And Another Backing Layer Other Than Aluminum Oxide Patents (Class 430/525)
  • Patent number: 9315676
    Abstract: The present invention generally relates to a method of making nanoparticles and uses thereof. In particular, the invention relates to methods of making metal nanoparticles (MNPs). The invention also relates to antimicrobial uses of the nanoparticles.
    Type: Grant
    Filed: July 9, 2013
    Date of Patent: April 19, 2016
    Assignee: RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK
    Inventors: George John, Praveen Kumar Vemula, Pulickel Ajayan, Ashavani Kumar
  • Patent number: 9120299
    Abstract: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
    Type: Grant
    Filed: October 25, 2013
    Date of Patent: September 1, 2015
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Celin Savariar-Hauck, Oliver Richard Blum, Michael Nielinger
  • Patent number: 8772018
    Abstract: The invention relates generally to solid supports for chromatography. In specific embodiments the invention provides for solid supports suitable for affinity chromatography along with methods, systems and kits which use the same.
    Type: Grant
    Filed: July 7, 2008
    Date of Patent: July 8, 2014
    Assignee: EMD Millipore Corporation
    Inventors: Nanying Bian, Senthil Ramaswamy, Neil Soice, Chen Wang, Yuan Wong
  • Patent number: 8383331
    Abstract: A silver halide photographic light-sensitive material for movie, having a specific layer structure by using particles of at least one kind of electroconductive metal oxide and at least one kind of an electroconductive polymer.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: February 26, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hiroshige Nakamura, Kenichi Yamamoto, Kazuhito Miyake, Hidekazu Sakai, Shigeru Shibayama
  • Patent number: 7427467
    Abstract: A silver salt photothermographic dry imaging material comprising a support having: (i) a photosensitive layer comprising photosensitive silver halide grains, an organic silver salt and a reducing agent for silver ions on one side of the support; and (ii) a backing layer on a side of the support opposite the photosensitive layer, comprising: (a) organic solid lubricant particles having an average diameter of 1.0 to 30 ?m; and (b) inorganic microparticles or organic microparticles.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: September 23, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Miyuki Teranishi
  • Patent number: 7105286
    Abstract: The present invention relates to a silver halide photographic material comprising a paper support having resin layers coated on both sides of a base paper, and in particular, to a silver halide photographic material exhibiting superior glossiness and improved sharpness, long-term stability, fingerprint resistance and pressure resistance. The silver halide photographic material comprising on one side of the paper support having resin coat layers on both sides of a base paper, one or more light-sensitive layers and one or more light-insensitive layers, wherein after the photographic material of an L-size (having a length of 89 mm in a machine direction of the base paper and a length of 127 mm vertical to the machine direction) is processed, the photographic material exhibits an image clarity (C-value) of 20% to 60% which is determined using a 1.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: September 12, 2006
    Assignee: Konica Minolta Photo Imaging, Inc.
    Inventor: Takesi Nakamura
  • Patent number: 7049048
    Abstract: Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl groups substituted with three alkoxy and/or phenoxy groups. The lithographic printing plate precursors additionally comprise an imageable layer over the interlayer.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: May 23, 2006
    Assignee: Eastman Kodak Company
    Inventors: Joseph Hunter, Saraiya Shashikant, Ting Tao, Fredéric Eugene Mikell
  • Patent number: 6899996
    Abstract: Various imaging members including lithographic imaging members can be prepared by applying to a support, an aqueous formulation comprising one or more imaging components to form an imaging layer. Over the imaging layer is directly applied a non-aqueous inverse emulsion comprising highly hydrophilic, water-swellable microgel particles dispersed in a water-immiscible organic solvent to form a protective layer. This protective layer provides physical durability but it is still readily removed during or after imaging with water or fountain solutions.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: May 31, 2005
    Assignee: Eastman Kodak Company
    Inventors: Jeffrey W. Leon, David B. Bailey
  • Patent number: 6838226
    Abstract: Various imaging members including lithographic imaging members (such as printing plates) have an aqueous-based imaging layer applied to a support. Directly over the imaging layer is a protective layer that is applied as a non-aqueous inverse emulsion comprising highly hydrophilic, water-swellable microgel particles dispersed in a water-immiscible organic solvent. This protective layer provides physical durability but it is still readily removed during or after imaging with water or fountain solutions.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: January 4, 2005
    Assignee: Eastman Kodak Company
    Inventors: Jeffrey W. Leon, David B. Bailey
  • Patent number: 6794099
    Abstract: The invention relates to a material to form an indicator element comprising a base material and at least one photosensitive silver halide layer, wherein the base material comprises at least one specular reflective layer between two polymer layers wherein the polymer layer between the at least one specular reflective layer and the silver halide layer is substantially transparent.
    Type: Grant
    Filed: April 8, 2003
    Date of Patent: September 21, 2004
    Assignee: Eastman Kodak Company
    Inventors: Wen-Li A. Chen, Robert P. Bourdelais, Cheryl J. Kaminsky, Richard A. Castle, Thomas M. Smith
  • Patent number: 6670092
    Abstract: The invention relates to a recording material for the production of offset printing plates having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous layer on its back. The back layer has a glass transition temperature Tg of at least 55° C. and a surface resistance of 106&OHgr; or less.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: December 30, 2003
    Assignee: Agfa-Gevaert
    Inventors: Steffen Denzinger, Michael Dörr
  • Publication number: 20030170566
    Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions.
    Type: Application
    Filed: December 6, 2002
    Publication date: September 11, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Sumiaki Yamasaki, Koichi Kawamura, Hisashi Hotta
  • Patent number: 6468717
    Abstract: A heat-sensitive lithographic printing plate precursor is disclosed, which comprises an aluminum support having provided thereon an ink-receptive layer and a hydrophilic layer containing a colloidal particle oxide or hydroxide of at least one element selected from the group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and transition metals, wherein at least one layer of the ink-receptive layer and the hydrophilic layer contains a compound capable of converting light into heat, the aluminum support has an anodic oxide film in an amount of 2 g/m2 or more, and the anodic oxide film has been subjected to sealing treatment at a sealing rate of 50% or more.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: October 22, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Hisashi Hotta
  • Patent number: 6420081
    Abstract: The invention relates to a process for the production of a photosensitive recording material for the production of offset printing plates which comprises a dimensionally stable, two-dimensional support of a metal or metal alloy and a silver halide-containing, photosensitive layer on the front of the support and a layer which essentially consists of an organic polymeric material and is resistant to processing chemicals on the back of the support. The layer on the back of the support is applied before the photosensitive coating on the front. The invention furthermore relates to a corresponding recording material in which the layer on the back comprises at least one organic polymer having a glass transition temperature Tg of 50° C. or above. Due to the back coating, the formation of local elements between the metallic support and the silver-containing layer is reliably prevented when the recording materials are stacked.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: July 16, 2002
    Assignee: AGFA-Gevaert
    Inventors: Andreas Elsässer, Michael Dörr, Steffen Denzinger, Paul Coppens
  • Patent number: 6335142
    Abstract: Light absorbing coating with high absorption capacity. This coating comprises at least one thin optically discontinuous metal layer (8), absorbent within a determined spectral range in the visible-near infrared range, and at least one dielectric layer (10) transparent within this range and formed on the thin layer. Application to imagery.
    Type: Grant
    Filed: November 16, 1998
    Date of Patent: January 1, 2002
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Etienne Quesnel, Patrick Chaton
  • Patent number: 6291150
    Abstract: This invention relates to a photographic element comprising at least one silver halide containing imaging layer and a metallic layer below said at least one imaging layer having a having a highly spectral reflectance.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: September 18, 2001
    Assignee: Eastman Kodak Company
    Inventors: Alphonse D. Camp, Robert P. Bourdelais, Peter T. Aylward
  • Patent number: 6277547
    Abstract: The invention relates to an element consisting essentially of a transparent polymer sheet, at least one emulsion adhering layer, and at least one light sensitive silver halide grain containing emulsion layer adhered to said emulsion adhering layer, wherein said polymer sheet is less than 40 &mgr;m in thickness.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: August 21, 2001
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Peter T. Aylward, Alphonse D. Camp, Thaddeus S. Gula
  • Patent number: 6238839
    Abstract: A lithographic printing plate precursor which comprises a metal support having provided thereon a heat-insulating layer, a metal layer having a hydrophilic surface, and a lipophilic layer which is abraded by heating or whose solubility to alkali is transformed by heating, in this order from the support.
    Type: Grant
    Filed: August 22, 2000
    Date of Patent: May 29, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadabumi Tomita, Hisashi Hotta, Akio Uesugi
  • Patent number: 6187518
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion superposed on a front side of the support and an outermost backing layer superposed on a backside of the support. The outermost backing layer is composed of a hydrophobic binder and a hydrophilic binder wherein the backing layer has an advancing water contact angle of 70 or greater and a receding water contact angle of at least 40 less than the advancing water contact angle.
    Type: Grant
    Filed: October 23, 1998
    Date of Patent: February 13, 2001
    Assignee: Eastman Kodak Company
    Inventors: Raymond T. Jones, Ravi Sharma, Alfred B. Fant
  • Patent number: 6130030
    Abstract: The present invention is a photographic element having a support, at least one silver halide emulsion layer superposed on the support, at least one electrically conductive layer superposed on the support and a protective overcoat superposed on the support. The electrically conductive layer is composed of an electrically conductive agent and a binder. The protective overcoat includes a polyurethane having a tensile elongation to break of at least 50% and a Young's modulus measured at 2% elongation of at least 50,000 lb/in.sup.2 and an interpolymer comprising repeating units of A and B wherein A comprises a fluorine containing acrylate or a fluorine containing methacrylate monomer and B comprises an ethylenically unsaturated monomer containing hydratable groups.
    Type: Grant
    Filed: March 23, 1999
    Date of Patent: October 10, 2000
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Brian A. Schell
  • Patent number: 6110642
    Abstract: In a photosensitive lithographic plate including a photosensitive layer coated on the surface of a substrate and a mat layer formed on the photosensitive layer, plural resinous protrusions are provided on the back surface of the substrate in the form of a layer. Deterioration of vacuum adhesion due to the mat collapsed in a production process of a photosensitive lithographic plate including a step of winding is prevented, consequently, a photosensitive lithographic plate with uniform quality is obtained regardless of its wound position.
    Type: Grant
    Filed: June 3, 1998
    Date of Patent: August 29, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuhito Naruse, Kenji Shinoda
  • Patent number: 6107015
    Abstract: The present invention is a photographic element having a support, at least one silver halide emulsion layer superposed on a first side of the support and a protective overcoat superposed on a second said of the support. The protective overcoat includes a polyurethane having a tensile elongation to break of at least 50% and a Young's modulus measured at 2% elongation of at least 50,000 lb/in.sup.2, an interpolymer composed of repeating units of A and B wherein A comprises a fluorine containing acrylate or a fluorine containing methacrylate monomer and B comprises an ethylenically unsaturated monomer containing hydratable groups and an electrically conductive agent.
    Type: Grant
    Filed: March 23, 1999
    Date of Patent: August 22, 2000
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Brian A. Schell, Mario D. DeLaura
  • Patent number: 5994045
    Abstract: This invention is generally accomplished by a photographic or imaging element comprising a paper base, at least one photosensitive silver halide layer, a tie layer and a biaxiaily oriented polyolefin sheet wherein said polyolefin sheet by itself or in combination with said tie layer has a water vapor transmission rate of less than 0.85.times.10.sup.-5 g/mm.sup.2 /day.
    Type: Grant
    Filed: December 24, 1997
    Date of Patent: November 30, 1999
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Douglas N. Haydock, Thaddeus S. Gula, Peter T. Aylward
  • Patent number: 5935765
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5830630
    Abstract: A light-sensitive sheet comprises an aluminum alloy support and a light-sensitive layer. The aluminum alloy support contains grains of secondary phase. The maximum grain size of the grains of secondary phase essentially is less than 5 .mu.m. Silver halide light-sensitive materials having the aluminum alloy support are also disclosed.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: November 3, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Satoshi Hoshi, Hirokazu Sakaki, Yoshinori Hotta
  • Patent number: 5733712
    Abstract: A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film.
    Type: Grant
    Filed: February 16, 1996
    Date of Patent: March 31, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5723272
    Abstract: Silver halide light sensitive photographic elements comprising a support bearing on one side thereof at least one blue-sensitive silver halide emulsion yellow-image forming layer, at least one red-sensitive silver halide emulsion cyan-image forming layer, at least one green-sensitive silver halide emulsion magenta-image forming layer, and an antihalation layer comprising a cyan filter dye coated between the support and the red-sensitive layer, wherein the green-sensitive layer comprises a four equivalent magenta image forming coupler and the cyan filter dye is of the formula (I): ##STR1## where L.sup.1, L.sup.2, L.sup.3, L.sup.4 and L.sup.5 are methine groups; R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently H or alkyl or aryl groups; and M.sup.+ is H or a counter ion; wherein at least one of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 comprises an aryl group substituted with a substituent having a .pi. value of less than -0.10, where .pi.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: March 3, 1998
    Assignee: Eastman Kodak Company
    Inventors: Gary Norman Barber, Margaret Jones Helber
  • Patent number: 5698352
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: March 19, 1997
    Date of Patent: December 16, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho
  • Patent number: 5670297
    Abstract: A process for formation of a metal pattern comprising the steps of forming a silicide metal film on an underlying substrate, forming an anti-reflection film on the underlying substrate on which the silicide metal film is formed, forming a resist film on the anti-reflection film, patterning the resist film by photolithography to form a predetermined pattern, and using the thus patterned resist film as a mask and etching the silicide metal film on the underlying substrate, wherein the optical constants and the thickness of the anti-reflection film are determined to give the smallest standing wave effect at the time of photolithography in accordance with the type of the silicide metal film.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: September 23, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Hiroyuki Nakano
  • Patent number: 5650258
    Abstract: Laminates of aluminum and plastic form the substrate of printing plate precursors that are suitable for imaging in conventional roll-fed imagesetters or phototypesetters.
    Type: Grant
    Filed: June 30, 1995
    Date of Patent: July 22, 1997
    Inventors: Stephen Bernard Doyle, Allen Peter Gates, John Michael Kitteridge, Philip John Watkiss
  • Patent number: 5648202
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: September 28, 1995
    Date of Patent: July 15, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho
  • Patent number: 5597681
    Abstract: Imaging elements, such as photographic films and papers, are comprised of a support, an image-forming layer, an electrically-conductive layer and a protective overcoat layer that overlies the electrically-conductive layer. The protective overcoat layer is coated from a dispersion of core/shell polymer particles in a liquid organic medium, the polymer particles comprising a core portion which is insoluble in the organic medium and a shell portion which has an affinity for both the core portion and the organic medium.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: January 28, 1997
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Yongcai Wang, Mario D. DeLaura, James L. Bello
  • Patent number: 5591566
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 7, 1997
    Assignee: Sony Corporation
    Inventor: Tohru Ogawa
  • Patent number: 5578426
    Abstract: There is disclosed a method for processing a silver halide color photographic material having, on a support, at least one photosensitive silver halide emulsion layer, which comprises processing after exposure to light said silver halide color photographic material, wherein the silver halide in said emulsion layer contains 90 mol % or more of silver chloride, and said photographic material has a white pigment-containing hydrophilic colloid layer coated on the support, the coating amount of the white pigment being 2 g/m.sup.2 or more, with a color developer containing chloride ions in an amount of 0.04 to 0.25 mol/l.
    Type: Grant
    Filed: December 14, 1994
    Date of Patent: November 26, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Koichi Nakamura
  • Patent number: 5472831
    Abstract: A silver halide light-sensitive material is described, including an embodiment containing a polyester film support having thereon at least one light-sensitive layer, wherein the polyester film support satisfies the following relationships:Tg.ltoreq.32.1A.sup.2 +55X.gtoreq.-0.74Tg+71.7wherein Tg is a glass transition temperature (.degree.C.); A is an equivalent water content (%) after moisture conditioning at 25.degree. C. and 50% RH for 10 days; and X is a degree of crystallinity.
    Type: Grant
    Filed: October 3, 1994
    Date of Patent: December 5, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yosuke Nishiura, Yukio Shinagawa, Kiyokazu Hashimoto, Junichi Yamanouchi, Yasuo Mukunoki
  • Patent number: 5472829
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: December 5, 1995
    Assignee: Sony Corporation
    Inventor: Tohru Ogawa
  • Patent number: 5472827
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: December 29, 1993
    Date of Patent: December 5, 1995
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho
  • Patent number: 5436123
    Abstract: A silver halide photographic light-sensitive material comprises a support and provided thereon, a hydrophilic colloid layer comprising a silver halide emulsion layer, wherein said support has a thickness of 70 to 120 .mu.m and Young's modulus of not less than 550 kg/mm.sup.2 and said hydrophilic colloid layer has a degree of swelling of not more than 80%, said degree of swelling being obtained by the following equation:Degree of swelling=(B-A).times.100 Awherein A represents a dry thickness .mu.m of the hydrophilic colloid layer and B represents a thickness .mu.m of the hydrophilic colloid layer after the material was immersed for 15 minutes at 35.degree. C. in developer (b).
    Type: Grant
    Filed: June 20, 1994
    Date of Patent: July 25, 1995
    Assignee: Konica Corporation
    Inventor: Akiko Suzuki
  • Patent number: 5330885
    Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer, wherein at least one hydrophilic colloidal layer containing said light-sensitive silver halide emulsion layer comprises the polymer latex stabilized by gelatin, and the outermost layer on the side containing said light-sensitive silver halide emulsion layer and/or the outermost layer on the other side comprises the anionic fluorine containing surfactant and/or cationic fluorine containing surfactant.
    Type: Grant
    Filed: February 4, 1993
    Date of Patent: July 19, 1994
    Assignee: Konica Corporation
    Inventors: Yasuhiko Takamuki, Kazuhiro Yoshida, Takeo Arai
  • Patent number: 5302460
    Abstract: A support material for photosensitive substances, useful in the production of offset-printing plates, is disclosed. The support material comprises mechanically, chemically or electrochemically roughened aluminum or an aluminum alloy in the form of a sheet, a foil or a web, and which is coated on at least one side with a hydrophilic polymer which comprises (a) at least 2 mol% of units having acidic side groups and (b) at least 2 mol% of units having basic side groups which are capable of being protonated.
    Type: Grant
    Filed: July 17, 1991
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Engelbert Pliefke, Raimund J. Faust
  • Patent number: 5294473
    Abstract: A photographic polyester support is disclosed which hardly curls when heat-treated at a temperature of from 50.degree. C. to the glass transition temperature thereof in the form of a bulk roll, its thickness pattern satisfying the conditions of (1) Max-Min in the whole widthwise direction (TD R value): 8 .mu.m or less, (2) Max-Min of 5 m length in the lengthwise direction (MD R value): 10 .mu.m or less, (3) the difference in thickness between the adjacent hill and hollow (MD fluctuation): 8 .mu.m or less, and (4) the maximum value of hills above a base line of the average thickness of both ends (TD base line value): 5 .mu.m or less. The surface flatness of the heat-treated support is good. When the support is coated with photographic emulsions, the surface of the coated photographic material is even.
    Type: Grant
    Filed: August 13, 1993
    Date of Patent: March 15, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Fumio Kawamoto
  • Patent number: 5281513
    Abstract: A silver halide photographic material is disclosed, comprising a support having on one side thereof (1) at least one light-sensitive silver halide emulsion layer and (2) at least one light-insensitive hydrophilic colloid layer containing a dye dispersed in the form of fine solid particles in which the light-sensitive silver halide emulsion layer is located between the support and the light-insensitive layer; and having on the other side thereof at least one light-insensitive backing layer, wherein the backing layer has a absorbance at 320 to 400 nm of 0.50 to 0.90.
    Type: Grant
    Filed: October 21, 1992
    Date of Patent: January 25, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Takahiro Goto, Nobuaki Inoue
  • Patent number: 5254430
    Abstract: A PS plate comprises an aluminum plate which is surface-roughened and then anodized so that the amount of an anodized layer formed is not less than 1.0 g/m.sup.2 ; a hydrophilic layer which is applied onto the anodized layer and which comprises at least one compound selected from the group consisting of:(A) substituted or unsubstituted aliphatic or aromatic phosphonic acids having one or two phosphonic acid residues in the molecule and salts thereof; and(B) substituted or unsubstituted aliphatic or aromatic phosphinic acids having one or two phosphinic acid residues in the molecule and salts thereof,wherein the substituent of the compounds (A) and (B) being at least one member selected from the group consisting of hydroxyl, alkoxy, aryloxy, carboxyl, alkyl, aryl, allyl, acyl, acyloxy, nitro and cyano groups and halogen atoms; and a layer of a positive-working light-sensitive composition formed on the hydrophilic layer.
    Type: Grant
    Filed: January 29, 1992
    Date of Patent: October 19, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nagashima, Keiji Akiyama, Tadao Toyama
  • Patent number: 5242784
    Abstract: An optical phase change media comprises a substrate, an active layer having a crystalline and a liquid state, a dielectric layer and a reflective layer. The active layer is of a thickness which will transmit incident light. The dielectric layer is of a thickness such that light passing through the active layer is reflected by the reflective layer and destructively interferes with the incident light reflected directly off of the active layer, thereby causing the crystalline state of the active layer to absorb more light than the liquid state. The result is that the media experiences reduced temperature during writing.
    Type: Grant
    Filed: June 22, 1992
    Date of Patent: September 7, 1993
    Assignee: International Business Machines Corporation
    Inventors: Martin Y. Chen, Kurt A. Rubin
  • Patent number: 5238788
    Abstract: There is disclosed a method for forming a dye image which comprises a step of processing, with a color developing solution, a photo-sensitive silver halide photographic material comprising a support having thereon a silver halide emulsion layer. The method is characterized in that said silver halide emulsion layer comprises silver halide grains having a silver chloride content of not less than 90 mol. %; said photosensitive silver halide photographic material comprises a white pigment in an amount of not less than 3.5 g per m.sup.2 of said photographic material; and said photosensitive silver halide photographic material is, after being processed with the color developing solution, processed with a bleaching solution (BL-1) and subsequently with a fixing solution.
    Type: Grant
    Filed: January 13, 1992
    Date of Patent: August 24, 1993
    Assignee: Konica Corporation
    Inventors: Makoto Kajiwara, Takashi Kadowaki
  • Patent number: 5153115
    Abstract: Silver halide photographic materials are disclosed, comprising a support having thereon at least one photosensitive silver halide emulsion layer, wherein at least one layer of said photographic material is formed by polymerizing a film which contains a compound represented by formula (I): ##STR1## wherein X represents --CO--, --COO--, --OCO-- or an arylene group; L represents an alkylene group, an aralkylene group or an arylene group, any of which can optionally have substituents; Y represents --CO--, --SO.sub.2 -- or --NHCO--; m and p each independently represents 0 to 1, provided that when X is ##STR2## m is 1; Z represents --O--, --S-- or ##STR3## R.sub.1 represents a hydrogen atom, an alkyl group, a halogen atom or a cyano group; R.sub.2, R.sub.3 and R.sub.4 represent lower alkylene groups; R.sub.5 represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an aralkyl group, --CO--R.sub.9 or --SO.sub.2 R.sub.9, any of which, other than a hydrogen atom, can optionally have substituents; R.
    Type: Grant
    Filed: August 5, 1991
    Date of Patent: October 6, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shoichiro Yasunami, Yasuo Mukunoki
  • Patent number: 5151345
    Abstract: A silver halide color photographic material comprising a reflective support comprising a support base material coated with a waterproof resin layer, and at least one silver halide emulsion layer thereon, wherein at least one silver halide emulsion layer thereon comprises silver halide grains containing at least 90 mol % silver chloride, having a silver bromide-rich region near at least one apex of the silver halide grain, and having a mean bromide content at the surface of the grain of not more than 15 mol %, wherein the waterproof resin layer having the silver halide emulsion layer thereon contains titanium oxide in an amount of 14% or more by weight; and further the optical reflection density of the photographic material at 680 nm is not lower than 0.70.
    Type: Grant
    Filed: November 13, 1990
    Date of Patent: September 29, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazunori Hasebe
  • Patent number: 5100770
    Abstract: Disclosed is a support used for photographic materials which is prevented from staining of the edge portion which is caused by permeation of developing solution from cut section. This support for photographic materials comprises a base paper both sides of which are coated with a resin, said base paper containing a titanium oxide coated with at least one metal oxide selected from the oxides of Al, Si, Mn, Zn and Ti.
    Type: Grant
    Filed: October 5, 1990
    Date of Patent: March 31, 1992
    Assignee: Mitsubishi Paper Mills Limited
    Inventor: Tetsuya Ashida
  • Patent number: 5075204
    Abstract: A silver halide color photosensitive material comprising a support having a metal surface with secondary diffuse reflection and a total reflectance of 0.5 or more in the visible wavelength region of 420 to 680 nm, said support having provided thereon a photosensitive silver halide emulsion layer containing a yellow coupler, a photosensitive silver halide emulsion layer containin a magenta coupler, and a photosensitive silver halide emulsion layer containing a cyan coupler and at least one non-photosensitive hydrophilic colloid layer, wherein the volume ratio R of the hydrophilic constituents in each photosensitive silver halide emulsion layer with respect to the non-hydrophilic constituents therein is 1.30 or less, and the photosensitive silver halide emulsion layer containing a color coupler which is arranged nearest the support has an R value of 1.20 or less.
    Type: Grant
    Filed: March 13, 1990
    Date of Patent: December 24, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keisuke Shiba, Tadashi Ogawa
  • Patent number: 5068165
    Abstract: Method for making lithographic aluminium offset printing plates according to the DTR-process by photo-exposing a photosensitive monosheet layer assemblage comprising a hydrophilic aluminium foil, a water-swellable intermediate layer comprising a non-protenic hydrophilic film-forming polymer, and a silver halide emulsion layer, applying an aqueous alkaline solution thereto in the presence of a developing agent and a silver halide solvent, allowing to reduce the photo-exposed silver halide, allowing the unreduced silver halide or complexes thereof to diffuse to said aluminium foil to form a silver image thereon, and separating said emulsion layer and said intermediate layer from the image aluminium foil. The invention also relates to the photosensitive monosheet layer assemblage used for making such printing plates.
    Type: Grant
    Filed: July 16, 1990
    Date of Patent: November 26, 1991
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Paul J. Coppens, Ludovicus H. Vervloet, Luc H. Leenders, Ronald Schuerwegen