Micrography, Process, Composition, Or Product Other Than Microelectronic Device Manufacture Patents (Class 430/8)
  • Patent number: 9434856
    Abstract: Provided is a film-forming composition containing organic monomers represented by formula (A) that are capable of providing triazine ring-containing polymers, crosslinking agents, and linear polymers, which contain a repeating unit structure represented by formula (1). Thus, a film-forming composition that is suitable as an embedding material can be provided, said film-forming composition: including triazine ring-containing polymers that are capable of achieving, by polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage; and is capable of minimizing occurrences of cracks when embedding films are manufactured. Furthermore, a solvent-free film-forming composition that does not contain any solvents conducive to organic electroluminescent film degradation, can be cured at a low temperature, and is suitable for forming top-emission type organic electroluminescent elements, can be provided.
    Type: Grant
    Filed: May 10, 2013
    Date of Patent: September 6, 2016
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naoya Nishimura, Takahiro Kaseyama, Masaaki Ozawa
  • Patent number: 9311431
    Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into a scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: April 12, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Sungchul Yoo, Andrei V. Shchegrov, Thaddeus G. Dziura, InKyo Kim, SeungHwan Lee, ByeoungSu Hwang, Leonid Poslavsky
  • Patent number: 8993699
    Abstract: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: March 31, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takahiro Kishioka, Takahiro Sakaguchi
  • Publication number: 20140369901
    Abstract: The present application for patent is in the field of microreactors and more specifically in the field of microreactors which are prepared from flexible substrates. Methods of preparing flexible substrates using various printing methods are also disclosed.
    Type: Application
    Filed: June 18, 2013
    Publication date: December 18, 2014
    Inventor: John C. Warner
  • Publication number: 20140342441
    Abstract: The present invention provides, among others, apparatus for detecting a disease, comprising a system delivery biological subject and a probing and detecting device, wherein the probing and detecting device includes a first micro-device and a first substrate supporting the first micro-device, the first micro-device contacts a biologic material to be detected and is capable of measuring at the microscopic level an electric, magnetic, electromagnetic, thermal, optical, acoustical, biological, chemical, physical, or mechanical property of the biologic material.
    Type: Application
    Filed: April 4, 2013
    Publication date: November 20, 2014
    Applicant: ANPAC BIO-MEDICAL SCIENCE CO., LTD.
    Inventors: Chris C. Yu, Xuedong Du, He Yu
  • Patent number: 8852947
    Abstract: A photographic material for image display including an intimately sorbed contrast agent that provides a contrast layer against which the recorded image can be seen regardless of the nature and color of the background.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: October 7, 2014
    Assignee: Smartwater Research Limited
    Inventors: Michael Cleary, Marcello Vitale, Sharon Robinson
  • Patent number: 8790534
    Abstract: A system and method are disclosed for the precision fabrication of Micro-Electro-Mechanical Systems (MEMS), Nano-Electro-Mechanical Systems (NEMS), Microsytems, Nanosystems, Photonics, 3-D integration, heterogeneous integration, and Nanotechology devices and structures. The disclosed system and method can also be used in any fabrication technology to increase the precision and accuracy of the devices and structures being made compared to conventional means of implementation. A platform holds and moves a substrate to be machined during machining and a plurality of lasers and/or ion beams are provided that are capable of achieving predetermined levels of machining resolution and precision and machining rates for a predetermined application. The plurality of lasers and/or ion beams comprises a plurality of the same type of laser and/or ion beam.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: July 29, 2014
    Assignee: Corporation for National Research Initiatives
    Inventor: Michael A. Huff
  • Patent number: 8778834
    Abstract: A multi-layer card-shaped data carrier has a marking layer containing a hidden marking, and a thermochromic cover layer arranged over the marking layer at least in the area of the hidden marking. The thermochromic cover layer is opaque below its change temperature, hides the marking, and is translucent or transparent above its change temperature, enabling viewing of the marking. The thermochromic cover layer is pervious to radiation outside the visible spectral range and the marking layer absorbs radiation energy outside the visible spectral range, so that the hidden marking can be incorporated into the marking layer through the thermochromic cover layer by laser radiation of a wavelength outside the visible spectral range.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: July 15, 2014
    Assignee: Giesecke & Devrient GmbH
    Inventors: Günter Endres, Tobias Salzer
  • Publication number: 20140146159
    Abstract: We present a method for parallel axial imaging, or z-microscopy, utilizing an array of tilted micro mirrors arranged along the axial direction. Image signals emitted from different axial positions can be orthogonally reflected by the corresponding micro mirrors and spatially separated for parallel detection, essentially converting the more challenging axial imaging to a lateral imaging problem. Each micro mirror also provides optical sectioning capability due to its finite dimension.
    Type: Application
    Filed: November 29, 2013
    Publication date: May 29, 2014
    Applicant: The Penn State Research Foundation
    Inventors: Zhiwen Liu, Chuan Yang, Kebin Shi, Mingda Zhou, Siyang Zheng, Shizhuo Yin
  • Publication number: 20130250418
    Abstract: Methods for producing retroreflector tooling and retroreflective sheeting using laser writing techniques, and corresponding products thereof, are presented. In one embodiment, a seamless retroreflective sheet having a plurality of retroreflectors formed in a continuous retroreflective microstructured pattern is provided. In the methods described herein, a substrate having a photosensitive coating on a surface thereof is provided. A surface-relief microstructured pattern is produced in the photosensitive coating by selectively exposing the photosensitive coating to a beam of electromagnetic radiation. The exposed portions of the photosensitive coating are developed to form a retroreflective microstructured pattern on the surface of the substrate. The retroreflective microstructured pattern is then transferred into retroreflector tooling comprising the retroreflective microstructured pattern on a surface thereof.
    Type: Application
    Filed: March 23, 2012
    Publication date: September 26, 2013
    Applicant: REFLEXITE CORPORATION
    Inventor: Steven SCOTT
  • Publication number: 20130222780
    Abstract: The disclosure relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral range from 5 nm-15 nm, and a heat light source for producing radiation in a second spectral range from 1-50 ?m. The apparatus also includes an optical system having a first group of mirrors for guiding radiation from the first spectral range along a light path such that each mirror in the first group can have a first associated intensity distribution applied to it in the first spectral range during operation of the exposure light source. The heat light source is arranged such that at least one mirror in the first group can have a second associated intensity distribution in the second spectral range applied to it during operation of the heat light source. The first intensity distribution differs from the second intensity distribution essentially by a position-independent factor.
    Type: Application
    Filed: March 4, 2013
    Publication date: August 29, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventor: Damian Fiolka
  • Publication number: 20130101795
    Abstract: Provided are methods of preparing a plurality of extrusions, comprising (a) shrinking a transparent first thermoplastic material comprising a plurality of non-transparent marks, (b) lithographically transferring the pattern of the shrunk non-transparent marks to a layer of photoresist deposited on a second thermoplastic material, and (c) shrinking the second thermoplastic material, thereby generating a plurality of extrusions on the shrunk second thermoplastic material.
    Type: Application
    Filed: May 25, 2012
    Publication date: April 25, 2013
    Inventors: Michelle Khine, Shreshta Jayadev
  • Publication number: 20130059239
    Abstract: A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film.
    Type: Application
    Filed: August 24, 2012
    Publication date: March 7, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kousei Uehira, Satoshi Hirayama
  • Publication number: 20120298842
    Abstract: A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.
    Type: Application
    Filed: January 20, 2011
    Publication date: November 29, 2012
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Shinya Arase, Takahiro Sakaguchi
  • Publication number: 20120263893
    Abstract: A multi-layer card-shaped data carrier has a marking layer containing a hidden marking, and a thermochromic cover layer arranged over the marking layer at least in the area of the hidden marking. The thermochromic cover layer is opaque below its change temperature, hides the marking, and is translucent or transparent above its change temperature, enabling viewing of the marking. The thermochromic cover layer is pervious to radiation outside the visible spectral range and the marking layer absorbs radiation energy outside the visible spectral range, so that the hidden marking can be incorporated into the marking layer through the thermochromic cover layer by laser radiation of a wavelength outside the visible spectral range.
    Type: Application
    Filed: November 9, 2010
    Publication date: October 18, 2012
    Inventors: Günter Endres, Tobias Salzer
  • Publication number: 20120224028
    Abstract: A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 6, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: DOO CHEOL PARK, SEUNG HYUK CHANG, MYUNG-SUN KIM, WON JOO KIM, JU HWAN JUNG, SEUNG HOON LEE, KWANG-MIN LEE, HYOUNG SOO KO
  • Publication number: 20120208115
    Abstract: An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.
    Type: Application
    Filed: April 3, 2012
    Publication date: August 16, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Ulrich Loering, Ralf Mueller, Hans-Juergen Mann, Norman Baer
  • Publication number: 20120196381
    Abstract: An encoded microparticle having a spatial code is provided; and a set of encoded microparticles possessing subsets each provided with a distinguishable spatial code, wherein the codes comply with a pre-determined coding scheme. Presented are also methods of using the encoded microparticles in various biological assays, such as various multiplex assays and visualizing them by creating a digital image of the encoded microparticles and determining whether false positives are present. Further are provided methods of manufacture of the encoded microparticles which employ ferromagnetic nanoparticles applied using spin-on-glass techniques.
    Type: Application
    Filed: December 23, 2011
    Publication date: August 2, 2012
    Applicant: Affymetrix, Inc.
    Inventors: Randall J. True, Martin J. Goldberg, Michael Ru, Michael P. Mittmann
  • Publication number: 20120183946
    Abstract: Micro- and nanofilters with precision pore sizes and pore layout have applications in many fields including capturing circulating tumor cells and fetal cells in blood, water treatment, pathogen detection in water, etc. Methods to fabricate micro- and nanofilters not using track etching or reactive ion etching are provided, allowing easy fabrication of single layer or stack of films simultaneously, and/or stack of films on rolls. Microfilter can be made using one or more layers of material. Invention enables mass production of microfilters with lithographic quality at low cost. Isolation, enumeration and characterization of circulating tumor cells using microfilters provides (i) guides to cancer treatment selection and personalize dosage, (ii) low cost monitoring for treatment response, disease progression and recurrence, (iii) assessment of pharmacodynamic effects, (iv) information on mechanisms of resistance to therapy, and (v) cancer staging.
    Type: Application
    Filed: January 6, 2012
    Publication date: July 19, 2012
    Inventors: Cha-Mei Tang, Olga Makarova
  • Publication number: 20120183990
    Abstract: A closed microfluidic system is equipped with a carrier plate and a cover plate as well as wall regions arranged therebetween, which form a system of channels and/or cavities with an inner surface. Selected regions of the inner surface are selectively functionalized.
    Type: Application
    Filed: February 27, 2012
    Publication date: July 19, 2012
    Inventors: Julia Schuette, Martin Stelzle
  • Publication number: 20120156598
    Abstract: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
    Type: Application
    Filed: June 21, 2010
    Publication date: June 21, 2012
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Kishioka, Takahiro Sakaguchi
  • Publication number: 20120107734
    Abstract: Microlens sheetings with different types of composite images are disclosed, in which the composite image floats above, in, or below the sheeting, or some combination. One type of composite image may be viewable to the unaided eye or an observer and another type of composite image is viewable only to the aided eye of an observer. Methods for providing such an imaged sheeting are also disclosed.
    Type: Application
    Filed: January 6, 2012
    Publication date: May 3, 2012
    Inventors: James P. Endle, Lynn E. Lorimor
  • Publication number: 20120088072
    Abstract: Microfabricated particles are dispersed throughout a matrix to create a composite. The microfabricated particles are engineered to a specific structure and composition to enhance the physical attributes of a composite material.
    Type: Application
    Filed: June 11, 2010
    Publication date: April 12, 2012
    Inventors: Adam R. Pawloski, Jeffrey Jacob Cernohous
  • Patent number: 7705963
    Abstract: A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
    Type: Grant
    Filed: August 23, 2005
    Date of Patent: April 27, 2010
    Assignee: Micronic Laser Systems AB
    Inventors: Torbjorn Sandstrom, Igor Ivonin
  • Publication number: 20080226995
    Abstract: A composition is provided that includes a polymer matrix. A core having a core surface is embedded within the polymer matrix. A polymeric ligand passivates the core surface and has a moiety Y, where Y is a Diels-Alder group of a diene or dienophile. A polymeric linker has a complementary Diels-Alder group diene or dienophile to moiety Y and forms a Diels-Alder bond with the moiety Y. A composition is also provided that includes polymer matrix having a matrix surface. A core having a core surface is present on the matrix surface. A polymeric ligand passivates the core surface and has a moiety Y, where Y is Diels-Alder group of a diene or dienophile. The polymer matrix and polymeric ligand together define a matrix-ligand Flory-Huggins binary interaction function greater than 0.
    Type: Application
    Filed: March 13, 2007
    Publication date: September 18, 2008
    Inventors: Philip J. Costanzo, Frederick L. Beyer
  • Publication number: 20080166640
    Abstract: A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process.
    Type: Application
    Filed: August 30, 2007
    Publication date: July 10, 2008
    Inventors: Chan-wook Baik, Yong-wan Jin, Gun-sik Park, Jong-min Kim, Young-min Shin, Jin-kyu So
  • Publication number: 20080160433
    Abstract: A coatable inorganic material is provided, which is suitable for being coated on a substrate in the form of sol-gel solution and then being directly written with thermochemical mode by using a laser beam. The coatable inorganic material is an oxide, in which the chemical element constitution is more than one element selected from Te, Al, Zr, and Ti.
    Type: Application
    Filed: February 16, 2007
    Publication date: July 3, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Tien Yang, Ming-Fang Hsu, Sheng-Li Chang, Tzuan-Ren Jeng
  • Patent number: 7354733
    Abstract: We disclose methods of sorting or separating mixtures of living cells (e.g., eukaryotic, prokaryotic, mammalian, pathogenic, bacterial, viral, etc.). We perform our methods by activating cell-selective photophoric labels, which photosensitize and chemically reduce a photosensitive metal compound to form metal grains, particles or crystals. The metal adheres to the cells and forms the basis for sorting or separating different cell types. Photophoric labels may include chemiluminescent agents such as peroxidase enzymes activated with peroxidase substrates capable of luminescence. Photosensitive metal compounds may be present in a light-sensitive matrix or emulsion containing photosensitizable metal compounds, which form metal grains, particles or crystals upon exposure to a developer solution. Developer solutions are formulated to substantially allow living cells to remain viable after exposure to the developing solution.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: April 8, 2008
    Assignee: Cellect Technologies Corp.
    Inventors: Shmuel Bukshpan, Gleb Zilberstein
  • Publication number: 20080020301
    Abstract: The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.
    Type: Application
    Filed: June 25, 2007
    Publication date: January 24, 2008
    Applicant: Instrument Technology Research Center, National Applied Research Laboratories
    Inventors: Jyh-Shin Chen, Liang-Chiun Chao, Sheng-Yuan Chen, Hsiao-Yu Chou
  • Patent number: 7285363
    Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: October 23, 2007
    Assignee: The University of Connecticut
    Inventors: Paul J. Campagnola, Amy R. Howell, Jun Wang, Steven L. Goodman
  • Patent number: 7247507
    Abstract: A method for forming a LOCOS layer in a semiconductor device includes steps of oxidizing a high voltage region of the semiconductor device to form a LOCOS layer in the high voltage region; and etching the LOCOS layer according to a pattern.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: July 24, 2007
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Woong Je Sung
  • Patent number: 7223505
    Abstract: A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.
    Type: Grant
    Filed: February 8, 2005
    Date of Patent: May 29, 2007
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Junji Hirokane, Michinobu Mieda, Go Mori
  • Patent number: 7094305
    Abstract: A method of producing batches of micro particles includes affixing a substrate sheet to a support and cutting the substrate sheet with a laser device to define a plurality of micro particles. Before, after or during the cutting of the substrate sheet, the region of the substrate sheet defining each micro particle is marked with a code or other identifying marking using a laser device. The code or other identifying marking is unique to the particular batch of micro particles to uniquely identify that batch. The micro particles are removed from the support by a solvent. Preferably, a single laser device is used for cutting the substrate sheet and marking the micro particles. Alternatively, separate laser devices may be used for cutting the substrate sheet and marking the micro particles.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: August 22, 2006
    Inventor: Michael Cleary
  • Publication number: 20040259007
    Abstract: An electrically conductive composition can be obtained that provides an electrically conductive coating having low volume resistivity and high electrical conductivity comparable to that of metallic silver independent of high-temperature film deposition conditions, while also enabling the line width of an electrical circuit to be sufficiently narrow without having to increase thickness in the case of forming an electrical circuit of a flexible circuit board and so forth.
    Type: Application
    Filed: June 25, 2004
    Publication date: December 23, 2004
    Inventors: Katsuhiko Takahashi, Kiwako Ohmori, Masanori Endo, Hikaru Yasuhara, Akinobu Ono, Takayuki Imai, Yukihiko Kurosawa, Hiroaki Zaima
  • Patent number: 6806925
    Abstract: The irregularities of coloring concentration which is generated between dyed media when a color filter substrate which is prepared in a manufacturing method of a liquid crystal display device is manufactured by supplying ink to dyed media formed on a main surface of the color filter substrate using an ink jet method. In the present invention, as color filter ink which is supplied to the dyed media formed on the color filter substrate using the inkjet method, liquid which contains dye which colors the dyed media, solvent (for example, water) which has an affinity for the dye, a volatility-adjusting agent (for example, glycerin) which lowers the volatility of the ink to a level below the volatility of the solvent, and a dyeing-promoter agent (for example, N-methyl-2-pyrrolidone) which exhibits a higher affinity for the dye and the dyed media than the volatility adjusting agent. Then, the dyed media is colored with this ink.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: October 19, 2004
    Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.
    Inventors: Akira Ishii, Miyo Shimizu, Shigeru Matsuyama
  • Patent number: 6746819
    Abstract: The invention relates to a lithographic method for producing microcomponents with component structures in the submillimeter range. According to the inventive method, a structured adhesive layer is applied to a metal layer and then a photostructured epoxy resin layer is applied to said adhesive layer. Said epoxide resin is structured by means of selective exposition and removing the unexposed zones and filling in the gaps between the resin structures with metal by electroplating. The aim of the invention is to provide an adhesive layer that is suitable for photostructured epoxy resins, especially for SU-8 resist material and that prevents the resist material from being detached. To this end, the adhesive layer consists of polyimide or a polyimide mixture.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: June 8, 2004
    Assignee: Institut fur Mikrotechnik Mainz GmbH
    Inventors: Felix Schmitz, Matthias Nienhaus
  • Publication number: 20040096757
    Abstract: An object of the present invention is to provide a photosensitive resin composition or a photosensitive resist for color filters which is superior in heat resistance, water resistance, solvent resistance, chemical resistance, and also transparency, and a method for producing color filters using them. The present invention relates to a photosensitive resin composition comprising a vinyl polymer (A) having at least one cyclocarbonate group and at least one carboxyl group in the molecule and a compound (B) having at least two ethylenically unsaturated double bonds in the molecule as a main component, which can introduce crosslinked structures by photocuring and thermosetting, a photosensitive resist for color filters comprising the photosensitive resin composition and a colorant, and a method for producing a color filter, using the photosensitive resist for color filters.
    Type: Application
    Filed: September 25, 2003
    Publication date: May 20, 2004
    Inventors: Hiroyuki Tokuda, Yasunobu Hirota, Hidenobu Ishikawa
  • Publication number: 20040081919
    Abstract: When manufacturing a recording medium, a material layer 12 formed on a substrate 11 that composes the recording medium is exposed to a laser beam in accordance with a recording pattern. The material layer 12 has a predetermined reflectivity for the laser beam 13 so as to produce return light for the laser beam 13. By detecting this return light, the focusing of the laser beam on the material layer is adjusted. By doing so, a laser beam can be easily and accurately focused on a material layer during a process in which a laser beam is shone, in accordance with a recording pattern, onto a material layer formed on a recording medium or a production plate used when manufacturing a recording medium.
    Type: Application
    Filed: May 28, 2003
    Publication date: April 29, 2004
    Inventor: Koichiro Kishima
  • Patent number: 6713772
    Abstract: A method wherein small, two- or three-dimensional structures are formed by multiple-photon-absorbed photopolymerization and/or cross-linking of a precursor composition. Use of multi-photon excitation allows fabrication of structures and structural features having at least one dimension of less than about one micron, preferably less than about 500 nm, more preferably less than about 250 nm, and most preferably of less than about 100 nm, in bulk phase as well as in solution, and from a wide variety of organic and inorganic precursor subunits, including synthetic polymers and biological polymers such as proteins, lipids, oligonucleotides, and the like. In one embodiment, use of two-photon far field optics allows the formation of structures having X-Y dimensions of less than about 300 nm and a Z dimension of less than about 500 nm, while use of three-photon far field optics allows the formation of structures having X-Y dimensions of less than about 250 nm and a Z dimension of less than about 300 nm.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: March 30, 2004
    Assignee: The University of Connecticut
    Inventors: Steven L. Goodman, Paul Campagnola
  • Patent number: 6655862
    Abstract: This invention relates to the printing of transparent media often used for later projection, commonly referred to as Over Head Transparencies, or OHT's. These OHTs are used in several ways: They can be printed in advance and projected in sequence, created in the course of the presentation using marking pens, or a combination of he two, where a pre-printed OHT is edited or modified after printing or in the course of presentation using pens or other marking means. This third use is often compromised by incompatibilities between the marking technology used to create the pre-printed image and the marking pens used to edit the image later. This invention describes a technique for separating the two images, placing each on opposite sides of the transparent film, avoiding this conflict and producing a better solution for the user.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: December 2, 2003
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Steven M. Johnson
  • Patent number: 6607674
    Abstract: A phase shifting mask repair process is described. The process uses an etching gas or a hydrofluoric acid solution to etch the quartz substrate and the characteristics of the phase shifter layer being only slightly etched when clean with a NH3/H2O2/H2O2 solution to calculate and adjust the respective processing time accordingly. As a result, the phase difference between the quartz substrate and the MoSiON phase shifter layer stays relatively the same before and after the repair process.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: August 19, 2003
    Assignee: Macronix International CO, Ltd.
    Inventor: Ching-Yu Chang
  • Patent number: 6514877
    Abstract: To fabricate masks for deep ultra-violet lithography and for extreme ultra-violet lithography, a layer of material opaque to deep ultra-violet radiation and an extreme ultra-violet radiation absorbent layer are each deposited successively with a layer of silicon and a layer of metal on a respective transparent substrate. A focused electron beam is displaced on the superposed layers of metal and silicon to form a structure of etch-resistant metal/silicon compound. The deep ultra-violet mask is then formed by etching the three layers to leave on the substrate, the metal/silicon compound structure with the extreme ultra-violet absorbent layer beneath it.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: February 4, 2003
    Assignee: Universite de Sherbrooke
    Inventors: Jacques Beauvais, Dominique Drouin, Eric Lavallee
  • Patent number: 6322938
    Abstract: The placement accuracy and resolution of direct-write patterning tools, in particular the atomic force microscope (AFM), is considered for application to fabricating multi-passband integrated optical filters. Because of its simpler fabrication a grating structure is proposed that consists of identical stripes that are non-periodically spaced. The recently developed pseudorandom encoding method from the field of computer generated holography is modified to effectively assign analog reflectances at each point along the grating by selective withdrawal and offsetting of the stripes from a periodic spacing. An example filter designed by this method has two 1.5 nm bandwidth passbands and −23 dB of rejection for lightly coupled stripes. As with single band filters, the passbands broaden as the coupling increases.
    Type: Grant
    Filed: May 22, 2000
    Date of Patent: November 27, 2001
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: Robert W. Cohn
  • Patent number: 6316153
    Abstract: A method wherein small, two- or three- dimensional structures are formed by multiple-photon-absorbed photopolymerization and/or cross-linking of a precursor composition. Use of multi-photon excitation allows fabrication of structures and structural features having at least one dimension of less than about one micron, preferably less than about 500 nm, more preferably less than about 250 nm, and most preferably of less than about 100 nm, in bulk phase as well as in solution, and from a wide variety of organic and inorganic precursor subunits, including synthetic polymers and biological polymers such as proteins, lipids, oligonucleotides, and the like. In one embodiment, use of two-photon far field optics allows the formation of structures having X-Y dimensions of less than about 300 mn and a Z dimension of less than about 500 nm, while use of three-photon far field optics allows the formation of structures having X-Y dimensions of less than about 250 mn and a Z dimension of less than about 300 nm.
    Type: Grant
    Filed: April 21, 1999
    Date of Patent: November 13, 2001
    Assignee: The University of Connecticut
    Inventors: Steven L. Goodman, Paul Campagnola
  • Patent number: 6083697
    Abstract: Radiation-activated catalysts (RACs), autocatalytic reactions, and protective groups are employed to achieve a highly sensitive, high resolution, radiation directed combinatorial synthesis of pattern arrays of diverse polymers. When irradiated, RACs produce catalysts that can react with enhancers, such as those involved in autocatalytic reactions. The autocatalytic reactions produce at least one product that removes protecting groups from synthesis intermediates. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: July 4, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Jody E. Beecher, Martin J. Goldberg, Glenn H. McGall
  • Patent number: 6083275
    Abstract: A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using layout modification system technology based on a predetermined cost constraint, determining if all violations are corrected, and either changing the cost constraint to a higher cost constraint if violations still exist and repeating the process or terminating the conversion if all violations are corrected.
    Type: Grant
    Filed: January 9, 1998
    Date of Patent: July 4, 2000
    Assignee: International Business Machines Corporation
    Inventors: Fook-Luen Heng, Lars W. Liebmann
  • Patent number: 5994110
    Abstract: Compounds which possess a complementary structure to a desired molecule, such as a biomolecule, in particular polymeric or oligomeric compounds, which are useful as in vivo or in vitro diagnostic and therapeutic agents are provided. Also, various methods for producing such compounds are provided. These polymeric or oligomeric compounds are useful in particular as antimicrobial agents, receptor, hormone or enzyme agonists and antagonists.
    Type: Grant
    Filed: September 2, 1998
    Date of Patent: November 30, 1999
    Inventors: Klaus Mosbach, Peter A. G. Cormack, Olof Ramstrom, Karsten Haupt
  • Patent number: 5776644
    Abstract: A photolithographic method for patterning small diameter circles at a high resolution on a layer, comprises the steps of depositing a resist layer on said layer; depositing calibrated microspheres, opaque to a radiation, on the surface of the resist layer; and irradiating said resist layer with said radiation.
    Type: Grant
    Filed: October 23, 1995
    Date of Patent: July 7, 1998
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Jean-Frederic Clerc, Denis Randet
  • Patent number: 5716741
    Abstract: The present invention concerns stepped mould inserts, a method of producing the same and high-precision stepped microstructure bodies moulded therewith. The present stepped mould inserts and method of producing the same are more simple than previous methods. The lithographically produced regions of a patterned resist layer, which are exposed by development on a flat plate, are filled with metal. The layer may be mechanically removed, down to a predetermined thickness. After the residues of the resist have been dissolved out, if necessary or desired, this operation is repeated from one to several times. The regions removed from the resist layer are filled with metal, covered and separated from the resist layer, thus providing a multistep metallic mould insert. High-precision microstructure bodies having a multistep structure are produced with the present stepped mould insert.
    Type: Grant
    Filed: April 2, 1996
    Date of Patent: February 10, 1998
    Assignee: MicroParts Gesellschaft fur Mikrostrukturtechnik mbH
    Inventors: Holger Reinecke, Arnd Rogner, Friedolin Franz Noeker, Ulrich Sieber, Gerd Pruefer, Helge Pannhoff, Uwe Brenk
  • Patent number: 5705321
    Abstract: Multiple-exposure fine-line interferometric lithography, combined with conventional optical lithography, is used in a sequence of steps to define arrays of complex, nm-scale structures in a photoresist layer. Nonlinearities in the develop, mask etch, and Si etch processes are used to modify the characteristics and further reduce the scale of the structures. Local curvature dependent oxidation provides an additional flexibility. Electrical contact to the quantum structures is achieved. Uniform arrays of Si structures, including quantum wires and quantum dots, are produced that have structure dimensions on the scale of electronic wave functions. Applications include enhanced optical interactions with quantum structured Si, including optical emission and lasing and novel electronic devices based on the fundamentally altered electronic properties of these materials. All of the process sequences involve parallel processing steps to make large fields of these quantum structures.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 6, 1998
    Assignee: The University of New Mexico
    Inventors: Steven R. J. Brueck, An-Shyang Chu, Bruce L. Draper, Saleem H. Zaidi