Relief Patents (Class 430/306)
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Patent number: 4216289Abstract: A light-sensitive printing plate with a coating layer with an uneven pattern removable during development provided on the surface thereof, which can be brought into intimate contact with an original image in a short period of time by vacuum adhesion. The light-sensitive printing plate is produced by taking up a coating solution from a coating solution pan by a gravure roll, scraping away excess coating solution adhering to the gravure roll by a doctor blade, transferring the coating solution still retained on the gravure roll to a coating roll made of rubber with a fine uneven pattern on the surface thereof which is turning in the same direction and at the same speed as the gravure roll, and transferring the coating solution thus transferred to the coating roll to a support running at the same speed and in the same direction as the coating roll.Type: GrantFiled: February 16, 1978Date of Patent: August 5, 1980Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazutaka Oda, Yoshio Okishi
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Patent number: 4214249Abstract: A laser beam recording member capable of recording information by absorbing the radiation energy of a laser beam to cause a thermal melting deformation and/or evaporation removal at the portion exposed to the laser beam wherein the recording layer is composed of a non-metallic layer mainly composed of S, Se, Te or chalcogenide compounds thereof.Type: GrantFiled: September 21, 1976Date of Patent: July 22, 1980Assignee: Canon Kabushiki KaishaInventors: Masanao Kasai, Hitoshi Hanadate, Yoshioki Hajimoto, Takashi Kitamura, Kiyonobu Endo
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Patent number: 4211561Abstract: The invention is directed to a process for producing cross-linked polymeric images on a substrate employing an oxygen-insensitive silver halide system to obtain camera-speed imaging with good resolution of the resulting image. The process comprises imagewise exposing a photosensitive layer containing dispersed silver halide in operative association with a multifunctional hydrophilic polymeric coupler, developing the exposed layer with a multifunctional developing agent, and removing the undeveloped, noncross-linked areas by washing with a solvent.Type: GrantFiled: December 8, 1978Date of Patent: July 8, 1980Assignee: E. I. Du Pont de Nemours and CompanyInventor: Louis Plambeck, Jr.
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Patent number: 4207105Abstract: A method for forming an image comprising forming a silver, silver halide or binder image in the emulsion layer of a photographic material, which photographic material comprises a support having a silver halide emulsion layer thereon, by exposing and developing the photographic material, and plasma etching the emulsion layer to preferentially remove the emulsion layer at the non-image areas. Alternatively, the emulsion layer may be on a masking layer, whereafter, following exposing and developing, the photographic material is plasma etched to preferentially remove the emulsion layer at the non-image areas and to uncover the masking layer lying thereunder and then the masking layer is etched away at the uncovered areas.Type: GrantFiled: July 12, 1977Date of Patent: June 10, 1980Assignee: Fuji Photo Film Co., Ltd.Inventor: Masamichi Sato
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Patent number: 4205989Abstract: There is disclosed a dry system image producing element comprising a substrate, a thin metal layer and a photosensitive layer. After exposing the element to light through a desired pattern, the photosensitive layer is peeled off to obtain a light barrier pattern made from the metal on the substrate corresponding to the photosensitized portion.Type: GrantFiled: August 17, 1978Date of Patent: June 3, 1980Assignee: Kimoto & Co., Ltd.Inventors: Takeo Moriya, Toshio Yamagata
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Patent number: 4204866Abstract: A color imaging device is comprised of means for sensing radiation comprising a planar array of charge-handling semiconductor photosensors, preferably at least one of the photosensors having a radiation sensing area with at least one dimension less than about 100 microns, and superimposed thereon, filter means for controlling access of radiation to the sensing means. The filter means is in micro-registration with the array of photosensors and comprises a transparent mordant layer with a plurality of radiation intercepting means defining a planar array of filter elements. The filter area of each intercepting means contains at least one mordantable dye which absorbs radiation in at least one portion of the spectrum and transmits radiation in at least one other portion of the spectrum. The color imaging device comprises an interlaid pattern having at least two sets of intercepting means, the first set having a different radiation absorption and transmission characteristic from that of the second set.Type: GrantFiled: January 9, 1978Date of Patent: May 27, 1980Assignee: Eastman Kodak CompanyInventors: Jerry R. Horak, Harold F. Langworthy, Frederick J. Rauner, Robert C. Gross
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Patent number: 4202697Abstract: A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon image-wise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.Type: GrantFiled: May 30, 1978Date of Patent: May 13, 1980Assignee: AGFA-GEVAERT N.V.Inventors: Hugo V. Van Goethem, Marcel Stroobants, Walter F. De Winter
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Patent number: 4202696Abstract: A novel method of removing surface tack of a cured free radical polymerized resin composition which comprises impregnating the surface layer of the cured free radical polymerized resin composition with a specific organic carbonyl compound and irradiating the impregnated layer of the cured resin composition with specific actinic rays. The method of the present invention is applicable for effectively removing surface tack of cured photopolymerized or heat-polymerized resin compositions, especially photopolymer type printing plates manufactured therefrom.Type: GrantFiled: May 16, 1978Date of Patent: May 13, 1980Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Gensho Takahashi, Kazuhito Miyoshi, Yoneharu Tanaka
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Patent number: 4201581Abstract: In certain types of printing applications (for example optical or magnetic contact printing) wherein it is desired to transfer imagery from a master device to a replicate device, providing and maintaining close contact between the master device and the replicate device poses certain problems. These problems become even more acute if the surfaces to be contacted are of large area. In accordance with the present invention, close contact over even large areas is obtained between a master device and a replicate device by forming a thin and uniform liquid layer between the master and replicate devices, thus producing a vacuum effect which serves to tightly press the master and replicate devices together.Type: GrantFiled: March 13, 1978Date of Patent: May 6, 1980Assignee: Eastman Kodak CompanyInventors: Harold T. Thomas, Dennis G. Howe, James K. Lee
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Patent number: 4198236Abstract: A lithographic printing plate is prepared from a layer of a photopolymerizable composition comprising an oleophilic macromolecular organic binder and a leachable hydrophilic ethylenically unsaturated compound by exposing the layer and then leaching the compound from the unexposed areas by treating with a suitable developing solvent, preferably water, producing an oleophilic surface. A similar plate may be prepared from a composition containing a hydrophilic binder and oleophilic leachable compound by imagewise exposure and solvent leaching producing an oleophilic surface in exposed areas and a hydrophilic surface in unexposed areas.Type: GrantFiled: November 30, 1978Date of Patent: April 15, 1980Assignee: E. I. Du Pont de Nemours and CompanyInventor: Robert P. Held
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Patent number: 4198241Abstract: A photopolymerizable composition for the manufacture of printing plates and relief plates, based on a mixture, containing a photoinitiator, of photopolymerizable olefinically unsaturated monomers and a polymeric binder, contains up to 0.1% by weight of an etherified thioanthraquinone for improving the relief image in the production of relief plates.The composition advantageously also contains a small amount of an organic tertiary amine or of an aromatic .alpha.-ketocarboxylic acid or its ester and/or of an inhibitor, e.g. the salt of an organic N-nitrosohydroxylamine.Type: GrantFiled: May 18, 1978Date of Patent: April 15, 1980Assignee: BASF AktiengesellschaftInventors: Bernd Bronstert, Werner Kuesters, Mong-Jon Jun, Guenter Wallbillich
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Patent number: 4198238Abstract: Photopolymerizable compositions containing a mixture of a liquid unsaturated polyester and a liquid urethane-linked polymer can be used to prepare printing plates having improved solvent resistance and washout characteristics.Type: GrantFiled: September 21, 1978Date of Patent: April 15, 1980Assignee: Hercules IncorporatedInventor: Bernard J. Scheve
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Patent number: 4197126Abstract: This invention is directed to a method for developing printing plates by stripping away uncured material using a carefully controlled gas stream. An optional supplemental blotting system is provided.Type: GrantFiled: January 18, 1977Date of Patent: April 8, 1980Assignee: W. R. Grace & Co.Inventors: Forrest A. Wessells, John E. Pickard
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Patent number: 4197132Abstract: In a photoresist material comprising a support having formed thereon a layer of a photopolymerizable composition comprising a film forming polymer, a monomer having at least one addition polymerizable unsaturated bond, and a photopolymerization initiator, the adhesive property and the light-sensitivity of the layer of the photopolymerizable composition are improved by incorporating a rosin tackifier in the layer.Type: GrantFiled: November 2, 1977Date of Patent: April 8, 1980Assignee: Fuji Photo Film Co., Ltd.Inventors: Kenichiro Yazawa, Eiichi Hasegawa
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Patent number: 4195997Abstract: Photopolymerizable compositions or layers containing an ethylenically unsaturated compound, a photoinitiator or photoninitiator system, and at least one polymeric binder, at least half of the binder being cellulose acetate butyrate having a composition of 44 to 50 weight percent butyryl, 5.0 to 8.5 weight percent acetyl and 0.5 to 1.0 weight percent hydroxyl. The use of the specific cellulose acetate butyrates in photopolymerizable compositions improves cold flow resistance and processability, i.e., development. The compositions and layers are particularly useful in preparing dry film photoresists and solder masks.Type: GrantFiled: January 23, 1978Date of Patent: April 1, 1980Assignee: E. I. Du Pont de Nemours and CompanyInventor: Boynton Graham
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Patent number: 4193798Abstract: A printing resin plate is produced by adoption of such process and apparatus that a negative film is placed on a transparent plate positioned on a frame stand; a liquid photopolymerizable resin is applied through a cover film onto said negative film to form a layer; the frame stand and/or a means having a belt, which has been extended between at least two rolls and which can rotate synchronously with the frame stand, are moved to insert a support into a space between the liquid photopolymerizable resin layer on the frame stand and the lower surface of said belt; the frame stand is moved to below the lower surface of the belt while pressing the support with the lower surface of the belt by the downward pressure of the belt thereby closely adhering the support onto the liquid photopolymerizable resin layer; and then the liquid photopolymerizable resin layer is exposed to light.Type: GrantFiled: May 31, 1977Date of Patent: March 18, 1980Assignee: Sumitomo Chemical Company, LimitedInventors: Takezo Sano, Tadanori Inoue
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Patent number: 4192685Abstract: A photosensitive resin composition consisting essentially of an unsaturated polyester, a cross-linking agent and a photosensitizer, said cross-linking agent consisting of a compound having at least one radical-polymerizable double bond within the molecule and a compound expressed by the following formula ##STR1## wherein n is an integer of at least 1, p, q, and r is 0 or an integer of at least 1 with the proviso that p+q+r equals to 2-6, R.sup.1 is a hydrogen or a methyl group, R.sup.2 is a lower alkyl group optionally substituted with a halogen atom, and R.sup.3 is an alkyl, aryl or acyl group optionally having a substituent.Type: GrantFiled: February 1, 1978Date of Patent: March 11, 1980Assignee: Teijin LimitedInventors: Akihiro Horike, Yoshio Itakura, Tadashi Shingu
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Patent number: 4188221Abstract: Photosensitive polyamide resin composition which can be developed with water to give a relief printing plate having an excellent moisture resistance, comprising 30 to 90% by weight of a water-soluble polyamide having ammonium type nitrogen atoms and 5 to 70% by weight of a photopolymerizable unsaturated compound prepared by reacting (meth)acrylic acid (I) and a polyglycidyl ether of an aliphatic polyvalent alcohol (II) in an equivalent ratio of 0.5.ltoreq.(I)/(II).ltoreq.2.0, and 0.01 to 10% by weight of a photopolymerization initiator.Type: GrantFiled: May 8, 1978Date of Patent: February 12, 1980Assignee: Toyo Boseki Kabushiki KaishaInventors: Masaru Nanpei, Toshiaki Fujimura, Hajime Kouda, Yoshihiro Kasho, Kuniomi Etoh
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Patent number: 4187112Abstract: A photosensitive resin composition which comprises a polyester having a nitrogen atom in the ammonium salt form in the main or side chain representable by the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.4 representing a polymeric chain, and X is an anion to be paired with the ammonium ion, a photopolymerizable unsaturated monomer and a photosensitizer.Type: GrantFiled: October 20, 1977Date of Patent: February 5, 1980Assignee: Toyobo Co., Ltd.Inventors: Kuniomi Etoh, Masaru Nanpei, Morio Miyagi
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Patent number: 4177073Abstract: Disclosed is a novel photosensitive composition comprising an alkali-soluble photosensitive resin and an additive consisting of at least one aromatic polybasic carboxylic cellulose ether ester which is a reaction product of an aromatic polybasic carboxylic anhydride with a cellulose ether compound of the formula (I) or (II):R.sub.a.sup.1 R.sub.b.sup.2 A (I)orR.sub.c.sup.3 R.sub.d.sup.4 R.sub.e.sup.5 A (II)wherein R.sup.1 represents a hydroxyalkyl radical having 3 or 4 carbon atoms; R.sup.2 and R.sup.5 are a hydrogen atom or an alkyl radical having 1 or 2 carbon atoms, respectively; R.sup.3 and R.sup.4 represent a hydroxyalkyl radical having 2 to 4 carbon atoms, respectively, and are different from each other; A represents a cellulose residue, and; a, b, c, d and e, respectively, represent a positive number.Type: GrantFiled: November 17, 1977Date of Patent: December 4, 1979Assignee: Oji Paper Co., Ltd.Inventors: Yukinori Hata, Tsutomu Watanabe, Fumio Itoh
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Patent number: 4175964Abstract: A light-sensitive lithographic printing plate element suitable for the formation of negative and positive images, simultaneously, comprising a hydrophilic support having, in succession, a light-sensitive composition layer and a transparent cover film in which images for printing are formed by imagewise exposing through the cover film and peeling apart to remove, together with the cover film, the areas having a stronger adhesion to the cover film in the light-sensitive composition layer by utilizing the difference in adhesion to the support and to the cover film between the exposed areas and the unexposed areas of the light-sensitive composition layer, whereby the areas of the light-sensitive composition layer having a stronger adhesion to the support remain on the support, wherein the surface of the support adjacent the light-sensitive composition layer is treated with an aqueous solution containing at least one water soluble oxygen acid or water soluble oxygen acid salt selected from the group consisting ofType: GrantFiled: June 7, 1977Date of Patent: November 27, 1979Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshio Uchida, Yorimiti Yabuta, Teppei Ikeda
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Patent number: 4174218Abstract: It has been found that excellent quality photopolymer printing plates having hardness, flexibility, resilience, abrasion resistance and resistance to alcohol-based inks can be prepared from photopolymer compositions comprising a liquid polymer containing at least two terminal olefin groups attached to the polymer through a combination of at least two ether, thioether, ester, keto or amide groups, from about 1 to about 50% by weight based on the polymer of at least one ethylenically unsaturated monomer, from about 0.1 to about 10% by weight of a photoinitiator and about 0.01 to about 2% of a stabilizer.Type: GrantFiled: August 16, 1978Date of Patent: November 13, 1979Assignee: Hercules IncorporatedInventor: Rudolph L. Pohl
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Patent number: 4173474Abstract: A hologram comprises a polymer carrier and a portion composed of a polymerization product of a photopolymerizable monomer contained in the polymer carrier, and the polymerization product is produced by exposing the carrier polymer containing the photopolymerizable monomer to an interference pattern of radiation.Type: GrantFiled: July 27, 1977Date of Patent: November 6, 1979Assignee: Canon Kabushiki KaishaInventors: Takashi Tanaka, Katsuhiko Nishide
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Patent number: 4173673Abstract: Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.Type: GrantFiled: June 1, 1977Date of Patent: November 6, 1979Assignee: E. I. Du Pont de Nemours and CompanyInventors: Martin D. Bratt, Abraham B. Cohen
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Patent number: 4173470Abstract: A novolak resin suitable for use as a light-sensitive photoresist or maskant is prepared by reaction of at least one cresol with an aldehyde or reactive ketone and an aromatic hydroxyl compound having an alkyl side chain of from 3-15 carbon atoms. The addition of a conventional photosensitive agent yields a composition evidencing superior characteristics as compared with prior art novolak photoresists and which requires less sensitizer than such prior art resists.Type: GrantFiled: November 9, 1977Date of Patent: November 6, 1979Assignee: Bell Telephone Laboratories, IncorporatedInventors: Susan Fahrenholtz, David T. Long, Raymond C. Pitetti
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Patent number: 4173476Abstract: A triarylsulfonium complex salt is described which has particular utility as a photoinitiator for the polymerization of epoxide monomers in thick films or coatings. Photopolymerizable compositions are also described.Type: GrantFiled: February 8, 1978Date of Patent: November 6, 1979Assignee: Minnesota Mining and Manufacturing CompanyInventors: George H. Smith, Peter M. Olofson
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Patent number: RE30186Abstract: The invention provides a method for the preparation of relief structures of highly heat-resistant polymers, using radiation-sensitive, soluble preliminary polymers in the form of polyaddition or polycondensation products of polyfunctional carbocyclic or heterocyclic compounds containing radiation-sensitive radicals in ester groups bound to said compounds with diamines, diisocyanates, bis-acid chlorides or dicarboxylic acids of cyclic structure. According to the invention, the polyfunctional compounds containing the radiation-sensitive radicals contain, besides carboxyl, carboxylic acid chloride, amino, isocyanate or hydroxyl groups suitable for addition or condensation reactions, partly in ortho or periposition thereto, radiation-reactive radicals in the ester groups bound to the compounds having an oxyalkylene methacrylate or acrylate structure.Type: GrantFiled: December 22, 1978Date of Patent: January 8, 1980Assignee: Siemens AktiengesellschaftInventors: Roland Rubner, Wolfgang Kleeberg, Eberhard Kuhn