Single Station And Plural Fluids Patents (Class 396/625)
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Patent number: 7018481Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.Type: GrantFiled: January 27, 2003Date of Patent: March 28, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Kei Hayasaki, Shinichi Ito, Tatsuhiko Ema, Riichiro Takahashi
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Publication number: 20040115567Abstract: Methods and apparatus for controllably dispensing fluids within wafer track modules using rotatable liquid dispense arms and nozzles. The fluid dispense apparatus may be specifically selected for developing a photoresist-coated substrate. A series of one or more rotatable arms can be mounted adjacent to a mounted substrate within a develop module, wherein each arm supports a dispense nozzle that is connected to a fluid source. The dispense nozzle may be formed with a plurality of nozzle tips for dispensing selected developer and rinse fluids. Each rotatable arm can be configured to rotate about its longitudinal axis to selectively position the dispense nozzle between various dispense positions and non-dispense positions to reduce risk of dripping solution onto the substrate. Methods for developing photoresist-coated semiconductor wafers are also provided herein using developer and rinse fluid dispense apparatus with a dispense arm that is rotatable about its longitudinal axis.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Inventors: Robert P. Mandal, Dikran Babikian
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Patent number: 6722799Abstract: The present invention relates to a photographic processor and a method of processing photographic film which utilizes a circular processing drum and a disk positioned inside the drum. In the arrangement of the present invention, a tubular shaft has one end that is positioned at the central opening of the disk, and at least one processing solution delivery tube extends through the tubular shaft. The at least one processing solution delivery tube has a first end associated with a processing solution source and a second end which opens to a film path in the circular processing drum.Type: GrantFiled: October 28, 2002Date of Patent: April 20, 2004Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Daniel M. Pagano, Kevin H. Blakely
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Patent number: 6719465Abstract: A processor has a rotatable drum housed within an enclosure chamber. Processing solution is applied to the surface of the rotating drum and forms a film of solution around the periphery. The media to be processed is fed around the periphery of the rotating drum with its sensitized surface facing the drum.Type: GrantFiled: September 16, 2002Date of Patent: April 13, 2004Assignee: Eastman Kodak CompanyInventors: Anthony Earle, Leslie R. Wells, Daniel M. Pagano, Ralph L. Piccinino, Jr.
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Patent number: 6704087Abstract: A method of processing a print order in which the entire order is delivered simultaneously. An exposed sheet carrying all the latent images of the order is developed in a single processing space.Type: GrantFiled: June 5, 2002Date of Patent: March 9, 2004Assignee: Eastman Kodak CompanyInventors: Nigel R. Wildman, Roy King
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Patent number: 6692904Abstract: A photographic washing bath comprises a chamber containing a wash solution for a silver halide photographic material having a pH of less than 7 and comprising water having dissolved therein an oxidizing agent, said oxidizing agent having an oxidizing potential of at least 1 volt and being in a concentration of from 0.05 to 2 Molar. The oxidation potential of the oxidizing agent is preferably at least 1.2 volts and may be hydrogen peroxide or a source of hydrogen peroxide, a persulphate, a perborate, a bromate, or an iodate. A washing process using the invention is suitable for being carried out in same chamber as the development and fixing stages in which case hydrogen peroxide is the preferred oxidizing agent because any peroxide remaining at the end of the wash stage can be removed by evaporation, thereby avoiding risk of contamination of the next stage to be carried out in the chamber.Type: GrantFiled: February 14, 2003Date of Patent: February 17, 2004Assignee: Eastman Kodak CompanyInventors: John R. Fyson, Jeffrey L. Hall, Peter J. Twist
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Patent number: 6619862Abstract: The present invention relates to a photographic processor and a method of processing photographic material where heat is applied to a processing drum in a manner which requires less warm up time and permits better film processing uniformity. The system of the present invention includes a circular drum and a heating material provided either on an outer surface of the drum, embedded into a side wall of the drum, or provided in an interior surface of the drum. The heating material is adapted to be heated so as to heat the processing path through which film is conveyed during processing, to an appropriate temperature for the processing of the photographic material.Type: GrantFiled: June 28, 2002Date of Patent: September 16, 2003Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Faye Transvalidou, Jeffrey L. Hall
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Patent number: 6595705Abstract: A photographic processor and a method of operation is disclosed. The processor is in the form of a circular drum processor into which photographic film is inserted and processed. The processor includes a washing assembly which is adapted to wash the non-emulsion surface of the film and other components of the processor as the processed film is removed from the processor.Type: GrantFiled: September 12, 2002Date of Patent: July 22, 2003Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Ronald W. Grant, Jr., Kevin H. Blakely
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Patent number: 6592271Abstract: A processing solution delivery system and method for a photographic processor includes a plurality of chambers that are adapted to hold a distinct processing solution therein. A manifold is fluidly connected to the chambers and includes an inclined solution passageway. The manifold provides a connection between the chambers and an associated processor. Provided in a spaced manner along the inclined solution passageway are manifold bores which introduce solution at different points along the inclined passageway. With the present invention, it is possible to introduce wash solution at the highest point of the inclined processing path at the end of a processing cycle so as to assure the removal of contaminants from previously supplied solutions. Further, it is possible to introduce a bleach or fixing solution at the lowermost point of the inclined path to effectively and uniformly quench a development reaction.Type: GrantFiled: June 5, 2002Date of Patent: July 15, 2003Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Jeffrey L. Hall, Daniel C. Davis
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Patent number: 6575645Abstract: An apparatus and method for developing a selectively exposed resist pattern, on an integrated circuit wafer, which avoids damage to the resist pattern and allows greater freedom in the choice of resists. Developer is placed on a selectively exposed layer of resist for a first time. The layer of resist and developer are then immersed in a cleaning liquid time for a second time to stop the developing action and remove the developer. As an option, ultrasonic power can be delivered to the wafer or the cleaning liquid while the layer of resist is immersed in the cleaning liquid. The cleaning liquid is then removed from the layer of resist, now a resist pattern, and the wafer and resist pattern is placed in a vacuum for drying. As another option, heat can be applied to the wafer and resist pattern while they are in the vacuum. The wafer and resist pattern are then removed from the vacuum for further processing.Type: GrantFiled: February 6, 2002Date of Patent: June 10, 2003Assignee: Taiwan Semiconductor Manufacturing CompanyInventor: Wei-Kay Chiu
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Patent number: 6572286Abstract: A photographic processing system has a first processing stage to process photographic material. A second processing stage is also provided to further process the photographic material. A storage device is provided between the first processing stage and the second processing stage to receive and store photographic material output from the first processing stage prior to output to the second processing stage. This enables the photographic material to be output from the first processing stage at a different rate than that at which it is input to the second processing stage. Accordingly, the first processing stage can be vacated for use by subsequent photographic material before processing in the second processing stage is complete.Type: GrantFiled: April 2, 2002Date of Patent: June 3, 2003Assignee: Eastman Kodak CompanyInventors: Anthony Earle, Leslie Wells
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Patent number: 6517263Abstract: A photographic processor and method of operation is disclosed. The processor includes a circular drum having first and second film processing paths, and a disk positioned inside the drum. The disk comprises a first set of disk teeth for engagement with perforations on a first type of film and a second set of disk teeth for engagement with perforations on a second type of film. The first and second set of disk teeth are positioned along a portion of an outer periphery of the disk. The processor also includes a circular dryer for drying the processed film. The dryer extends around an outer periphery of the drum.Type: GrantFiled: March 27, 2002Date of Patent: February 11, 2003Assignee: Eastman Kodak CompanyInventors: Ralph L. Piccinino, Jr., Daniel M. Pagano
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Patent number: 6517262Abstract: An apparatus for processing photographic material comprises a chamber adapted to hold the material therein, means for introducing solution into the chamber, means for removing the solution from the chamber, and a member located within the chamber and filling a central part thereof. A gap is defined between the inner wall of the chamber and the central member in which the material is held, thereby retaining the material around the inner circumference of the chamber.Type: GrantFiled: October 9, 2001Date of Patent: February 11, 2003Assignee: Eastman Kodak CompanyInventors: Peter J. Twist, Anthony Earle
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Patent number: 6508599Abstract: An automated static film processor that will allow for the running of additional processing cycles of X-ray film while a previous cycle is running, comprising a housing having a pair of chemical storage reservoirs and multiple reaction chambers. The advantage of this apparatus is that a secondary operator may start processing X-ray film immediately without having to wait for completion of a previous cycle. The reaction chambers are configured so that tubing, connectors, and valves will allow chemicals to flow into and out of each reaction chamber from a single set of developer and fixer storage reservoirs. Each reaction chamber is provided with water and drain valves, and overflow protection. Each reaction chamber includes a lid that prevents light damage while X-ray film is being processed. A drying device that forces warm air into each reaction chamber is disclosed.Type: GrantFiled: December 11, 2000Date of Patent: January 21, 2003Inventor: Stephen Thomas Blume
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Patent number: 6505979Abstract: A method of processing a photographic material in which the material is loaded into a rotatable chamber and a metered amount of solution is introduced into the chamber. The chamber is rotated and the solution is continuously swept along the surface of the material, forming a wave through which the material passes to enable uniform processing.Type: GrantFiled: August 1, 2001Date of Patent: January 14, 2003Assignee: Eastman Kodak CompanyInventors: Peter J. Twist, Anthony Earle, Nigel R. Wildman, Leslie R. Wells
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Publication number: 20020081537Abstract: A method of processing photographic material in which a fixed volume of processing solution is added to the surface of the material and spread repeatedly over the length of material. The processing solution is added to the material in at least two stages.Type: ApplicationFiled: September 24, 2001Publication date: June 27, 2002Applicant: Eastman Kodak CompanyInventor: Peter J. Twist
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Patent number: 6322261Abstract: A film developing apparatus is provided for developing photographic film by an automated batch process. The apparatus provides automated preparation of precise mixtures of the processing liquids at various stages of the batch process. The mixtures are made on-demand and are pre-heated just before use in the batch process. Additionally, the apparatus provides a method to reuse used processing fluids in future processing. In particular, the apparatus makes use of its mixing capability to combine a reserved processing fluid with a fresh processing fluid to create a replenished processing fluid.Type: GrantFiled: February 16, 2000Date of Patent: November 27, 2001Assignee: Photo-Therm, L.P.Inventor: Roman Kuzyk
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Patent number: 6259514Abstract: In a rangefinder apparatus, a clamp signal is set to Ic1, the number of accumulating operations of an output ratio signal in an integrating circuit is set to N1, and a first distance measurement value D1 is detected. If the first distance measurement value D1 is larger than a reference distance L1, then the clamp signal is further set to Ic2, which is lower than CI1, the number of accumulating operations is set to N2, and a second distance measurement value D2 is detected. If the difference obtained by subtracting the first distance measurement value D1 from the second distance measurement value D2 is larger than a threshold value DD, then the clamp signal is set to Ic2, the number of accumulating operations is set to N3, and a third distance measurement value D3 is detected. A weighted average of the second distance measurement value D2 and the third distance measurement value D3 is obtained according to the number of accumulating operations N2 and N3, whereby the distance to the object is determined.Type: GrantFiled: October 26, 1999Date of Patent: July 10, 2001Assignee: Fuji Photo Optical Co., Ltd.Inventor: Hideo Yoshida
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Patent number: 6020948Abstract: The method for acquiring and printing electronic images comprises the following phases: acquiring and digitizing an image by means of input means (1) on a computer 10; displaying said image on primary display means (11) and on secondary display means (12); exposing an end portion (33) of a web (32) of photosensitive medium with the image displayed by said secondary display means (12), through conveying means (50); forwarding the end portion (33) and cutting it by means of a cutter (7), to obtain a sheet (5) of photosensitive medium; developing the hidden image by means of single sheet developing means (40); drying the said sheet (5) and forwarding it to the outside.The exposing phase preferably comprises three different filtered exposing steps, each one for a different primary color.Type: GrantFiled: April 29, 1997Date of Patent: February 1, 2000Assignee: Gipco S.r.l.Inventor: Daniele Tumidei
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Patent number: 5960227Abstract: A photosensitive material processing apparatus feeds an elongated film, which is wound on a spool shaft, out from an entrance/exit opening of a film accommodating container, and carries out developing processing of the film. The photosensitive material processing apparatus includes a loading section in which the film accommodating container which accommodates the film is loaded; a feeder which feeds the film out from the film accommodating container loaded in the loading section, in a state in which one longitudinal direction end of the film is anchored to the spool shaft of the film accommodating container; and a processing tank which is sheath-shaped and whose length is longer than a length of a portion of the film which portion is to be processed and which portion has been fed out to an exterior of the film accommodating container, the processing tank having at only one longitudinal direction end portion a film entrance/exit opening through which the film enters and exits.Type: GrantFiled: April 24, 1997Date of Patent: September 28, 1999Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshio Kurokawa, Noboru Sasaki
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Patent number: 5890028Abstract: A development processing apparatus includes: a plurality of stock tanks which stores a plurality of types of processing solutions; a small-volume single processing tank including an entrance/exit port for a film which enables the entering/exiting of the film, the processing tank accommodating the film via the entrance/exit port for a film and developing the film in the plurality of types of processing solutions; processing solution supply which supplies the plurality of types of processing solutions from the plurality of stock tanks to the processing tank in a predetermined order; a sensor which measures the temperature of the processing solution within the processing tank; a heater which is disposed at the stock tanks or the processing solution supply and heats the processing solution; and control which is connected to the processing solution supply and the heater and controls the processing solution supply such that the last processing solution supplied to the processing tank is filled within the processingType: GrantFiled: December 22, 1997Date of Patent: March 30, 1999Assignee: Fuji Photo Film Co., Ltd.Inventors: Hideaki Nomura, Toshio Kurokawa
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Patent number: 5867747Abstract: An automatic film processor is provided for developing high resolution, large sheet-format film in such a manner that fluid flow across the film will be uniform during all phases of film production, in order to avoid gradients, ridge lines and streaking sometimes associated with development of high resolution film. The film processor facilitates the uniform application of chemistry to the film by rapidly applying film-developing chemistry to the film, agitating and washing the chemistry over the film and quickly removing the chemistry from the film.Type: GrantFiled: March 10, 1997Date of Patent: February 2, 1999Assignee: Wing-Lynch, Inc.Inventors: Marine D. Lynch, Richard D. Paulson
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Patent number: 5701544Abstract: A color filter is produced through the steps of: forming a layer of a color filter material including a colorant dispersed in a photosensitive resin on a substrate; and pre-baking, exposing and developing the color filter material layer to leave a color filter pattern on the substrate. In the developing step, a developer liquid is applied in the form of a curtain onto the exposed color filter material layer on the substrate, the substrate is allowed to stand in a substantially still state and then the substrate is supplied with an ultrasonic wave projected perpendicularly to the substrate while being in contact with the developer liquid. The ultrasonic wave is preferably uniformized by at least two rotating reflection or diffusion plates before it is projected onto the substrate. As a result, the color filter pattern can be developed with little development irregularity even on a large-size substrate.Type: GrantFiled: October 26, 1995Date of Patent: December 23, 1997Assignee: Canon Kabushiki KaishaInventors: Kazuya Ishiwata, Yasuyuki Watanabe, Naoya Nishida, Akira Unno