Abstract: A discrete metallic particle having a metallic material, and a coating covering at least a portion of the metallic component. The discrete metallic particle has a thickness from 50 nm to 1000 nm, and the discrete metallic particle has a skin depth ? of greater than or equal to 1.0 ?m in a frequency range from 20-40 GHz. The skin depth ? is calculated by: ? = 2 ? ? ( 2 ? ? ? f ) ? ( ? 0 ? ? r ) ? 503 ? ? ? r ? f Where ? is skin depth in meters (m); ? is resistivity in ohm meter (?·m); f is frequency of an electromagnetic radiation in hertz (Hz); ?0 is permeability; and ?r is relative permeability of the metallic material.

Abstract: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a ?max of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.

Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be used in methods to form predetermined patterns of metal nanoparticles.

Abstract: Embodiments of the present invention involve printing members that utilize a particle-fusion imaging mechanism but avoid susceptibility to handling damage. In particular, printing plates in accordance with the invention may utilize two phases, and these may originate, during manufacture, as two particle systems. Both systems are initially dispersed in a single coating applied as a layer, or in multiple coatings applied as adjacent layers, on a substrate. The second particle system exhibits a glass-transition or thermal coalescing temperature well above room temperature and also above the temperature at which the coating is dried. The coalescing temperature of the first particle system is below the drying temperature. As a result, when the coating is dried, the first particle system coalesces and forms a binder that entrains the second particle system, which has not coalesced.

Abstract: [Purpose] To provide a photosensitive resin composition having satisfactory compatibility during dry film formation, exhibiting similar sensitivity for exposure with both i-line radiation and h-line radiation type exposure devices, having excellent resolution and adhesiveness, allowing development with aqueous alkali solutions, and preferably, having no generation of aggregates during development. [Solution Means] A photosensitive resin composition comprising (a) 20-90 wt % of a thermoplastic copolymer having a specific copolymerizing component copolymerized, and having a carboxyl group content of 100-600 acid equivalents and a weight-average molecular weight of 5,000-500,000, (b) 5-75 wt % of an addition polymerizable monomer having at least one terminal ethylenic unsaturated group, (c) 0.01-30 wt % of a photopolymerization initiator containing a triarylimidazolyl dimer, and (d) 0.001-10 wt % of a pyrazoline compound.

Abstract: The present invention relates to a method of manufacturing semiconductor devices. According to the method, an etch target layer, a chemically amplified photoresist layer, and an Anti-Reflective Coating (ARC) layer are first sequentially formed over a semiconductor substrate. An exposure process is performed in order to form exposure portions in the photoresist layer. A thermal process is performed so that a decrosslinking reaction is generated in the ARC layer on the exposure portions. A development process is performed in order to form photoresist layer patterns and ARC layer patterns by removing the ARC layer at portions in which the decrosslinking reaction has occurred and the exposure portions. A silylation process is performed in order to form silylation patterns on sidewalls of each of the photoresist layer patterns. The ARC layer patterns and the photoresist layer patterns are removed. The etch target layer is patterned using the silylation patterns as an etch mask.

Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.

Abstract: The present invention provides a pattern forming method characterized in that energy is applied to a surface of a base material including a polyimide having a polymerization initiating moiety in a skeleton thereof to thereby generate an active site on the surface of the base material, and a polymer directly bonded to the base material surface and having at least a group selected from a group consisting of: a polar group; a functional group whose hydrophilicity/hydrophobicity changes, whose structure is changed into a structure that interacts with an electroless plating catalyst or a precursor thereof, or which ceases to interact with an electroless plating catalyst or a precursor thereof in response to heat, acid or radiation; and a polymerizable functional group, is generated in a pattern shape using the active site as a starting point so that a pattern is formed on the surface of the base material.

Abstract: An embodiment may be an organic photoreceptor, which comprises a conductive support; a photosensitive layer provided on the conductive support; and a surface layer containing a binder and a fluorine-containing resin fine particle having a number average primary particle diameter between about 0.02 ?m and about 0.20 ?m and a crystallinity of less than 90% and a binder resin; wherein a contact angle of the surface layer for water is 90° or more and a dispersion of the contact angle is within ±2.0°.

Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.

Abstract: A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a resist film having a predetermined pattern on the upper layer, and patterning the metal film by etching the metal film using the resist film as a mask. Here, patterning the metal film comprises etching the upper layer, immersing the resist film and the upper layer in a pretreatment liquid containing a nonionic surfactant after the first etching process, and etching the lower layer after the immersing process.

Abstract: We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing reagent prior to the pattern transfer. The process bias is a measure of the difference between a nominal feature critical dimension (CD) produced in a patterned reticle and the nominal isofocal CD for the feature. Improvement of the average process bias is directly related to an improved resolution in the mask features. The reduction in average process bias achievable using the method of the invention typically ranges from about 30% to about 70%. This reduction in average process bias enables the printing of smaller features.

Abstract: A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.

Abstract: The invention provides a pattern forming method including providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support, and forming a pattern including a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise; an image forming method which applies the pattern forming method; a pattern forming material; and a planographic printing plate. A fine particle adsorption pattern forming method and a conductive pattern forming method are also provided.

Abstract: An organic anti-reflective coating (ARC) is formed over a surface of a semiconductor substrate, and a resist layer including a photosensitive polymer is formed on the ARC. The photoresistive polymer contains a hydroxy group. The resist layer is then subjected to exposure and development to form a resist pattern. The resist pattern to then silylated to a given depth by exposing a surface of the resist pattern to a vapor phase organic silane mixture of a first organic silane compound having a functional group capable of reacting with the hydroxy group of the photoresistive polymer, and a second organic silane compound having two functional groups capable of reacting with the hydroxy group of the photoresistive polymer Then, the silylated resist pattern is thermally treated, and the organic ARC is an isotropically etched using the thermally treated resist pattern as an etching mask.

Abstract: A surface graft material including a substrate and a surface graft polymer chain, wherein the surface graft polymer chain includes a photocleavable moiety at one of its terminals, and the surface graft polymer chain is directly bonded to a surface of the substrate by a covalent bond between the photocleavable moiety and the substrate. A graft pattern formation method comprising exposing the graft material to cleave the photocleavable moiety in the exposed area, and removing the graft polymer chain from the exposed are to form a surface graft polymer chain pattern. A conductive pattern material and a metal particle pattern material using the graft pattern.

Abstract: A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.

Abstract: There are provided a conductive pattern material and a pattern-forming method by which a fine pattern having a high resolution and no wire breakage is obtained. The conductive pattern material is such that on a support surface a pattern-forming layer is formed which allows the formation of a hydrophilic/hydrophobic region directly bonded to the support surface due to energy imparted. Energy is imparted to the pattern-forming material in an imagewise manner to form the conductive material layer.

Abstract: An image forming material for forming an image on an image recording material with an image binding force being established between the image and the image recording material, the image forming material containing an image forming substance, and a binding force reducing substance which reduces the image binding force when the image is heated. A method of removing an image formed on an image recording material with a binding force being established between the image and the recording material by contacting a stripping member with the image with heating under pressure. A binding force reducing substance may be contained in the surface of the stripping member or in the image recording material.

Abstract: A method of making a printing plate from a heat-sensitive PS plate of a positive-working mode for lithographic printing includes the steps of exposing the heat-sensitive PS plate to light and developing the PS plate using an alkaline developing solution containing at least one surfactant selected from the group consisting of anionic surfactants and ampholytic surfactants, and a salt selected from the group consisting of alkali metal salts and ammonium cation salts. The PS plate has a substrate and an image forming layer formed thereon, the image forming layer including a lower layer which is formed on the substrate and contains a water-insoluble and alkali-soluble resin and an upper heat-sensitive layer which is overlaid on the lower layer and contains a water-insoluble and alkali-soluble resin and an infrared absorption dye and exhibits an elevated solubility with respect to alkaline aqueous solutions when heated.

Abstract: The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking do of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles. The invention also concerns the substrate produced by this method and its applications.

Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.

Abstract: A surface modification layer having a surface modification coefficient of 0.1 to 0.5 is formed on the surface of an organic insulating film on a substrate. A metal wiring is provided on the surface of the organic insulating film having the surface modification layer formed at the surface thereof. Thus, the bonding strength between the metal wiring and the organic insulating film is enhanced.

Abstract: The use of dual-focused ion beams for semiconductor image scanning and mask repair is disclosed. A mask is imaged with either a focused negative ion beam, such as a focused oxygen ion beam, or a focused positive ion beam, such as a focused gallium ion beam. Mask imaging is also referred to as image scanning. Defects in the mask are repaired with the ion beam not used in imaging of the mask. Also disclosed is image scanning being performed with the focused negative ion beam to neutralize potential charge buildup, and mask repair being performed with the focused positive ion beam. An apparatus is disclosed that has a negative ion mechanism supplying negative ions, a positive ion mechanism supplying positive ions, a filter to select the desired ratio of the negative to the positive ions, and an aiming mechanism to focus the ions onto the mask.

Abstract: A semiconductor device is manufactured using an ashing process to eliminate the adverse effects of contamination, such as amine-airborne contamination. Consistent with one embodiment of the present invention, the semiconductor device is formed by applying a DUV-type photoresist over the wafer surface, exposing the photoresist to DUV light, baking the wafer, and then ashing the wafer in a highly-oxidized environment to remove insoluble amine-related resist.

Abstract: An ablation image forming material is disclosed. In the image forming material the colorant particles are metal particles which are magnetized upon application of to magnetic force, a production method of the same, and an image forming apparatus.

Abstract: Methods and associated apparatus are disclosed for use in mounting particles on and de-mounting particles from a substrate having an array of tacky and non-tacky areas. The particles can be either electrically conducting or electrically non-conducting. Selection of electrically conducting particles is preferred. The substrate having an array of tacky and non-tacky areas can either be electrically non-conducting (e.g., a dielectric substrate) or electrically-conducting. The methods involve use of first and second electrode plates with the substrate therebetween, the plates having applied thereto a direct current potential, which potential in preferred embodiments is reversed in polarity for a number N of cycles. Methods and articles are disclosed using an electrically conductive surface adjacent the tacky and non-tacky areas to minimize static buildup on the particles and tacky and non-tacky areas.

Abstract: The present invention relates to a polymer represented by following Formula 1 and a method of forming a micro pattern using the same: wherein, R is C1-C10 primary or secondary alcohol group; m and n independently represent a number from 1 to 3; and the ratio a:b:c is (10-80)mol %:(10-80)mol %:(10-80)mol %, respectively. The photoresist polymer according to the present invention is suitable for forming an ultra-micro pattern such as used in 4G or 16G DRAM semiconductor devices using a light source such as ArF, an E-beam, EUV, or an ion-beam.

Abstract: A tonable, photosensitive composition, the adhesion properties of which are controlled by a polycaprolactone having an average molecular weight of at least 50,000 and a process for preparing polychromatic images by means of such a composition are described.

Abstract: A tonable, radiation sensitive composition, whose adhesion properties can be controlled by the presence of a polydiorganosiloxane with polar and/or ethylenic unsaturated groups and a process for preparing multicolored images using such a composition is described.

Abstract: A monochromatic or polychromatic proof of a high resolution master and a process and means for its preparation are described. The graphic arts industry requires monochromatic or polychromatic proofs having high resolution and tonally correct reproduction of halftone masters having frequency modulated screen or line screens with more than 80 lines/cm. These proofs are obtained by using image carriers having image-side surfaces with an average roughness of 1.1 &mgr;m maximum. Such color proofs are necessary to check color separations in the graphic arts industry for whether subsequent printing results are a tonally correct reproduction of the master.

Abstract: The present invention is directed to a process for obtaining permanent representations of full-tone, full-color photographs on bases such as ceramics, glass and plastic. This process contemplates the utilization of a set of transparent and opaque ceramic colors or mineral pigments in order to obtain the permanent representations of images on bases.

Abstract: A method for forming images on a substrate wherein imaging is performed on a photosensitive element, the method including the steps of (a) providing a photosensitive element having a support, a dry strippable layer and a first photosensitive layer, wherein the dry strippable release layer is present between the support and the photosensitive layer; (b) imaging the photosensitive element; (c) toning to form a photosensitive element having an imagewise toned surface; (d) applying an additional photosensitive layer to the imagewise toned surface of the photosensitive element; (e) forming a final imaged element by removing the support from the toned, photosensitive element; and (f) placing the final imaged element on the substrate to form a final image on the substrate.

Abstract: The invention relates to a process for the production of a colored image for color proofing of copy masters for multicolor printing and a layer material for carrying out this process.A positive image of the exposure mask (color separation film) is produced by lamination of a photosensitive material onto a colored layer material, followed by imagewise exposure and peeling-off of a film support, or a negative image of the exposure mask is obtained by imagewise exposure of the photosensitive material before the lamination, accompanied by flood exposure after lamination followed by peeling-off of a film support. The two procedures use the same materials and do not require wet development. For each single-color image, only one lamination step is required.

Abstract: A method of forming a fluorescent screen, such as a black matrix or a color filter, on a front panel of a cathode ray tube is described. The method comprises the steps of forming a photosensitive adhesion layer on an inner surface of the front panel, exposing the photosensitive adhesion layer through a color selecting electrode having a plurality of slots for reducing adhesion level of exposed area of the photosensitive adhesion layer, bringing a pigment layer provided on a supporting sheet into intimate contact with the photosensitive adhesion layer, applying pressure to the pigment layer and the photosensitive layer, and peeling off the supporting sheet from the pigment layer. Alternatively, a pigment may be dispersed in the photosensitive adhesion pigment layer.

Abstract: A photosensitive printing element having an overall layer of powder material and a process for making a flexographic printing plate from such an element are disclosed. The photosensitive element includes a support, a photopolymerizable layer, and a layer of powder material on the photopolymerizable layer. The layer of powder material can be opaque or transparent depending upon desired use.

Abstract: A photosensitive printing element having an overall layer of powder material and a process for making a flexographic printing plate from such an element are disclosed. The photosensitive element includes a support, a photopolymerizable layer, and a layer of powder material on the photopolymerizable layer. The layer of powder material can be opaque or transparent depending upon desired use.

Abstract: Unique laser ablation transfer ("LAT") imaging films presenting options of flexibility and versatility hitherto alien to this art are produced, on-demand, by toning appropriate substrate as to provide thereon an ablative discontinuous film topcoat comprising a contrast imaging amount of conventional or modified toner particulates.

Abstract: A process for preparing an image on a substrate by applying a photoimageable composition on a first substrate, wherein the photoimageable composition, having a solids content from 25 to 60 weight percent, contains a partially neutralized acid-containing polymer formed from a precursor polymer having an acid number from 90 to 160 prior to neutralization and wherein 1 to 15% of acid-containing groups of the precursor polymer are neutralized with base; an ethylenically unsaturated monomer; a photoinitiator or photoinitiating system, water; 0-5% by weight a solution polymer, based on the weight of total polymer present in the composition; and 0-25% by weight of an organic solvent based on the total weight of the organic solvent and water; wherein the liquid composition is present as a stable emulsion, and wherein the liquid composition has a Brookfield viscosity, at 25.degree. C.

Abstract: A method for forming fine pattern in a semiconductor device. It comprises the steps of: providing an objective material layer to be patterned covering a photosensitive film atop a semiconductor substrate; selectively exposing the surface of the photosensitive film, to determine a region to be patterned, in the surface of the photosensitive film; diffusing silicon into the surface of the photosensitive film by use of hexamethyl disilazane (HMDS) or tetramethyl disilazane (TMDS), to form a uniformly thin, silylated photosensitive material film at an unexposed surface of the photosensitive film and a thick, silylated photosensitive material film having a shape of convex lens at the exposed surface of the photosensitive film; etching the silylated photosensitive material layer and the photosensitive film with plasma containing NF.sub.3 /O.sub.

Abstract: A process for the preparation of an image is provided, which comprises exposing to light a layer of a composition which changes its stickiness when irradiated with active light, spraying a particulate image-forming material on to the layer, removing the particulate matter which has not been attached to the layer, and then heating the layer to fix the particulate image-forming to the substrate. This process is suitable for the patterning of not only a fluorescent substance for plasma display but also a light-impermeable or sparingly light-permeable material to which photolithography has heretofore been difficultly applied. Furthermore, the thickness of the image-forming material layer can be easily varied by properly selecting the grain diameter of the image-forming material.

Abstract: Unique laser ablation transfer ("LAT") imaging films presenting options of flexibility and versatility hitherto alien to this art are produced, on-demand, by toning appropriate substrate as to provide thereon an ablative discontinuous film topcoat comprising a contrast imaging amount of conventional or modified toner particulates.

Abstract: A process of forming a single color, ablation image having improved abrasion resistance comprising:a) imagewise-heating by means of a laser an ablative recording element comprising a support having thereon an image layer comprising an image dye or pigment dispersed in a polymeric binder, which causes the image layer to ablate imagewise, the image layer having a near infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye or pigment absorbing in the region of from about 300 to about 700 nm;b) removing the ablated material to obtain an image in the ablative recording element;c) either charging the imaged, ablative recording element to a given polarity or applying a voltage across the surface of the element which is attracted to a conductive surface behind the element;d) applying colorless, charged particles to the element which causes them to be electrostatically attracted to the surface of the image layer; ande) heat-fusing the par

Abstract: A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises a supporting sheet, a image mask-protection layer peelablly adhered to the supporting sheet and a layer of a water-soluble resin composition having photocrosslinkability to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer; (b) a process for dissolving out the non-crosslinked portion of the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus from an image-carrying mask which is constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer; (c) a process for adhering the photo-sensitive laminate film on which the images are formed to the surface of a material to be processed; (d) a process for peeling off the supporting sheet from th

Abstract: Unique laser ablation transfer ("LAT") imaging films presenting options of flexibility and versatility hitherto alien to this art are produced, on-demand, by toning appropriate substrate as to provide thereon an ablative discontinuous film topcoat comprising a contrast imaging amount of conventional or modified toner particulates.

Abstract: Surface reforming of a polymeric article containing a polymerizable compound is effectively performed by polymerizing the polymeric article in contact with a surface reforming medium because the transfer of the material constituting the surface reforming medium to the polymeric article is enhanced by the polymerization. The surface reforming can be performed locally selectively, i.e., imagewise. The remaining un-polymerized part may be subjected to further surface reforming, e.g., by using another type of surface reforming medium or attachment of powder, to provide an enhanced contrast of surface property. Such an enhanced contrast of surface property can be effectively used, e.g., for production of a printing plate.

Abstract: A peel-developable imaging medium for the imagewise recordation of information is provided, the imaging medium having therein a plurality of fracturable layers, the plurality comprising a porous or particulate image-forming layer and a release layer, and at least one of the fracturable layers having incorporated therein a boric ion generating species. In particular embodiments, the fracturable layers contain crosslinked borated polymeric binder. The laminar imaging medium is characterized by good imaging performance in an extended range of environmental conditions.

Abstract: This invention makes available processes for preparing images, especially color proofs. A layer with imagewise tacky and nontacky areas is toned. Toner adhering to the tacky areas is transferred first onto a temporary support and from there onto an image receptor.

Abstract: A process is described for providing a conductive metal circuit using a coherent radiation source. The circuit pattern is directly written onto a laser addressable element having a supercooling material layer. A conductive metal toner is then applied to the light struck areas and fired in a furnace to provide a conductive metal circuit.

Abstract: A process for preparing a black matrix comprising the steps of producing a developed substrate by coating, drying, exposing and developing a photoresist on the inside of a substrate, producing a dried substrate by drying the developed substrate several times, coating a dye on the dried substrate and then drying the board, coating graphite on the dried substrate, and etching the graphite-coated substrate. This method makes it possible to perfectly etch the black matrix dot and increase volatility in fluorescent coating.