer such that the central layer in the stack is a metallic layer (m2), each of the layers in the stack having a constant thickness except for the central metallic layer for which the varying thickness fixes the optimum transmission frequency of an elementary filter.

Abstract: An interface between two different optical materials can comprise a stack of thin film layers that manage light incident on that interface. One of the optical materials can have a first composition and a first refractive index, while the other optical material can have a second composition and a second refractive index. The stack can comprise thin film layers of the first optical material interleaved between thin film layers of the second optical material. The layers of the stack can be configured to provide the stack with an aggregate composition of at least one of the optical materials that progressively varies from one end of the stack to the other end. To provide the progressive variation in composition, the layers of one of the optical materials can have a progressively increased thickness across the stack, or can progressively increase in number, for example.

Abstract: A method for designing a first optical filter, exhibiting a first filter performance satisfying a first preset criterion, and a second optical filter, exhibiting a second filter performance satisfying a second preset criterion, includes providing initial first and second filter designs for the first and second optical filters, respectively, as first and second ordered stacks of layers, respectively. A pair of layers, including a first layer, characterized by a first thickness, and a second layer, characterized by a second thickness, is selected from the first and second ordered stacks of layers. The first thickness is constrained to a first constrained thickness that is a positive integer multiple of the second thickness to yield a constrained first filter design. A predicted performance of the constrained first filter design is determined and compared with the first preset criterion for one of accepting and rejecting the constrained first filter design.

Abstract: Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.

Abstract: An optical article includes: an optical base; and a layer that is provided on the optical base and contains SiO2 as a main component, the layer being a silicon-nitride-containing silicon oxide layer containing SisOtNu (s>0, T?0, u>0).

Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.

Abstract: An interface between two different optical materials can comprise a stack of thin film layers that manage light incident on that interface. One of the optical materials can have a first composition and a first refractive index, while the other optical material can have a second composition and a second refractive index. The stack can comprise thin film layers of the first optical material interleaved between thin film layers of the second optical material. The layers of the stack can be configured to provide the stack with an aggregate composition of at least one of the optical materials that progressively varies from one end of the stack to the other end. To provide the progressive variation in composition, the layers of one of the optical materials can have a progressively increased thickness across the stack, or can progressively increase in number, for example.

Abstract: A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

Abstract: The infrared reflective device includes infrared reflective members which reflect infrared rays. The infrared reflective members include colloidal particles arranged at regular spacing, and a filler material intervening in the spaces between the colloidal particles. The difference between the refractive index of the colloidal particles and the refractive index of the filler material is set so as to be 0.05 or less in the visible light region and 0.1 or above in the infrared region, whereby visible light is transmitted while infrared rays are reflected.

Abstract: A system and method for uniform light generation in projection display systems. An illumination source comprises a light source to produce colored light, and a scrolling optics unit optically coupled to the light source, the scrolling optics unit configured to create lines of colored light from the colored light, and to scroll the lines of colored light along a direction orthogonal to a light path of the illumination source. The scrolling optics unit comprises a single light shaping diffuser to transform the colored light into the lines of colored light, an optical filter positioned in the light path after the light shaping diffuser, and a scrolling optics element positioned in the light path after the optical filter. The single light shaping diffuser is capable of simultaneously transforming colored light into lines of colored light having substantially uniform intensity to provide uniform illumination.

Abstract: The invention is directed to elements having fluoride coated surfaces having multiple layers of fluoride material coatings for use in laser systems, and in particular in laser systems operating at wavelength <200 nm. In a particular embodiment the invention is directed to highly reflective mirrors for use in wavelengths <200 nm laser systems. The invention describes the mirrors and a method of making them that utilizes a plurality of periods of fluoride coatings, each period comprising one layer a high refractive index fluoride material and one layer low refractive index fluoride material, and additionally at least one layer of an amorphous silica material. The silica material can be inserted between each period, inserted between a stack consisting of a plurality of periods, and, optionally, can also be applied as the final layer of the finished element to protect the element.

Abstract: There is disclosed an optical filter element that includes a translucent substrate; a laminated film formed by laminating plural thin films including a metal film on the translucent substrate; and a parallel structure in which parallel concave-shaped defective parts are periodically provided at a pitch shorter than a transmitted light wavelength. The parallel structure is formed in at least a part of the laminated film.

Abstract: An antireflection film includes a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, and a seventh layer. Each of the first, third, fifth, and seventh layer is formed using a low refractive index material. Each of the second, fourth, and sixth layer is formed using a high refractive index material. The thicknesses of the first, second, third, fourth, fifth, sixth, and seventh layers are in ranges of 0.122d1 to 3.052d1, 0.267d2 to 0.370d2, 0.427d3 to 0.610d3, 0.760d4 to 0.924d4, 0.305d5 to 0.378d5, 0.575d6 to 0.718d6, and 1.160d7 to 1.342d7, correspondingly, wherein di=?/(4×ni), (i=1, 2, . . . 7), ni is a refractive index of the i-th layer, and ? is a reference wavelength of incident light entered into the antireflection film.

Abstract: In a multilayer mirror (1) for the reflection of EUV radiation containing a large number of alternating molybdenum layers (4) and silicon layers (3), a barrier layer (5) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers (4) and the silicon layers (3). As a result of the barrier layers (5) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror (1) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

Abstract: Taught herein is an integragted narrow bandpass filter array and a method of its fabrication. The filter array is a Fabry-Perot type of filter array, wherein the pass band changes with the thickness of the spacer layer. The integrated filter array comprises a substrate, a lower mirror stack, a spacer array, and an upper mirror stack. The spacer array is an array of varied thicknesses formed using a combinatorial deposition technique. The spacer array is used to control the pass band of each mini-size narrow bandpass filter and realizes the integration of narrow bandpass filters with different pass bands on a single substrate. The merit of this technique lies in its fabrication efficiency and finished product rate which are much higher than for conventional methods. The filter array is completely matched with detector arrays and functional in most of the important optical ranges.

Abstract: An antireflective coating is disclosed having at least one layer of a first material with a first index of refraction and a first thickness, the first index of refraction and first thickness substantially conforming to a refractive index profile matching a reflectionless potential.

Abstract: This invention relates to the field of thermophotovoltaic (TPV) direct energy conversion. In particular, TPV systems use filters to minimize parasitic absorption of below bandgap energy. This invention constitutes a novel combination of front surface filters to increase TPV conversion efficiency by reflecting useless below bandgap energy while transmitting a very high percentage of the useful above bandgap energy. In particular, a frequency selective surface is used in combination with an interference filter. The frequency selective surface provides high transmission of above bandgap energy and high reflection of long wavelength below bandgap energy. The interference filter maintains high transmission of above bandgap energy and provides high reflection of short wavelength below bandgap energy and a sharp transition from high transmission to high reflection.

Abstract: A non-polarizing beam splitter has a first prism; one or more ground layer(s) made of a dielectric material which is (are) formed on a slant face of the first right angle prism; an Au layer having thickness of 13 to 35 nm which is formed on the ground layer; one or more protective layer(s) made of a dielectric material which is (are) formed on the Au layer; and a second prism which is jointed to an outermost layer of the protective layer via adhesive. The non-polarizing beam splitter divides light at wavelength of 640 nm to 820 nm into transmission light and reflection light by a predetermined ratio.

Abstract: A multi-layer thin film is provided preferably for use with photochromic lenses, wherein the thin film comprises a plurality of layers, preferably including dielectric layers, selected and arranged so as to reflect less than about 6 percent of the UVA rays in a range of about 315 to 400 nm, more preferably about 350 to 380 nm. The thin film preferably has an activation value greater than 25%.

Abstract: A terahertz band optical filter having a dielectric multilayer periodic structure in which a plurality of dielectric materials are periodically layered. Multi-cavity layers each having an optical path length of n times ?/2 (n is an integer greater than or equal to 1) and made of a low-refractive index medium are arranged. The cavity layers are coupled using a single-layer coupling layer having an optical path length ?/4 and made of a high-refractive index medium, thus forming a multi-cavity structure. Matching layers each including a high refractive index layer and a low refractive index layer each having an optical path length of ?/4 are disposed at either end of the multi-cavity structure.

Abstract: An optical element structured in accordance with the invention comprises a substrate with at least two zones with different optical functions. The coating systems in the two zones can in each case be subdivided into a zone-specific internal partial coating system and a complementary partial coating system that is common to all the zones, where the complementary partial coating system comprises at least one layer and in the zones in which the internal partial coating systems comprises at least one layer said coating system is arranged between the substrate and the complementary partial coating system.

Abstract: The present invention relates to a security element in the form of a strip. The strip exhibits optical effects which vary, depending on the illumination or viewing direction. The optical effects are provided only in one or more definably delimited, mutually spaced surface regions. The strip outside the visually variable surface regions is transparent or is adapted to the appearance of the surface of the substrate.

Abstract: The invention is directed to elements used in high power laser lithographic systems operating at below 250 nm, and in particular to elements that have a coating of selected materials to extend lifetime of the elements; and to a method of preparing the extended lifetime elements. The invention is particularly directed to gratings and mirrors that are coated with silicon dioxide, aluminum oxide or fluorinated silicon dioxide. The coatings of the invention attain their extended life as a result of being deposited while being simultaneously bombarded with an energetic ion plasma.

Abstract: A phase shifter includes at least one photonic crystal structure having alternating high and low index dielectric layers. At least two defect structures are positioned between said photonic crystal structures. The defect structure includes one or more nonlinear materials used to produce an index change, whose effect is amplified to produce a specified phase shift in the output signal of said phase shifter.

Abstract: A hybrid transmission-reflection grating includes an array of essentially parallel principal interfaces, with each principal interface separating a first medium and a second medium. The first medium has a first index of refraction, and the second medium has a second index of refraction. The first medium allows for transmission of quantum-mechanical objects in excess of one percent of an incident number of quantum-mechanical objects. The array of principal interfaces has a spacing distance between adjacent principal interfaces. The first medium has a width in the direction normal to the principal interfaces, the width being less than the spacing distance.

Abstract: An optical tunable filter has a fixed substrate having a first recess formed therein and a movable substrate bonded to the fixed substrate. The movable substrate includes a movable portion having an opening formed at a location facing the first recess and a support portion for supporting the movable portion so that the movable portion can be displaced. The optical tunable filter also has a light-transmittable substrate bonded to the movable portion, a fixed reflection film formed on a bottom of the first recess, and a movable reflection film formed on a surface of the light-transmittable substrate. The optical tunable filter includes an interference gap formed between the fixed reflection film and the movable reflection film. The optical tunable filter also includes an actuator operable to displace the movable portion relative to the fixed substrate.

Abstract: An image signal processing method for performing nonlinear compensation on an image signal to be fed into a display device (103). The characteristics of nonlinear compensation are changed according to the brightness of a place in which the display device (103) is installed. This method can make the characteristics of brightness of human beings feel linear with respect to an image signal, even when the display luminance of the display device (103) is uniformly increased by the influence of ambient light.

Abstract: A sensing method and apparatus using photonic band gap multilayered material. Photonic band gap multi-layers are formed from alternating layers of higher refractive index and lower refractive index materials, and may be deposited or disposed on a optically transparent substrate or a reflecting face of a prism. Light is directed into the prism, directed to the photonic band gap multilayer, and reflected out of the prism, where it is captured and analyzed. Various sensor configurations keep light wavelength or coupling angle fixed, while monitoring the change in the other parameter. Also disclosed is a microarray configuration with an array of probe spots placed on one surface of the multilayer, which is mounted on an x-y translation stage.

Abstract: The invention relates to wavelength-selective optical filters for allowing light of a narrow optical spectral band, centered around a wavelength (?c) to pass through them, while reflecting the wavelengths lying outside this band. According to the invention, the transfer function (T1,2(?)) of the component is defined by multiplying two transfer functions of spectrally offset Fabry-Perot filters.

Abstract: The present invention is dedicated to a cost reduced anti-reflection film of a multi-lamination structure that is reduced in number of layers and increased in thickness of the same for the purpose of facilitating the total control of the film thickness and that can be manufactured in a simplified process so as to reduce the manufacturing cost. Three component layers are deposited one over another on a substrate ranging from 1.90?ns?2.10 in refractive index at an arbitrary design basis wavelength within a wavelength range in and near visible band, and these layers exhibit optical properties as in the following table: Refractive Index ‘n’ Optical Film thickness ‘nd’ 1st Layer 1.54 ? n1 ? 2.00 0.465 ? ? n1d1 ? 0.575 ? 2nd Layer 1.95 ? n2 ? 2.63 0.490 ? ? n2d2 ? 0.508 ? 3rd Layer 1.35 ? n3 ? 1.55 0.245 ? ? n3d3 ? 0.255 ?.

Abstract: Disclosed are a mirror unit and a method of producing the same. In one preferred embodiment, the mirror unit includes a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred embodiment includes forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and partially removing the multilayered film.

Abstract: A light emitting device includes a light-generating unit for generating a primary light in a first wavelength range, a wavelength-converting member connected to the light-generating unit for converting a portion of the primary light into a secondary light in a second wavelength range, and an omnidirectional reflector connected to the wavelength-converting member for receiving the secondary light and the remainder of the primary light which was not converted by the wavelength-converting member. The omnidirectional reflector is made from an omnidirectional one-dimensional photonic crystal having a reflectance characteristic that substantially permits total reflection of the remainder of the primary light with any incident angle and polarization back to the wavelength-converting member.

Abstract: The invention provides an electro-optical device capable of improving a high light projection efficiency to the outside while maintaining sealing ability for providing high recognition of vision. An organic electroluminescence display can include a light permeable substrate, and an organic electroluminescence element having a luminous layer and positive hole transfer layer interposed between a pair of electrodes. Additionally, a low refractivity film having a lower refractivity than the substrate, and a seal layer for blocking the air from invading from the substrate side to the organic electroluminescence element are laminated between the substrate and electrode of the organic electroluminescence element.

Abstract: A CWDM filter of the present invention comprises a substrate; a first portion formed on the substrate having at least two first stacking structures; a second portion superposed on the first portion including at least two second stacking structures; and a first matching layer sandwiched between the first and second portions. Each of the first stacking structures of the first portion has a Fabry-Perot cavity and a first coupling layer which are stacked over each other in turn from the substrate. Each second stacking structure has a (HnLH) structure and a second coupling layer, wherein n represents a positive integer greater than 1, L represents a low index layer with a thickness of ?o/4, H represents a high index layer with a thickness of ?o/4, and ?o is the center wavelength of said noise.