Stencil Patents (Class 430/308)
  • Patent number: 11456450
    Abstract: A method for evaluating phase stability of an electrode mixture slurry, including the steps of: (S1) introducing the electrode mixture slurry to a rheometer; (S2) applying a first shear rate to the electrode mixture slurry; (S3) applying a second shear rate after applying the first shear rate to the electrode mixture slurry, wherein the second shear rate is higher than the first shear rate; (S4) applying a third shear rate after applying the second shear rate to the electrode mixture slurry, wherein the third shear rate is lower than the second shear rate; and (S5) comparing the shear viscosity at the first shear rate with the shear viscosity at the third shear rate. An apparatus for evaluating phase stability of the electrode mixture slurry is also provided.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: September 27, 2022
    Assignee: LG ENERGY SOLUTION, LTD.
    Inventors: Ga-Hyun Lim, Jin-Young Son, Hwi-Soo Yang, Jong-Heon Seol, Hyung-Suk Cho, Sang-Hoon Choy
  • Patent number: 11059314
    Abstract: A printing method that carries out printing using a mesh screen, which is a screen gauze including multiple holes, is provided. The printing method includes: a covering process of covering one surface of the mesh screen with a covering member; an entering process of entering the covering member to at least a middle of the hole from a side of the one surface with respect to the multiple holes of the mesh screen; a mask forming process of ejecting a mask forming liquid used to form a mask that covers one part of an other surface of the mesh screen from an ejection head, to form the mask; a peeling process of peeling the covering member from the mesh screen; and a print executing process of printing an image corresponding to a pattern of the mask on the medium using the mesh screen and the printing ink.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: July 13, 2021
    Assignee: MIMAKI ENGINEERING CO., LTD.
    Inventor: Masaru Ohnishi
  • Patent number: 10773275
    Abstract: Methods for using a hollow, rotating stencil roll to deposit flowable dry powder particles onto a moving substrate and to adhesively bond the particles to a pressure-sensitive adhesive surface of the substrate.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: September 15, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Evan D. Brutinel, Jon E. Dable, Shawn C. Dodds, Ann M. Gilman, Matthew R. D. Smith, Matthew S. Stay, Eric A. Vandre
  • Patent number: 9619878
    Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: April 11, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Fred Stanke, Ilya Toytman, David Alles, Gregg Anthony Inderhees, Stanley E. Stokowski, Mehdi Vaez-Iravani
  • Publication number: 20140038108
    Abstract: An apparatus and method for curing a photo activated emulsion. The apparatus is a light emitting apparatus is a plurality of light emitting diodes (LED's) attached to a circuit board. The LED's are used to quickly and efficiently cure a photo sensitive emulsion on a mesh screen for use in silk screening.
    Type: Application
    Filed: July 31, 2013
    Publication date: February 6, 2014
    Inventor: Louis D'Amelio
  • Patent number: 8062834
    Abstract: Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.
    Type: Grant
    Filed: December 27, 2008
    Date of Patent: November 22, 2011
    Assignee: Jusung Engineering Co. Ltd.
    Inventors: Hyung Sup Lee, Kyoo Hwan Lee, Young Ho Kwon
  • Patent number: 7981590
    Abstract: Method for producing a base material (25) for screen printing, which comprises a protective film (10), a screen (5) and an intermediate resist layer (13) comprising photosensitive material, the method comprising the steps of applying a first resist layer (15) to one side of the protective film (10), drying the first resist layer (15), applying an additional resist layer (17) to the first resist layer (15), and then applying a screen (5) to the additional resist layer (17) under pressure, with that side of the additional resist layer (17) to which the screen (5) is applied being wet. The invention also describes a base material (25) for screen printing, which comprises a protective film (10), an electroformed screen (5) and an intermediate resist layer (13) comprising photosensitive material.
    Type: Grant
    Filed: March 18, 2005
    Date of Patent: July 19, 2011
    Assignee: Stork Prints B.V.
    Inventor: Stephanus Gerardus Johannes Blankenborg
  • Patent number: 7968173
    Abstract: The present invention relates to printable security paper that includes a region capable of receiving printed indicia on the front side and on the reverse side which are observable in reflected light and form an image observable in transmitted light, as security element protecting against two-sided copying, characterized in that such region is a screened region having an average overall opacity less than the opacity of the vellum part of the rest of the paper, said screened region being made up from alternations of vellum miniregions, having an approximately constant thickness equal to that of the vellum part of the rest of the paper, and of miniregions of reduced opacity because of their smaller thickness compared with the vellum miniregions. The invention also relates to the security document obtained with this paper.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: June 28, 2011
    Assignee: Arjowiggins Security
    Inventors: Nathalie Vast, Yvan Thierry, Stephane Mallol
  • Patent number: 7883762
    Abstract: The invention concerns a security document comprising, as security element against recto/verso copying, indicia present on both sides and capable of being viewed under reflected lighting and forming an image capable of being viewed under transmitted light. The invention is characterized in that said indicia comprise lines and form said image with 3D effect.
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: February 8, 2011
    Assignee: Arjowiggins Security
    Inventor: Pierre Doublet
  • Patent number: 7754298
    Abstract: A method of producing an intermediate transfer member for digital offset printing comprises: a) providing an intermediate transfer member body portion, b) coating the body portion with a rubber layer, c) coating the rubber layer with a primer comprising an organosilane, a photoinitiator, and a catalyst, d) coating the primer with a release layer, and e) applying UV irradiation to the coated primer to bond the release layer to the rubber layer.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: July 13, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Meir Soria, Shirley Lee, Yevgenia Rudoy, Frida Avadic, Nava Klein, Raia Slivniak-Zozin
  • Patent number: 7415927
    Abstract: A method for forming openings of predetermined position in a substrate in the form of a printing stencil by means of a laser, wherein the substrate is positioned using a fixture means in the form of a tensioning frame. In the process, a shift in position of openings resulting from subsequent processing steps and leading to a changed state of stress of the substrate is prevented by first determining the coordinates of a central reference point. Then, the respective distances of the predetermined positions of the openings from this reference point are determined, and an order of priority is determined therefrom. This order of priority then forms the basis for a machining program, which controls the path of movement of the laser head and forms the openings in the substrate.
    Type: Grant
    Filed: July 25, 2005
    Date of Patent: August 26, 2008
    Assignee: LPKF Laser & Electronics AG
    Inventor: Stephan Wenke
  • Publication number: 20070254243
    Abstract: A method for manufacturing a positive photosensitive resin composition, the method comprising: filtering a composition having a concentration of solids content of 30 mass % or more through a hollow fiber filter having a pore size of 0.1 ?m or less, wherein the composition comprises: (A) resin; (B) a photosensitizer; and (C) a solvent, and a relief pattern formed with the photosensitive resin composition.
    Type: Application
    Filed: May 1, 2007
    Publication date: November 1, 2007
    Applicant: FUJIFILM Corporation
    Inventor: Tsukasa YAMANAKA
  • Patent number: 7115353
    Abstract: A system and method for generating a master screen for a silk screen imaging process. Photo activated emulsion is applied to a printing screen and the emulsion is exposed according to a digitized pattern using a light emitting diode (LED) source. The LED source in one embodiment is an array of UV emitting devices which scans the printing screen in a line by line basis.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: October 3, 2006
    Inventors: Gary Baxter, Brian Baxter, David Kennedy, P. Gunnar Wareberg, Steve Wilson, David Rayner, Orson Bourne
  • Patent number: 6893676
    Abstract: A method of making a glow in the dark puff heat transfer material and a composition of glow in the dark puff heat transfer material are presented in this invention. Unlike many prior art heat transfer methods, the heat transfer method utilized in the present invention adheres to OSHA regulations 29 CFR 1910.1017. The process of making the glow in the dark puff heat transfer material comprises the steps of applying one or more layers of a specific glowing material between the colors layers. The composition comprises specific amounts of a glow clear base, glow puff material, translucent inks, and an effective amount of glowing material. A printable adhesive base may be added to the composition if the glowing material is not mixed with the glow clear base or with the glow puff material. The composition is printed on a paper substrate and cured through a conventional dryer.
    Type: Grant
    Filed: December 5, 2002
    Date of Patent: May 17, 2005
    Assignee: Next Graphics, Inc.
    Inventor: Nidal Alif
  • Patent number: 6841337
    Abstract: A masking apparatus and method includes a substrate fabricated to include a mask removable affixed to a backing. A plurality of designs may be formed in the apparatus by conventional methods. The mask may be cut into variable lengths and thereafter removably attached to a working surface. A transfer medium may be applied to the mask and the working surface to transfer both positive and negative images of the mask onto the working surface.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: January 11, 2005
    Inventor: Becki Speakman
  • Patent number: 6808865
    Abstract: Present invention provides an aqueous emulsion type photosensitive resin composition which forms a cured film significantly superior in water and solvent resistances in comparison with the conventional aqueous emulsion type photosensitive resin compositions. This photosensitive resin composition contains (A) an emulsion of a photosensitive water-insoluble polymer, the emulsion being obtained by reacting (i) an aqueous polymer emulsion whose main ingredient is a water-insoluble polymer and which contains a polymer having a hydroxyl group with (ii) an N-alkylol(meth)acrylamide, (B) a compound having a photoreactive ethylenically unsaturated group, and (C) a photopolymerization initiator.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: October 26, 2004
    Assignee: Goo Chemical Co., Ltd.
    Inventors: Toshio Morigaki, Masatami Matsumoto
  • Patent number: 6749996
    Abstract: The present invention is a puff heat transfer, a puff transfer composition, and a method of making a puff transfer composition. The puff transfer composition, i.e., ink, is actually loaded with the color. In particular, the transfer composition comprises effective amounts of a transfer base material, at least one pigment concentrate, and a puff base material. The transfer base material and the pigment concentrate may be mixed together and then loaded into the puff base material to form the transfer composition. The transfer composition may be deposited on a transfer sheet to make the heat transfer. The transfer sheet may be a substrate that is treated with QUILLON™. By using a substrate sheet that is treated with QUILLON™, the puff of the present invention has an improved, velvet-like feel when the transfer sheet is removed.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: June 15, 2004
    Assignee: Impulse Wear, Inc.
    Inventors: Christopher Roberts, Lawrence Levine
  • Patent number: 6634289
    Abstract: Screen printing stencils are produced by a positive-working method which involves no light-sensitive materials and does not require the use of safe lights. A coated receptor film having a coating layer and a support layer is imaged using an ink-jet printer or plotter in areas corresponding to the open stencil areas. The film is then applied to a mesh and an emulsion applied. Chemical hardening of the emulsion takes place in the non-imaged areas. The stencil is then produced by removing the support layer of the film and washing away the unhardened emulsion. The receptor film may include a layer which is incorporated into the stencil layer to form a profile. In addition to screen production methods, coated films, coating compositions and compositions for imagewise application are disclosed.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: October 21, 2003
    Assignee: Autotype International Limited
    Inventors: David Joseph Foster, John William Jones
  • Publication number: 20030148217
    Abstract: The present invention is directed to an ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink receptive, radiation transmissive layer; and at least one photosensitive resist layer.
    Type: Application
    Filed: January 30, 2002
    Publication date: August 7, 2003
    Inventors: Toshifumi Komatsu, Kyle Johnson, William Charles Ulland
  • Patent number: 6573023
    Abstract: The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters.
    Type: Grant
    Filed: December 10, 1999
    Date of Patent: June 3, 2003
    Assignee: Micron Technology, Inc.
    Inventors: John Michiels, David Wells, Eric J. Knappenberger, James J. Alwan
  • Patent number: 6541561
    Abstract: A method is disclosed of making a polymerizable printing ink which comprises mixing a powdered polymer with a liquid composition comprising at least one polymerizable monomer or oligomer, said oligomer or monomer being polymerizable and the powdered polymer being soluble in said liquid composition at elevated temperature.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: April 1, 2003
    Assignee: Trip Industries Holding, B.V.
    Inventor: Alan Lennox Lythgoe
  • Patent number: 6503683
    Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 7, 2003
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
  • Patent number: 6492071
    Abstract: A device and process for applying mixtures of adhesive formulations combined with solder flux such that flip chips may be rapidly encapsulated with such combinations without interfering with subsequent wafer processing steps are provided. Also provided is a wafer stencil designed in such a manner that the saw kerf lines separating individual chip dies are protected from coming into contact with the formulation. Extrusion screening using such wafer stencil is also provided.
    Type: Grant
    Filed: September 26, 2000
    Date of Patent: December 10, 2002
    Assignee: International Business Machines Corporation
    Inventors: William E. Bernier, Mark V. Pierson, Ajit K. Trivedi
  • Publication number: 20020142229
    Abstract: This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (20, 30, 42) is formed having a substrate (22, 32) and a template pedestal (24, 34) having formed thereon an uppermost surface an etched pattern or relief image (26, 36, 48). The template (20, 30, 42) is used in the fabrication of a semiconductor device (44) for affecting a pattern in the device (44) by positioning the template (20, 30, 42) in close proximity to semiconductor device (44) having a radiation sensitive material (50) formed thereon and applying a pressure (52) to cause the radiation sensitive material (50) to flow into the relief image (48) present on the template (42).
    Type: Application
    Filed: March 28, 2001
    Publication date: October 3, 2002
    Applicant: Motorola Inc.
    Inventors: Doug J. Resnick, Kevin J. Nordquist
  • Patent number: 6387594
    Abstract: A plate making film has a layer provided on a transparent substrate, the layer consisting essentially of a polymeric compound composed of a repeating unit represented by the following general formula (1): &Brketopenst;AXAR1&Brketclosest;  (1) where A is x, y and z each denote an integer of 1 or more, X is a residue of an organic compound having 2 active hydrogen groups, Y is a hydrocarbon group having 1 or more carbon atoms, and R1 is a dicarboxylic acid compound residue, or a diisocyanate compound residue. On the plate making film, an image is formed, preferably, by ink jets using, preferably, a plate making ink containing a mono- or disazo dye which is a yellow dye highly ultraviolet absorbing properties for a wavelength of 350 to 450 nm. An inexpensive, high resolution, high grade photomask for plate making is produced thereby.
    Type: Grant
    Filed: May 28, 1999
    Date of Patent: May 14, 2002
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Osamu Kakishita, Jun Nishioka, Shigeki Nishimura, Kazuo Kuzukawa
  • Patent number: 6333137
    Abstract: A photopolymerizable composition for making screen printing stencils. The composition comprises polyvinyl alcohol having at least one photocrosslinkable group appended thereto. At least one metal salt, wherein the metal is selected from: aluminum, zinc, chromium, zirconium, titanium, tin or iron, is added to the composition. The metal salt is used to improve water resistance of a screen printing image that is prepared from the photopolymerizable composition.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: December 25, 2001
    Assignee: Sericol Limited
    Inventors: Peter Dickinson, Nicholas R. Collins
  • Publication number: 20010046646
    Abstract: A stencil mask has a mask layer having an aperture part with either one or a plurality of apertures, a support part supporting the mask part formed by parts other the aperture parts, and a silicon oxide film layer, disposed between the support part and the mask layer, this silicon oxide film layer including a metal.
    Type: Application
    Filed: May 17, 2001
    Publication date: November 29, 2001
    Applicant: NEC Corporation
    Inventor: Fumihiro Koba
  • Patent number: 6319851
    Abstract: A resin sealing film is formed on a silicon substrate by using a printing mask and a squeegee. The side surface in the tip portion of the squeegee is substantially V-shaped, and the printing is performed by pushing the tip portion of the squeegee into the gap between adjacent bump electrodes. As a result, the sealing film is formed in a manner to be depressed in the region between adjacent bump electrodes so as to facilitate the swinging movement of the bump electrodes. It follows that, in a temperature cycle test performed after the silicon substrate is mounted to a circuit substrate, the stress derived from the difference in thermal expansion coefficient between the silicon substrate and the circuit substrate is absorbed by the bump electrode.
    Type: Grant
    Filed: January 19, 2000
    Date of Patent: November 20, 2001
    Assignee: Casio Computer Co., Ltd.
    Inventors: Ichiro Mihara, Osamu Kuwabara
  • Patent number: 6309799
    Abstract: The invention relates to a process for producing a printing form, in which a covering layer (5) is applied to a first radiation-sensitive layer (4) arranged on a carrier (1), the applied covering layer (5) is structured in accordance with a pattern to be printed, in order to form an irradiation mask (5′), and the radiation-sensitive layer (4) is irradiated and developed. In this way, in the production of printing forms, an irradiation mask (5′) can be applied very precisely in accordance with a pattern to be printed later.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: October 30, 2001
    Assignee: Schablonentechnik Kufstein Aktiengesellschaft
    Inventor: Siegfried Rückl
  • Patent number: 6232041
    Abstract: A method of making a heat transfer from an image for application to a T-shirt or other piece of cloth is disclosed. An image is scanned to create a computer image represented by a computer readable image file. The image is separated into a plurality of colors using a computer to create a separated image. A plurality of plates is created from the separated image corresponding to each of the colors. The plates are printed on film to create a plurality of color separation films corresponding to one of the plurality of colors. Mesh screens are treated with a photoemulsion. The color separation films are then placed on the mesh screens and light is applied to the mesh screens A portion of the photoemulsion hardens in the light and a second portion of the photemulsion covered by the printed matter on the color separation films remains soft. The mesh screens are washed to remove the second portion of the photoemulsion. Ink is applied to a piece of transfer paper through the mesh screens.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: May 15, 2001
    Assignee: Impulse Wear Inc.
    Inventors: Chris Roberts, James Glassburn
  • Patent number: 6225026
    Abstract: It is an object of the present invention to provide a printing stencil and a method for its preparation. There is thus provided, In accordance with a preferred embodiment of the present invention, a printing stencil comprising a porous stencil carrier layer, preferably of a non-woven tissue, which is impregnated with a solid or liquid radiation curable material. The printing stencil may further comprise a mask laid upon or integral to the stencil layer for defining areas transparent and areas non transparent to curing irradiation. There is thus also provided, in accordance with a preferred embodiment of the present invention, a method for the preparation of a printing stencil, said printing stencil comprising a stencil carrier layer and a stencil layer, which is impregnated with a radiation curable material.
    Type: Grant
    Filed: October 19, 1998
    Date of Patent: May 1, 2001
    Assignee: Afrion Digital Ltd.
    Inventors: Lior Lifshitz, Murray Figov, Hannoch Ron
  • Patent number: 5994033
    Abstract: A screen printing stencil made from a composition comprising polyhydroxy compounds having a plurality of 1,2- or 1,3-diol groups along a polymer backbone, the diol groups grafted thereto a compound of formula (I) (where A is an arylene or an alkylene group; X is an oxygen atom, a sulfur atom, a carbon-carbon bond, or a group of formula (a), (b) or (c); R is a hydrogen atom or a methyl group; R.sup.1 is a (C.sub.1 -C.sub.4) alkyl group; m is an integer of from 1 to 8; n is an integer of from 1 to 3; and p is 1 or 2); or an acetal of the polyhydroxy, compound with ethylene glycol.
    Type: Grant
    Filed: June 2, 1999
    Date of Patent: November 30, 1999
    Assignee: Sericol Limited
    Inventors: Robert S. Davidson, Stuart J. Palmer, Julie E. Pratt, Stephen P. Wilson
  • Patent number: 5922496
    Abstract: A material deposition contact mask is disclosed in which apertures formed therein have a larger dimension in lower openings in a bottom side of the mask contacting the substrate than in constricted openings located near the top side of the mask. Apertures of the contact mask have knife edges located within the upper sidewalls thereof, e.g. within the top 25% of the mask thickness above the substrate. A mask is disclosed which, in addition, is thermally compensated to the substrate temperature at which the deposition is performed. Methods for fabricating the mask by differential etching are disclosed.
    Type: Grant
    Filed: November 18, 1997
    Date of Patent: July 13, 1999
    Assignee: International Business Machines Corporation
    Inventors: Hormazdyar Minocher Dalal, Gene Joseph Gaudenzi, Frederic Robert Pierre, Georges Henri Robert
  • Patent number: 5876880
    Abstract: A process is disclosed for producing a structured mask for use in reproducing structures of that mask on an object with the aid of electromagnetic or particulate radiation, in particular for ion beam lithography. A flat smooth substrate of more than 20 .mu.m in thickness is selected and a thin diaphragm is produced from that substrate by etching one of the sections removed from the edging to a depth of c. 0.5-20 .mu.m, the tensile stress within the diaphragm being greater than 5 MPa. Lithographic structures are then formed on a central region of the diaphragm with a tensile stress of more than 5 MPa; apertures are etched into the diaphragm to form the mask structures and the effective thickness inside a diaphragm region substantially enclosing the mask structures is reduced, causing the central region containing the structures to be joined to the substrate edging elastically in such a way that the mean tensile stress within this central region is reduced to below 5 MPa.
    Type: Grant
    Filed: November 25, 1997
    Date of Patent: March 2, 1999
    Assignee: IMS Ionen Mikrofabrikations Systeme Gellschaft M.B.H.
    Inventors: Herbert Vonach, Alfred Chalupka, Hans Loschner
  • Patent number: 5645975
    Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: July 8, 1997
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
  • Patent number: 5589315
    Abstract: A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: January 6, 1995
    Date of Patent: December 31, 1996
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5580698
    Abstract: For producing fine printing patterns on large serigraphical printing frames it is possible to apply an exposure through correspondingly large film areas, but it is cheaper to make use of a successive line-by-line exposure with the use of a modulated light or laser beam, which is caused to sweep across an emulsion coated printing frame surface from an oscillating deflection mirror. The beam (20), in its outermost positions, will be directed obliquely towards the surface (14), and if the latter changes its distance from the oscillating mirror (48) the exposure lines (16) will thus be correspondingly shorter or longer, whereby the printing pattern may be distorted.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: December 3, 1996
    Assignee: MOGRAFO A/S
    Inventor: Allan V. Andersen
  • Patent number: 5569569
    Abstract: A stencil mask for use in a photochemical reaction process includes a path extending between the rear and front surfaces thereof. The path is used with a window for passing photons so as to supply a reactive medium and discharge an exhaust medium containing reaction products. Further, the path also serves as a space for separating an object from a pattern on a mask substrate. The path has a depth which is smaller than a minimum value attained by a semiconductor manufacturing process.
    Type: Grant
    Filed: January 24, 1995
    Date of Patent: October 29, 1996
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Takashi Goto, Shingo Terakado
  • Patent number: 5529862
    Abstract: A stencil mask (10) has a membrane (14) under tensile stress and at least one pattern opening (22) formed through the membrane (14). A plurality of stress relief openings (30) are formed in the membrane for reducing stress-induced distortion of the membrane and the mask pattern. The stress relief openings (30) are positioned to relieve concentrations of stress within the membrane (14) such as those resulting from non-regularities within the pattern. In one embodiment, a screening material (56), less rigid than the membrane (14), is contained within the stress relief openings (30). Methods of forming such masks (10) are also disclosed.
    Type: Grant
    Filed: September 1, 1993
    Date of Patent: June 25, 1996
    Assignee: Texas Instruments Incorporated
    Inventor: John N. Randall
  • Patent number: 5523185
    Abstract: A method for manufacturing a stencil mask in provided, in which precise patterning and a sufficient thickness of the absorber film are ensured, and manufacturing steps are simplified. Temporary holes 1h are formed on the substrate 1 based on the precise mask pattern of the intermediate film 2. The absorber film 3 is formed on the intermediate film 2, while an extra portion of the absorber film is deposited and stored in the temporary holes 1h. The absorber film 3 is made sufficiently thick while maintaining the precise patterning of the intermediate film 2. A window 6 is formed from the rear surface of the substrate penetrating through the substrate, through which beams pass. The temporary holes 1h and the extra portion of the absorber film are naturally removed during the forming of the window 6.
    Type: Grant
    Filed: November 15, 1994
    Date of Patent: June 4, 1996
    Assignee: Sanyo Electric Co., Ltd.
    Inventor: Takashi Goto
  • Patent number: 5478699
    Abstract: To prepare a screen printing stencil, a pattern of resist, having a complementary design to the final screen printing stencil, is applied to a conductive mandrel. A patterned layer is electroformed onto the exposed surface of the mandrel such that the layer corresponds to the exposed orifices of the pattern of resist. The resulting screen printing stencil can have an overgrowth geometry or a straight-wall geometry depending on the type of photoresist employed, and can be used in the electronic substrate fabrication and electronic assembly industries.
    Type: Grant
    Filed: March 12, 1992
    Date of Patent: December 26, 1995
    Assignee: AMTX, Inc.
    Inventors: Daniel R. Blessington, deceased, Gary T. Marks, Jerry E. Sergent, Judy A. Sline, Stephen A. De Lucia
  • Patent number: 5460920
    Abstract: Flexible printing plates are produced from printing plates consisting essentially of a dimensionally stable substrate (1) and a recording layer (2) by a process in which the printing plate is produced alternatively either by photochemical or by mechanical structuring, and in the case of photochemical structuring the photosensitive recording layer (2) is exposed imagewise and the unexposed parts of the recording layer (2) are washed out with a developer and in the case of mechanical structuring the originally photosensitive, uniformly exposed recording layer (2) is cut imagewise and the nonprinting parts of the recording layer (2) are peeled off from the substrate (1).The printing plates produced by this process are suitable for the production of products printed by the flexographic method and for lacquering products printed by the offset method.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: October 24, 1995
    Assignee: BASF Lacke + Farben Aktiengesellschaft
    Inventors: Thomas Telser, Heinz-Ulrich Werther, Manfred Zuerger
  • Patent number: 5366584
    Abstract: Uncured emulsion is effectively washed from a stencil in the production of photomasks by mounting a drum rotatable about a horizontal axis within a portable cabinet. The drum is driven by a small (e.g. variable speed 1/16 HP) electric motor and spins at about 50-100 rpm. Water is sprayed onto the stencil mounted on the drum at about 80 psi by 4-10 V-jet nozzles. Liquid running off the stencil is collected by a catch basin mounted just below the drum, and passes through a drain pipe with strainer into a heat insulated holding tank with an electric resistance heating element, and is recirculated from the tank to the spray nozzles-by a high pressure pump. The pump and motor are controlled by a timer, and after completion of the washing cycle the stencil is removed from the cabinet.
    Type: Grant
    Filed: April 6, 1993
    Date of Patent: November 22, 1994
    Assignee: Rayzist Photomask, Inc.
    Inventors: Raymond L. Zukowski, Randy S. Willis
  • Patent number: 5359928
    Abstract: To prepare a screen printing stencil, a pattern of resist, having a complementary design to the final screen printing stencil, is applied to a conductive mandrel. A patterned layer is electroformed onto the exposed surface of the mandrel such that the layer corresponds to the exposed orifices of the pattern of resist. The resulting screen printing stencil has raised edges surrounding orifices. The raised edges are placed against a surface of a substrate to be printed in use of the stencil. The screen printing stencil can be used for printing substrates in the electronic substrate fabrication and electronic assembly industries.
    Type: Grant
    Filed: October 20, 1992
    Date of Patent: November 1, 1994
    Assignee: AMTX, Inc.
    Inventors: Daniel R. Blessington, deceased, Gary T. Marks, Jerry E. Sergent, Judy A. Sline, Stephen A. De Lucia
  • Patent number: 5328537
    Abstract: A method of manufacturing a screen printing plate which can be obtained without using a mother mesh sheet and a resist film including a step of providing a non-plating area on the roll and exposing the roll coated with high-sensitivity photosensitive film by a multiple number of laser beams. The multiple number of laser beams are controlled by preset electric data so that the desired halftone points of negative halftone image are exposed on the roll.
    Type: Grant
    Filed: April 15, 1992
    Date of Patent: July 12, 1994
    Assignee: Think Laboratory Co., Ltd.
    Inventor: Tatsuo Shigeta
  • Patent number: 5328752
    Abstract: The instant invention discloses a process for producing a substrate for use in printed circuit which comprises: a vessel for containing a photo-curable resin; a masking means positioned above and in close proximity to the resin surface; a planar light for irradiating through the mask a thin layer of the photo-curable resin, means for moving the thin-layered cured product in the vertical direction, means for coating additional uncured resin on the cured product and irradiating the same to form a newly formed thin-layered cured product thereon, and means for successively coating and forming additional thin-layers of cured products. The second aspect of this invention relates to a substrate for use in printed circuit boards produced by the above-mentioned process and apparatus.
    Type: Grant
    Filed: September 21, 1992
    Date of Patent: July 12, 1994
    Assignee: Nitto Boseki Co., Ltd.
    Inventor: Keita Miyazato
  • Patent number: 5322763
    Abstract: A process for making a metal ledge on one side of a metal screen involves exposing through the stencil screen a photoresist layer, removing unexposed photoresist areas, plating the metal stencil screen where the unexposed photoresist has been removed and removing the exposed photoresist.
    Type: Grant
    Filed: May 6, 1992
    Date of Patent: June 21, 1994
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Allan Cairncross, Chester A. Thayer, II
  • Patent number: 5284536
    Abstract: A method of fabricating model trees and plants for decorating a diorama. The model is made from stacking foliage disks on a telescoping dowel, which functions as an imitation trunk. First, an outline of leaves and branches is drawn within a panel on paper. Next, the outline is shaded in to obtain a silhouette thereof. Numerous foliage disks can be clustered on a single panel to conserve space and to facilitate mass production. The silhouette is photographed to obtain a reverse image. Then through photolithography and etching, a metal template of the reverse image is made. The template is overlaid on a wood veneer having a kraft paper backing, and is laser cut. After laser cutting, each foliage disk can be separated from the veneer sheet. An assembly hole is provided in each foliage disk to facilitate attachment to the dowel. In an alternative embodiment, the trunk can be fashioned from braided wire with one end that is unraveled and flared outwards.
    Type: Grant
    Filed: August 13, 1991
    Date of Patent: February 8, 1994
    Inventor: Michael I. Gruber
  • Patent number: 5275700
    Abstract: A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the belt, a second surface opposite the first surface, and conduits which extend between first and second surfaces of the belt. The first surface of the framework has a paper side network formed therein which defines the conduits. The second surface of the framework has a backside network with passageways that provide surface texture irregularities in the backside network.
    Type: Grant
    Filed: June 29, 1990
    Date of Patent: January 4, 1994
    Assignee: The Procter & Gamble Company
    Inventor: Paul D. Trokhan
  • Patent number: 5246815
    Abstract: A photosensitive material for screen processing comprising a photosensitive resin composition (A) applied to a plastic film, and including a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound, and a photopolymerization initiator, and a photosensitive resin composition (B) applied in a thickness of at least 0.1 .mu.m to the coated composition (A) and including a film-forming polymeric compound; and a photo-crosslinking polyvinyl alcohol partially containing photo-cross-linkable units provides a coating film which is water-developable, highly sensitive, and excellent in water and solvent resistances.
    Type: Grant
    Filed: May 20, 1992
    Date of Patent: September 21, 1993
    Assignees: Gen. Director of the Agency of Industrial Science & Technology, Daicel Chemical Industries, Ltd.
    Inventors: Kunihiro Ichimura, Keiji Kubo