Abstract: A photographic processor is in the form of an outside load drum processor. The outside load drum processor includes a circular member that includes a first wall, a second wall and a side-wall that connects the first wall to the second wall and extends around a perimeter of the circular member. A flexible shield member is wrapped around an outer surface of the side-wall so that a processing path for photographic material to be processed is defined between at least the outer surface of the side-wall and the inner surface of the flexible shield member. The circular drum member is rotated for processing of photographic film within the processing path.

Abstract: A developer and a method of a developing process which improve upon uniformity in a size of a resist pattern are provided. The developer includes a wafer rotating system (10) and a wafer oscillating system (20) which oscillates whole of the wafer rotating system (10) in one-dimensional direction, and the wafer oscillating system (20) has a motor supporting part (4) which mounts and fixes a motor part (1), a rail (5) which engages a rail groove (41) formed on a bottom side of the motor supporting part (4) and also enables the motor supporting part (4) to slide smoothly in one-dimensional direction, a guide bar (6) which is coupled with the motor part (1) and transmits a propulsion which enables the motor part (1) to slide along the rail (5) and a linear motor part (7) which engages the guide bar (6) and is a propulsion supplying source which supplies the propulsion with the wafer rotating system (10) by sliding the guide bar (6) in the axial direction of the guide bar (6).

Abstract: A photographic processor includes a circular processing drum and a circular drying cylinder. A transfer arm is utilized to transfer processed photographic media from the circular processing drum to the circular drying cylinder. The circular drying cylinder includes an outer housing and a diffuser member having slots provided therein. The slots extend in a spaced manner from an entrance to an exit of the drying cylinder so as maximize the drying of film in the drying cylinder.

Abstract: An apparatus for removing a photoresist film includes a substrate cassette for fixing a substrate having a surface covered with a photoresist film, an ozone feed tube for supplying ozone, a liquid feed tube for supplying a liquid photoresist film removing solution, and a processing tank for recovering and processing at least one of ozone and the liquid photoresist film removing solution, wherein the liquid photoresist film removing solution is supplied through the liquid feed tube as a liquid or mist, at least one of ozone and the photoresist film removing solution being continuously supplied.

Abstract: The present invention provides for a circular processing drum that defines a processing chamber therein. The circular processing drum includes a first media path for media of a first type which includes a first set of grooves in opposing walls of the processing drum, and a second media path which includes a further set of grooves in the opposing walls of the processing drum. The combination of the first and second media paths provides for a drum that is capable of processing multiple types of media while utilizing a minimum amount of space.

Abstract: A developer and a method of a developing process which improve upon uniformity in a size of a resist pattern are provided.

Abstract: An apparatus and method for developing a selectively exposed resist pattern, on an integrated circuit wafer, which avoids damage to the resist pattern and allows greater freedom in the choice of resists. Developer is placed on a selectively exposed layer of resist for a first time. The layer of resist and developer are then immersed in a cleaning liquid time for a second time to stop the developing action and remove the developer. As an option, ultrasonic power can be delivered to the wafer or the cleaning liquid while the layer of resist is immersed in the cleaning liquid. The cleaning liquid is then removed from the layer of resist, now a resist pattern, and the wafer and resist pattern is placed in a vacuum for drying. As another option, heat can be applied to the wafer and resist pattern while they are in the vacuum. The wafer and resist pattern are then removed from the vacuum for further processing.

Abstract: The method and apparatus supplies processing solution directly to the surface of a web of sensitized material by means of a movable applicator. The web and applicator are moved relative to each other to enable good mixing of the solution on the surface. The movable applicators can be moved in and out of contact with the material as required so that the process can be varied.

Abstract: A method of processing photographic material in which a reciprocable member is plunged into a tank containing a small volume of processing solution. The solution is rapidly displaced through the channels created between the tank wall and the plunger and across the surface of the photographic material.

Abstract: A method and an apparatus are disclosed for enhancing the solution diffusibility of a developing liquid in a semiconductor wafer developing unit through the agitation of the liquid by acoustic power. Two embodiments are described using sonic and ultrasonic waves. In the first embodiment, a sonic wave couples into the developing liquid, agitating it and thereby enhancing its solution diffusibility. In the second embodiment, an ultrasonic wave couples into the semiconductor wafer, causing the photoresist pattern to vibrate, again enhancing the solution diffusibility of the developing liquid.

Abstract: A method and apparatus for processing an undeveloped filmstrip contained in a reel. The apparatus comprises at least one processing tank containing a processing solution therein. A holding mechanism is provided for holding and retaining the processing reel and for positioning the processing reel within the at least one processing tank so that the filmstrip can be submerged within the processing solution contained in the at least one processing tank. An agitation mechanism is provided and comprises a motor and a propeller connected to the motor. The propeller is disposed within the tank for agitating the processed solution contained in the tank. The motor is activated as the reel is being lowered into the processing solution causes the processing solution to be moved past the filmstrip as it is being placed within the processing solution.

Abstract: A method and apparatus for processing a photosensitive material. The apparatus has a processing tank for holding and retaining a processing solution, an agitation propeller, and a motor for driving said agitation propeller so as to move the processing solution. The apparatus includes a device for monitoring a characteristic feature of the motor which can be correlated to the level of the processing fluid within the processing tank.

Abstract: A method of imagewise exposing and processing a photographic silver halide color material in a machine containing a number of non-replenished processing tanks or processing tanks that are supplied from a non-replenished source,the method comprising increasing the exposure time automatically by a predetermined factor related to the area of photographic material already processed and the volume of the non-replenished processing solution.

Abstract: A method of processing an imagewise exposed photographic silver halide color material in a machine containing a number of processing tanks or processing tanks which are supplied from a non-replenished source, the method comprising increasing the temperature of at least one of the tanks automatically by a predetermined amount related to the area of photographic material already processed and optionally, the time of treatment in said at least one processing tank is increased by a predetermined factor related to the area of photographic material already processed and the volume of the non-replenished processing solution.

Abstract: A method of processing an imagewise exposed photographic silver halide material in a machine containing a number of non-replenished processing tanks or processing tanks that are supplied from a non-replenished source, the method wherein the silver halide comprises at least 95% by weight silver chloride and processing in each tank is carried out with sufficient agitation to avoid the need for replenishment.