Abstract: An apparatus for dispensing a vapor phase reactant to a reaction chamber is disclosed. The apparatus may include: a vessel having an inner volume configured to contain a liquid chemical; an array of sensors configured for detecting a fill level of the liquid chemical disposed within the inner volume, wherein the array of sensors are vertically distributed within the inner volume with an irregular vertical interval between adjacent sensors. The apparatus may also include: an inlet disposed in the vessel and configured for providing a carrier gas into the inner volume; and an outlet disposed in the vessel and configured for dispensing the vapor phase reactant from the inner volume to the reaction chamber. A sensor array for detecting the fill level of a liquid chemical is also disclosed, as well as methods for dispensing a vapor phase reactant to a reaction chamber.

Abstract: A method includes embedding clothing with at least one sensor and at least one control unit; a power unit powering on the at least one sensor and the at least one control unit; the at least one sensor monitoring a sensed condition; the at least one control unit conducting a heat prediction based on the sensed condition; and the at least one control unit controlling threads within the clothing based on the heat prediction to actively adjust properties of the clothing.

Abstract: The invention relates to a heating element (25) for liquids to be vaporized as well as a burner (6) of a steam cutting device (1) and a burner (38) of a power-generating device, the element being designed as an induction heater (47) comprising one coil (25a). In order to improve vaporization, the coil (25a) of the induction heater (47) is enclosed in a hybrid construction which is composed of a main part (31) with laterally extending webs (33), and which consists of an easily magnetizable material (35) and a thermally highly-conductive material, a covering element (32) consisting of nanocrystalline materials being arranged on the webs (33), and the easily magnetizable material (35) being designed to be installed on a thermally highly-conductive material (37) of a vaporizer (21).

Abstract: A method of manufacturing a light absorbing layer for a solar cell by performing thermal treatment on a specimen configured to include thin films of one or more of copper, indium, and gallium on a substrate and element selenium, includes steps of: heating a wall of a chamber up to a predefined thin film formation temperature in order to maintain a selenium vapor pressure; mounting the specimen and the element selenium on the susceptor at the room temperature and loading the susceptor in the chamber; and heating the specimen in the lower portion of the susceptor and, at the same time, heating the element selenium in the upper portion of the susceptor.

Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

Abstract: A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

Abstract: A heat equalizer includes a container structure, a material feed pipe, and a heating mechanism. The container structure includes an inner container and an outer container. In the outer container, a working fluid is held. Respective upper ends of the inner container and the outer container are joined to form a hollow portion between the inner container and the outer container. The material feed pipe extends from an outside of the container structure to the inner surface of the inner container. The heating mechanism is placed at the bottom of the outer container. At the bottom surface of the inner container, a plurality of protrusions protruding toward the inside of the inner container and depressions formed by the bottom surface depressed inward of the protrusions and capable of receiving the vaporized working fluid are formed.

Abstract: A heat equalizer includes a container structure having a heating block in which a working fluid is held for heating and vaporizing a material to be heated, a heater placed at the bottom of the container structure, and a material feed pipe allowing the outside and the inside of the container structure to communicate with each other. In the heating block, as a flow path in which the material to be heated flows, a main header pipe connected to the material feed pipe and extending in the horizontally, and a riser pipe branching from the main header pipe and extending vertically are formed. As a condensation path in which the working fluid is cooled and condensed, condensation holes formed respectively on the opposite sides of the riser pipe and extending horizontally, and a condensation pit formed under the riser pipe are formed. Between the condensation holes and the condensation pit, the main header pipe is placed.

Abstract: An apparatus for processing coating material includes a crucible having a receptacle for receiving coating material, a drive member having a drive shaft, a cover coupled to the drive shaft, and a flame nozzle opposing the receptacle. The cover includes an inner chamber, a first through hole and a number of second through holes. The first through hole and the second through holes communicate with the inner chamber. The cover has a flat surface with the second through holes exposed at the flat surface. The drive shaft drives the cover to rotate between a closed position where the cover covers the receptacle and the flat surface presses against the coating material to flatten the coating material, and an open position where the cover is moved away from the receptacle. The flame nozzle sprays flame from the second through holes through the first through hole to heat the coating material.

Abstract: A device for evaporating a metal melt, the device comprising a first crucible or crucible portion operative to receive the metal melt comprising at least one aperture, from which the evaporated metal may pass off, a second crucible or crucible portion operative to receive a susceptor material, comprising an electromagnetic radiation source, which is arranged such that it can heat susceptor material comprised in the second crucible or crucible portion through incident electromagnetic induction, wherein it does not or only negligibly heats the metal melt in the first crucible or crucible portion, wherein the first crucible or crucible portion and the second crucible or crucible portion are thermally coupled, such that the metal melt can attain a desired temperature.

Abstract: A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

Abstract: A system and associated process are provided for recovering cadmium telluride (CdTe) that has plated onto components, such as components used in the manufacture of photovoltaic (PV) modules. The system includes a vacuum oven configured for maintaining a vacuum and being heated to a temperature effective for sublimating CdTe off of components placed within the oven. A collection member is disposed so that sublimated CdTe generated in the oven diffuses to the collection member. The collection member is maintained at a temperature effective for causing the sublimated CdTe to plate thereon. The collection member is subsequently processed to collect the plated CdTe.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: A deposition apparatus includes a vacuum chamber and a heating crucible. A substrate, on which deposition films are formed, is installed in the vacuum chamber. The heating crucible is installed opposite to the substrate so as to vaporize an organic compound. The heating crucible includes a main body and an inner plate. The main body includes a space which contains the organic compound and a nozzle through which the organic compound that is vaporized is discharged. The inner plate is installed within the main body and includes at least one opening formed around an edge of an area facing the nozzle, so as to transmit the vaporized organic compound.

Abstract: Provided is a heating crucible for an organic thin film forming apparatus, the heating crucible including a main body in which to contain an organic substance, a cover provided on the main body, the cover formed of an insulating material and having a nozzle through which a gaseous organic substance comes out from the main body, a cover heater formed as a thin film type on the top surface of the cover, and a body heater heating the main body.

Abstract: The invention relates to an evaporator device with a receptacle for holding material to be evaporated. With this evaporator device an oil film can be applied onto specific sites of a sheet to be coated, this sheet being coated with aluminum or zinc in a further step. At the sites at which the oil film is located, no aluminum or zinc is deposited. With the aid of a rod valve, precise application of the oil onto the sheet is ensured. This rod valve is driven by a stepping motor, which can release percentage fractions of oil vapor.

Abstract: A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain a solid precursor, and permit the flow of a carrier gas. Furthermore, each tray comprises precursor stabilization elements designed to maintain a substantially level solid precursor powder during transport of the multi-tray precursor evaporation system.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: A graphite heater and method of forming a graphite heater comprising a graphite body configured to form an electrical heating circuit for at least one heating zone through the graphite encapsulated in a continuous overcoat layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof, wherein prior to being configured to form the electrical heating circuit path, the graphite body is coated with a layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof.

Abstract: A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing the deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.

Abstract: In an evaporator for evaporating mists of liquid raw material to thereby generate start gas for layer-formation, an evaporator body has an evaporator chamber defined therein, and a mist supply throat for introducing the mists into the evaporating chamber. The evaporator chamber is defined by a principal evaporating face which opposes to the mist supply throat. The evaporator body also has a start-gas supply passage which is formed therein between the mist supply throat and the principal evaporating face such that the start gas flows out of the evaporating chamber through the start-gas supply passage. A ridge member is provided on an inner side wall surface of the evaporating chamber between the start-gas is supply passage and the principal evaporating face so that a tip edge of the ridge member is directed to the principal evaporating face.

Abstract: The present invention relates to an evaporation source for evaporating an organic electroluminescent layer. In particular, the present invention relates to the evaporation source preventing an aperture, through which a vaporized evaporation material is emitted, from being clogged by restricting heat transfer to outward.

Abstract: A high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system includes a base tray with one or more upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.

Abstract: A ceramics sintered body improved in corrosion resistance to a molten metal and a method for producing such a ceramics sintered body. The ceramics sintered body includes boron nitride, titanium diboride, a calcium compound and titanium nitride and having a relative density of 92% or more, wherein the content of the calcium compound in terms of CaO is from 0.05 to 0.8% by weight, and a peak intensity by X-ray diffraction of the (200) plane derived from titanium nitride is from 0.06 to 0.15 relative to a peak intensity of the (002) plane of BN. Further, a method for producing a ceramics sintered body, which is applicable to the ceramics sintered body, and an exothermic body for metal vapor deposition constituted by the ceramics sintered body are also disclosed.

Abstract: A coating system is applied to a ceramic evaporator boat to extend the life of the boat. The coating system includes a ceramic layer is applied over the surface of an evaporator boat reservoir. Optionally, a refractory metal layer is applied as an intermediate layer between the surface of the evaporator boat reservoir and the ceramic layer. The ceramic layer is form of a ceramic material selected from metal borides, metal nitrides, metal carbides, metal oxides, and combinations thereof, and wherein the metal component of the ceramic material is selected from zirconium, aluminum, titanium, silicon, tantalum, vanadium, and combinations thereof. The resulting coating system reduces corrosion and/or erosion that occur primarily in the reservoir region of the evaporator boat. One method of applying or depositing the ceramic layer or the optional refractory metal layer includes sputtering.

Abstract: An evaporation crucible is described. The evaporation crucible (100; 300; 400; 500) includes: an electrically conductive body (120) and a cover (150; 550); the body having a first electrical connection (162) and a second electrical connection (164) for applying a heating current through the body, the body includes a chamber (130) providing a melting-evaporation area, the chamber including a chamber bottom and a chamber wall, wherein the cover forms an enclosure with the chamber; a feeding opening (134; 430) for feeding a material; and a distributor orifice (170; 571, 572) providing a vapor outlet of the enclosure.

Abstract: Embodiments of the invention provide a method and an apparatus for generating a gaseous chemical precursor for a processing system. In one embodiment, an apparatus for generating the gaseous chemical precursor used in a vapor deposition processing system is provided and includes a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending from the inlet port into the canister, wherein the inlet tube contains an outlet positioned to direct a gas flow away from the outlet port and towards the sidewall of the canister.

Abstract: Resistance-heated ceramic vaporizer boat (10) comprising an elongated vaporizer body having an upper side (1) and a lower side (2) being parallel to each other, and the vaporizer body having plane lateral side surfaces (3) being non-parallel to each other, wherein each of said lateral side surfaces (3) is inclined by an angle of 45° with respect to the upper side (1). Preferably, the end portions at the longitudinal ends of the vaporizer body are reduced, at the lower side (2) thereof, to a predetermined partial thickness (t), whereby a cavity at the upper side (1) of the vaporizer body can be omitted.

Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: In one embodiment, an apparatus for generating a gaseous chemical precursor used in a vapor deposition processing system is provided which includes a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending from the inlet port into the canister. The apparatus further may contain a plurality of baffles within the interior volume extending between the top and the bottom of the canister, and a precursor slurry contained within the interior volume, wherein the precursor slurry contains a solid precursor material and a thermally conductive material that is unreactive towards the solid precursor material. In one example, the solid precursor material solid precursor material is pentakis(dimethylamino) tantalum.

Abstract: An evaporation crucible is described. The evaporation crucible (100; 300; 400; 500) includes: an electrically conductive body (120) and a cover (150; 550); the body having a first electrical connection (162) and a second electrical connection (164) for applying a heating current through the body, the body includes a chamber (130) providing a melting-evaporation area, the chamber including a chamber bottom and a chamber wall, wherein the cover forms an enclosure with the chamber; a feeding opening (134; 430) for feeding a material; and a distributor orifice (170; 571, 572) providing a vapor outlet of the enclosure.

Abstract: Vapor depositions sources, systems, and related deposition methods. Vapor deposition sources for use with materials that evaporate or sublime in a difficult to control or otherwise unstable manner are provided. The present invention is particularly applicable to deposition of organic material such as those for forming one or more layer in organic light emitting devices.

Abstract: A molecular beam source for use in accumulation of organic thin-films which enables the forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing deposition or separation of a film-forming material in an opening for discharging molecules of the film-forming material, wherein a valve 33 is disposed in a space starting from a side of a molecule heating portion 12 and reaching to a molecule discharge opening 14 for discharging the generated molecules of the film-forming material towards a film-forming surface and, further, heaters 18 and 19 are provided at a side of the molecule discharge opening 14 for heating the molecules of the film-forming material to be discharged. At the side of the molecule discharge opening 14 are provided an exterior guide 13 having a tapered guide wall and also an interior guide 16 having a tapered guide wall is provided within an inside of the exterior guide.

Abstract: The present invention relates to an evaporation source for evaporating an organic electroluminescent layer. In particular, the present invention relates to the evaporation source preventing an aperture, through which a vaporized evaporation material is emitted, from being clogged by restricting heat transfer to outward.

Abstract: The present invention provides a system and method for uniform coating of a substrate at high deposition rates by evaporating a coating material in a vacuum chamber. The system includes an evaporator having a heating crucible for containing a coating material to be evaporated and a generally planar heat source disposed so as to heat a surface of a coating material contained in the heating crucible. Preferably, the heat source is manufactured from a ceramic or intermetallic material and includes a first layer defining a first set of openings and a second layer defining a second set of openings wherein the second layer overlies the first layer and is spaced apart therefrom. The first and second sets of openings allow the evaporated coating material to pass therethrough for dispersion of the coating material in a deposition zone defined by a containment shield disposed above the heat source.

Abstract: The present invention provides an assembly comprising two plates or covers, one of which being an outermost plate or cover, and both, at least in part having a perforation pattern over a surface area covering an open side of a crucible having a bottom and surrounding side walls containing raw materials, wherein said outermost cover is mounted at a distance farther from the said crucible than said cover covering said open side of a crucible, and wherein both covers are mounted versus each other, so that, when viewed through an axis in a direction perpendicular to the bottom of the crucible from a distance to said outermost cover of at least 10 times the distance between said two plates or covers, its contents cannot be observed as their perforations and the crucible are never forming one line, perpendicular to the plane formed by said bottom.

Abstract: A graphite heater and method of forming a graphite heater comprising a graphite body configured to form an electrical heating circuit for at least one heating zone through the graphite encapsulated in a continuous overcoat layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof, wherein prior to being configured to form the electrical heating circuit path, the graphite body is coated with a layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof.

Abstract: An apparatus for generating carbon monoxide comprising an enclosure (6) having an inlet and an outlet at least one of which is provided with means (8) restricting air flow from the inlet to the outlet, a container (1) located within the enclosure (6) arranged to receive carbon material (2) in intimate contact with an electrical heating element (3), and means (5) for causing air to move from the inlet to the outlet.

Abstract: A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

Abstract: An apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.

Abstract: A vapor deposition source for depositing organic material includes a boat having a cavity for holding organic material and an aperture plate, having a plurality of spaced apertures, for enclosing the boat. The vapor deposition source also includes a heating element provided in the cavity between the aperture plate and the organic material, and a baffle member in contact with the heating element and having at least three surfaces which absorb energy from the heating element, the first surface redirecting energy to the aperture plate and the second and third surfaces redirecting energy to the boat walls and the organic material.

Abstract: The invention concerns a device and a process for applying a lubricant by means of vapour deposition to a target object, especially a magnetic data carrier. The device in accordance with the invention comprises a lubricant supply means (1) that can be filled from outside, possibly by means of a feed line. The produced lubricant vapour (5) is expanded through one or more exit openings (6) in the direction of a target object (8) on which the vapour deposition is to be effected. The vapour at first becomes adsorbed on the walls of a cone-shaped distribution element (4) situated between the lubricant supply means (1) and the target object (8), from which it subsequently desorbs again. Said adsorption/desorption process assures an even and homogeneous vapour distribution over the target object (8). A device for interrupting the vapour supply makes it possible for the device to be operated in a discontinuous manner.

Abstract: Preferred embodiments of the present invention provides a sublimation system employing guidance structures including certain preferred embodiments having a high surface area support medium onto which a solid source material for vapor reactant is coated. Preferably, a guidance structure is configured to facilitate the repeated saturation of the carrier gas with the solid source for a vapor reactant. Methods of saturating a carrier gas using guidance structures are also provided.

Abstract: A vapor deposition apparatus, developed in particular for on-line deposition of phosphor or scintillator material, wherein said vapor deposition apparatus comprises a crucible containing a mixture of raw materials, a chimney having at least one inlet in communication with the said crucible and a linear slot outlet, one or more lineair heating elements, contained within said chimney, an oven surrounding said crucible, wherein said oven contains heating elements, shielding elements and cooling elements.

Abstract: A method and apparatus for depositing a dielectric material at a rate of at least 3000 Angstroms per minute on a large area substrate that has a surface area of at least about 0.35 square meters is provided. In one embodiment, the dielectric material is silicon oxide. Also provided is a large area substrate having a layer of dielectric material deposited by a process yielding a deposition rate in excess of about 3000 Angstroms per minute and a processing chamber for fabricating the same.

Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.