Abstract: A coating and developing apparatus develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.

Abstract: There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.

Abstract: A processing method of a photothermographic material is disclosed comprising subjecting the photothermographic material to heat development by the use of a thermal processing apparatus, wherein the photothermographic material comprises a support, organic silver salt particles, light sensitive silver halide grains, a reducing agent and a contrast-increasing agent; and after having been subjected to heat development, the photothermographic material exhibits a distortion of not more than 0.03 degree. A thermal processing apparatus for the photothermographic material is also disclosed.

Abstract: A method for processing a heat developable photothermographic material by the use of an automatic processor is disclosed, wherein the photothermographic material comprises a support, a light sensitive silver halide, an organic silver salt, a reducing agent and a contrast-increasing agent; and in the step of heat-developing, the photothermographic material passes at a transport speed of 22 to 40 mm/sec. through an atmosphere of not less than 117° C. in not less than 10 sec., and further passing, while being brought into contact with the surface of a heating member exhibiting a surface temperature of 90 to 115° C. or in the vicinity of the surface of the heating member.

Abstract: A resist film is formed out of a resist material on a substrate, and then pre-baked. Next, the pre-baked resist film is exposed to extreme ultraviolet radiation through a photomask. Then, the exposed resist film is developed, thereby defining a resist pattern on the substrate. The pre-baking and exposing steps are carried out in a vacuum without subjecting the resist film to the air.

Abstract: A photographic processing apparatus efficiently processes color photographic film and color printing paper. Intermediate portions of pipes for circulating processing solutions which communicate with a bleaching tank, first and second fixing tanks, a wash tank and first and second stabilizing bath tanks of a film processing section, and a bleaching/fixing tank and first through third rinsing tanks of a printing paper processing section penetrate a metal block of a cast heater so that the pipes are coupled together by the metal block for efficient heat transmission. A heater is provided inside the metal block to uniformly heat the processing solutions which flow through the pipes.

Abstract: A method of processing an imagewise exposed photographic silver halide color material in a machine containing a number of processing tanks or processing tanks which are supplied from a non-replenished source, the method comprising increasing the temperature of at least one of the tanks automatically by a predetermined amount related to the area of photographic material already processed and optionally, the time of treatment in said at least one processing tank is increased by a predetermined factor related to the area of photographic material already processed and the volume of the non-replenished processing solution.