Abstract: An apparatus for handling wafer carriers in a semiconductor fabrication facility (FAB) is disclosed. In one example, the apparatus includes: a table configured to receive a wafer carrier having a first door and operable to hold a plurality of wafers; an opening mechanism configured to open the first door of the wafer carrier; and a door storage space configured to store the first door. The apparatus may be either located on a floor of the FAB or physically coupled to a ceiling of the FAB.

Abstract: A solids handling equipment rotary plough (200) includes an elongate metal body (201) with a leading face (210) and a trailing face (212). The body (201) is configured to be mounted to a rotary component for rotation about an axis of rotation at least in one direction which is an operative forward direction such that the leading face (210) leads the trailing face (212). At least the leading face (210) has at least two major operatively upwardly and outwardly extending surfaces (202.1, 204.1) which are not coplanar. A first major surface (202.1) is angled operatively rearwardly and upwardly relative to the forward direction of rotation at an angle of at least 1° to the vertical. A second major surface (204.1) is angled operatively forwardly and outwardly at an angle of at least 1° relative to a radius of a circle described in use by the rotary plough (200) when rotating in the operative forward direction.

Abstract: A vacuum processing apparatus includes: a plurality of carriers to be mounted with a base member; a circulation path which is kept in a controlled atmosphere and through which the carriers circulate; a plurality of base member loading and unloading chambers which are disposed in the circulation path and which load and unload the base member to and from the carriers; and a plurality of vacuum processing chambers which are disposed between the base member loading and unloading chambers in the circulation path for performing a vacuum process on the base member.

Abstract: A disk processing system with a corner chamber having a heater assembly and a carrier rotary assembly configured to rotate the heater assembly.

Abstract: A selective dispensing device (1) is disclosed for limestone in vats (5a, 5b) of a regenerating oven adapted to arrange limestone with greater sizes next to an external wall (7a, 7b) of the vats (5a, 5b) and limestone with smaller sizes next to an internal wall (8a, 8b) of the vats (5a, 5b), comprising at least one mobile bulkhead (11) connected to a drive shaft (13) rotating around a rotation axis (X), such rotation being driven by an actuator system and the mobile bulkhead (11) being able to rotate around the rotation axis X to be alternatively inclined by a first angle (?) and by a second angle (?) with respect to reference plane (Z).

Abstract: “Annular swivel joint including an annular fixed part and an annular rotary part and having an annular trough that defines an annular volume, via which the circuits portions communicate, a stationary forward connection for receiving cooling fluid from the stationary circuit portion; a rotary forward connection for supplying cooling fluid to the rotary circuit portion; a rotary return connection for receiving cooling fluid from the rotary circuit portion; and a stationary return connection for returning cooling fluid to the stationary circuit portion; a partition dividing the annular volume into an annular external cavity and an annular internal cavity so that the forward connections are coupled via one of the external and internal cavities and the return connections are coupled via the other cavity, so that the internal cavity is at least partially surrounded by the external cavity.

Abstract: A cooling system for a dental porcelain furnace speeds up the cycle time for the furnace.

Abstract: Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

Abstract: A charging device for a shaft furnace comprises a distribution chute for bulk material and a drive mechanism for the distribution chute. The distribution chute has a trough-shaped main part with an open impact section and an outlet section. The main part provides a sliding channel between the impact section and the outlet section. The drive mechanism for the distribution chute is capable of rotating the distribution chute about an essentially vertical axis and pivoting the distribution chute about an essentially horizontal axis so as to allow distribution of bulk material on a charging surface of the shaft furnace. According to the present invention, the distribution chute comprises a circumferentially closed funnel portion which tapers in the direction of flow and is arranged downstream of the impact section and with its outlet at the downstream end of said trough-shaped main part.

Abstract: A furnace includes: a furnace housing; a perforated tray mounted in the furnace housing; and a stirring rod disposed rotatably on the perforated tray. The stirring rod has top and bottom ends, two opposite lateral ends, a middle portion, and opposite first and second portions, each of which extends from the middle portion to a respective one of the lateral ends. Each of the first and second portions has an inclined face that extends between the top and bottom ends of the stirring rod from the respective one of the lateral ends toward the middle portion of the stirring rod, that is inclined relative to the perforated tray, and that faces toward the perforated tray.

Abstract: A method of a single wafer wet/dry cleaning apparatus comprising: a transfer chamber having a wafer handler contained therein; a first single wafer wet cleaning chamber directly coupled to the transfer chamber; and a first single wafer ashing chamber directly coupled to the transfer chamber.

Abstract: A dummy substrate (17) differs from a substrate to be processed in having a first guide (G1) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber (2), a second guide (G2) is arranged to assist the dummy substrate (17) to center. To detect a transfer shift of a transfer mechanism (TRM), at first, the dummy substrate (17) is centered to a placing table (14) on the placing table (14) or at an upper position thereof by engagement of the first and the second guides (G1, G2). The dummy substrate (17) centered in such a manner is received by the transfer mechanism (TRM) and transferred to a detector (11). Then, a detection value of a decentering quantity and that in a decentering direction of the dummy substrate (17) are obtained by the detector (11), and a transfer shift of the transfer mechanism (TRM) is obtained based on the detection values.

Abstract: In order to provide a treatment apparatus for treating workpieces or groups of workpieces that are conveyed from an inlet to an outlet of the treatment apparatus, wherein the treatment apparatus comprises a plurality of treatment levels and with said treatment apparatus the workpieces to be treated are passed from level to level in a safe and controlled manner, it is proposed that the treatment apparatus comprises a housing and receiving chambers, which rotate relative to the housing, for receiving the workpieces or groups of workpieces, wherein the receiving chambers are disposed in at least two different chamber levels and an outlet opening in the housing is associated with a first chamber level, through which the workpieces or groups of workpieces travel first, and an inlet opening is associated with a second chamber level, through which the workpieces or groups of workpieces travel after the first chamber level, and wherein the treatment apparatus comprises at least one transfer apparatus, which moves the

Abstract: A system which performs heating or the like with respect to a workpiece in a production system for a mechanical product such as a motor, and a production system including this system, for decreasing line inventories, continuously maintaining the cleanliness, and decreasing an installation space. The system comprises: a carriage device (41a, 41b) which is arranged in an oven (40) capable of accommodating a plurality of workpieces (2) and carries each workpiece (2) to a supply side or a discharge side in the oven (40); and a control portion which controls the carriage device (41a, 41b). The carriage device (41a, 41b) is operated in accordance with each workpiece (2), and heat treatment statuses of the workpieces (2) are individually managed in the oven (40). The carriage device (41a, 41b) is set in such a manner that an operation drive device (43) as a drive mechanism thereof is positioned outside the oven (40) and only an operation end (41a) which holds the workpiece (2) enters the oven (40).

Abstract: A system for the plasma treatment of parts. The system includes a chamber base sealingly engageable with a reaction chamber to form a treatment chamber and a lifting device operable to lift the reaction chamber from the chamber base. A transfer mechanism is operable to transfer parts along a guide to multiple treatment positions within the treatment chamber when the reaction chamber is disengaged from the chamber base. An electronic control system controls the transfer mechanism for transferring the plurality of parts to the treatment positions. The parts are treated with a plasma produced within the treatment chamber by a plasma-generating device.

Abstract: A sterilization tunnel for pharmaceutical containers such as vials has an inlet zone, a sterilization zone, and a cooling zone. A conveyor belt for the vials is disposed inside the sterilization tunnel. An emptying device that can be raised and lowered is disposed in the vicinity of the cooling zone. In order to empty the sterilization tunnel, the frame-shaped emptying device is lowered onto the conveyor belt and then pushes an emptying slider, which is being moved through the sterilization tunnel together with the last vials disposed on the conveyor belt, out from the sterilization tunnel. The emptying device permits a particularly simple operation of the sterilization tunnel.

Abstract: A test handler for automatically testing rambus type semiconductor devices.

Abstract: A vertical multiple stage oven includes a first plurality of ovens in a vertical arrangement, and a second plurality of ovens in a vertical arrangement positioned adjacent the first plurality of ovens. An access port is provided to the first plurality of ovens and an exit port is provided from the second plurality of ovens. A coupling port couples the first plurality of ovens to the second plurality of ovens. A continuous pathway is defined through the first plurality of ovens and through the second plurality of ovens from the access port, through the coupling port to the exit port. Each oven is sealed from adjacent ovens by trays moving along the pathway.

Abstract: A thermal processor for treating a plurality of semiconductor articles introduced into the processor and pods includes a work-in-process stocker and furnace combination. The stocker includes a loading port, shelves for storing pods and a loadport. The loadport includes a pod opener and is positioned at a port through to the furnace housing. The pod opener may be an indexer for an SMIF pod or a FOUP loadport for handling a 300 mm. wafer pod. A manipulator within the stocker operates to receive and output pods from the processor, present pods to the loadport for loading and unloading and warehousing pods between such operations. In one embodiment, the manipulator operates in an X-axis, Y-axis horizontal plane as well as in a Z-axis direction and rotation about the Z-axis. In the other, the Y-axis degree of freedom is eliminated.

Abstract: A pusher furnace for heating workpieces has an elongate and generally horizontally extending chamber housing a plurality of trays to receive workpieces thereon to be heated within the chamber. The chamber is divided into at least two generally parallel rows of a plurality of trays and pusher mechanisms are provided adjacent each end of the chamber to push the trays along the rows to circulate them within the chamber. In one embodiment, the chamber is divided into three rows of trays wherein a pusher mechanism alternately transfers work trays from one row to the other rows. Each work tray is provided with a plurality of opposed slots at the upper and lower surface thereof so that work engaging fingers can be inserted into the slots for engaging underneath the workpieces for transfer to and from the furnace.

Abstract: A system for applying a heat-shrinkable sleeve or label to a container such as a vial for pharmaceuticals includes a novel heat tunnel assembly. The heat tunnel assembly, in a preferred embodiment, includes a conveyor for moving the sleeved containers past a heat source. The conveyor has a plurality of rollers upon which the sleeved containers are supported and rotated. The rollers turn at a first rate during initial shrinkage of the sleeve, and at a second, slower, rate after the initial shrinkage has occurred to reduce distortion and unwanted displacement of the label during its application. The heat tunnel assembly also includes a system for withdrawing the heat source from the vicinity of the conveyor should unexpected circumstances arise.

Abstract: This invention relates to apparatus for quantitatively analyzing a gaseous mixture for its components. A predetermined volume of a gaseous mixture of combustion products component is collected in a gas mixer up to a preselected pressure. A portion of the mixture is discharged successively through the tubular column and a sample chamber for a predetermined time period with the mixture being initially at the preselected pressure in the volume means. Detection of delayed output of gas constitutents from the column provides an analysis of constituents. The apparatus further comprises a furnace, a magazine for holding the plurality of test samples, a transfer device connected to the furnace for sequentially transferring a successive sample from the magazine to the furnace, and a furnace seal integral with the transfer device for temporal sealing of the furnace from ambient atmosphere after the sample is transferred to the furnace until subsequent transferral.

Abstract: The circuit board plasma etching apparatus includes a preheating chamber, a plasma reaction chamber and a cooling chamber for etching circuit boards with plasma in a quasi continuous operation. The plasma reaction chamber is sealed by a gas-tight preheating sealing slide adjacent the preheating chamber and by a gas-tight cooling sealing slide adjacent the cooling chamber. A preheating door selectively closes the preheating entry end and a cooling door selectively closes the cooling chamber exit end. Boards to be etched are placed in printed circuit board cages supported by a guide rail within the chambers. The guide rail is separable into a preheating segment, a reaction chamber segment and a cooling segment contained within the respective chambers. A preheating chamber bellows allows axial movement of the preheating door, as does a cooling chamber bellows for the cooling chamber door. Axial displacement of the doors allows selective segmentation of the guide rail.

Abstract: Disclosed is a furnace having a furnace chamber formed with a work inlet and a work outlet, and a work mount turntable rotatably provided within the furnace chamber, the furnace further comprising work carry-in means for carrying a work while mounting the work thereon into the furnace chamber through work inlet to transfer the work onto given one of work mount portions on the turntable, and work carry-out means for carrying a work mounted on one of the the work mounts out of the work outlet while mounting the work thereon. Each of the work mounts, the work carry-in means, and the work carry-out means is constituted by a plurality of strip members disposed at regular intervals. The respective strip members of each of the work carry-in means and the work carry-out means are arranged to move up and down passing through the gaps formed between the adjacent strip members of the work mounts.

Abstract: The specification discloses an analyzer having a furnace defining a furnace chamber and including a floor with an aperture communicating with the chamber. A sample-supporting platform is provided and movable between an analyzing position within said furnace chamber and a loading position below the level of, and out from under, the furnace. A plurality of heating elements extend into the furnace chamber and are insulatively sealed therein by a pair of slotted members which cooperate to reduce airflow along the elements.

Abstract: A continuous heating or pusher-type furnace for the heat treatment of small arts, by which in a closed furnace chamber glide tracks are provided for the intermittent feeding of basket cars in a row between a loading station and a discharge station which is connected gas-tight to the furnace chamber, in the vicinity of which stations there is arranged respectively a reversing device for the translation of the individual baskets from one glide track to the other glide track, whereby the filled baskets automatically can be inserted into the discharge station, and can be emptied by a tipping device with a connecting gravity chute into a quenching bath. The glide tracks with the loading station and the discharging station lie on one plane and at least two glide tracks are provided for the transportation of the filled baskets, the two glide tracks being symmetrically arranged relative to a glide track provided for the return transportation of the emptied baskets.