Abstract: In a substrate processing apparatus (1), an enlarged sealed space (100) is formed by bringing a cup part (161) that forms a lateral space (160) around the outer periphery of a chamber (12) into contact with a chamber lid part (122) separated from a chamber body (121). A scan nozzle (188) is attached to the cup part (161) in the lateral space (160) and supplies a chemical solution onto a substrate after moving to above the substrate through an annular opening (81). During processing for cleaning the substrate and processing for drying the substrate, the scan nozzle (188) is housed in the lateral space (160) and an upper opening of the chamber body (121) is closed by the chamber lid part (122) to isolate the chamber space (120) from the lateral space (160) and seal the chamber space (120). Thus, the chamber space (120) can be isolated from the scan nozzle (188). This consequently prevents a mist or the like of the chemical solution supplied from the scan nozzle (188) from adhering to the substrate.

Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.

Abstract: A thermal processor includes an oven for thermally developing an imaging media which produces gaseous contaminants during development. The gaseous contaminants includes odorous portions and condensable portions which have a condensation temperature. A contaminant removal cartridge has a housing configured to couple to the oven, a heat exchanger, and a filter module. The heat exchanger receives from the oven at least a first air flow at a first temperature, wherein the first temperature is above the condensation temperature, and including gaseous contaminants. The heat exchanger cools the first air flow to a desired filtering temperature, which is below the condensation temperature, to condense and collect the condensable portion of the gaseous contaminants and form a filtering air flow. The filter module receives the filtering air flow, to collect the remaining condensed contaminants, and to absorb the odorous portion of the gaseous contaminants to form an exhaust air flow.

Abstract: A photographic imaging apparatus includes a housing defining an interior cavity, an opening at one end of the housing to allow light to enter the interior cavity, and a photographic imaging substrate located within the interior cavity opposite from the opening for receiving the light entering the interior cavity through the opening, the photographic imaging substrate including a light passing substrate, a photosensitive agent capable of producing oxygen in the presence of light, and precursor gas, the photosensitive agent being supported on the light passing substrate away from the opening, and exposable to light that has passed through the light passing substrate from the opening, and an oxidizable surface positioned in close association with the photosensitive agent, the oxidizable surface is chemically reactive, the reaction being enhanced by electric current, to yield a visual change or image upon exposure to oxygen produced by the photosensitive agent upon.

Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

Abstract: A dryer for drying photographic material and a transfer assembly for transferring processed photographic film from a processor to the dryer. The dryer comprises a path through which the photographic material extends wherein at least one slack loop is provided in the photographic material. An adjustable roller is provided along the path to adjust a size of the slack loop and an air supply arrangement is adapted to provide drying air to the slack loop.

Abstract: A photographic processor and a dryer for drying photographic material. The dryer comprises a path through which the photographic material extends wherein at least one slack loop is provided in the photographic material. An adjustable roller is provided along the path to adjust a size of the slack loop and an air supply arrangement is adapted to provide drying air to the slack loop. The air supply arrangement supplies air to a frame member that has slots along at least one wall. A sliding member is provided within the frame member to open and close the slots in accordance with the size of the slack loop. This enables a supply of drying air directly on the media and further permits the automatic adjustment of the amount of air being supplied in accordance with the size of the slack loop or the length of the media being dried.

Abstract: A resist coating unit includes a coater cup surrounding a wafer W held by a spin chuck and an air supply mechanism for blowing an air into the coater cup. The air supply mechanism includes a hollow frame having a first open portion formed in the vertical wall, an air blowing device for blowing an air into the hollow frame, and a filter chamber unit into which the air within the frame is introduced. The filter chamber unit includes a first air introducing chamber having a heater arranged therein, a second air introducing chamber, an air stream control mechanism, and a filter unit. The air flowing within the frame flows into the first air introducing chamber through the first open portion so as to be uniformly heated by the heater and, then, is introduced into the second air introducing chamber. Then, the air uniformly heated by the heater is blown into the coater cup through the air stream control mechanism and the filter unit.

Abstract: The present invention relates to a photographic processor that includes a circular processing drum that is adapted to process photographic media. The processor also includes a circular cylinder that defines a holding or cueing cylinder. The circular cylinder has a circular media path therein and is adapted to received the processed photographic media from the circular processing drum to hold or cue the processed photographic media therein prior to drying. The processor also includes a dryer that is provided at an outlet of the circular cylinder for drying the processed media as the media exits the cylinder.

Abstract: A photographic processor includes a circular processing drum and a circular drying cylinder. A transfer arm is utilized to transfer processed photographic media from the circular processing drum to the circular drying cylinder. The circular drying cylinder includes an outer housing and a diffuser member having slots provided therein. The slots extend in a spaced manner from an entrance to an exit of the drying cylinder so as maximize the drying of film in the drying cylinder.

Abstract: Since it is possible to exhaust air from a first peripheral region &agr; around a substrate undergoing processing and further exhaust air from a second peripheral region &bgr; between the first peripheral region and substrate, it is possible to reduce effects of the current of air on a developing solution on a substrate and to cause the developing solution used in development processing to act on the exposed resist on the substrate properly.

Abstract: A photographic processing apparatus includes a photographic paper processing bath train. A drier, positioned downstream from the train, heats air and dries the photographic paper. Feeding racks feed the paper in a predetermined travel path which begins on an upstream side of the train, extends therethrough, and ends at the drier. A memory is accessed to estimate expected travel time t1 for passing of the paper through the travel path. The memory is accessed to estimate expected warmup time t2 for warming up the air in the drier to a target temperature T2. A controller compares the time t1 and the time t2, initially starts heating in the drier if the time t2 is longer than the time t1, and starts actuation of the feeding racks when a time difference (t2-t1) elapses after start of the heating to synchronize drier warmup to temperature T2 with paper reaching the drier.

Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

Abstract: A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.

Abstract: A photographic processor and method of operation is disclosed. The processor includes a circular drum and a disk positioned inside the drum. The disk comprises at least one set of teeth along an outer periphery thereof for engagement with perforations on film. The processor also includes a circular dryer for drying the processed film. The dryer extends around an outer periphery of the drum.

Abstract: Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.

Abstract: A current member is disposed above a wafer holding section for holding a wafer and a top plate and a bottom plate of the current member are positioned so that respective air holes are overlapped each other in a vertical direction, and a developing solution is heaped on a front face of the wafer. Thereafter, the developing is performed with the bottom plate of the current member slid in a lateral direction so that the air holes are not overlapped each other in the vertical direction. In this configuration, air streams to the wafer are obstructed during the developing because the air holes in the current member are obstructed in the vertical direction, whereby occurrence of temperature distribution of the developing solution within the plane of the wafer caused by flows of air currents to the wafer is prevented and uniform developing processing can be performed.

Abstract: The present invention relates to a processing system and method for photographic material which is adapted to use sources of heat within the processing machine for photographic processing purposes. More specifically, in the system and method of the present invention, sources of heat such as electrical, electro-mechanical and mechanical components and dryers can be utilized to provide heat in a small scale processor which uses a low volume of processing solution. Therefore, the arrangement of the present invention is designed in such a manner that permits the efficient use of heat produced as a by-product of an operation of these components. Furthermore, the arrangement of the present invention includes heat supplying members such as heaters and/or heat storage members to assist in supplying heat to those areas of the processors where the heat can be used for processing.

Abstract: A resist coating block is composed of a resist coating unit, a cooling unit group, and a first sub-conveying unit that conveys a wafer W between the resist coating unit and the cooling unit group. A developing block is composed of a developing unit, a cooling unit group, and a second sub-conveying unit that conveys a wafer W between the developing unit and the cooling unit group. Heat insulating panels are disposed to the blocks opposite to heating units. A first main-conveying unit and a second main-conveying unit are disposed between the blocks. The first main conveying unit is disposed between a first heat treatment block and a third heat treatment block. The second main conveying unit is disposed between a second heat treatment block and a fourth heat treatment block. Thus, variation of the film thickness of a resist film coated on a wafer W can be prevented against heat radiated by the heating units.

Abstract: A processing apparatus includes a housing, a plurality of process units arranged within the housing for subjecting an object to a series of processes including coating of processing solution, exposure and development, a transport mechanism for conveying the object to and from the process units, an air cleaning mechanism having a filter for removing impurity which is contained in air introduced into the housing and which lowers resolution, a concentration detection mechanism for detecting the concentration of the impurity in a region outside of the filter, and a life estimation section for estimating the life of the filter in accordance with the result of detection by the concentration detection mechanism.

Abstract: A solvent of a resist solution is dropped from a solvent supply nozzle onto the surface of a semiconductor wafer held by a spin chuck. The semiconductor wafer is rotated by the spin chuck to spread the resist solution over the entire surface of the semiconductor wafer W. Simultaneously, the resist solution is dropped from a resist solution supply nozzle onto the semiconductor wafer and spread following the solvent. During the processing, the processing space is isolated from the outer atmosphere by closing a lid of a processing vessel and a sprayed solvent is supplied into the processing space. The processing space is thus filled with the mist of solvent. In the processing space supplied with the solvent, evaporation of the solvent from the resist solution is suppressed. A film of the resist solution is formed with a uniform film thickness to the edge of the semiconductor wafer W.

Abstract: Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.

Abstract: An improved drying chamber, which in the preferred embodiment is employed with an x-ray film processor, includes an infrared heater source. Preferably the infrared source is positioned to dry respective first and second sides of a material requiring drying, for example x-ray film. The infrared source includes a control circuit for driving the infrared source. The frequency at which the infrared source operates is chosen so as to cause fluid particles being dried to resonate, permitting a more efficient heating cycle.

Abstract: A photosensitive material which has been exposed by an exposure device is fed into a processor, which is an automatic developing device, by a delivery section and processed. Within the exposure device, negative pressure is generated for holding the photosensitive material by suction. A gas outflow preventing device provided at the delivery section includes a chamber disposed in an upper vicinity of guides of a transport device. A nozzle that protrudes from this chamber is provided opposing an exposed photosensitive material insertion slot of the processor. The gas outflow preventing device blows air, which is fed into the chamber by operation of a blower fan, from an ejecting slit formed in the nozzle toward the photosensitive material insertion slot. This blowing of air, without interfering with output of the photosensitive material to the processor, prevents air in the processor flowing out through the photosensitive material insertion slot to the exposure device side.

Abstract: One aspect of the present invention relates to a method of inspecting a patterned substrate using an SEM, involving the steps of evaluating the patterned substrate to determine if charges exist thereon; introducing the patterned substrate having charges thereon into a processing chamber of the SEM; inspecting the patterned resist using an electron beam generated by the SEM; and introducing a cleaner containing ozone into the processing chamber of the SEM.

Abstract: A photographic paper drier device includes a conveyor belt for conveying the photographic paper along a conveying path. A fan or blower dries the photographic paper by application of air thereto while the photographic paper is conveyed along the conveying path. The fan or blower sends the air into an air blow case, which has an air blow wall extending along the conveying path, and being positioned opposite to the photographic paper. Plural outlet slits are formed through the air blow wall, and blow the photographic paper with the air. Each of the outlet slits extends in a crosswise direction crosswise to the conveying path. The outlet slits are arranged in 18 trains arranged along the conveying path. Each of the outlet slits has a length smaller than a width of the photographic paper.

Abstract: A photographic light-sensitive material conveying apparatus for conveying a photographic light-sensitive material in a dryer chamber has a hollow guide member fixedly mounted in the dryer chamber for shifting the conveying direction of the photographic light-sensitive material. An air suction duct is connected to the inner space of the guide member. A plurality of perforations are formed in the guide member for communication between the inner space of the guide member and the interior of the dryer chamber. A conveyor belt has air permeability and is provided over the guide member for conveying the photographic light-sensitive material, wherein the conveyor belt can slidingly run on and along the outer side of the guide member.

Abstract: A heat developing method for obtaining a visible image comprising contacting a heat-developable light-sensitive material or a light-sensitive heat-sensitive recording material on which a latent image has beer formed with a heating means in a heat developing part, wherein the heat-developable light-sensitive material or light-sensitive heat-sensitive recording material which is peeled off from the heating means is cooled, in a noncontacting state, to a temperature not higher than a temperature at which progress of development is stopped, and then the material is held with a transfer means for discharging the material outside of the heat developing part, and a developing apparatus for obtaining a visible image.

Abstract: An apparatus and method for cooling a thermally processed, imaging material which has been heated to a first temperature by a thermal processor is disclosed. The cooling apparatus includes a cooling article, on which the imaging material rides after the imaging material exits the thermal processor, and an imaging material transport mechanism. The cooling article is at a lower temperature than the first temperature to cool the imaging material. The transport mechanism conveys the imaging material over the cooling article. The imaging material transport mechanism includes a first roller, a second roller and a displacement mechanism. The displacement mechanism effects relative movement between the first and second rollers between a first position and a second position. In the first position, the first and second rollers engage the imaging material to convey the imaging material over the cooling article.

Abstract: Disclosed is an apparatus for cooling a thermally processed, imaging material which has been heated to a first temperature by a thermal processor. The cooling apparatus includes a cooling article, on which the imaging material rides after the imaging material exits the thermal processor, and an imaging material transport mechanism. The cooling article is at a lower temperature than the first temperature to cool the imaging material. The transport mechanism conveys the imaging material over the cooling article. The transport mechanism operates at a rate of speed that is faster than an operational rate of speed of an imaging material conveyance device of the thermal processor. This speed differential allows the transport mechanism to apply tension to the imaging material as the imaging material passes over the cooling article to minimize imaging material defects during cooling.

Abstract: The present invention discloses an apparatus for photolithography process with phase-pretreatment. The apparatus comprises several chambers: a vapor prime chamber, a vacuum-bake chamber, a chill-plate chamber, a coater chamber and a stepper chamber. Further, an interface chamber is between the stepper chamber and the apparatus. These chambers are connected together to a track system. A base gas is introduced into one of these chambers to perform a gas-phase pretreatment. The concentration of the base gas can be controlled and the processing time of the pretreatment process is well controlled by operating the apparatus. As a photoresist layer is applied on a substrate, the photoresist layer is hardened in the base gas to increase the depth of focus in photolithography process.

Abstract: Disclosed is an apparatus for processing a substrate in which a processing consisting of a plurality of process steps is applied to a substrate to be processed. The apparatus comprises a transfer zone extending in a vertical direction, a plurality of process groups arranged to surround the transfer zone for processing the substrate, each process group consisting of a plurality of process units stacked one upon the other, and each process unit having an opening communicating with the transfer zone for transferring the substrate into and out of the process unit, a main arm mechanism movably mounted in the transfer zone for transferring the substrate into and out of the process unit through the opening, and down flow forming means for forming a down flow of a clean air within the transfer zone.

Abstract: A substrate developing method and apparatus for improving uniformity of a developing process by adjusting a temperature gradient of a developer spread over the surface of a substrate. The developer is delivered to a central region of the substrate surface and spread over the surface. The developer in this state has activity diminishing, and thereby lowering the developing rate, gradually from center to edge of the substrate. With a gas flowing down around the edge of the substrate during the developing process, the developer vaporizes from peripheral regions of the substrate at an increased rate, thereby lowering the developer temperature in the peripheral regions. This increases the developing rate gradually from edge to center of the substrate. The uniformity of the developing process is improved by balancing the gradient of developing rate due to the temperature variation of the developer against the gradient of developing rate due to the lowering of developer activity.

Abstract: A development processing apparatus in which a photosensitive material is processed in processing solutions, and thereafter, the photosensitive material which has been processed in the processing solutions is subjected to drying processing by a dry air from a drying machine built in the development processing apparatus, comprising: a re-drying section which delivers the dry air from the drying machine to the outer side of the development processing apparatus; and photosensitive material holding means in which, in order to dry again the photosensitive material which has been subjected to drying processing by the dry air from the re-drying section, the photosensitive material which has been subjected to drying processing is held such that the surface of the photosensitive material which has been subjected to drying processing is substantially parallel to the direction of the dry air delivered from the re-drying section.

Abstract: A thermal processor and method for using the same which is particularly useful for developing a sheet of imaging material, such as photothermographic film. The thermal processor includes means for transporting the imaging material through the apparatus. The thermal processor also includes means for heating the imaging material to develop the image in the imaging material. The thermal processor also includes a fog reduction system which removes a gaseous by-product emitted from the imaging material which may cause fogging of the image as the image is developed on the imaging material.

Abstract: A processing apparatus including a drying part provided with at least a drying fan and a drying heater to automatically develop a photosensitive material wherein the drying part further includes a means for detecting reduction in air amount of the drying fan.

Abstract: An apparatus and method of developing a heat developing film includes a film support surface for supporting and constraining a film and heaters for developing the film supported on the film constraining surface. The film constraining surface may either be stationary or form part of a film transport. The film transport may either be a continuous film transport or a reciprocating film transport. The continuous film transport may be inclined or include an input pinch roller. In addition, the heaters may either be stationary, reciprocatable, or pivotable. The heat is applied by conduction and may include a profiled heater output to control uniformity of the temperature. The apparatus may be provided as a stand-alone unit or may be coupled, either externally to or within, a film exposure device.

Abstract: A heat treatment device for a printing form in which the contact of the printing form with a heating plate can be made more complete to achieve heat development reproducing complete images. The device comprises a heating means for surface heating the photosensitive planographic printing form having a metal support and continuous belt for covering the whole printing form to hold it between a continuous belt and the heating means and heating the printing form while transferring it along the continuous belt. The heat treatment device further comprises at least one tension roller for increasing the pressure on the continuous belt at a central portion of the printing form to laterally distribute the pressure.

Abstract: An apparatus and method of developing a heat developing film includes a film support surface for supporting and constraining a film and heaters for developing the film supported on the film constraining surface. The film constraining surface may either be stationary or form part of a film transport. The film transport may either be a continuous film transport or a reciprocating film transport. The continuous film transport may be inclined or include an input pinch roller. In addition, the heaters may either be stationary, reciprocatable, or pivotable. The heaters are radiant heaters which may include a profiled heater output to control uniformity of the temperature. The apparatus may be provided as a stand-alone unit or may be coupled, either externally to or within, a film exposure device.

Abstract: A thermal developing unit for the thermal development of photothermographic media which comprises a means for thermally developing photothermographic media by placing said media in contact with a heated element within a case, a first and second opening for venting gas from said case, said first opening being connected to an area surrounding said heated element said second opening being connected to an area within said unit where said media passes after it has been thermally developed, and in a path by which said gas can be vented through at least one of said first or second openings from said case there is a filter cartridge comprising a filter housing containing a chemical filtration media having no bonded absorbent partculates therein.

Abstract: Disclosed is a method for processing a silver halide photographic material, having on one side of a support a hydrophobic polymer layer as the outermost layer and on the side opposite an emulsion layer, by means of an automatic developing apparatus. The apparatus has a drying operation part which is equipped with two or more hot rollers arranged so that the silver halide photographic material may be wrapped partly around each of the hot rollers in turn and the contact between the rollers and the material may alternate between the front surface and the back surface of the photographic material, whereby the moisture in the photographic material evaporates from the surface areas when they are not in contact with the hot rollers. This method results in improvements in the drying characteristics of the photographic material and the transportation characteristics of the automatic developing apparatus.

Abstract: An air tube for use in a drying apparatus includes a tapered main tube body comprising an open air inlet end and a closed end opposite the open air inlet end, an air discharge port including an air exhaust slot, and an air diffuser located between the main tube body and the air discharge port, wherein the air diffuser includes a plurality of air flow apertures that are located at a position offset from the air exhaust slot of the air discharge port. The air tube is readily incorporated into a film processing system that includes a plurality of processing tanks, a film drying apparatus including a plurality of the air tubes, and a mechanism for transporting a photosensitive film through the processing tanks and into the film drying apparatus.