Abstract: The present invention relates to a processing system and method for processing photographic material. The processing system and method of the invention is adapted to recover water from humid air for reuse in the processor, as well as convert a liquid waste processing solution into a dry waste for disposal. In the system and method of the present invention, heated air is circulated through the processor and comes into contact with a cold surface to condense the heated air. The water resulting from this contacting of the heated air with the cold surface can be collected and recycled back to the processor for reuse in the processor. Further, waste solution can be absorbed by a matting material appropriately placed in the processor which evaporates the waste solution to a solid waste for subsequent disposal.

Abstract: After a developer is applied to a semiconductor wafer, a head member having a plurality of fluid discharge holes is positioned so as to face the wafer, and during development of the wafer, a fluid is discharged from the discharge holes of the head member toward the developer on the wafer. By supplying the fluid to a region of the wafer where the line widths of the resulting circuit pattern are liable to become uneven, the temperature, thickness, liquid surface state, etc. of the developer in this region are controlled.

Abstract: Apparatus and method for depositing water onto the surface of a substrate passed through the apparatus. The apparatus has a housing that defines an internal atmosphere confined in at least partial isolation from the ambient atmosphere. The housing has a moisture saturation portion, a deposition portion, and a passageway. The moisture saturation portion has a water supply and a vapor reservoir. The water supply contains a quantity of water. The vapor reservoir holds a volume of the interior atmosphere in thermal and phase equilibrium with the water in the water supply. The deposition portion has a plenum wall surrounding a central chamber. The plenum wall is substantially insulated from ambient temperature variations and has a pair of opposed substrate gaps. The gaps define a path for the substrate through the chamber. The passageway communicates with the vapor reservoir and the chamber. A primary heater is disposed to heat the water in the water supply.

Abstract: A method for reforming the surface of a photographic emulsion layer. In the method, the surface of the emulsion layer is dried to at least sensible dryness. Water is then deposited onto the surface of the emulsion layer. The depositing is substantially uniform and in an amount that is less than about 0.80 grams of water per square foot of emulsion layer.