Aluminum Patents (Class 430/526)
  • Patent number: 8632940
    Abstract: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: January 21, 2014
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Celin Savariar-Hauck, Oliver R. Blum, Michael Nielinger
  • Patent number: 6861200
    Abstract: A negative working photosensitive lithographic printing plate is disclosed, which comprises a support having thereon at least one photosensitive layer containing a polymeric binder having repeating units represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group which has an alicyclic structure and has 3 to 30 carbon atoms and a valence of n+1; A represents an oxygen atom or —NR3—, wherein R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n is an integer of 1 to 5. The negative working photosensitive lithographic printing plate can attain both high productivity and high printing durability. It is especially suitable for drawing with laser light.
    Type: Grant
    Filed: July 19, 2001
    Date of Patent: March 1, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasuhito Oshima
  • Patent number: 6551760
    Abstract: A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.
    Type: Grant
    Filed: March 23, 2001
    Date of Patent: April 22, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akio Uesugi, Masahiro Endo
  • Patent number: 6468717
    Abstract: A heat-sensitive lithographic printing plate precursor is disclosed, which comprises an aluminum support having provided thereon an ink-receptive layer and a hydrophilic layer containing a colloidal particle oxide or hydroxide of at least one element selected from the group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and transition metals, wherein at least one layer of the ink-receptive layer and the hydrophilic layer contains a compound capable of converting light into heat, the aluminum support has an anodic oxide film in an amount of 2 g/m2 or more, and the anodic oxide film has been subjected to sealing treatment at a sealing rate of 50% or more.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: October 22, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Hisashi Hotta
  • Patent number: 6447982
    Abstract: A litho strip for use as an offset printing plate is described which has a composition of 0.05-0.25% Si, 0.30-0.40% Fe, 0.10-0.30% Mg, max. 0.05% Mn, and max. 0.04% Cu. The strip is produced from a continuous cast ingot of the above composition which is hot rolled to a thickness of up to 2-7 mm. The residual resistance ratio of the hot rolled strip is RR=10-20. The cold rolling is carried out with or without intermediate annealing, wherein the degree of rolling reduction after intermediate annealing is >60%. The further processing up to the EC roughening takes place with the microstructure adjusted in the rolling process at <100° C. The litho strip is characterized by a high thermal stability, a good roughening behavior in the EC processes, and a high reverse bending fatigue strength perpendicular to the rolling direction.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: September 10, 2002
    Assignee: VAW Aluminium AG
    Inventors: Wolfgang von Asten, Bernhard Kernig, Barbara Grzemba
  • Publication number: 20020028403
    Abstract: The invention relates to a process for the production of a photosensitive recording material for the production of offset printing plates which comprises a dimensionally stable, two-dimensional support of a metal or metal alloy and a silver halide-containing, photosensitive layer on the front of the support and a layer which essentially consists of an organic polymeric material and is resistant to processing chemicals on the back of the support. The layer on the back of the support is applied before the photosensitive coating on the front. The invention furthermore relates to a corresponding recording material in which the layer on the back comprises at least one organic polymer having a glass transition temperature Tg of 50° C. or above. Due to the back coating, the formation of local elements between the metallic support and the silver-containing layer is reliably prevented when the recording materials are stacked.
    Type: Application
    Filed: April 26, 2001
    Publication date: March 7, 2002
    Inventors: Andreas Elsasser, Michael Dorr, Steffen Denzinger, Paul Coppens
  • Patent number: 6291150
    Abstract: This invention relates to a photographic element comprising at least one silver halide containing imaging layer and a metallic layer below said at least one imaging layer having a having a highly spectral reflectance.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: September 18, 2001
    Assignee: Eastman Kodak Company
    Inventors: Alphonse D. Camp, Robert P. Bourdelais, Peter T. Aylward
  • Patent number: 6242156
    Abstract: This invention discloses a lithographic plate comprising on a roughened substrate a substantially conformal radiation-sensitive layer. The radiation-sensitive layer can be a photo hardenable or photo solubilizable layer, or can be a laser ablatable layer. The radiation-sensitive layer is substantially conformally coated on the roughened substrate surface in a way so that the surface of the radiation-sensitive layer has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: June 5, 2001
    Inventor: Gary Ganghui Teng
  • Patent number: 6146808
    Abstract: According to the present invention there is provided a method for preparing a silver salt diffusion transfer imaging element comprising the steps of coating in the order given on a grained and anodized side of an aluminum support (i) an image receiving layer containing physical development nuclei, (ii) a photosensitive layer containing a silver halide emulsion being in water permeable relationship with said image receiving layer and (iii) optionally an antistress layer being in water permeable relationship with said image receiving layer, characterized in that said element before and/or after being coated with said image-receiving layer and before being coated with another layer is wetted with a fluidum with a conductivity of at least 1 .mu.S/cm at 25.degree. C. and then the wetted element is brought in contact with an earthed discharging means and dried before coating the following layer.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: November 14, 2000
    Assignee: AGFA-Gevaert, N.V.
    Inventor: Marcus Jonkheere
  • Patent number: 6146807
    Abstract: According to the present invention there is provided a method for preparing a silver salt diffusion transfer imaging element comprising the steps of coating in the order given on a grained and anodized side of an aluminum support (i) an image receiving layer containing physical development nuclei, (ii) a photosensitive layer containing a silver halide emulsion in water permeable relationship with said image receiving layer and (iii) optionally an antistress layer in water permeable relationship with said image receiving layer, characterized in that said aluminum support, provided with said image receiving layer, is kept at a relative humidity of at least 45% in an area of a machine, the said area being ahead of a coating head used for coating said photosensitive layer.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: November 14, 2000
    Assignee: Agfa-Gevaert, N.V.
    Inventor: Marcus Jonkheere
  • Patent number: 5985517
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: April 1, 1999
    Date of Patent: November 16, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5935765
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5830630
    Abstract: A light-sensitive sheet comprises an aluminum alloy support and a light-sensitive layer. The aluminum alloy support contains grains of secondary phase. The maximum grain size of the grains of secondary phase essentially is less than 5 .mu.m. Silver halide light-sensitive materials having the aluminum alloy support are also disclosed.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: November 3, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Satoshi Hoshi, Hirokazu Sakaki, Yoshinori Hotta
  • Patent number: 5733712
    Abstract: A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film.
    Type: Grant
    Filed: February 16, 1996
    Date of Patent: March 31, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5670297
    Abstract: A process for formation of a metal pattern comprising the steps of forming a silicide metal film on an underlying substrate, forming an anti-reflection film on the underlying substrate on which the silicide metal film is formed, forming a resist film on the anti-reflection film, patterning the resist film by photolithography to form a predetermined pattern, and using the thus patterned resist film as a mask and etching the silicide metal film on the underlying substrate, wherein the optical constants and the thickness of the anti-reflection film are determined to give the smallest standing wave effect at the time of photolithography in accordance with the type of the silicide metal film.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: September 23, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Hiroyuki Nakano
  • Patent number: 5591566
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 7, 1997
    Assignee: Sony Corporation
    Inventor: Tohru Ogawa
  • Patent number: 5556738
    Abstract: A silver halide photographic element with enhanced sensitivity and improved pressure resistance is disclosed, comprising a support having, on at least one side thereof, hydrophilic colloidal layers including a light-sensitive silver halide emulsion layer and a nonlight-sensitive hydrophilic colloidal layer, wherein the nonlight-sensitive layer contains organic material-aggregation particles; and gelatin contained in the total hydrophilic colloidal layers provided on one side of the support amounts to a range of 1.3 to 2.5 g per m.sup.2.
    Type: Grant
    Filed: July 13, 1995
    Date of Patent: September 17, 1996
    Assignee: Konica Corporation
    Inventors: Yasuhiko Takamuki, Ken Nagami
  • Patent number: 5547821
    Abstract: Thermally processable imaging elements in which the image is formed by imagewise heating or by imagewise exposure to light followed by uniform heating are provided with an electroconductive overcoat layer or an electroconductive backing layer or both an electroconductive overcoat layer and an electroconductive backing layer. Such electroconductive layers are comprised of electrically-conductive metal-containing particles dispersed in a polymeric binder in an amount sufficient to provide a surface resistivity of less than 5.times.10.sup.11 ohms/square.
    Type: Grant
    Filed: May 17, 1995
    Date of Patent: August 20, 1996
    Assignee: Eastman Kodak Company
    Inventors: Sharon M. Melpolder, Charles C. Anderson, Peter J. Cowdery-Corvan, John F. DeCory
  • Patent number: 5472829
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: December 5, 1995
    Assignee: Sony Corporation
    Inventor: Tohru Ogawa
  • Patent number: 5393651
    Abstract: A silver halide light-sensitive material is disclosed. The light-sensitive material comprises an aluminum support, an anodic oxide layer and a light-sensitive polymerizable layer in the order. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. According to the present invention, an intervening layer is further provided between the anodic oxide layer and the light-sensitive polymerizable layer. The intervening layer contains a compound having a metal cation or a metal oxide anion. The metal cation or the metal oxide anion has a standard electrode potential of 0 V or more.
    Type: Grant
    Filed: July 8, 1994
    Date of Patent: February 28, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Satoshi Hoshi
  • Patent number: 5302460
    Abstract: A support material for photosensitive substances, useful in the production of offset-printing plates, is disclosed. The support material comprises mechanically, chemically or electrochemically roughened aluminum or an aluminum alloy in the form of a sheet, a foil or a web, and which is coated on at least one side with a hydrophilic polymer which comprises (a) at least 2 mol% of units having acidic side groups and (b) at least 2 mol% of units having basic side groups which are capable of being protonated.
    Type: Grant
    Filed: July 17, 1991
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Engelbert Pliefke, Raimund J. Faust
  • Patent number: 5273858
    Abstract: Method for making lithographic aluminum offset printing plates according to the DTR-process by photo-exposing a photosensitive monosheet layer assemblage comprising a hydrophilic aluminum foil, an intermediate layer comprising hydrophobic polymer beads prepared by polymerization of ethylenically unsaturated monomer(s) and having an average diameter not lower than 0.2 .mu.m, and a silver halide emulsion layer, applying an aqueous alkaline solution to the photo-exposed silver halide emulsion layer in the presence of a developing agent and a silver halide solvent to form a silver image and to allow unreduced silver halide or complexes formed thereof to diffuse imagewise from the developed silver halide emulsion layer to said aluminum foil to produce thereon a silver image, and separating said emulsion layer and said intermediate layer from the imaged aluminum foil. The invention also relates to the photosensitive monosheet layer assemblage used for making such printing plates.
    Type: Grant
    Filed: October 28, 1991
    Date of Patent: December 28, 1993
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Paul J. Coppens, Joan T. Vermeersch, Luc H. Leenders, Ludovicus H. Vervloet, Eric M. Hoes, Eddie R. Daems
  • Patent number: 5258276
    Abstract: A ternary surfactant system useful in reducing the propensity of silver halide elements to generate unwanted static is described. This ternary system comprises a mixture of a specific anionic and two specific nonionic surfactants and produces a surprising synergistic result. A solution of this ternary system is also useful in reducing static produced on the surface of an X-ray intensifying screen.
    Type: Grant
    Filed: May 15, 1992
    Date of Patent: November 2, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Allan R. Schoenberg, Ming-tsai Shu
  • Patent number: 5254430
    Abstract: A PS plate comprises an aluminum plate which is surface-roughened and then anodized so that the amount of an anodized layer formed is not less than 1.0 g/m.sup.2 ; a hydrophilic layer which is applied onto the anodized layer and which comprises at least one compound selected from the group consisting of:(A) substituted or unsubstituted aliphatic or aromatic phosphonic acids having one or two phosphonic acid residues in the molecule and salts thereof; and(B) substituted or unsubstituted aliphatic or aromatic phosphinic acids having one or two phosphinic acid residues in the molecule and salts thereof,wherein the substituent of the compounds (A) and (B) being at least one member selected from the group consisting of hydroxyl, alkoxy, aryloxy, carboxyl, alkyl, aryl, allyl, acyl, acyloxy, nitro and cyano groups and halogen atoms; and a layer of a positive-working light-sensitive composition formed on the hydrophilic layer.
    Type: Grant
    Filed: January 29, 1992
    Date of Patent: October 19, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nagashima, Keiji Akiyama, Tadao Toyama
  • Patent number: 5196288
    Abstract: An image forming method of imagewise exposing and heating a light-sensitive material is disclosed. The light-sensitive material comprises a support and a light-sensitive layer provided thereon. The light-sensitive layer contains silver halide, a reducing agent, an ethylenically unsaturated polymerizable compound, a color image forming substance and a base precursor. The silver halide, the reducing agent, the polymerizable compound, the color image forming substance and the base precursor are contained in microcapsules which are dispersed in the light-sensitive layer. According to the present invention, the support is made of a thin polymer film having a thickness of not more than 75 .mu.m. The light-sensitive material is heated from the side of the support for 0.1 to 5 seconds.
    Type: Grant
    Filed: September 9, 1991
    Date of Patent: March 23, 1993
    Assignees: Fuji Photo Film Co., Ltd., Seiko Epson Corp., Seiko Instruments, Inc.
    Inventor: Taku Nakamura
  • Patent number: 5135843
    Abstract: The improved silver halide photographic material comprises a support having an antistatic coating thereon that contains a water-soluble conductive polymer, hydrophobic polymer particles and a curing agent which is a bifunctional ethylene oxide type curing agent that is to be cured by exposure to electron beams or X-rays. This silver halide photographic material may contain a tetrazolium compound or a hydrazine compound in order to prevent desensitization due to aging. At least one hydrophilic colloidal layer may be provided on the antistatic coating, which colloidal layer contains an epoxy curing agent having a hydroxy group.
    Type: Grant
    Filed: July 27, 1990
    Date of Patent: August 4, 1992
    Assignee: Konica Corporation
    Inventors: Yasuhiko Takamuki, Takatoshi Yamada, Takeshi Habu, Toshiharu Nagashima
  • Patent number: 5132196
    Abstract: The present invention relates to an electrophotographic sensitive member having a photosensitive layer superimposed on an aluminum substrate having an aluminum oxide layer improving the color reproducibility of specific colors' wherein the aluminum oxide layer is colored to have specific maximum absorption wavelength.
    Type: Grant
    Filed: August 28, 1990
    Date of Patent: July 21, 1992
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventors: Junya Hirayama, Yasuyuki Nomura, Fumio Masuda
  • Patent number: 5068165
    Abstract: Method for making lithographic aluminium offset printing plates according to the DTR-process by photo-exposing a photosensitive monosheet layer assemblage comprising a hydrophilic aluminium foil, a water-swellable intermediate layer comprising a non-protenic hydrophilic film-forming polymer, and a silver halide emulsion layer, applying an aqueous alkaline solution thereto in the presence of a developing agent and a silver halide solvent, allowing to reduce the photo-exposed silver halide, allowing the unreduced silver halide or complexes thereof to diffuse to said aluminium foil to form a silver image thereon, and separating said emulsion layer and said intermediate layer from the image aluminium foil. The invention also relates to the photosensitive monosheet layer assemblage used for making such printing plates.
    Type: Grant
    Filed: July 16, 1990
    Date of Patent: November 26, 1991
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Paul J. Coppens, Ludovicus H. Vervloet, Luc H. Leenders, Ronald Schuerwegen
  • Patent number: 5053322
    Abstract: A method for processing a silver halide color photographic material is disclosed, comprising a support having a thin film of metal or metal oxide on a substrate; said thin film having mirror surface reflection properties or secondary diffuse reflection properties and having a surfaced reflectance of at least 0.5; said photographic material having thereon, in order outwardly from the support, an adhesive layer and at least one light-sensitive silver halide emulsion layer, by the steps which comprise developing the silver halide color photographic material with a developing bath containing a color developing agent and at least one compound represented by formulae (I), (II), (III) or (IV): ##STR1## wherein M each represents hydrogen, an alkali metal or an ammonium group; and R.sub.1 represents a lower alkyl group; ##STR2## wherein R.sub.2 R.sub.3 and R.sub.4 each represents --COOM, --PO.sub.3 M.sub.
    Type: Grant
    Filed: October 27, 1989
    Date of Patent: October 1, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keisuke Shiba, Akira Abe
  • Patent number: 4971885
    Abstract: A recording sheet which comprises a substrate having a large of a metal on the surface thereof, and a layer of microcapsules, said layer of microcapsules including a coupling agent to improve the adhesion of said microcapsule layer to said metal layer; the coupling agent is preferably a silane.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: November 20, 1990
    Assignee: The Mead Corporation
    Inventors: William A. Hammann, IV, Rong-Chang Liang, Teresa M. Thomas, Jesse Hipps, Sr.
  • Patent number: 4948719
    Abstract: A photographic support comprising a substrate having thereon a metal film layer having mirror reflective surface or secondary diffuse-reflective surface and an adhesive layer on the metal film layer, wherein the adhesive layer contains a copolymer composition of a diolefin and at least one other ethylenically unsaturated polymerizable monomer, or a silane coupling agent represented by formula (2-I) or (2-II): ##STR1## wherein Y represents an organic functional group, R represents an alkylene group having 1 to 5 carbon atoms, R' represents an alkoxy group having 1 to 4 carbon atoms, and n represents 2 or 3.
    Type: Grant
    Filed: April 11, 1988
    Date of Patent: August 14, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuyuki Koike, Tetsuro Fuchizawa, Keisuke Shiba
  • Patent number: 4933304
    Abstract: The method for producing the surface reflectance of the metal layer during semiconductor processing includes the step of roughening the surface of a metal layer prior to forming the photoresist thereon. The roughened surface reduces reflections that can cause metal notching effects. The step of roughening the surface includes depositing a layer (34) of aluminum which is substantially thinner than the thickness of the primary metal layer by a sputtering process.
    Type: Grant
    Filed: November 3, 1988
    Date of Patent: June 12, 1990
    Assignee: SGS-Thomson Microelectronics, Inc.
    Inventors: Fusen Chen, Yih-Shung Lin, Fu-Tai Liou
  • Patent number: 4908295
    Abstract: A photographic support having a secondary diffuse-reflective surface is disclosed, wherein a thin metal layer is provided on the matted surface of a substrate and the center plane average roughness, as determined by a three dimensional roughness measuring apparatus, of the thin metal layer is 0.1 to 1.2 .mu.m.
    Type: Grant
    Filed: January 26, 1989
    Date of Patent: March 13, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tetsuro Fuchizawa, Kazuyuki Koike
  • Patent number: 4894321
    Abstract: The present invention relates to a photographic support comprising, on a substrate, a filling layer comprising a fine solid powder having the stationary diffuse-reflective surface and a color photosensitive material comprising at least one silver halide emulsion layer formed on the secondary diffuse-reflective surface of a filling layer comprising a solid powder formed on a substrate. A photographic support of the present invention provides an image having remarkably improved brightness, saturation, tone reproducibility in shade areas and sharpness. A printing color photosensitive material of the present invention provides an image having remarkably improved brightness, saturation, tone reproducibility in shades and sharpness and also capable of rigid development.
    Type: Grant
    Filed: July 15, 1987
    Date of Patent: January 16, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadashi Ogawa, Tetsuro Fuchizawa, Masaru Sano, Seiichi Taguchi, Keisuke Shiba
  • Patent number: 4853093
    Abstract: There is disclosed a plate-, foil- or web-shaped support material for offset printing plates, made of mill-finished, mechanically and/or chemically or mechanically and electrochemically grained aluminum or an aluminum alloy, which has been anodized in aqueous-alkaline solutions. The support material of the invention shows a reflectometer value, at an angle of incidence of 60.degree. (measured according to DIN 67 530; 1982), of greater than 5, an abrasion of the oxide layer of less than 0.5 g/m.sup.2 and a resistance to alkali of greater than 140 s. Also disclosed is a process for the manufacture of the support material, in which an anodic oxidation is carried out in an electrolyte having a pH greater than or equal to 12.5, at a voltage of less than 50 V.
    Type: Grant
    Filed: October 30, 1987
    Date of Patent: August 1, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Michael Brenk, Renate Ernst
  • Patent number: 4851327
    Abstract: The present invention relates to a photographic support having a secondary diffuse-reflective surface, and a color photosensitive material comprising at least one silver halide emulsion layer formed on the secondary diffuse-reflective surface of a photographic support. A photographic support of the present invention provides an image having remarkably improved brightness, saturation, tone reproducibility in shadow areas and sharpness. A color photosensitive material of the present invention provides an image having remakably improved brightness, saturation, tone reproducibility in shades and sharpness and also capable of rapid development.
    Type: Grant
    Filed: July 15, 1987
    Date of Patent: July 25, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tetsuro Fuchizawa, Masaru Sano, Seiichi Taguchi, Keisuke Shiba, Tadashi Ogawa
  • Patent number: 4777109
    Abstract: A metal base lithographic printing plate cleaned and treated by RF plasma to render the non-exposed area hydrophilic, then coated with either a negative working or positive working photosensitive coating. The method is characterized by its elimination of the conventional alkaline etch with attendant hazard, pollution and toxicity problems.
    Type: Grant
    Filed: May 11, 1987
    Date of Patent: October 11, 1988
    Inventors: Robert Gumbinner, Gregory Halpern
  • Patent number: 4707437
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula--A--B--C--wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%.
    Type: Grant
    Filed: October 29, 1986
    Date of Patent: November 17, 1987
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Carlos Tellechea, Major S. Dhillon
  • Patent number: 4663218
    Abstract: A packaging film for photosensitive materials for photographic purposes which is a laminated film containing at least a metallized film layer and two polyethylene polymer layers which are located on both sides of the metallized film layer, at least one of the above polyethylene polymer layers contains more than 50 wt % of linear low density polyethylene manufactured by a low pressure method, and side or both of the above polyethylene polymer layers contains 0.3 to 30 wt % of a light-shielding material, and the strength of one or both sides of the above polyethylene polymer layers is stronger than the adhesive force between the above metallized film and the difference in the thickness of the polyethylene polymer layers is smaller than 50%.This film is superior in physical strength, moisture proofing, gas barrier, light-shielding and antistatic character, and it is superior as a packaging film for a photosensitive material for photographic purpose.
    Type: Grant
    Filed: August 26, 1985
    Date of Patent: May 5, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Mutsuo Akao
  • Patent number: 4610946
    Abstract: A support for lithographic printing plates is disclosed which comprises a plate of an aluminum alloy containing 0.02 to 0.20% by weight zirconium. The aluminum alloy causes no recrystallization phenomenon at temperatures below 320.degree. C. There is also disclosed a photosensitive lithographic printing plate comprising such a support with a photosensitive layer thereon.
    Type: Grant
    Filed: February 22, 1984
    Date of Patent: September 9, 1986
    Assignees: Fuji Photo Film Co., Ltd., Nippon Light Metal Co., Ltd.
    Inventors: Akira Shirai, Kazushige Takizawa, Yasuhisa Nishikawa, Tadayuki Katoh
  • Patent number: 4609613
    Abstract: Permanent gray-scale reproductions including half-tone images. A refractory background region bears refractory thin-film dichroic filter means patterned to conform to the reproduced half-tone image. Preferred background region materials include metals, semiconductors, and ceramics; the thin-film materials are preferably oxides or nitrides of metals and semiconductors. If the refractory materials are appropriately selected, the reproductions are highly resistant to chemical and thermal deterioration and should have useful lives in the hundreds of thousands of years.
    Type: Grant
    Filed: March 29, 1984
    Date of Patent: September 2, 1986
    Assignee: Permanent Images, Inc.
    Inventors: George R. Cogar, Robert E. Markle
  • Patent number: 4606937
    Abstract: A track recording support for recording devices is suggested with a support (10) made of paper or plastic on which a metallic coating (12) is mounted by means of evaporation and being able to be burned off by means of recording electrodes, in particular an aluminum coating. A lubricant in a finely dispersed form is added to contrast coating (11) for reducing of scratching and grinding traces on the surface of metal coating (12) which reaches metal coating (12) and the freely exposed surface thereof by means of diffusion. Preferably, the lubricant is fed to the contrast substance in a powdery form before the processing of the same. On the one hand, it acts in a physical point of view by a reduction of the slide friction on the surface and, on the other hand, in a chemical point of view in that it substantially prevents the build up of combustion residues from the contrast layer on the recording electrodes.
    Type: Grant
    Filed: January 30, 1985
    Date of Patent: August 19, 1986
    Assignee: Robert Bosch GmbH
    Inventors: Manfred Rossler, Gerhard Winter, Hermann Stiltz
  • Patent number: 4587209
    Abstract: Disclosed is an optical information recording member which permits recording of optical information at a high speed and high density by means of energy of light or heat, as well as a high speed reproduction of the recorded information. The optical information recording member has a thin film formed on a substrate which thin film is made of TeOx constituted by a mixture of Te and TeO.sub.2 with a small amount of Au being added such that the contents of Te, O and Au in the thin film falls within a predetermined region limited in terms of atomic percent. The optical information recording member of the invention having the thin film of Te-O-Au system permits the information to be recorded in quite a short time thus allowing quite high speed of recording and reproduction as compared with the conventional recording film of TeOx system. The optical information recording member of the invention also brings about a higher recording sensitivity and a higher C/N ratio.
    Type: Grant
    Filed: March 25, 1985
    Date of Patent: May 6, 1986
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Eiji Ohno, Kunio Kimura, Noboru Yamada, Nobuo Akahira
  • Patent number: 4582784
    Abstract: A photographic light-sensitive material comprising at least one light-sensitive photographic emulsion layer on a support and a back layer provided on the reverse side of the support, wherein the uppermost surface layer of the back layer comprises a hydrophobic polymer binder and a hydrophilic polymer binder.
    Type: Grant
    Filed: October 18, 1984
    Date of Patent: April 15, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masafumi Fukugawa, Shinzi Kataoka, Yukio Shinagawa, Itsuo Fujiwara
  • Patent number: 4529688
    Abstract: Disclosed is an ablative infrared sensitive optical recording composition containing as a component thereof a dispersion of a resinous binder and an absorbing infrared sensitive tertiary butyl substituted vanadyl phthalocyanine obtained by the vapor treatment of a non-infrared sensitive tertiary butyl substituted vanadyl phthalocyanine of the following formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are tertiary butyl groups, or hydrogen, and M is vanadium oxide, subject to the provision that the average number of tertiary butyl groups present is from about 1 to 2.5, and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is tertiary butyl.
    Type: Grant
    Filed: October 13, 1983
    Date of Patent: July 16, 1985
    Assignee: Xerox Corporation
    Inventors: Kock-Yee Law, Gordon E. Johnson
  • Patent number: 4499178
    Abstract: An optical information recording material which comprises a substrate having thereon a heat mode recording layer made of a metal and a metal compound that increases the sensitivity of said recording layer and decreases the reflectivity of said recording layer, a reflecting layer made of a metal, and a heat insulating layer interposed between said recording layer and said reflecting layer. The material makes it possible to record information at high sensitivity and read recorded information by reflected light at high contrast.
    Type: Grant
    Filed: June 14, 1982
    Date of Patent: February 12, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Minoru Wada, Yonosuke Takahashi, Eiichi Hasegawa
  • Patent number: 4492750
    Abstract: Disclosed is an ablative infrared-sensitive optical recording composition containing as a component thereof a dispersion of a resinous binder and a soluble naphthalocyanine of the following formula: ##STR1## wherein R.sub.5 and R.sub.6 are independently selected from hydrogen and alkyl groups containing from about 4 carbon atoms to about 8 carbon atoms, and M is two hydrogen atoms, a divalent, trivalent, or tetravalent metal complex.
    Type: Grant
    Filed: October 13, 1983
    Date of Patent: January 8, 1985
    Assignee: Xerox Corporation
    Inventors: Kock-Yee Law, Gordon E. Johnson, John W. P. Lin
  • Patent number: 4477555
    Abstract: An optical information recording medium comprising a substrate and a recording layer superimposed on said substrate, said recording layer comprising a reflective layer in which metal particles with a particle diameter of 1500.ANG. or less have been distributed closely and a light absorptive layer in which metal compounds and a very small amount of metal particles with a particle diameter of 200-2000.ANG. have been dispersed unformly or substantially uniformly in the volume ratio of 1-30% in a resin.
    Type: Grant
    Filed: July 28, 1982
    Date of Patent: October 16, 1984
    Assignee: Ricoh Co., Ltd.
    Inventors: Hideaki Oba, Makoto Kunikane, Masaakira Umehara, Kiyoshi Tanikawa, Michiharu Abe
  • Patent number: 4467028
    Abstract: A planographic printing plate comprises an anodized metal substrate, an interlayer on the substrate and a photosensitive layer on the interlayer in which the interlayer is a hydroxy-substituted organic acid.
    Type: Grant
    Filed: July 12, 1982
    Date of Patent: August 21, 1984
    Assignee: Polychrome Corporation
    Inventors: Jen-chi Huang, James Shelnut
  • Patent number: RE40788
    Abstract: A litho strip for use as an offset printing plate is described which has a composition of 0.05-0.25% Si, 0.30-0.40% Fe, 0.10-0.30% Mg, max. 0.05% Mn, and max. 0.04% Cu. The strip is produced from a continuous cast ingot of the above composition which is hot rolled to a thickness of up to 2-7 mm. The residual resistance ratio of the hot rolled strip is RR=10-20. The cold rolling is carried out with or without intermediate annealing, wherein the degree of rolling reduction after intermediate annealing is >60%. The further processing up to the EC roughening takes place with the microstructure adjusted in the rolling process at <100° C. The litho strip is characterized by a high thermal stability, a good roughening behavior in the EC processes, and a high reverse bending fatigue strength perpendicular to the rolling direction.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: June 23, 2009
    Assignee: Hydro Aluminium Deutschland GmbH
    Inventors: Wolfgang Von Asten, Bernhard Kernig, Barbara Grzemba