Abstract: A substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and subjected to exposure processing. The substrate for which exposure processing for the second time has been finished is transferred to a first processing system and again subjected to post-exposure baking. The time periods from the ends of the exposure processing to the starts of the post-exposure baking for the first time and the second time are controlled to be equal. In pattern forming processing in which exposure processing is performed a plurality of times between the resist film forming processing and the developing treatment, a pattern with a desired dimension can be finally formed.

Abstract: A system and method for facilitating uniform heating temperature of a material is provided. The material may be a photoresist, a top or bottom anti-reflective coating, a low K dielectric material, SOG or other spin-on material. The system can include at least one heating element and a heat transfer fluid, the heating element heating the heat transfer fluid, which in turn heats the material. The transfer fluid more evenly distributes the heat from the heating element, which can have hot and cold spots at the material.

Abstract: The present invention relates to a processing system and method for processing photographic material. The processing system and method of the invention is adapted to recover water from humid air for reuse in the processor, as well as convert a liquid waste processing solution into a dry waste for disposal. In the system and method of the present invention, heated air is circulated through the processor and comes into contact with a cold surface to condense the heated air. The water resulting from this contacting of the heated air with the cold surface can be collected and recycled back to the processor for reuse in the processor. Further, waste solution can be absorbed by a matting material appropriately placed in the processor which evaporates the waste solution to a solid waste for subsequent disposal.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: A development processing apparatus includes: a plurality of stock tanks which stores a plurality of types of processing solutions; a small-volume single processing tank including an entrance/exit port for a film which enables the entering/exiting of the film, the processing tank accommodating the film via the entrance/exit port for a film and developing the film in the plurality of types of processing solutions; processing solution supply which supplies the plurality of types of processing solutions from the plurality of stock tanks to the processing tank in a predetermined order; a sensor which measures the temperature of the processing solution within the processing tank; a heater which is disposed at the stock tanks or the processing solution supply and heats the processing solution; and control which is connected to the processing solution supply and the heater and controls the processing solution supply such that the last processing solution supplied to the processing tank is filled within the processing

Abstract: A photosensitive material processing device having a processing tank in which is stored a processing solution for processing photosensitive materials. The processing tank is formed such that, given that a tank volume is V milliliters and a path length is L centimeters, a value V/L is less than or equal to 25. A circulating path which circulates the processing solution within the processing tank is provided. A cast heater which heats the processing solution in the circulating path to a predetermined temperature is provided on the circulating path. Accordingly, because the processing tank is long and thin, stores a small amount of processing solution, and has a value V/L of less than or equal to 25, the cast heater heats the processing solution to the predetermined temperature in a short time and stably maintains the predetermined temperature. The photosensitive material processing device is advantageous in terms of cost and environmental preservation.

Abstract: A quick disconnect filter assembly and manifold assembly for use in a photographic processor having a recirculating system designed for receiving a filter assembly in line. The filter assembly comprising: a housing having an internal chamber, a chamber inlet for allowing processing fluid to flow into the internal chamber and an chamber outlet for allowing processing solution to flow out of the internal chamber. The housing has a quick disconnect valve for allowing quick connection and disconnecting of the filter assembly with the recirculating system without any substantial loss of fluid. The manifold assembly comprising: a body having an inlet port and an outlet port and a fluid connecting passage therethrough connecting the inlet to the outlet. A wall member is provided for dividing the connecting passage into a first receiving section and an outer delivery section.