Temperature Detecting Or Controlling Of Drying Station Patents (Class 396/572)
-
Patent number: 8978670Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.Type: GrantFiled: October 4, 2010Date of Patent: March 17, 2015Assignee: Tokyo Electron LimitedInventors: Junya Minamida, Issei Ueda, Yasuhiro Chouno, Osamu Kuroda, Kazuyoshi Eshima, Masahiro Yoshida, Satoshi Morita
-
Patent number: 8631809Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.Type: GrantFiled: March 17, 2010Date of Patent: January 21, 2014Assignee: Sokudo Co., Ltd.Inventors: Tetsuya Hamada, Takashi Taguchi
-
Patent number: 8122851Abstract: A substrate processing apparatus is configured to provide in series a plurality of processing blocks, each block including a processing unit and a transport robot transporting a substrate. A substrate rest is provided in a connecting portion of adjacent processing blocks. A sensor plate with sensor coils is provided spanning over support pins of the substrate rest. Once a temperature-measurement substrate with temperature-measuring elements, each element formed by connecting a coil to a quartz resonator, is placed on the support pins, a transmitter-receiver transmits transmission waves corresponding to the characteristic frequencies of the quartz resonators to the temperature-measuring elements through the sensor coils. After the stop of the transmission, the transmitter-receiver receives electromagnetic waves from the temperature-measuring elements through the sensor coils, and the temperature computer computes the substrate temperature based on the frequencies of the electromagnetic waves.Type: GrantFiled: November 7, 2008Date of Patent: February 28, 2012Assignee: Sokudo Co., Ltd.Inventor: Tetsuya Hamada
-
Patent number: 7722267Abstract: A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.Type: GrantFiled: January 9, 2007Date of Patent: May 25, 2010Assignee: Sokudo Co., Ltd.Inventor: Tetsuya Hamada
-
Patent number: 7344322Abstract: A drying device, which dries a photosensitive layer of a photosensitive planographic printing plate using infrared rays, includes an infrared emitting device and a filter that is arranged between the photosensitive planographic printing plate conveyed through the drying device and the infrared emitting device and that blocks a predetermined range of wavelength. More specifically, the filter is arranged between a web that is conveyed through the drying device and a mid-infrared radiator, so as to block 30% or more of wavelengths of 1 ?m or less. As a result, fogging on a photosensitive coating layer can be prevented, and high heating efficiency can be achieved.Type: GrantFiled: January 26, 2005Date of Patent: March 18, 2008Assignee: FUJIFILM CorporationInventors: Kenji Hayashi, Manabu Hashigaya
-
Patent number: 6869756Abstract: A heat developing method having the steps of: initially making the overall surface of a heat developing photosensitive material or a photosensitive and thermosensitive recording material (hereinafter called a “heat developing recording material”) to a predetermined temperature not lower than a glass transition temperature and not higher than heat development start temperature; and performing heat development.Type: GrantFiled: March 31, 2003Date of Patent: March 22, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Masaharu Ogawa, Toshitaka Agano
-
Publication number: 20040213562Abstract: A dryer for drying photographic material and a transfer assembly for transferring processed photographic film from a processor to the dryer. The dryer comprises a path through which the photographic material extends wherein at least one slack loop is provided in the photographic material. An adjustable roller is provided along the path to adjust a size of the slack loop and an air supply arrangement is adapted to provide drying air to the slack loop.Type: ApplicationFiled: April 23, 2003Publication date: October 28, 2004Applicant: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Daniel M. Pagano, Kevin H. Blakely
-
Patent number: 6802658Abstract: A dryer for drying photographic material and a transfer assembly for transferring processed photographic film from a processor to the dryer. The dryer comprises a path through which the photographic material extends wherein at least one slack loop is provided in the photographic material. An adjustable roller is provided along the path to adjust a size of the slack loop and an air supply arrangement is adapted to provide drying air to the slack loop.Type: GrantFiled: April 23, 2003Date of Patent: October 12, 2004Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Daniel M. Pagano, Kevin H. Blakely
-
Patent number: 6746163Abstract: A photographic processor and a dryer for drying photographic material. The dryer comprises a path through which the photographic material extends wherein at least one slack loop is provided in the photographic material. An adjustable roller is provided along the path to adjust a size of the slack loop and an air supply arrangement is adapted to provide drying air to the slack loop. The air supply arrangement supplies air to a frame member that has slots along at least one wall. A sliding member is provided within the frame member to open and close the slots in accordance with the size of the slack loop. This enables a supply of drying air directly on the media and further permits the automatic adjustment of the amount of air being supplied in accordance with the size of the slack loop or the length of the media being dried.Type: GrantFiled: April 23, 2003Date of Patent: June 8, 2004Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Daniel M. Pagano
-
Patent number: 6705778Abstract: A photographic processing apparatus includes a photographic paper processing bath train. A drier, positioned downstream from the train, heats air and dries the photographic paper. Feeding racks feed the paper in a predetermined travel path which begins on an upstream side of the train, extends therethrough, and ends at the drier. A memory is accessed to estimate expected travel time t1 for passing of the paper through the travel path. The memory is accessed to estimate expected warmup time t2 for warming up the air in the drier to a target temperature T2. A controller compares the time t1 and the time t2, initially starts heating in the drier if the time t2 is longer than the time t1, and starts actuation of the feeding racks when a time difference (t2-t1) elapses after start of the heating to synchronize drier warmup to temperature T2 with paper reaching the drier.Type: GrantFiled: March 31, 2003Date of Patent: March 16, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Futoshi Yoshida, Yoshinori Seguchi
-
Publication number: 20030165756Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: February 26, 2003Publication date: September 4, 2003Inventors: Yuko Ono, Junichi Kitano
-
Patent number: 6217238Abstract: A compact and energy efficient apparatus for processing and drying an elongated strip of photographic film having a succession of film processing tanks containing selected processing liquids; drive system which advances the film strip endwise through the tanks to selected depths in liquids corresponding to required exposure times of the film to the different liquids while reducing the tank to tank contamination caused by the transport of treatment of liquids from tank to tank, and a heater system which reuses the waste heat generated by the mechanical and electrical components of the apparatus to dry the film strip as it emerges from the successive processing tanks.Type: GrantFiled: February 17, 1999Date of Patent: April 17, 2001Assignee: Phototrader, Inc.Inventors: Nando Alfonso Mastrodicasa, David Bradley Marett
-
Patent number: 5845169Abstract: A method and apparatus for processing a photosensitive material through at least one processing solution for processing of a photosensitive material. The apparatus includes a transport mechanism for providing moving of the photosensitive material through the processor. A heater is provided in the processing tank for localized heating of the photosensitive material passing through the processing solution.Type: GrantFiled: April 17, 1997Date of Patent: December 1, 1998Assignee: Eastman Kodak CompanyInventors: David L. Patton, John H. Rosenburgh
-
Patent number: 5832328Abstract: An apparatus for processing a silver halide photographic light-sensitive material having an emulsion surface includes a heater for heating the light sensitive material and a supplier having a supplying section positioned so as to form air space between the supplying section and the emulsion surface of the light-sensitive material so that the supplier supplies a processing solution from the supplying section through the air space onto the emulsion surface of the conveyed light-sensitive material.Type: GrantFiled: May 13, 1996Date of Patent: November 3, 1998Assignee: Konica CorporationInventor: Yutaka Ueda
-
Patent number: 5826128Abstract: A processing apparatus including a drying part provided with at least a drying fan and a drying heater to automatically develop a photosensitive material wherein the drying part further includes a means for detecting reduction in air amount of the drying fan.Type: GrantFiled: August 7, 1996Date of Patent: October 20, 1998Assignee: Noritsu Koki Co., Ltd.Inventor: Yoshio Nishida
-
Patent number: 5716743Abstract: An apparatus and a process for developing radiation-sensitive, exposed printing forms into printing plates is disclosed. The apparatus has a developer pan that contains a developer bath. Individual printing form runs through the developing station of this apparatus in a running-through plane. On each side of the running-through plane there is are a first pair of transport rollers, two brushing rollers with counter-rollers and a second pair of transport rollers at the end of the developing station. Guide rollers are arranged between the first pair of transport rollers and the first brushing roller with its counter-roller, on the underside of the running-through plane. A closed vessel, filled with developing solution, is connected via a developer circuit and a pump to the developer bath. The vessel contains a temperature sensor and a measuring electrode for the electric conductivity of the developing solution.Type: GrantFiled: November 28, 1994Date of Patent: February 10, 1998Assignee: Agfa-Gevaert AGInventors: Eckehard Stein, Peter Jessen Juergensen
-
Patent number: 5649261Abstract: An apparatus (14) for developing an exposed proof (16) provided with a visible light absorbing composition such as color particles or pigments includes a transport means (22-28, 36) for transporting the proof (16) along a treatment liquid dispenser unit (30, 32) and a take-off device (44, 38, 40) for removing detached composition from the proof (16). A tempering device (48) is provided for keeping the treatment liquid, which in the dispenser unit (30, 32) is applied onto the proof (16), at the optimum temperature for the developing process. The tempering device (48) comprises at least one Peltier element (52) which has at least one of its two tempering faces thermally connected with treatment liquid. The Peltier element (52) is adapted to receive a reversible supply voltage whose amount and polarity can be controlled. Depending on the polarity of the supply voltage, the Peltier element (52) operates either as a heating element or a cooling element.Type: GrantFiled: August 30, 1995Date of Patent: July 15, 1997Assignee: Minnesota Mining and Manufacturing CompanyInventors: Reiner Schlickhoff, Giovanni Mento, Heinz-Guenter Moebius
-
Patent number: 5619745Abstract: In an apparatus for processing a light-sensitive material, a plurality of processing tanks are serially arranged along a conveyance passage on which the light-sensitive material is conveyed in a conveying direction. The apparatus comprises a device for replenishing compensation water into a most-downstream tank arranged most downstream among the plurality of processing tanks in terms of the conveying direction under the following inequality:0.ltoreq.(E-C)/(P-R)<0.3E (ml/day): amount of evaporated water from the plurality of processing tanks per day,C (ml/day): amount of the compensation water to compensate the evaporated water,P (m.sup.1 /day): amount of the light-sensitive material processed per day,R (ml/m.sup.2): amount of replenishing processing solution per m.sup.2 of light-sensitive material.Type: GrantFiled: April 10, 1996Date of Patent: April 8, 1997Assignee: Konica CorporationInventor: Hiroaki Kobayashi
-
Patent number: 5583608Abstract: A condensation preventing structure for a crossover rack provided in a printer processor. The structure has a plurality of conveying rollers provided at a crossover rack provided within a printer processor, and a moisture adhesion prevention/moisture removing device which effects one of prevention of adhesion of moisture to the plurality of conveying rollers due to condensation and removal of moisture on the plurality of conveying rollers due to condensation. Due to the moisture adhesion prevention/moisture removing device, uneven development of a photographic printing paper caused by moisture adhering to the plurality of conveying rollers due to condensation does not occur.Type: GrantFiled: May 23, 1995Date of Patent: December 10, 1996Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouki Nomura, Hiroyuki Satoh