Abstract: A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.

Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

Abstract: A substrate processing system includes a substrate processing apparatus and a cleaning/drying apparatus. The substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block and a first interface block. The cleaning/drying apparatus includes a cleaning/drying processing block and a second interface block. An exposure device is arranged adjacent to the second interface block. In the cleaning/drying processing block, cleaning processing is applied to a substrate before exposure processing and drying processing is applied to the substrate after the exposure processing.

Abstract: A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.

Abstract: A substrate transfer apparatus that is designed provide an inclined transfer function that improves liquid saving efficiency of a process solution (developing solution) during the transfer of the substrate. The substrate transfer apparatus includes a first transfer unit for transferring a substrate, a second transfer unit spaced apart from an end of the first transfer unit, a third transfer unit disposed between the first and second transfer units and providing an inclined transfer that is capable of saving a developing solution adhered to the substrate during transfer of the substrate, and a transfer controller for controlling an inclined transfer angle and a connection state of the third transfer unit.

Abstract: A photosensitive material treating apparatus comprises a bulkhead provided between a plurality of treating tanks in which treating liquid is stored, and having an opening through which a photosensitive material is passed, an elastic blade which abuts against an opening wall of the opening to close the opening, arresting leakage of the treating liquid and, at the same time, which is elastically deformed to allow a photosensitive material to be passed, and a mounting member for mounting the elastic blade on a peripheral wall of the opening. The mounting member has a smaller linear expansion coefficient than that of the elastic blade, and is integrally formed with the elastic blade.

Abstract: A method of developing a latent image on a photographic element (such as imagewise exposed photographic film) by absorbing a dye precursor into the film, applying a developer solution to the film to develop the latent image and form a dye in the film, scanning the film with light, and detecting at least one of light reflected away from and light transmitted through the film.

Abstract: A method and system for environmental control in film processing is disclosed. In general, photographic film is coated with a processing solution, such as a developer solution, and is then developed within a controlled air environment. In the preferred embodiments, the temperature and humidity within the air environment is strictly controlled, which allows the development process to be more accurately and consistently controlled. This also allows fewer processing chemicals to be used and reduces harmful effluents caused by photographic film processing.

Abstract: A rack comprises feed rollers, sidewall members, a base member, a top wall member, a bottom plate, guide members, and a grip. The inside of the top wall member is hollow, and filling liquid is loaded therein. A processing tank contains rinsing solution. The rack gets snagged on the upper end of the processing tank. Since the filling liquid increases the total weight of the rack, the rack is prevented from floating in the processing tank by buoyant force.

Abstract: An image recording device includes: a supplying section for supplying recording media; an image recording section for exposing, on the basis of digital image data, the recording media supplied from the supplying section, so as to record images on the recording media; a developing section for developing the recording media on which the images have been recorded; a drying section for drying the recording media which have been developed; and a sealing mechanism, provided between the image recording section and one of the developing section and the drying section, for preventing one of heat and vapor from one of the developing section and the drying section from entering the image recording section. The image recording section is disposed above or below the developing section.

Abstract: A method and apparatus for processing a photosensitive material. The apparatus includes a narrow processing channel through which a photosensitive material passes. A drive mechanism for transporting of the photosensitive material through the processing channel, and a scrubbing roller which extends across at least a portion of the photosensitive material passing through the processing channel. The scrubbing roller is positioned such that it contacts the photosensitive material passing thereby and is rotated in the opposite direction to the direction of travel of the photosensitive material.

Abstract: The roller (20) comprises a main body member (31), a shaft (46) fixed to the main body member (31) and extending from one end thereof, and an end member (34) in contact with the main body member (31), characterised in that the end member (34) is mounted on the shaft (46) in a replaceable manner.

Abstract: A resist process method includes the steps of, preparing a process section for processing a wafer, means for extracting the wafer from a cassette and conveying the substrate to the process section, a cleaning section for finally cleaning the wafer processed by the process section, means for transferring the wafer from the process section to the cleaning section, and means for receiving the wafer from the cleaning section and storing the wafer in a cassette, extracting the wafer from the cassette, conveying the extracted wafer to the process section, causing the process section to include at least a process of developing the resist coated onto the wafer, transferring the wafer from the process section to the cleaning section after at least the developing process, finally cleaning the non-resist coated surface of the wafer by applying a cleaning solution to at least the non-resist coated surface of the substrate in the cleaning section, and storing the finally cleaned wafer in the cassette.

Abstract: The apparatus comprises a developing station (10), a second treatment station (12), a third treatment station (14). A liquid connection (52) is provided between the third treatment station (14) and the second treatment station (12). In a cleaning mode, liquid is fed from the developing station (10) to the third treatment station (14) to assist in cleaning of the third and second treatment stations (12, 14). The apparatus can be cleaned in a particularly convenient and efficient method, enabling optimum use of cleaning liquids and enabling automation of the cleaning process.

Abstract: A processing apparatus for processing of photographic material, the apparatus comprises a first plurality of successive processing tanks, each containing a processing solution. The plurality of first tanks form a first processing path for a first photographic material. A second plurality of successive processing tanks, each containing a processing solution, form a second processing path for processing a second photographic material. The first and second plurality of tanks are disposed adjacent each other. A first transport system drives the first photographic material through the first processing path, and a second transport system drives the second photographic material through the second processing path. A single common drive drives both said first and second transport systems.

Abstract: A modular photographic processor for processing a photosensitive material. The processor comprising a modular processing section containing at least one removable processing tank for holding a processing solution therein, the removable processing tank having an outlet port and an inlet port, and a modular recirculation system having a first end and a second end. The first end being connected to the inlet port by a first fluid connection and the second end being connected to the outlet port by a second fluid connection. The recirculation system including at least one replaceable fluid processing component which is connected to the recirculation system by a fluid connection, and the replaceable tank and/or component being configured such that they may be easily stacked together to minimize space and provide stability when stacked.

Abstract: Apparatus for exposing and processing a photographic recording material, generally called imaging element, comprising (i) an exposing part, generally called imagesetter, in which the imaging element is imagewise exposed, and (ii) a processing part, generally called processor, in which the imaging element is wet processed, characterized in that the exposed imaging element is fed automatically from the imagesetter into the processor and in that the processing is carried out along a substantially vertical path. Also disclosed is a method for recording an image by using the above described apparatus for exposing and processing an imaging element.

Abstract: A roller, for use in a photographic sheet material processing apparatus, comprises a core (32) provided with a covering of relatively soft material (34). The roller has a length (L) of from 0.4 to 2.0 m. The core has a maximum diameter (D) of less than 0.04*L m. The roller is characterised by having a deflection as measured by a specific test and a weight (W) below levels defined by a specified boundary condition formulae (1) & (2). Rollers satisfying this condition are characterised in that the core is formed of a composite material comprising fibers and a resin matrix. Such rollers have a relatively small diameter, are light and yet still have sufficient stiffness to avoid substantial wrinkling of the sheet material in the apparatus and to satisfy the requirements of high processing quality.

Abstract: An apparatus and a process for developing radiation-sensitive, exposed printing forms into printing plates is disclosed. The apparatus has a developer pan that contains a developer bath. Individual printing form runs through the developing station of this apparatus in a running-through plane. On each side of the running-through plane there is are a first pair of transport rollers, two brushing rollers with counter-rollers and a second pair of transport rollers at the end of the developing station. Guide rollers are arranged between the first pair of transport rollers and the first brushing roller with its counter-roller, on the underside of the running-through plane. A closed vessel, filled with developing solution, is connected via a developer circuit and a pump to the developer bath. The vessel contains a temperature sensor and a measuring electrode for the electric conductivity of the developing solution.

Abstract: A photographic film developing apparatus includes a developing section including a developing tank for developing a photographic film strip, a drying section drying the developed film strip, and a film collecting/storing holder disposed adjacent an exit of the drying section for collecting and storing the dried film strip from the drying section. The film collecting/storing holder includes a film rolling device for rolling the film strip for the storage thereof within the holder.

Abstract: A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle .theta.

Abstract: A substrate photolithography system includes a substrate handling robot which pivots about a fixed point and transfers substrates between photoresist coater, a developer, and a heating/cooling unit, all of which are clustered about the robot. The end effector of the robot is capable of both vertical and lateral movement so that individual modules of the heating/cooling unit may be stacked. An apparatus and a method for baking and cooling silicon substrates are disclosed. Both baking and cooling of silicon substrates are done in a single integrated thermal process module. Each thermal process module includes two hot plate assemblies, a cool plate assembly, two local linear transfer arms and a micro-processor based module controller. Both transfer arms are capable of transferring substrates among the cool and hot plate assemblies. A cassette input/output unit handles cassettes which contain semiconductor wafers or other substrates that are to be delivered to or withdrawn from a semiconductor processing system.

Abstract: A wet processor comprises a plurality of cells (12, 12', 12") mounted one above the other in a stack to define a substantially vertical sheet material path (20) through the apparatus. Each cell comprises a housing within which is mounted rotatable roller (28) biased towards a reaction surface (31) to define a roller nip (36) there-between through which the sheet material path extends and associated sealing means (38, 39) serving to provide a gas- and liquid-tight seal between roller (28) and reaction surface (31) on the one hand and a wall (14) of the housing on the other. The roller (28) is a drive roller. Alternatively or additionally means (19, 21) are provided for connecting each cell to adjacent cells in the stack in a closed manner. By this simple construction, treatment liquid in one cell is not contaminated by contents of the adjacent cells. Furthermore, consumption of treatment liquids is reduced by reducing the evaporation, oxidation and carbonization thereof.

Abstract: A condensation preventing structure for a crossover rack provided in a printer processor. The structure has a plurality of conveying rollers provided at a crossover rack provided within a printer processor, and a moisture adhesion prevention/moisture removing device which effects one of prevention of adhesion of moisture to the plurality of conveying rollers due to condensation and removal of moisture on the plurality of conveying rollers due to condensation. Due to the moisture adhesion prevention/moisture removing device, uneven development of a photographic printing paper caused by moisture adhering to the plurality of conveying rollers due to condensation does not occur.

Abstract: Provided is an apparatus for processing a photographic sheet (9) which comprises at least one station (4) with inlet and outlet pressure roller pairs (42 to 45) for transporting the sheet, spray means (22) for spraying processing liquid (21) onto at least one surface of the sheet, characterised in that the station (4) comprises sealing means for maintaining a liquid seal (58, 59) between at least one roller of at least one roller pair and an adjacent wall of the washing station. Also provided is an apparatus for making an offset printing plate according to the silver salt diffusion transfer process, using the described station (4) as washing station. Also provided is a method for making an offset printing plate using the above described apparatus for processing an imaging element.

Abstract: A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle &thgr; to load/unload the wafer into/from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection resul