Abstract: Described methods are useful for depositing a silicon carbide film including Alpha-SiC at low temperatures (e.g., below about 1400° C.), and resulting multi-layer structures and devices. A method includes introducing a chlorinated hydrocarbon gas and a chlorosilicon gas into a reaction chamber, and reacting the chlorinated hydrocarbon gas with the chlorosilicon gas at a temperature of less than about 1400° C. to grow the silicon carbide film. The silicon carbide film so-formed includes Alpha-SiC.
Abstract: A graphite crucible for silicon single crystal manufacturing by the Czochralski method, having a long life cycle, contains at least one gas venting hole provided in a corner portion of the crucible. Gas generated by reaction between the graphite crucible and a quartz crucible is released to the outside through the gas venting hole, and formation of SiC on the surface of the graphite crucible and deformation of the quartz crucible caused by the pressure of the generated gas are prevented.
Abstract: A system is provided for analyzing a plurality of samples in a furnace. The system includes an upper holder including at least one opening adapted to engage at least one upper crucible. The system also includes a lower holder including at least one opening adapted to engage at least one lower crucible. The system includes a scale adapted to receive a lower crucible and weigh the lower crucible. The scale is further adapted to receive a combination of an upper crucible stacked on the lower crucible and weigh the combination. The system also includes means for moving the upper holder and the lower holder relative to each other and relative to the scale so that the scale selectively receives the lower crucible and the combination of the upper crucible stacked on the lower crucible. A method of testing samples in a furnace is provided.
Abstract: Proposed is a zirconium crucible used for melting an analytical sample in the pretreatment of the analytical sample, wherein the purity of the zirconium crucible is 99.99 wt % or higher. In light of the recent analytical technology demanded of fast and accurate measurement of high purity materials, the present invention provides a zirconium crucible for melting an analytical sample, a method of preparing such analytical sample, and a method of analysis that enables the analysis of high purity materials by inhibiting the inclusion of impurities from the crucible regardless of difference in the analysts and their skill.
Abstract: A silica glass crucible is manufactured by introducing into a rotating crucible mold bulk silica grain to form a bulky wall including a bottom wall and a side wall. After heating the interior of the mold to begin to fuse the bulk silica grains, an inner silica grain, doped with aluminum, is introduced. The heat at least partially melts the inner silica grain, allowing it to fuse to the wall to form an inner layer. The crucible is cooled, the fused silica grains forming nuclei of crystalline silica within the inner layer.
Type:
Grant
Filed:
July 16, 2001
Date of Patent:
October 10, 2006
Assignee:
Heraeus Shin-Etsu America
Inventors:
Katsuhiko Kemmochi, Robert O. Mosier, Paul G. Spencer
Abstract: Disclosed is a multilayer structured quartz glass crucible, for pulling up silicon single crystal, whose structure has at least three layers comprising: a translucent outer layer made of naturally occurring quartz glass and having a large number of pores, a translucent intermediate layer, made of synthetic quartz glass and having a large number of pores, and a transparent inner layer substantially free from pores and made of a synthetic quartz glass. Thermal convection within the silicon melt is suppressed by use of the quartz glass crucible, thereby preventing oscillation on the surface of the silicon melt. A method for producing the quartz glas crucible is also disclosed.
Abstract: A crucible 40 having an inner surface 42 not wetted by a melt which shrinks when it solidifies is provided with indentations 41 in the walls of the crucible to support an ingot grown in it. Supporting the crystal provides a gap between the bottom of the ingot 44 and the inner surface of the bottom of the crucible. The gap allows more uniform heat transfer from the bottom of the crucible than is provided when there is no gap; the gap provides a controllable temperature gradient between the interior and exterior of the crucible. To direct propagation of the growth of a macrocrystal, the bottom of the crucible is provided with at least one set of multiple grooves in parallel relationship with each other. Preferably a second set of multiple grooves in parallel relationship with each other intersect the grooves of the first set at an angle chosen depending upon the lattice structure of the macrocrystal to be grown. A macrocrystal grown in a crucible with twin sets of angulated grooves produces single crystals.