Abstract: A substrate processing apparatus includes a substrate holding unit that holds a substrate horizontally while rotating the substrate around a vertical rotational axis running through its center portion, an opposed member having an opposed surface that is opposed to an upper surface of the substrate, and a processing liquid discharge unit that includes a center portion discharge port on the opposed surface, that opens being opposed to the upper surface center portion of the substrate, and a peripheral portion discharge port on the opposed surface, that opens being opposed to the upper surface peripheral portion of the substrate, that discharges a processing liquid from the center portion discharge port to supply the processing liquid between the substrate and the opposed surface, and discharges the processing liquid from the peripheral portion discharge port to replenish the processing liquid between the substrate and the opposed surface.

Abstract: A substrate processing apparatus includes a substrate holding unit that holds a substrate horizontally while rotating the substrate around a vertical rotational axis running through its center portion, an opposed member having an opposed surface that is opposed to an upper surface of the substrate, and a processing liquid discharge unit that includes a center portion discharge port on the opposed surface, that opens being opposed to the upper surface center portion of the substrate, and a peripheral portion discharge port on the opposed surface, that opens being opposed to the upper surface peripheral portion of the substrate, that discharges a processing liquid from the center portion discharge port to supply the processing liquid between the substrate and the opposed surface, and discharges the processing liquid from the peripheral portion discharge port to replenish the processing liquid between the substrate and the opposed surface.

Abstract: A substrate processing apparatus includes a substrate holding unit that holds a substrate horizontally while rotating the substrate around a vertical rotational axis running through its center portion, an opposed member having an opposed surface that is opposed to an upper surface of the substrate, and a processing liquid discharge unit that includes a center portion discharge port on the opposed surface, that opens being opposed to the upper surface center portion of the substrate, and a peripheral portion discharge port on the opposed surface, that opens being opposed to the upper surface peripheral portion of the substrate, that discharges a processing liquid from the center portion discharge port to supply the processing liquid between the substrate and the opposed surface, and discharges the processing liquid from the peripheral portion discharge port to replenish the processing liquid between the substrate and the opposed surface.

Abstract: In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank.

Abstract: Rinsing nozzles 310a to 310e are moved on a wafer W while they are discharging rinsing solution 326. At that point, discharging openings 317a to 317e are contacted to developing solution 350 coated on the wafer W or rinsing solution 326 on the wafer W. Thus, the impact against the wafer W can be suppressed. As a result, pattern collapse can be prevented. In addition, a front portion of the developing solution 350 can push away the developing solution 350.

Abstract: A developing apparatus for organic electroluminescent display panels comprises a developing unit for supplying a developing solution to be uniformly dispensed to the surface of an organic electroluminescent display panel by immersing the organic electroluminescent display panel into the developing solution or spreading the developing solution over the organic electroluminescent display panel, a cleaning unit having at least a bath connected to the end of the developing unit for spraying a recycled cleaning liquid or cleaning liquid over the organic electroluminescent display panel, a drying unit having at least an airflow driers, and a transporting unit for transporting the electroluminescent display panel; wherein the organic electroluminescent display panel is transported at a constant speed by the transporting unit of the developing apparatus.

Abstract: In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.

Abstract: An X-ray film development device performs development, fixing, rinsing, and drying processes while transporting an exposed X-ray film. A rinsing unit is provided with a light source, which illuminates the X-ray film during transportation, and a reading unit, which receives the passing light and reads an image recorded on the X-ray film. The image signal from the reading unit is processed by a display device (CRT, LCD, etc.), and the film image can be provided to the doctor or patient without waiting until the film dries.

Abstract: A photographic processor and a method of operation is disclosed. The processor is in the form of a circular drum processor into which photographic film is inserted and processed. The processor includes a washing assembly which is adapted to wash the non-emulsion surface of the film and other components of the processor as the processed film is removed from the processor.

Abstract: The present invention relates to a method and system for reusing a washing solution within a processor for processing photographic material. In the method and system of the present invention, sequential washing stages are applied to the processor. During one of the wash stages, and preferably a wash stage subsequent to an initial a first wash stage (a second wash stage), a volume of washing solution which is greater than the washing solution applied in the first wash stage is applied. The washing solution applied in the second or subsequent wash stage is subject to a chemical treatment such as an ion exchange, and is thereafter, recycled back to the processor for reuse in processing photographic material and/or cleaning the components of the processor.

Abstract: The invention relates to a process for the manufacture of photopolymer printing blocks, which are utilizable for producing printed matter by flexography, typography or dry offset, of the type including a stage for polymerizing areas by exposure to ultraviolet rays; a stage for engraving non-polymerized areas by immersion and brushing in an engraving bath contained in an engraving tank, the bath becoming loaded with dissolved particles or particles in suspension during the engraving stage; and a separation of the constituents of the engraving bath, with the liquid obtained at the time of separation being injected back into the engraving tank, characterized in that the separation consists of filtration, during which the particles are progressively eliminated. The invention also relates to an engraving device for carrying out the process.

Abstract: An etching device for preparing flexible blocks which can be used for printing in flexography, typography or dry offset generally includes an etching tank containing a bath (22) and brushes (3), a stirring and heating device, and an overfill system (20) for discharging the solution from the etching tank through an outlet duct (21) to a separation device. The separation device includes a reception vat (14) having an upper part which is equipped with a device (10) for separating the water and the polymer, and at least one filtering membrane (7).

Abstract: The apparatus comprises a developing station (10), a second treatment station (12), a third treatment station (14). A liquid connection (52) is provided between the third treatment station (14) and the second treatment station (12). In a cleaning mode, liquid is fed from the developing station (10) to the third treatment station (14) to assist in cleaning of the third and second treatment stations (12, 14). The apparatus can be cleaned in a particularly convenient and efficient method, enabling optimum use of cleaning liquids and enabling automation of the cleaning process.

Abstract: Described herein is a countercurrent multi-tank washing stage (10) for photographic processing apparatus which comprises a first washing tank (500), a last washing tank (100) and at least one intermediate washing tank (200, 300, 400), each washing tank having a recirculation system (102, 202, 302, 402, 502) associated therewith. The first washing tank (500) is positioned upstream from the last washing tank (100). Each of the last washing tank (100) and the intermediate washing tanks (200, 300, 400) is fluidly connected to the recirculation system of an adjacent upstream washing tank (200, 300, 400, 500). Level sensors (112, 114, 212, 214, 312, 314, 412, 414, 512) are provided in each of the washing tanks (100, 200, 300, 400, 500) to control an operating level (116, 216, 316, 416, 516) of washing solution in each of the tanks (100, 200, 300, 400, 500) and a fill level (118, 218, 318, 418) in the last and intermediate tanks (100, 200, 300, 400).

Abstract: A water replenishing device is disclosed which makes it possible to supply the necessary volume of water in response to a decrease in the processing solution in the processing tank due to evaporation. A water supply guide member is attached to an upper part of a processing solution tank. A discharge opening is formed at one end of the water supply guide member. Water supplied from a water replenishing pipe is fed to the water supply guide member and then it is supplied into the processing solution tank. When the processing solution level in the processing solution tank reaches an overflow opening, the excess water supplied to the water supply guide member is discharged outside the processing solution tank through the discharge opening.

Abstract: An apparatus for washing a web or sheet of photosensitive material during the development process by passing the material through a series of stations where the washing is accomplished by spraying and the material is not immersed into a wash bath and the washed material consistently meets archival quality and a process for washing the material using the apparatus.

Abstract: There is disclosed an automatic X-ray film processor assembly comprised of a gear drive assembly for the film transport unit including continuously operated lower and upper film lifters operating at different rotational speeds for passing film more rapidly through processing units. Additionally, there is provided an improved drying assembly including gear train in driving interrelationship with the gear drive assembly for the film transport as well as a fan unit providing improved aero-thermodynamics for drying film chips and additionally reducing film transit times. Additionally, there is provided a valved water drain system and a closeable door access means to more easily facilitate wash water draining and refilling for improved film processing.

Abstract: In an apparatus for processing a light-sensitive material, a plurality of processing tanks are serially arranged along a conveyance passage on which the light-sensitive material is conveyed in a conveying direction. The apparatus comprises a device for replenishing compensation water into a most-downstream tank arranged most downstream among the plurality of processing tanks in terms of the conveying direction under the following inequality:0.ltoreq.(E-C)/(P-R)<0.3E (ml/day): amount of evaporated water from the plurality of processing tanks per day,C (ml/day): amount of the compensation water to compensate the evaporated water,P (m.sup.1 /day): amount of the light-sensitive material processed per day,R (ml/m.sup.2): amount of replenishing processing solution per m.sup.2 of light-sensitive material.