Abstract: A method and instrument provide a very detailed symmetric resistivity image of a formation. A first asymmetric resistivity image is collected from a first arrangement of electrodes, which form an asymmetric sensor. A second asymmetric resistivity image is collected from a second arrangement of electrodes, which form an asymmetric sensor. The first image and the second image overlap each other. The images are assembled about a selected reference point and then processed to provide the very detailed symmetric resistivity image.