Fullerene Type Base Or Coating Patents (Class 427/903)
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Patent number: 8734900Abstract: Provided are a process for economically preparing a graphene shell having a desired configuration which is applicable in various fields wherein in the process the thickness of the graphene shell can be controlled, and a graphene shell prepared by the process.Type: GrantFiled: December 1, 2011Date of Patent: May 27, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-young Choi, Hyeon-Jin Shin, Seon-mi Yoon
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Patent number: 8685160Abstract: Provided is a fullerene thin wires-attached substrate in which fullerene thin wires are vertically aligned relative to the surface of the substrate and which is applicable to catalysts, column materials, chemical synthesis templates, field emission devices, field effect transistors, photonic crystals, etc.Type: GrantFiled: August 29, 2008Date of Patent: April 1, 2014Assignee: National Institute for Materials ScienceInventors: Cha Seung, II, Kunichi Miyazawa, Jedeok Kim
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Patent number: 8075918Abstract: A carbon nanocapsule thin film and the preparation method thereof. A plurality of carbon nanocapsules are electroplated on a substrate, and the carbon nanocapsule thin film is thereby formed. By electroplating purified carbon nanocapsules on the substrate, the carbon nanocapsule thin film, electric- and heat-conductive, chemical-resistive, and anti-oxidizing, is formed.Type: GrantFiled: November 19, 2003Date of Patent: December 13, 2011Assignee: Industrial Technology Research InstituteInventors: Gan-Lin Hwang, Chao-Kang Chang, Shih-Jung Tsai, Tzy-Chin Day
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Patent number: 7998658Abstract: A first resist film is formed on a substrate, and first pattern exposure is performed such that the first resist film is irradiated with exposure light through a first mask. Then, the first resist film is developed, thereby forming a first resist pattern out of the first resist film. Subsequently, a nano-carbon material is attached to the surface of the first resist pattern, and then a second resist film is formed on the substrate including the first resist pattern. Thereafter, second pattern exposure is performed such that the second resist film is irradiated with exposure light through a second mask. Then, the second resist film is developed, thereby forming a second resist pattern out of the second resist film.Type: GrantFiled: April 26, 2010Date of Patent: August 16, 2011Assignee: Panasonic CorporationInventors: Masayuki Endou, Masaru Sasago
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Patent number: 7955663Abstract: Processes for the simultaneous and selective growth of single walled and multiwalled carbon nanotubes in a single set of experiments are disclosed. The processes may include preparing a graphite electrode rod containing catalyst selected from Fe, Co, Ni, and a mixture thereof, acting as an anode. The process may include preparing another graphite electrode rod, each electrode having a distal and a proximal end. The process may include placing the above said two electrodes parallel to each other and their axis being substantially aligned in a chamber. The process may further include creating a DC-arc discharge inside the chamber by applying a DC-current voltage. The process may further include an cooling assembly having a cooling coil that surrounds the two electrodes. The cooling assembly may be used to maintain a temperature gradient that permits the depositing of single walled and multiwalled carbon nanotubes simultaneously in one experiment.Type: GrantFiled: November 5, 2007Date of Patent: June 7, 2011Assignee: Council of Scientific and Industrial ResearchInventors: Rakesh Behari Mathur, Chhotey Lal Nil, Tersem Lal Dhami, Bhanu Pratap Singh, Anil Kumar Gupta, Jagdish Ghawana
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Patent number: 7767270Abstract: Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or NH3 or NF3 or F2 or CF4 or CnHm) is irradiated to provide a cold plasma of selected target particles, such as atomic H or F, in a first chamber. The target particles are directed toward an array of CNTs located in a second chamber while suppressing transport of ultraviolet radiation to the second chamber. A CNT array is functionalized with the target particles, at or below room temperature, to a point of saturation, in an exposure time interval no longer than about 30 sec. The predominant species that are deposited on the CNT array vary with the distance d measured along a path from the precursor gas to the CNT array; two or three different predominant species can be deposited on a CNT array for distances d=d1 and d=d2>d1 and d=d3>d2.Type: GrantFiled: March 22, 2006Date of Patent: August 3, 2010Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Bishun N. Khare, Meyya Meyyappan
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Patent number: 7731927Abstract: A method by which ceramic nanowires with diameters ranging from several to several tens of nanometers can be synthesized with improvements in the shape retention of the nanowires and the yield of conversion to ceramic, which method comprises the steps of forming a thin film of a silicon-containing polymer usable as a ceramic precursor, irradiating the thin film with ion beams to form cylindrical crosslinked portions, extracting the un-crosslinked portions with a solvent to produce nanowires of the silicon-containing polymer, irradiating the nanowires with an ionizing radiation so that they are crosslinked again, and firing the re-crosslinked nanowires.Type: GrantFiled: September 14, 2006Date of Patent: June 8, 2010Assignee: Japan Atomic Energy Research InstituteInventors: Masaki Sugimoto, Masahito Yoshikawa, Shuhei Seki, Satoshi Tsukuda, Seiichi Tagawa
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Patent number: 7718224Abstract: Systems and methods for synthesizing ultra long carbon nanotubes comprising one or more metal underlayer platforms that allow the nanotube to grow freely suspended from the substrate. A modified gas-flow injector is used to reduce the gas flow turbulence during nanotube growth. Nanotube electrodes are formed by growing arrays of aligned nanotubes between two metal underlayer platforms.Type: GrantFiled: August 4, 2005Date of Patent: May 18, 2010Assignee: The Regents of the University of CaliforniaInventors: Peter J. Burke, Zhen Yu
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Patent number: 7687109Abstract: An apparatus for making an array of carbon nanotubes includes a reaction chamber with a gas inlet and a gas outlet; a quartz boat disposed in the reaction chamber; a substrate with a surface deposited with a film of first catalyst, the substrate being disposed in the quartz boat; and a second catalyst disposed in the quartz beside the substrate. A method for making an array of carbon nanotubes, comprising the steps of: (a) providing a substrate with a surface deposited with a film of first catalyst; (b) disposing a second catalyst beside the substrate to produce small amounts of hydrogen gas which flows to the first catalyst; (c) introducing a carrier gas and a carbon source gas flowing from the second catalyst to the first catalyst at a predetermined temperature; and (d) growing an array of carbon nanotubes extending from the substrate.Type: GrantFiled: March 8, 2006Date of Patent: March 30, 2010Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.Inventors: Kai-Li Jiang, Kai Liu, Shou-Shan Fan
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Patent number: 7645482Abstract: Systems and methods for synthesizing long carbon nanotubes and using the nanotube as an electrical conductor. A substrate is provided with one or more metal underlayer platforms that allow the nanotube to grow freely suspended from the substrate. A modified gas-flow injector is used to reduce the gas flow turbulence during nanotube growth. Nanotube electrodes are formed by growing arrays of aligned nanotubes between two metal underlayer platforms.Type: GrantFiled: September 12, 2005Date of Patent: January 12, 2010Assignee: The Regents of the University of CaliforniaInventors: Peter J. Burke, Zhen Yu, Shengdong Li
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Patent number: 7481990Abstract: The present invention provides a method of differentiating metallic carbon nanotubes from semiconducting carbon nanotubes. The method comprising providing a nanotube dispersion, wherein the nanotube dispersion comprises a plurality of carbon nanotubes, osmium tetroxide, or ruthenium tetroxide, and a solvent; and irradiating the nanotube dispersion with ultraviolet light, wherein the metallic carbon nanotubes are osmylated, or ruthenylated, thereby differentiating the metallic carbon nanotubes from the semiconducting carbon nanotubes.Type: GrantFiled: January 27, 2005Date of Patent: January 27, 2009Assignee: The Research Foundation of State University of New YorkInventors: Stanislaus S. Wong, Sarbajit Banerjee
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Patent number: 7473436Abstract: Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or F2 or CnHm) is irradiated to provide a cold plasma of selected target species particles, such as atomic H or F, in a first chamber. The target species particles are directed toward an array of CNTs located in a second chamber while suppressing transport of ultraviolet radiation to the second chamber. A CNT array is functionalized with the target species particles, at or below room temperature, to a point of saturation, in an exposure time interval no longer than about 30 sec. *Discrimination against non-target species is provided by (i) use of a target species having a lifetime that is much greater than a lifetime of a non-target species and/or (2) use of an applied magnetic field to discriminate between charged particle trajectories for target species and for non-target species.Type: GrantFiled: April 5, 2004Date of Patent: January 6, 2009Assignees: The United States of America as represented by the Administrator of the National Aeronautics and Space Administrator, SETI InstituteInventors: Bishun N. Khare, Meyya Meyyappan
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Patent number: 7276266Abstract: Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or F2 or CnHm) is irradiated to provide a cold plasma of selected target particles, such as atomic H or F, in a first chamber. The target particles are directed toward an array of CNTs located in a second chamber while suppressing transport of ultraviolet radiation to the second chamber. A CNT array is functionalized with the target particles, at or below room temperature, to a point of saturation, in an exposure time interval no longer than about 30 sec.Type: GrantFiled: December 13, 2002Date of Patent: October 2, 2007Assignee: United States of America as represented by the Administrator of the National Aeronautics and Space Administration (NASA)Inventors: Bishun N. Khare, Meyya Meyyappan
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Patent number: 7166325Abstract: Nanotubes and nanotube-based devices are implemented in a variety of applications. According to an example embodiment of the present invention, a nanotube device is manufactured having a nanotube extending between two conductive elements. In one implementation, each conductive element includes a catalyst portion, wherein electrical connection is made to opposite ends of the nanotube at each of the catalyst portions. In one implementation, the conductive elements are coupled to circuitry for detecting an electrical characteristic of the nanotube, such as the response of the nanotube to exposure to one or more of a variety of materials. In another implementation, the nanotube device is adapted for chemical and biological sensing. In still another implementation, a particular functionality is imparted to the nanotube using one or more of a variety of materials coupled to the nanotube, such as metal particles, biological particles and/or layers of the same.Type: GrantFiled: November 18, 2002Date of Patent: January 23, 2007Assignee: The Board of Trustees of the Leland Stanford Junior UniversityInventors: Hongjie Dai, Jing Kong
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Patent number: 7160585Abstract: A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one electronic cyclotron resonance zone faciliting ionization and/or dissociation of a gas containing carbon injected into the deposition chamber at a low pressure inside the deposition chamber, causing ionization and/or dissociation of this gas in each electronic cyclotron resonance zone. The ions and electrons produced are located along the field lines of the magnetic field set up in the deposition chamber. The process also includes a screening operation of the various species produced in each electronic cyclotron resonance zone to enable exclusive access of CxHy°non condensable free radicals produced to access a deposition zone adjacent to at least one part of the substrate including the two electrically conducting elements to make the nanotube.Type: GrantFiled: December 26, 2002Date of Patent: January 9, 2007Assignee: Commissariat a l'Energie AtomiqueInventors: Marc Delaunay, Anne Senillou, Marie-Noelle Semeria
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Patent number: 7147894Abstract: A method for the self assembly of a macroscopic structure with a pre-formed nano object is provided. The method includes processing a nano object to a desired aspect ratio and chemical functionality and mixing the processed nano object with a solvent to form a suspension. Upon formation of the suspension, a substrate is inserted into the suspension. By either evaporation of the solvent, changing the pH value of the suspension, or changing the temperature of the suspension, the nano objects within the suspension deposit onto the substrate in an orientational order. In addition, a seed crystal may be used in place of the substrate thereby forming single-crystals and free-standing membranes of the nano-objects.Type: GrantFiled: March 25, 2002Date of Patent: December 12, 2006Assignee: The University of North Carolina at Chapel HillInventors: Otto Z. Zhou, Hideo Shimoda, Soojin Oh
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Patent number: 7033647Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.Type: GrantFiled: November 20, 2002Date of Patent: April 25, 2006Assignees: Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.B.H., IMS-Ionen Mikrofabrikationas SystemeInventors: Xinhe Tang, Klaus Mauthner, Ernst Hammel, Hans Löschner, Elmar Platzgummer, Gerhard Stengl
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Patent number: 7033650Abstract: In a method of producing a nanotube layer on a substrate by using a CVD process, the substrate is placed in a reaction chamber, which is flushed with a carbon-containing gas. Subsequently, the substrate is heated by an induction process to a temperature at which carbon from the gas phase is deposited on the substrate while forming nanotubes thereon.Type: GrantFiled: March 20, 2002Date of Patent: April 25, 2006Assignee: Electrovac, Fabrikation, Elektrotechnischer Spezialartikel, Gesellschaft mbHInventors: Klaus Mauthner, Xinhe Tang, Roland Haubner
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Patent number: 7011771Abstract: The present invention includes carbon nanotubes whose hollow cores are 100% filled with conductive filler. The carbon nanotubes are in uniform arrays on a conductive substrate and are well-aligned and can be densely packed. The uniformity of the carbon nanotube arrays is indicated by the uniform length and diameter of the carbon nanotubes, both which vary from nanotube to nanotube on a given array by no more than about 5%. The alignment of the carbon nanotubes is indicated by the perpendicular growth of the nanotubes from the substrates which is achieved in part by the simultaneous growth of the conductive filler within the hollow core of the nanotube and the densely packed growth of the nanotubes. The present invention provides a densely packed carbon nanotube growth where each nanotube is in contact with at least one nearest-neighbor nanotube.Type: GrantFiled: November 28, 2001Date of Patent: March 14, 2006Assignee: Battelle Memorial InstituteInventors: Yufei Gao, Jun Liu
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Patent number: 6967043Abstract: A method of manufacturing, with high purity and high efficiency, a multi-wall carbon nanotube (10) having layers densely fitted to the center part thereof, comprising the step of leading a graphite rod (2) into plasma flame (1) generated in the atmosphere of inert gas (4) added with hydrogen to evaporate carbon so as to stack the densest multi-wall carbon nanotube (10) on the surface of the graphite rod (2).Type: GrantFiled: November 5, 2002Date of Patent: November 22, 2005Assignees: Japan Science and Technology Agency, NEC CorporationInventors: Sumio Iijima, Masako Yudasaka, Akira Koshio
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Patent number: 6924003Abstract: The present invention provides a method of processing a nanotube, comprising the steps of: causing a selective solid state reaction between a selected part of a nanotube and a reactive substance to have the selected part only become a reaction product; and separating the nanotube from the reaction product to define an end of the nanotube.Type: GrantFiled: December 18, 2000Date of Patent: August 2, 2005Assignee: NEC CorporationInventor: Yuegang Zhang
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Patent number: 6808746Abstract: This invention relates to a process for the preparation of a substrate-free aligned nanotube film, comprising: (a) synthesizing a layer of aligned carbon nanotubes on a quartz glass substrate by pyrolysis of a carbon-containing material, in the presence of a suitable catalyst for nanotube formation; and (b) etching the quartz glass substrate at the nanotube/substrate interface to release the layer of aligned nanotubes from the substrate. The invention also provides a process for the preparation of a multilayer carbon nanotube film comprising depositing a substrate-free carbon nanotube film onto another nanotube film. Further, the invention provides a process for the preparation of a “hetero-structured” multilayer carbon nanotube film which includes one or more carbon nanotube layers together with layers of other materials, such as metal, semiconductor and polymer.Type: GrantFiled: January 11, 2002Date of Patent: October 26, 2004Assignee: Commonwealth Scientific and Industrial Research Organisation CampellInventors: Liming Dai, Shaoming Huang
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Patent number: 6743481Abstract: A multilayer coating of fullerene molecules is deposited on a substrate, and layers of the multilayer coating are removed leaving an approximate monolayer coating of fullerene molecules on the substrate. In some embodiments, a beam generator, such as an ion beam, electron beam or laser generator, produces a beam arranged to break the weaker fullerene-to-fullerene intermolecular bond of the multilayer coating and inadequate to break the stronger fullerene-to-substrate association/bond of the coating. The beam is directed at the multilayer coating to break the fullerene-to-fullerene intermolecular bond. In other embodiments, the monolayer of fullerene molecules is formed by applying a solvent to the multilayer coating to break the fullerene-to-fullerene intermolecular bond of the multilayer coating.Type: GrantFiled: May 31, 2001Date of Patent: June 1, 2004Assignee: Seagate Technology LLCInventors: Joel W. Hoehn, John W. Dykes, James E. Angelo, William D. Mosley, Richard T. Greenlee, Brian W. Karr
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Patent number: 6699525Abstract: Carbon nanotubes are formed on a substrate by providing a coiled filament in a chemical vapor deposition chamber, supporting a substrate having a catalytic coating provided thereon inside the coiled filament, evacuating air, if present, from the chamber, heating the filament and applying a bias voltage between the filament and the substrate, introducing a reactant gas into the chamber, and pyrolyzing the reactant gas to deposit the carbon nanotubes on the catalytic coating. The substrate can be in the form of a rod or fiber and the carbon nanotubes can be deposited in a radially extending cluster on the substrate. The present invention also contemplates an apparatus for carrying out the inventive method.Type: GrantFiled: April 16, 2001Date of Patent: March 2, 2004Assignee: The Board of Trustees of Western Michigan UniversityInventor: Ahalapitiya H. Jayatissa
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Patent number: 6673392Abstract: A method of vertically aligning pure carbon nanotubes on a large glass or silicon substrate at a low temperature using a low pressure DC thermal chemical vapor deposition method is provided. In this method, catalytic decomposition with respect to hydro-carbon gases is performed in two steps. Basically, an existing thermal chemical vapor deposition method using hydro-carbon gases such as acetylene, ethylene, methane or propane is used. To be more specific, the hydro-carbon gases are primarily decomposed at a low temperature of 400-500° C. by passing the hydro-carbon gases through a mesh-structure catalyst which is made of Ni, Fe, Co, Y, Pd, Pt, Au or an alloy of two or more of these materials.Type: GrantFiled: March 15, 2001Date of Patent: January 6, 2004Assignees: Samsung SDi Co., Ltd., Young-hee LeeInventors: Young-hee Lee, Nae-sung Lee, Jong-min Kim
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Patent number: 6652923Abstract: An electron-emitting source includes a substrate and a coating film. The substrate is made of a material containing a metal serving as a growth nucleus for nanotube fibers as a main component, and has a plurality of through holes. The coating film is constituted by nanotube fibers formed on a surface of the substrate and wall surfaces of the through holes. A method of manufacturing an electron-emitting source is also disclosed.Type: GrantFiled: September 12, 2002Date of Patent: November 25, 2003Assignees: ISE Electronics Corporation, Nihon Shinku Gijutsu Kabushiki KaishaInventors: Sashiro Uemura, Takeshi Nagasako, Junko Yotani, Hirohiko Murakami
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Patent number: 6177231Abstract: A resist material having a resist and particles mixed into the resist, a major component of the particles being a cluster of carbon atoms, is provided. A method for fabricating a resist material is also provided, the method repeatedly performing: a first step of coating a substrate with a resist film; and a second step of depositing particles whose major component is a cluster of carbon atoms on the resist film. Accordingly, a resist film with high etching resistance can be obtained, and it is possible to realize a reduction in the thickness of the resist film, improvements of contrast of resist patterns; resist sensitivity; heat resistance of resist films; mechanical strength of resist patterns; and further, stabilization of resist sensitivity. Therefore, highly precise fine pattern fabrication can be realized.Type: GrantFiled: June 6, 1997Date of Patent: January 23, 2001Assignee: Nippon Telegraph and Telephone CorporationInventors: Tetsuyoshi Ishii, Toshiaki Tamamura, Hiroshi Nozawa, Kenji Kurihara