Abstract: A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

Abstract: A method of manufacturing an integrated circuit. This method includes forming an epitaxial material comprising single crystal piezo material overlying a surface region of a substrate to a desired thickness and forming a trench region to form an exposed portion of the surface region through a pattern provided in the epitaxial material. Also, the method includes forming a topside landing pad metal and a first electrode member overlying a portion of the epitaxial material and a second electrode member overlying the topside landing pad metal. Furthermore, the method can include processing the backside of the substrate to form a backside trench region exposing a backside of the epitaxial material and the landing pad metal and forming a backside resonator metal material overlying the backside of the epitaxial material to couple to the second electrode member overlying the topside landing pad metal.

Abstract: A wet tantalum electrolytic capacitor containing a cathode, fluidic working electrolyte, and anode formed from an anodically oxidized sintered porous tantalum pellet is provided. The pellet is formed from a pressed tantalum powder. The tantalum powder is formed by reacting a tantalum oxide compound, for example, tantalum pentoxide, with a reducing agent that contains a metal having an oxidation state of 2 or more, for example, magnesium. The resulting tantalum powder is nodular or angular and has a specific charge that ranges from about 11,000 ?F*V/g to about 14,000 ?F*V/g. Using this powder, wet tantalum electrolytic capacitors have breakdown voltages that ranges from about 250 volts to about 400 volts. This makes the electrolytic capacitors ideal for use in an implantable medical device.

Abstract: A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

Abstract: Some embodiments include a magnetic tunnel junction device having a first magnetic electrode, a second magnetic electrode, and a tunnel insulator material between the first and second magnetic electrodes. A tungsten-containing material is directly against one of the magnetic electrodes. In some embodiments the tungsten-containing material may be in a first crystalline lattice arrangement, and the directly adjacent magnetic electrode may be in a second crystalline lattice arrangement different from said first crystalline lattice arrangement. In some embodiments the tungsten-containing material, the first magnetic electrode, the tunnel insulator material and the second magnetic electrode all comprise a common crystalline lattice arrangement.

Abstract: A reduction device using a liquid metal, which can improve the oxidation reaction of a reducing agent for reducing a material to be reduced using a liquid metal, while simultaneously effectively controlling the same. The reduction device according to the present invention comprises: a storage unit in which the liquid metal is supplied and stored; a reducing agent positioned in the storage unit; a reduction unit positioned on a side of the storage unit, which receives a material to be reduced and enables fluid communication with the storage unit; and a liquid metal storage unit. According to the present invention, a reducing agent, which has strong reducing ability, is sublimated using a liquid metal, thereby further improving the reduction capability, and the same is also controlled precisely, thereby removing restrictions on use resulting from the explosive reaction of the reducing agent and guaranteeing efficient operation.

Abstract: A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

Abstract: A method for providing a tantalum powder with a piece+block structure, comprising the following steps: 1) providing a granulous tantalum powder, and dividing same into a first part and a second part; 2) putting the first part of the tantalum powder in a ball mill for ball milling, taking the powder out after the ball milling and sieving same, and obtaining a tantalum powder in the form of a piece; 3) mixing the tantalum powder in the form of a piece and the second part of the tantalum powder to obtain a mixture, and preferably, the mixing proportion of the tantalum powder in the form of a piece and the granulous tantalum powder being 1:0.1˜1, preferably being 1:0.25˜0.8, and more preferably being 1:0.4˜0.6; and 4) performing the steps of water washing, acid washing, and nodularization on the mixture to finally obtain a tantalum powder with a piece+block structure.

Abstract: In various embodiments, superconducting wires feature assemblies of clad composite filaments and/or stabilized composite filaments embedded within a wire matrix. The wires may include one or more stabilizing elements for improved mechanical properties.

Abstract: A material for components of a gas turbine, in particular a jet aircraft engine, is disclosed. The material contains an amount of a ferritic phase with Fe and Al and an amount of at least one Laves phase, where the amount of the at least one Laves phase constitutes the largest amount of the material.

Abstract: Identifying a stable phase of a binary alloy comprising a solute element and a solvent element. In one example, at least two thermodynamic parameters associated with grain growth and phase separation of the binary alloy are determined, and the stable phase of the binary alloy is identified based on the first thermodynamic parameter and the second thermodynamic parameter, wherein the stable phase is one of a stable nanocrystalline phase, a metastable nanocrystalline phase, and a non-nanocrystalline phase.

Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.

Abstract: Provided is a tantalum sputtering target, which is characterized that an average crystal grain size of the target is 50 ?m or more and 200 ?m or less, and variation of a crystal grain size in the target plane is 40% or higher and 60% or less. This invention aims to provide a tantalum sputtering target capable of improving the uniformity of the film thickness and reducing the variation of the resistance value (sheet resistance).

Abstract: A bicontinuous non-porous microstructure comprising a refractory phase and a non-refractory phase, wherein the refractory phase substantially comprises one or more refractory elements and the non-refractory phase comprises a void filled by one or more materials that are different than a material comprising the non-refractory phase in a bicontinuous network from which the nanocomposite refractory material is formed and methods of making the same are disclosed.

Abstract: Method for manufacturing a zinc-coated nonferrous metal component for the production of a corrosion-protected vehicle body in a mixed construction includes providing an untreated nonferrous metal component and applying a coating by zinc diffusion onto the nonferrous metal component. A zinc dust mixture is diffused at a temperature of from 300 to 600° C. so as to form a zinc diffusion layer.

Abstract: The invention provides tantalum alloys, methods for forming tantalum alloys having a luminous, black, ceramic surface, and articles, such as, but not limited to, jewelry and watches, formed from the tantalum alloys.

Abstract: The present invention provides a cold sprayed layer of tungsten, molybdenum, titanium, zirconium, or of mixtures of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of two or more of tungsten, molybdenum, titanium and zirconium, or of alloys of tungsten, molybdenum, titanium, zirconium with other metals, wherein the cold spayed layer has an oxygen content of below 1,000 ppm.

Abstract: A ductile alloy is provided comprising molybdenum, chromium and aluminum, wherein the alloy has a ductile to brittle transition temperature of about 300 C after radiation exposure. The invention also provides a method for producing a ductile alloy, the method comprising purifying a base metal defining a lattice; and combining the base metal with chromium and aluminum, whereas the weight percent of chromium is sufficient to provide solute sites within the lattice for point defect annihilation.

Abstract: Provided in one embodiment is a method of identifying a stable phase of an ordering binary alloy system comprising a solute element and a solvent element, the method comprising: determining at least three thermodynamic parameters associated with grain boundary segregation, phase separation, and intermetallic compound formation of the ordering binary alloy system; and identifying the stable phase of the ordering binary alloy system based on the first thermodynamic parameter, the second thermodynamic parameter and the third thermodynamic parameter by comparing the first thermodynamic parameter, the second thermodynamic parameter and the third thermodynamic parameter with a predetermined set of respective thermodynamic parameters to identify the stable phase; wherein the stable phase is one of a stable nanocrystalline phase, a metastable nanocrystalline phase, and a non-nanocrystalline phase.

Abstract: A method for increasing surface area of a valve metal particle is provided as is an improved valve metal particle provided thereby. The method includes charging a mill apparatus with a valve metal powder and a media wherein the media has an average diameter of at least 0.01 cm to no more than 0.3175 cm. The valve metal powder is then milled at an average kinetic energy of no more than 3,000 ergs per media particle to obtain a milled powder.

Abstract: Medical devices that include a Ni—Ti ternary alloy and methods for their manufacture. The medical devices described herein include at least one part fabricated from the Ni—Ti ternary alloy. In the Ni—Ti alloys, the ternary alloying element is selected to be compatible with Ni—Ti. Example Ni—Ti ternary alloys include nickel (Ni), titanium (Ti), and one or more of tantalum (Ta), hafnium (Hf), vanadium (V), zirconium (Zr), scandium (Sc), or yttrium (Y). By virtue of their compatibility with Ni—Ti, additions of the ternary alloying element(s) may substitute for titanium in the Ni—Ti phase up to the solubility of the ternary element and the remainder can exist as a second phase whose mechanical properties resemble that of the pure ternary element and whose elastic modulus exceeds that of the Ni—Ti matrix.

Abstract: Provided is a tantalum sputtering target having a (200)-plane orientation ratio of 70% or less and a (222)-plane orientation ratio of 10% or more at the sputtering surface of the tantalum sputtering target. The sputter rate can be increased by controlling the crystalline orientation of the target, and thereby a film having an intended thickness can be formed in a short time to improve the throughput.

Abstract: A component for a steel pickling apparatus is formed from an alloy that predominately comprises niobium and tantalum. The component may be a heat exchanger component, such as a tube or tubesheet liner, formed from the alloy that predominately comprises niobium and tantalum. Also, disclosed is a heat exchanger including the component, a system and method for pickling using the heat exchanger, and a method of manufacturing a steel product including the method of pickling.

Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.

Abstract: The present invention relates to a medical device or implant made at least in part of a high-strength, low-modulus metal alloy comprising niobium, tantalum, and at least one element selected from the group consisting of zirconium, tungsten, and molybdenum. The medical devices according to the present invention provide superior characteristics with regard to biocompatibility, radio-opacity and MRI compatibility.

Abstract: A titanium alloy includes 15 to 27 atomic % (at %) of tantalum (Ta) and 0 to 8 at % of tin (Sn), the balance being titanium (Ti) and unavoidable impurities, when the entire amount of the titanium alloy is taken as 100 at %. Therefore, the titanium alloy provided has characteristics suitable for medical device materials, biocompatible materials, etc.

Abstract: Recovery of a metal from scrap materials or other source materials containing two or more metals or other materials by iodization of the materials or parts of them to create multiple metal iodides of respective metals, separating the iodides and dissociating at least one of the iodides to recover its metal component.

Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.

Abstract: The present invention relates to a medical device or implant made at least in part of a high strength, low modulus metal alloy comprising Niobium, Tantalum, and at least one element selected from the group consisting of Zirconium, Tungsten and Molybdenum. The medical devices according to the present invention provide superior characteristics with regard to biocompatibility, radio-opacity and MRI compatibility.

Abstract: A metallic material is made from at least one refractory metal or an alloy based on at least one refractory metal. The metallic material has an oxygen content of about 1,000 to about 30,000 ?g/g and the oxygen is interstitial.

Abstract: The present invention relates to a medical device or implant made at least in part of a high-strength, low-modulus metal alloy comprising niobium, tantalum, and at least one element selected from the group consisting of zirconium, tungsten, and molybdenum. The medical devices according to the present invention provide superior characteristics with regard to biocompatibility, radio-opacity and MRI compatibility.

Abstract: Extruded tantalum billets and niobium billets are described having a substantially uniform grain size and preferably an average grain size of about 150 microns or less and more preferably an average grain size of about 100 microns or less. The extruded billet can then be forged or processed by other conventional techniques to form end use products such as sputtering targets. A process for making the extruded tantalum billets or niobium billets is also described and involves extruding a starting billet at a sufficient temperature and for a sufficient time to at least partially recrystallize the billet and form the extruded billet of the present invention.

Abstract: Nanomaterial preparation methods, compositions, and articles are disclosed and claimed. Such methods can provide nanomaterials with improved morphologies relative to previous methods. Such materials are useful in electronic applications.

Abstract: Provided is a sputtering target in which the ratio of X-ray intensity of (110) measured with X-ray diffraction is 0.4 or less, and even 0.2 or less in a Ta or Ta alloy target. Further provided is a sputtering target in which the ratio of X-ray intensity of (110) on a Ta or Ta alloy target surface measured with X-ray diffraction is 0.8 or less, and the ratio of the foregoing X-ray intensity at a depth of 100 ?m or deeper is 0.4 or less. This Ta or Ta alloy target is capable of minimizing the fluctuation of the deposition speed for each target throughout the target life of a sputtering target, and thereby improving and stabilizing the production efficiency of semiconductors during the sputtering process, and contributing to the reduction of production costs.

Abstract: A catalyst is provided and includes fine catalyst particles of a composition represented by formula (1): PtuRuxTayTz, in which T is at least one element selected from the group consisting of Hf, W, Ni, and V; u, x, y, and z are 10 to 98.9 atm %, 0.1 to 50 atm %, 0.5 to 35 atm %, and 0.5 to 35 atm %, respectively, or formula (2): PtuRuxTayTz, in which T is at least one element selected from the group consisting of Ct, Mo, Nb, Zr, and T; u, x, y, and z are 40 to 70 atm %, 0.1 to 50 atm %, 0.5 to 15 atm %, and 0.5 to 15 atm %, respectively.

Abstract: Catalysts are provided which can catalyze both the oxygen reduction during the discharge of a secondary air battery and the oxygen production in the recharging of the battery and which are stable at a high potential in the recharging. The invention has been accomplished based on the finding that a catalyst including an oxycarbonitride of a specific transition metal selected from, for example, titanium, zirconium, hafnium, vanadium, niobium and tantalum can catalyze both the oxygen reduction during the discharge of a secondary air battery and the oxygen production in the recharging of the battery and is also stable at a high potential in the recharging.

Abstract: One aspect relates to a method for producing an alloy, whereby the alloy consists of three metals and the three metals are selected from the group consisting of tantalum, tungsten, and niobium. The method according to one embodiment is characterized by a) grinding the tantalum to form a tantalum powder and grinding the tungsten to form a tungsten powder; b) mixing the tantalum powder and the tungsten powder to form a blended powder, whereby the weight fraction of tungsten powder in the blended powder is larger than in the desired alloy; c) producing a blended body from the blended powder by means of a powder metallurgical route; d) producing a pre-alloy by means of a first melting of the blended body and at least a fraction of at least one further metal by means of a melt metallurgical route; and e) producing the alloy by means of a second melting of the pre-alloy and the remaining fraction of at least one metal by means of a melt metallurgical route.

Abstract: A method of making sputter targets from a BCC metal or BCC metal alloy is provided. The ingot is e-beamed melted and subjected to vacuum arc reduction. The ingot is then tri-axially forged, keeping the centerline of the ingot in the center of the ingot during the tri-axial forging step. The ingot is then vacuum annealed and clock rolled. During the clock rolling, the center line of the ingot is maintained in the center of the ingot and perpendicular to the compressive forces used during the clock rolling. The clock rolled ingot is then vacuum annealed and provided in a near net shape for usage as a sputter target. Tantalum target materials are disclosed having a purity of at least 99.5% and an interstitial content (CONH) of less than about 25 ppm. Tantalum targets, in accordance with the invention, have a grain size of about 50 to 100 microns and a mixed {100}/{111} texture with a higher % {111} gradient towards the center.

Abstract: A Titanium-Tantalum base shape memory alloy is provided which possesses high machinability and is suitable for repeated high temperature operation. The Titanium-Tantalum base shape memory alloy consists of 15 mol %-40 mol % Tantalum, additive elements, and the balance Titanium and impurities.

Abstract: A highly heat resistant wire based on niobium or tantalum or niobium tantalum alloy for single-side socket lamps is enriched, according to the invention, with phosphorus and converted into an annealed state. The wire exhibits a yield strength Rp 0.2 of at least 200 MPa or a tensile strength Rm of at least 300 MPa. For the production of a frame for single-side socket lamps, a metal based on niobium or tantalum or an alloy thereof is doped with phosphorus and the doped metal is cold shaped into a wire, this wire is annealed and formed into a frame. This frame is used for the simultaneous current supply and holding of a burner in a single-side socket lamp.

Abstract: Processes comprising: melting a mixture comprising a valve metal precursor and a diluting agent in at least one first vessel under a first set of temperature and residence time conditions; transferring the mixture to at least one second vessel; and initiating, in the at least one second vessel, a reaction of the valve metal precursor to form a valve metal under a second set of temperature and residence time conditions; valve metal powder prepared thereby and uses therefor.

Abstract: A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

Abstract: Process for the production of valve metal powders, in particular niobium and tantalum powder, by reduction of corresponding valve metal oxide powders by means of vaporous reducing metals and/or hydrides thereof, preferably in the presence of an inert carrier gas, wherein the reduction is performed at a vapor partial pressure of the reducing metal/metal hydride of 5 to 110 hPa and an overall pressure of less than 1000 hPa, and tantalum powder obtainable in this way having a high stability of the powder agglomerate particles.

Abstract: The present invention is directed to a process for the preparation of a metal powder having a purity at least as high as the starting powder and having an oxygen content of 10 ppm or less comprising heating said metal powder containing oxygen in the form of an oxide, with the total oxygen content being from 50 to 3000 ppmf in an inert atmosphere at a pressure of from 1 bar to 10?7 to a temperature at which the oxide of the metal powder becomes thermodynamically unstable and removing the resulting oxygen via volatilization. The metal powder is preferably selected from the group consisting of tantalum, niobium, molybdenum, hafnium, zirconium, titanium, vanadium, rhenium and tungsten. The invention also relates to the powders produced by the process and the use of such powders in a cold spray process.

Abstract: The present invention relates to the tantalum powder and the process for preparing the same, and also relates to the electrolytic capacitor anode made of the tantalum powder. More particularly, the present invention relates to the tantalum powder having a BET surface area not more than 0.530 m2/g, Fisher mean particle size not less than 3.00 ?m. The present invention relates to the process for preparing the tantalum powder, wherein the tantalum powder is prepared through reducing tantalum compound with a reducing agent, wherein the tantalum powder as seed is added during reduction, and said tantalum powder as seed is the tantalum powder that has been milled.

Abstract: A process and system for producing tantalum or other valve metal particles is provided comprising forming tantalum particles in a reduction process carried out in a reactor vessel, and using a siphon to transfer fine tantalum particles out of the reaction mixture to a recovery vessel. This particle transfer can occur while the reaction mixture is agitated. The tantalum particles can be automatically withdrawn when the reaction mixture has a depth level greater than the fluid level of the tantalum fine particle recovery vessel, and outflow automatically stops when the fluid levels of the reactor and particle recovery vessel equilibrate. Tantalum or other valve metal powders made by the processes, and capacitors made with valve metal powders are also provided.

Abstract: High purity refractory metals, valve metals, refractory metal oxides, valve metal oxides, or alloys thereof suitable for a variety of electrical, optical and mill product/fabricated parts usages are produced from their respective oxides by metalothermic reduction of a solid or liquid form of such oxide using a reducing agent that establishes (after ignition) a highly exothermic reaction, the reaction preferably taking place in a continuously or step-wise moving oxide such as gravity fall with metal retrievable at the bottom and an oxide of the reducing agent being removable as a gas or in other convenient form and unreacted reducing agent derivatives being removable by leaching or like process.

Abstract: Disclosed is a method of applying coatings to surfaces, wherein a gas flow forms a gas-powder mixture with a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, nickel, cobalt, iron, chromium, aluminum, silver, copper, mixtures of at least two thereof or their alloys with at least two thereof or with other metals, the powder has a particle size of from 0.5 to 150 ?m, an oxygen content of less than 500 ppm oxygen and a hydrogen content of less than 500 ppm, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed onto the surface of an object. The coatings prepared are used, for example, as corrosion protection coatings.

Abstract: Implantable medical devices made from a single beta phase Tantalum alloy utilizing Titanium as an alloying agent that are biocompatible, radiopaque and visible under x-ray and fluoroscopy, the alloy having mechanical properties that allow it to be machined by conventional, machining methods for forming the devices, and a method for making the alloy. The alloy is between approximately 10 percent and 25 percent Ti by weight and preferably has a density of 12 g/cm3 or greater.

Abstract: A titanium based carbonitride alloy containing Ti, Nb, W, C, N and Co. The alloy also contains, in addition to Ti, 9-14 at % Co with only impurity levels of Ni and Fe, 1-<3 at % Nb, 3-8 at % W and has a C/(C+N) ratio of 0.50-0.75. The amount of undissolved Ti(C,N) cores should be kept between 26 and 37 vol % of the hard constituents, the balance being one or more complex carbonitrides containing Ti, Nb and W. The alloy is particularly useful for milling of steel.