Abstract: According to one embodiment, a magnetic head for perpendicular recording includes a main pole, a first soft magnetic film disposed on a trailing side of the main pole, and a first nonmagnetic film interposed between the main pole and the first soft magnetic film. A thickness of the main pole is increased in a depth direction from an air bearing surface using an inclination, and a thickness of the first nonmagnetic film increases in the depth direction from the air bearing surface. In another embodiment, an angle from a horizontal plane of an upper surface of the first nonmagnetic film is greater than an angle from a horizontal plane of a lower surface of the first nonmagnetic film in contact with the main pole. Other heads, methods, and systems are described according to more embodiments.

Abstract: A magnetic recording head comprises a write pole including a throat region with a leading edge, a trailing edge opposite the leading edge, and first and second side edges opposite one another. The magnetic recording head further comprises a first side wall gap layer disposed alongside the first side edge of the throat region, and a second side wall gap layer disposed alongside the second side edge of the throat region. Each of the first and second side wall gap layers has a first width at the leading edge of the throat region smaller than a second width at the trailing edge of the throat region.

Abstract: The main magnetic pole piece of a magnetic head for perpendicular magnetic recording preferably has an inverted trapezoidal shape in order to maintain a sufficient recording magnetic field. Embodiments of the present invention enhance the covering power of the protective film around the main magnetic pole piece of the magnetic head and thereby ensure reliability even when the main magnetic pole piece has such a shape. In one embodiment, the protective film for protecting the main magnetic pole piece is formed by a sputtering apparatus while applying a bias, or it is formed by a carousel type sputtering apparatus or the chemical vapor deposition (CVD) technique.