Diamond-like Carbon Coating (i.e., Dlc) Patents (Class 427/902)
  • Patent number: 8778295
    Abstract: Disclosed is a combinatorial synthesis of Diamond wherein a first reactive species is produced by catalytic treatment of Acetylene, a second reactive species is produced by decomposition of a hydrocarbon source having a low Hydrogen-to-Carbon ratio using a high energy discharge, and the two reactive species so obtained are combined in the vapor phase to yield Diamond without the need of post-treatments. The reaction is efficient and affords Diamond under mild conditions with high purity such that it may be useful for producing Diamond for semiconductor and microelectronics applications.
    Type: Grant
    Filed: August 5, 2011
    Date of Patent: July 15, 2014
    Inventor: Daniel Hodes
  • Patent number: 8691386
    Abstract: A bonded body 10 of a carbon film covered article and a rubber is formed by bonding a carbon film covered article 13 having a carbon film 12 formed on a surface of an article 11 to an unvulcanized rubber 14 by affixing and vulcanizing. Thereby, a bonded body of rubber and, for example, metal can be provided without the need for an adhesive.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: April 8, 2014
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Kazuto Yamakawa, Yuusuke Matsuya
  • Patent number: 8475879
    Abstract: Polymer nanocomposites with improved resistance to high energy ionizing radiation. Certain embodiments involve methods for providing a nanocomposite material with resistance to high energy ionizing radiation using nanodiamond, zinc oxide and mixtures of these nanoparticles with other nanoparticles dispersed within the matrix. Other embodiments relate to methods of delivering and dispersing the nanoparticles through the material or a surface layer. Other embodiments include methods of forming chemical bonds between the nanoparticles and the material. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: July 2, 2013
    Assignee: International Technology Center
    Inventors: Vesna Borjanovic, Olga Alexander Shenderova, Gary Elder McGuire
  • Patent number: 8187671
    Abstract: There is provided a method of making a heat treated (HT) coated article to be used in shower door applications, window applications, or any other suitable applications where transparent coated articles are desired. For example, certain embodiments of this invention relate to a method of making a coated article including a step of heat treating a glass substrate coated with at least a layer of or including diamond-like carbon (DLC) and an overlying protective film thereon. In certain example embodiments, the protective film may be of or include both (a) an oxygen blocking or barrier layer, and (b) a release layer. Following and/or during heat treatment (e.g., thermal tempering, or the like) the protective film may be removed via blasting it off using particles mainly of material softer than the DLC. In certain example embodiments, the blasting particles may be of or include sodium bicarbonate and/or may be directed at the protective film at a blasting pressure of from about 2.5 to 7.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: May 29, 2012
    Assignee: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.)
    Inventor: Jean-Marc Sol
  • Patent number: 8056363
    Abstract: A method for providing a protective coating and enhanced optical qualities to a gemstone. The method includes coating a first portion and a second portion of a gemstone with TiO2 doped with calcium oxide (TiO2+). The TiO2+ coated gemstone is next coated with a diamond like carbon (DLC) coating. The gemstone may be synthetic or natural. The composite gemstone, having been coated with both TiO2 and DLC, exhibits high refractivity and enhanced wear resistance and color.
    Type: Grant
    Filed: June 16, 2008
    Date of Patent: November 15, 2011
    Assignee: Betterthandiamond, Inc.
    Inventor: Less Wright
  • Patent number: 7455883
    Abstract: A substrate is coated with a layer(s) or coating(s) that includes, for example, amorphous carbon in a form of diamond-like carbon (DLC). The DLC is then subjected to flame pyrolysis in order to cause the contact angle ? thereof to decrease.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: November 25, 2008
    Assignee: Guardian Industries Corp.
    Inventors: Rudolph Hugo Petrmichl, Joseph M. Bienkiewicz, Scott V. Thomsen
  • Patent number: 6827977
    Abstract: A method of making a coated article (e.g., window unit), and corresponding coated article are provided. A layer of or including diamond-like carbon (DLC) is formed on a glass substrate. Then, a protective layer is formed on the substrate over the DLC inclusive layer. During heat treatment (HT), the protective layer prevents the DLC inclusive layer from significantly burning off. Thereafter, the resulting coated glass substrate may be used as desired, it having been HT and including the protective DLC inclusive layer.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: December 7, 2004
    Assignee: Guardian Industries Corp.
    Inventor: Vijayen S. Veerasamy
  • Patent number: 6824836
    Abstract: A magnetic recording medium comprising a magnetic layer and a protective carbon-containing overcoat comprising a first carbon density, preferably of a low-density carbon, and a second carbon density different from the first carbon density, preferably of a high-density carbon, and a method of making and using the magnetic recording medium are disclosed.
    Type: Grant
    Filed: July 23, 2003
    Date of Patent: November 30, 2004
    Assignee: Seagate Technology LLC
    Inventors: Jing Gui, Michael Stirniman, Xiaoding Ma
  • Patent number: 6811610
    Abstract: Single crystal CVD diamond is heated to temperatures of 1500° C. to 2900° C. under a pressure that prevents significant graphitization. The result is a CVD diamond with improved optical properties.
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: November 2, 2004
    Assignee: Diamond Innovations, Inc.
    Inventors: Robert H. Frushour, Wei Li
  • Patent number: 6572935
    Abstract: A plasma-based method for the deposition of diamond-like carbon (DLC) coatings is described. The process uses a radio-frequency inductively coupled discharge to generate a plasma at relatively low gas pressures. The deposition process is environmentally friendly and scaleable to large areas, and components that have geometrically complicated surfaces can be processed. The method has been used to deposit adherent 100-400 nm thick DLC coatings on metals, glass, and polymers. These coatings are between three and four times harder than steel and are therefore scratch resistant, and transparent to visible light. Boron and silicon doping of the DLC coatings have produced coatings having improved optical properties and lower coating stress levels, but with slightly lower hardness.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: June 3, 2003
    Assignee: The Regents of the University of California
    Inventors: Xiao-Ming He, Deok-Hyung Lee, Michael A. Nastasi, Kevin C. Walter, Michel G. Tuszewski
  • Patent number: 6475565
    Abstract: The invention relates to a process for producing a clothing wire which is suitable for fitting to an opening-cylinder base body, wherein a raw wire which is customarily used to produce clothing wire is processed on end to form a wire coil, in which the teeth of the wire are perpendicular to the coil axis and which has a diameter which corresponds to the diameter of the opening-cylinder base body or differs by at most ±5% from the diameter of the opening-cylinder base body, and the wire coil is pushed loosely onto a support device and, together with this device, is introduced into an electroplating unit, the process steps which are customarily used for the chemical deburring of a raw wire and the nickel-diamond coating of a clothed opening cylinder taking place in the electroplating unit, and the clothing wire being removed from the electroplating unit.
    Type: Grant
    Filed: October 26, 2000
    Date of Patent: November 5, 2002
    Assignee: Elektroschmelzwerk Kempten GmbH
    Inventors: Jörg Lukschandel, Manfred Menge, Jürgen Meyer
  • Publication number: 20020048638
    Abstract: A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition system. The atmosphere that is subjected to microwave energy includes a source of carbon, nitrogen and hydrogen. The negative bias is maintained on the substrate through both the nucleation and growth phase of the film until the film is continuous. Biases between −100V and −200 are preferred. Carbon sources may be one or more of CH4, C2H2 other hydrocarbons and fullerenes.
    Type: Application
    Filed: July 14, 1999
    Publication date: April 25, 2002
    Inventors: DIETER M. GRUEN, ALAN R. KRAUSS, M. Q. DING, ORLANDO AUCIELLO
  • Patent number: 6224952
    Abstract: An abrasion-proof and static-erasing coating is formed on the contact surface of a contact image sensor. The coating comprises a first film having a high hardness and a low conductivity, a second film formed on the first film and having a low hardness and a high conductivity, and a third film having a high hardness and a high resistivity providing an abrasion-proof insulating external surface.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: May 1, 2001
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Kenji Itoh
  • Patent number: 6171456
    Abstract: The present invention relates to post manufacturing operations for improving the working life of known bonding tools such as capillaries, wedges and single point TAB tools of the type used in the semiconductor industry to make fine wire or TAB finger interconnections. After the desired bonding tool is manufactured to predetermined specifications, dimensions and tolerances, it is placed in a sputtering chamber with hard target material with an ionizing gas. A controlled volume of sputtered hard material is generated at high temperature by plasma ion bombardment and deposited onto the working face of the bonding tool while the tool is held at a temperature that prevents distortion. A very thin amorphous hard layer is bonded onto the working face of the bonding tool which increases the working life of most tools by an order of magnitude and there is no requirement for additional processing.
    Type: Grant
    Filed: August 2, 1999
    Date of Patent: January 9, 2001
    Assignee: Kulicke and Soffa Industries Inc.
    Inventors: Ilan Hadar, Beni Sonnenreich
  • Patent number: 6143142
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: November 7, 2000
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6110542
    Abstract: A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave of an electromagnetic wave having the same or different wavelength as that of the pulsed wave. The process enables deposition of a uniform film having an excellent adhesion to the substrate, at a reduced power consumption.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: August 29, 2000
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Akiharu Miyanaga, Tohru Inoue, Shunpei Yamazaki
  • Patent number: 6103305
    Abstract: A stress-relieved amorphous-diamond film is formed by depositing an amorphous diamond film with specific atomic structure and bonding on to a substrate, and annealing the film at sufficiently high temperature to relieve the compressive stress in said film without significantly softening said film. The maximum annealing temperature is preferably on the order of 650.degree. C., a much lower value than is expected from the annealing behavior of other materials.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: August 15, 2000
    Assignee: Sandia Corporation
    Inventors: Thomas A. Friedmann, John P. Sullivan
  • Patent number: 6090456
    Abstract: A new method for ion beam deposition of diamond-like carbon coatings onto a variety of substrates is described. A high power, radio frequency excited-inductively coupled ion gun directs a beam of carbon and hydrogen ions at a substrate inside an ultra vacuum deposition chamber. A four axis scanner is used for coating large and nonplaner substrates. A quadrupole mass spectrometer is mounted inside the deposition chamber for real time monitoring of ion composition. The disclosed method is particularly effective for coating zinc sulfide and zinc selenide infrared windows.
    Type: Grant
    Filed: May 3, 1997
    Date of Patent: July 18, 2000
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Richard L.C. Wu, William C. Lanter, Peter Bletzinger
  • Patent number: 6086962
    Abstract: A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 .ANG. per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively.
    Type: Grant
    Filed: February 3, 1999
    Date of Patent: July 11, 2000
    Assignee: Diamonex, Incorporated
    Inventors: Leonard Joseph Mahoney, David Ward Brown, Rudolph Hugo Petrmichl
  • Patent number: 6080445
    Abstract: A method of forming films over an insulating material is provided whereby an underlayer film having electric conductivity is formed on the surface of the insulating material constituting a base member, and a hard carbon film is formed over the underlayer film so that the surface electrical resistance value of the hard carbon film can be controlled so as not to cause the surface thereof to be charged with static electricity by varying an electrical resistance value of the underlayer film. In the case where the underlayer film is formed of a metal film composed of titanium, chromium, tungsten, or the like, the resistance value thereof can be changed by varying the thickness of the metal film. In the case where the underlayer film is formed of a semiconductor film composed of silicon, germanium, or the like, the resistance value thereof can be changed by varying the thickness of the semiconductor film, or the concentration of an impurity added thereto.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: June 27, 2000
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Osamu Sugiyama, Yukio Miya, Ryota Koike, Takashi Toida
  • Patent number: 6077572
    Abstract: A method of creating a diamond-like carbon film on a substrate, including the steps of exposing the substrate to a hydrocarbon gas environment and generating plasma in the environment of an electron density greater than approximately 5.times.10.sup.10 per cm.sup.3 and a sheath thickness less than about 2 mm under conditions of high ion flux and controlled, low energy ion bombardment.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: June 20, 2000
    Assignee: Northeastern University
    Inventors: Jeffrey A. Hopwood, David L. Pappas
  • Patent number: 6020036
    Abstract: A guide bush (11), coming in sliding contact with a workpiece, for use in an automatic lathe is placed in a vacuum vessel (61), and after inserting an auxiliary electrode (71), which is grounded or to which a positive DC voltage is applied, in the center bore (11j) of the guide bush (11), forming the inner surface (11b) thereof, the vacuum vessel (61) is evacuated such that an initially reached pressure therein is not higher than a predetermined degree of vacuum. Then, after a DC voltage is applied to an anode (79) and an AC voltage is applied to a filament (81) while applying a DC voltage to the guide bush (11), carbon-containing gas is fed into the vacuum vessel (61), producing a plasma therein and the pressure inside the vacuum vessel (61) is controlled to attain a film-forming pressure higher than the initially reached pressure while forming a hard carbon film over the inner surface of the guide bush (11) by means of a plasma CVD process.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: February 1, 2000
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Osamu Sugiyama, Yukio Miya, Ryota Koike, Takashi Toida, Toshiichi Sekine
  • Patent number: 5981000
    Abstract: A method for fabricating a thermally stable carbon-based low dielectric constant film such as a hydrogenated amorphous carbon film or a diamond-like carbon film in a parallel plate chemical vapor deposition process utilizing plasma enhanced chemical vapor deposition process is disclosed. Electronic devices containing insulating layers of thermally stable carbon-based low dielectric constant materials that are prepared by the method are further disclosed. In order to render the carbon-based low dielectric constant film thermally stable, i.e., at a temperature of at least 400.degree. C., the films are heat treated at a temperature of not less than 350.degree. C. for at least 0.5 hour. To enable the fabrication of thermally stable carbon-based low dielectric constant film, specific precursor materials such as cyclic hydrocarbons should be used, for instance, cyclohexane or benzene.
    Type: Grant
    Filed: April 10, 1998
    Date of Patent: November 9, 1999
    Assignee: International Business Machines Corporation
    Inventors: Alfred Grill, Christopher Vincent Jahnes, Vishnubhai Vitthalbhai Patel
  • Patent number: RE41189
    Abstract: Single crystal CVD diamond is heated to temperatures of 1500° C. to 2900° C. under a pressure that prevents significant graphitization. The result is a CVD diamond with improved optical properties.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: April 6, 2010
    Assignee: Carnegie Institution of Washington
    Inventors: Wei Li, Russell J. Hemley, Ho-kwang Mao, Chih-shiue Yan