Abstract: A circuit mounting assembly includes a housing and a protrusion extending from the housing. At least one retaining member is attached to the protrusion and adapted to deform when received in an opening of a mounting structure and form an interference fit with the mounting structure so as to hold the housing to the mounting structure. At least one attachment member provides a secure attachment of the housing to the mounting structure. Electrical circuitry is located within the housing for performing a function, and an electrical connector for providing an electrical connection between the electrical circuitry located within the housing and an external device.

Abstract: Metrology systems and methods for lithography processes are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a mask having a plurality of corner rounding test patterns formed thereon. A first semiconductor device is provided, and a layer of photosensitive material of the first semiconductor device is patterned with a plurality of corner rounding test features using the mask and a lithography process. An amount of corner rounding of the lithography process is measured by analyzing the plurality of corner rounding test features relative to other of the plurality of corner rounding test features formed on the layer of photosensitive material of the semiconductor device. The lithography process or the mask is altered in response to the amount of corner rounding measured, and a second semiconductor device is provided. The second semiconductor device is affected using the altered lithography process or the altered mask.

Abstract: In a method for displaying an image: a polarization inversion pattern is produced in a ferroelectric member in accordance with image information so as to produce a surface charge pattern corresponding to the polarization inversion pattern; and an image contrast is produced in a contrast production member by the influence of the surface charge pattern, where the contrast production member is joined to the ferroelectric member. The polarization inversion pattern may be produced by heating the ferroelectric member so as to produce a heat distribution corresponding to the image information in the ferroelectric member. Further, the ferroelectric member may be heated by applying infrared light carrying the image information to the ferroelectric member.

Abstract: A method of optical proximity correction, suitably applied to a photolithography process with a high numeric aperture. The exposure light comprises a P-polarized light and an S-polarized light perpendicular to the P-polarized light. The P-polarized light has a transmission coefficient larger than that of the S-polarized light. In this method, different optical proximity correction modes are applied to the patterns with different orientations. While correcting any pattern, the ratio of transmission coefficient of the P-polarized light to the S-polarized light and the polarization angle between the pattern orientation and the polarization direction of the P-polarization/S-polarization light are considered.

Abstract: A polarization reversion pattern is formed in ferroelectrics in accordance with image information. An image is obtained by surface charges corresponding to the polarization reversion pattern. The ferroelectrics are composed of an inorganic ferroelectric oxide such as LiNbxTa1-xO3(0≦x≦1).

Abstract: There is disclosed a jig for producing a pellicle comprising a support frame having an opening, and an adhesive layer provided at periphery of the opening, wherein the adhesive layer is composed of a polymer material having a glass transition temperature within a range of 0° C. to 300° C. The jig of the present invention can be repeatedly used without reforming the adhesive layer after use.

Abstract: A polarization reversion pattern is formed in ferroelectrics in accordance with image information. An image is obtained by surface charges corresponding to the polarization reversion pattern. The ferroelectrics are composed of an inorganic ferroelectric oxide such as LiNbxTa1-xO3 (0≦x≦1).

Abstract: A method of fabricating an attenuating phase shift photolithographic mask which will reduce the formation of side-lobes adjacent to large structures in the kerf regions on the patterned wafer. These structures are typically much larger in size than device nominal, and this method may be applied to either one axis or both axes of the kerf structure depending on it's susceptibility to form side-lobes. A substantially defect free optical lithography mask having partially transmissive attenuating phase-shift regions, transmissive clear regions, and more opaque than partially transmissive regions is fabricated by first depositing an attenuating phase-shifting layer on the top surface of a transmissive substrate followed by deposition of a more opaque than partially transmissive layer on top of the partially transmissive attenuating phase-shifting layer. Next an image transfer layer is deposited on top of the more opaque than partially transmissive layer.

Abstract: In an electrophotographic printing process as well as an electrophotographic printer for printing a substrate, a photo-sensitive layered system is brought to a homogeneous initial state by impressing an electrical field having a first direction. The photoconductive layer is exposed with predetermined image structures according to the image. The entire photoconductive layer is exposed uniformly through the cover layer and/or the electrode layer. Charged toner particles are applied to the cover layer in a development step. The toner image is then transferred to the substrate. If more than one copy is required, the development step and the transfer step are carried out a number of times, the electrical charge image present inside the layered system being retained. The substrate is conveyed at a very high speed by a conveyor device in this operational state.

Abstract: A printing form and process relating to the formation of images on the printing form. The printing form includes a ferroelectric layer (1) on which photoferroelectric effect is used to polarize or depolarize the layer to form the image to be printed in the layer (1). The printing form may also include a layer which is neither ferroelectric nor has the function of a photoconductor which adjoins the ferroelectric layer 1. In this instance, the photoelectric effect is used to form the image to be printed on the ferroelectric layer.

Abstract: An apparatus for packaging a vehicle sensor and integrated circuit chip includes a ceramic substrate having an opening formed therein. A sensor is secured within the opening. An integrated circuit chip is secured within the opening in electrical communication with the sensor. A pair of electrical connectors are secured on the ceramic substrate in electrical communication with the integrated circuit chip. A metal lid is secured over the opening on the ceramic housing to enclose the integrated circuit chip and sensor. A molded plastic coating encloses the ceramic housing and metal lid, and the electrical connectors extend from the plastic coating. The sensor may be a pressure sensor or acceleration sensor.

Abstract: A process for the reversible or irreversible production of an image by imagewise exposure of a recording layer to energy in the presence or absence of an electrical and/or magnetic field, resulting in a pattern of surface charges on the surface of the recording layer corresponding to the imagewise exposure to energy. The recording layer consists essentially ofan organic material which solidifies in a glass-like manner, is non-photoconductive or substantially non-photoconductive and contains permanent dipoles, in whichthe pattern of surface charges is produced without or substantially without the formation of free charge carriers by reversible imagewise alignment of at least some of the permanent dipoles present in the recording layer.

Abstract: A photoelectrographic element for electrostatic imaging, containing a conductive layer and a photosensitive layer, is produced using photosensitive layer materials which form a barrier to charge injection where exposed to near-infrared radiation. As a result, exposed areas can be charged, while unexposed portions cannot. The photosensitive layer contains an organic photoconductor, a near-infrared radiation sensitizer, and, optionally, an organic binder. A method of forming images with this phctoelectrographic element is also disclosed.

Abstract: Xeroprinting masters are formed by first forming a toner mask. The mask is used to expose a xeroprinting master material exhibiting persistent conductivity in response to a given wavelength and intensity of radiation. The toner mask can be formed and transferred to the xeroprinting material without fusing. After exposure the masking toner can be cleaned off providing a planographic master. Multicolor images are formed by forming two or more masking images, and transferring them to two or more master surfaces. After irradiation and cleaning each master surface is used as a xeroprinting master for a particular color in a multicolor duplicating system.

Abstract: Disclosed is a method of improving the sharpness of multiple copies made from a single imagewise exposure using an electrostatographic film buffer element having an insulating layer in between a conductive layer and a photoconductive layer, where the element is simultaneously charged and imagewise exposed and then uniformly exposed with light to bury the charges. The improvement consists of performing the uniform exposure with light that is absorbed by the photoconductive layer and does not penetrate through the photoconductive layer to the insulating layer.

Abstract: A persistent conductivity-type electrophotographic recording member comprising a nonconductive layer and a photoconductive layer disposed on one surface of the nonconductive layer, wherein the photoconductive layer comprises a photosensitive material substantially uniformly dispersed in a binder which consists essentially of a copolymer of styrene with at least one alkyl acrylate, the alkyl group of which comprises from four to twelve carbon atoms. The acid value of such copolymers is typically preferably below about 2, and more preferably below about 1.

Abstract: A persistent photoconductive element comprising an electroconductive support, a pigment layer formed on said support and composed mainly of a phthalocyanine pigment or Indanthrene Blue GCD and a polymer layer formed on said pigment layer and composed mainly of a polyvinyl carbazole, said polymer layer containing at least one member selected from the group consisting of aliphatic halogenated hydrocarbons, halogenated acyl compounds, halogenated keto compounds and hydrogen donor compounds. This element exhibits an improved photoconductive sensitivity and prolonged photoconductivity over the prior art, whereby it is highly useful in electrophotographic processes requiring persistent photoconductivity. Additives, such as plasticizer and binding agent, may be incorporated in the polymer and pigment layers to improve the flexibility and mechanical durability of the persistent photoconductive element.