Abstract: A method for specifying and fabricating non-homogeneous, anisotropic, truly functionally graded objects. The objects may have defined spatial heterogeneity (e.g., a gradient in material concentration) with local randomized distributions. This local randomness is designed in such a way that global averaging results in the specified spatial heterogeneity. The fabrication of structures is an additive process in which a material is deposited in defined patterns.

Abstract: Novel hyper-branched, dense, high-refractive-index polymers, and compositions utilizing those polymers are provided, along with methods of forming high refractive index films with those compositions. The refractive index of the material is at least about 1.8 at 400 nm. Further, it can be made into optically transparent thin films of only a couple hundred angstroms thickness to thick films of several micrometers thick, as well as into “bulk” solids. The use of a thermal acid or a photo acid generator facilitates crosslinking after the coating process.

Abstract: The present invention relates to a transparent optical article comprising at least one dye at least partially inhibiting light having a wavelength ranging from 400 to 460 nm and at least one selective optical brightener that emits light by fluorescence at a wavelength ranging from 400 to 460 nm. The optical brightener acts as a means for at least partially balancing the color imparted to the transparent optical article by the dye, thus allowing for perception of said optical article as less yellow, and even colorless to an user or an observer.

Abstract: The present invention relates to a transparent optical article (e.g. an ophthalmic lens) comprising a thermoplastic substrate and a dye at least partially inhibiting light having a wavelength ranging from 400 to 460 nm and an optical brightener for at least partially balancing the color imparted to the transparent optical article by the dye, wherein said optical brightener emits light by fluorescence at a wavelength ranging from 400 to 460 nm and is incorporated into a layer fused or bonded to the thermoplastic substrate. Said optical brightener allows for perception of said optical article as less yellow, and even colorless, to a user or to an observer. In addition, the UV-absorbers that may be present in the thermoplastic substrate do not negatively interact with the optical brightener.

Abstract: Provided is a film-forming composition containing organic monomers represented by formula (A) that are capable of providing triazine ring-containing polymers, crosslinking agents, and linear polymers, which contain a repeating unit structure represented by formula (1). Thus, a film-forming composition that is suitable as an embedding material can be provided, said film-forming composition: including triazine ring-containing polymers that are capable of achieving, by polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage; and is capable of minimizing occurrences of cracks when embedding films are manufactured. Furthermore, a solvent-free film-forming composition that does not contain any solvents conducive to organic electroluminescent film degradation, can be cured at a low temperature, and is suitable for forming top-emission type organic electroluminescent elements, can be provided.

Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into a scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Abstract: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.

Abstract: The present application for patent is in the field of microreactors and more specifically in the field of microreactors which are prepared from flexible substrates. Methods of preparing flexible substrates using various printing methods are also disclosed.

Abstract: The present invention provides, among others, apparatus for detecting a disease, comprising a system delivery biological subject and a probing and detecting device, wherein the probing and detecting device includes a first micro-device and a first substrate supporting the first micro-device, the first micro-device contacts a biologic material to be detected and is capable of measuring at the microscopic level an electric, magnetic, electromagnetic, thermal, optical, acoustical, biological, chemical, physical, or mechanical property of the biologic material.

Abstract: A photographic material for image display including an intimately sorbed contrast agent that provides a contrast layer against which the recorded image can be seen regardless of the nature and color of the background.

Abstract: A system and method are disclosed for the precision fabrication of Micro-Electro-Mechanical Systems (MEMS), Nano-Electro-Mechanical Systems (NEMS), Microsytems, Nanosystems, Photonics, 3-D integration, heterogeneous integration, and Nanotechology devices and structures. The disclosed system and method can also be used in any fabrication technology to increase the precision and accuracy of the devices and structures being made compared to conventional means of implementation. A platform holds and moves a substrate to be machined during machining and a plurality of lasers and/or ion beams are provided that are capable of achieving predetermined levels of machining resolution and precision and machining rates for a predetermined application. The plurality of lasers and/or ion beams comprises a plurality of the same type of laser and/or ion beam.

Abstract: A multi-layer card-shaped data carrier has a marking layer containing a hidden marking, and a thermochromic cover layer arranged over the marking layer at least in the area of the hidden marking. The thermochromic cover layer is opaque below its change temperature, hides the marking, and is translucent or transparent above its change temperature, enabling viewing of the marking. The thermochromic cover layer is pervious to radiation outside the visible spectral range and the marking layer absorbs radiation energy outside the visible spectral range, so that the hidden marking can be incorporated into the marking layer through the thermochromic cover layer by laser radiation of a wavelength outside the visible spectral range.

Abstract: We present a method for parallel axial imaging, or z-microscopy, utilizing an array of tilted micro mirrors arranged along the axial direction. Image signals emitted from different axial positions can be orthogonally reflected by the corresponding micro mirrors and spatially separated for parallel detection, essentially converting the more challenging axial imaging to a lateral imaging problem. Each micro mirror also provides optical sectioning capability due to its finite dimension.

Abstract: Methods for producing retroreflector tooling and retroreflective sheeting using laser writing techniques, and corresponding products thereof, are presented. In one embodiment, a seamless retroreflective sheet having a plurality of retroreflectors formed in a continuous retroreflective microstructured pattern is provided. In the methods described herein, a substrate having a photosensitive coating on a surface thereof is provided. A surface-relief microstructured pattern is produced in the photosensitive coating by selectively exposing the photosensitive coating to a beam of electromagnetic radiation. The exposed portions of the photosensitive coating are developed to form a retroreflective microstructured pattern on the surface of the substrate. The retroreflective microstructured pattern is then transferred into retroreflector tooling comprising the retroreflective microstructured pattern on a surface thereof.

Abstract: The disclosure relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral range from 5 nm-15 nm, and a heat light source for producing radiation in a second spectral range from 1-50 ?m. The apparatus also includes an optical system having a first group of mirrors for guiding radiation from the first spectral range along a light path such that each mirror in the first group can have a first associated intensity distribution applied to it in the first spectral range during operation of the exposure light source. The heat light source is arranged such that at least one mirror in the first group can have a second associated intensity distribution in the second spectral range applied to it during operation of the heat light source. The first intensity distribution differs from the second intensity distribution essentially by a position-independent factor.

Abstract: Provided are methods of preparing a plurality of extrusions, comprising (a) shrinking a transparent first thermoplastic material comprising a plurality of non-transparent marks, (b) lithographically transferring the pattern of the shrunk non-transparent marks to a layer of photoresist deposited on a second thermoplastic material, and (c) shrinking the second thermoplastic material, thereby generating a plurality of extrusions on the shrunk second thermoplastic material.

Abstract: A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film.

Abstract: A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.

Abstract: A multi-layer card-shaped data carrier has a marking layer containing a hidden marking, and a thermochromic cover layer arranged over the marking layer at least in the area of the hidden marking. The thermochromic cover layer is opaque below its change temperature, hides the marking, and is translucent or transparent above its change temperature, enabling viewing of the marking. The thermochromic cover layer is pervious to radiation outside the visible spectral range and the marking layer absorbs radiation energy outside the visible spectral range, so that the hidden marking can be incorporated into the marking layer through the thermochromic cover layer by laser radiation of a wavelength outside the visible spectral range.

Abstract: A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.

Abstract: An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.

Abstract: An encoded microparticle having a spatial code is provided; and a set of encoded microparticles possessing subsets each provided with a distinguishable spatial code, wherein the codes comply with a pre-determined coding scheme. Presented are also methods of using the encoded microparticles in various biological assays, such as various multiplex assays and visualizing them by creating a digital image of the encoded microparticles and determining whether false positives are present. Further are provided methods of manufacture of the encoded microparticles which employ ferromagnetic nanoparticles applied using spin-on-glass techniques.

Abstract: A closed microfluidic system is equipped with a carrier plate and a cover plate as well as wall regions arranged therebetween, which form a system of channels and/or cavities with an inner surface. Selected regions of the inner surface are selectively functionalized.

Abstract: Micro- and nanofilters with precision pore sizes and pore layout have applications in many fields including capturing circulating tumor cells and fetal cells in blood, water treatment, pathogen detection in water, etc. Methods to fabricate micro- and nanofilters not using track etching or reactive ion etching are provided, allowing easy fabrication of single layer or stack of films simultaneously, and/or stack of films on rolls. Microfilter can be made using one or more layers of material. Invention enables mass production of microfilters with lithographic quality at low cost. Isolation, enumeration and characterization of circulating tumor cells using microfilters provides (i) guides to cancer treatment selection and personalize dosage, (ii) low cost monitoring for treatment response, disease progression and recurrence, (iii) assessment of pharmacodynamic effects, (iv) information on mechanisms of resistance to therapy, and (v) cancer staging.

Abstract: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.

Abstract: Microlens sheetings with different types of composite images are disclosed, in which the composite image floats above, in, or below the sheeting, or some combination. One type of composite image may be viewable to the unaided eye or an observer and another type of composite image is viewable only to the aided eye of an observer. Methods for providing such an imaged sheeting are also disclosed.

Abstract: Microfabricated particles are dispersed throughout a matrix to create a composite. The microfabricated particles are engineered to a specific structure and composition to enhance the physical attributes of a composite material.

Abstract: A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.

Abstract: A composition is provided that includes a polymer matrix. A core having a core surface is embedded within the polymer matrix. A polymeric ligand passivates the core surface and has a moiety Y, where Y is a Diels-Alder group of a diene or dienophile. A polymeric linker has a complementary Diels-Alder group diene or dienophile to moiety Y and forms a Diels-Alder bond with the moiety Y. A composition is also provided that includes polymer matrix having a matrix surface. A core having a core surface is present on the matrix surface. A polymeric ligand passivates the core surface and has a moiety Y, where Y is Diels-Alder group of a diene or dienophile. The polymer matrix and polymeric ligand together define a matrix-ligand Flory-Huggins binary interaction function greater than 0.

Abstract: A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process.

Abstract: A coatable inorganic material is provided, which is suitable for being coated on a substrate in the form of sol-gel solution and then being directly written with thermochemical mode by using a laser beam. The coatable inorganic material is an oxide, in which the chemical element constitution is more than one element selected from Te, Al, Zr, and Ti.

Abstract: We disclose methods of sorting or separating mixtures of living cells (e.g., eukaryotic, prokaryotic, mammalian, pathogenic, bacterial, viral, etc.). We perform our methods by activating cell-selective photophoric labels, which photosensitize and chemically reduce a photosensitive metal compound to form metal grains, particles or crystals. The metal adheres to the cells and forms the basis for sorting or separating different cell types. Photophoric labels may include chemiluminescent agents such as peroxidase enzymes activated with peroxidase substrates capable of luminescence. Photosensitive metal compounds may be present in a light-sensitive matrix or emulsion containing photosensitizable metal compounds, which form metal grains, particles or crystals upon exposure to a developer solution. Developer solutions are formulated to substantially allow living cells to remain viable after exposure to the developing solution.

Abstract: The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.

Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.

Abstract: A method for forming a LOCOS layer in a semiconductor device includes steps of oxidizing a high voltage region of the semiconductor device to form a LOCOS layer in the high voltage region; and etching the LOCOS layer according to a pattern.

Abstract: A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.

Abstract: A method of producing batches of micro particles includes affixing a substrate sheet to a support and cutting the substrate sheet with a laser device to define a plurality of micro particles. Before, after or during the cutting of the substrate sheet, the region of the substrate sheet defining each micro particle is marked with a code or other identifying marking using a laser device. The code or other identifying marking is unique to the particular batch of micro particles to uniquely identify that batch. The micro particles are removed from the support by a solvent. Preferably, a single laser device is used for cutting the substrate sheet and marking the micro particles. Alternatively, separate laser devices may be used for cutting the substrate sheet and marking the micro particles.

Abstract: An electrically conductive composition can be obtained that provides an electrically conductive coating having low volume resistivity and high electrical conductivity comparable to that of metallic silver independent of high-temperature film deposition conditions, while also enabling the line width of an electrical circuit to be sufficiently narrow without having to increase thickness in the case of forming an electrical circuit of a flexible circuit board and so forth.

Abstract: The irregularities of coloring concentration which is generated between dyed media when a color filter substrate which is prepared in a manufacturing method of a liquid crystal display device is manufactured by supplying ink to dyed media formed on a main surface of the color filter substrate using an ink jet method. In the present invention, as color filter ink which is supplied to the dyed media formed on the color filter substrate using the inkjet method, liquid which contains dye which colors the dyed media, solvent (for example, water) which has an affinity for the dye, a volatility-adjusting agent (for example, glycerin) which lowers the volatility of the ink to a level below the volatility of the solvent, and a dyeing-promoter agent (for example, N-methyl-2-pyrrolidone) which exhibits a higher affinity for the dye and the dyed media than the volatility adjusting agent. Then, the dyed media is colored with this ink.

Abstract: The invention relates to a lithographic method for producing microcomponents with component structures in the submillimeter range. According to the inventive method, a structured adhesive layer is applied to a metal layer and then a photostructured epoxy resin layer is applied to said adhesive layer. Said epoxide resin is structured by means of selective exposition and removing the unexposed zones and filling in the gaps between the resin structures with metal by electroplating. The aim of the invention is to provide an adhesive layer that is suitable for photostructured epoxy resins, especially for SU-8 resist material and that prevents the resist material from being detached. To this end, the adhesive layer consists of polyimide or a polyimide mixture.

Abstract: An object of the present invention is to provide a photosensitive resin composition or a photosensitive resist for color filters which is superior in heat resistance, water resistance, solvent resistance, chemical resistance, and also transparency, and a method for producing color filters using them. The present invention relates to a photosensitive resin composition comprising a vinyl polymer (A) having at least one cyclocarbonate group and at least one carboxyl group in the molecule and a compound (B) having at least two ethylenically unsaturated double bonds in the molecule as a main component, which can introduce crosslinked structures by photocuring and thermosetting, a photosensitive resist for color filters comprising the photosensitive resin composition and a colorant, and a method for producing a color filter, using the photosensitive resist for color filters.

Abstract: When manufacturing a recording medium, a material layer 12 formed on a substrate 11 that composes the recording medium is exposed to a laser beam in accordance with a recording pattern. The material layer 12 has a predetermined reflectivity for the laser beam 13 so as to produce return light for the laser beam 13. By detecting this return light, the focusing of the laser beam on the material layer is adjusted. By doing so, a laser beam can be easily and accurately focused on a material layer during a process in which a laser beam is shone, in accordance with a recording pattern, onto a material layer formed on a recording medium or a production plate used when manufacturing a recording medium.

Abstract: A method wherein small, two- or three-dimensional structures are formed by multiple-photon-absorbed photopolymerization and/or cross-linking of a precursor composition. Use of multi-photon excitation allows fabrication of structures and structural features having at least one dimension of less than about one micron, preferably less than about 500 nm, more preferably less than about 250 nm, and most preferably of less than about 100 nm, in bulk phase as well as in solution, and from a wide variety of organic and inorganic precursor subunits, including synthetic polymers and biological polymers such as proteins, lipids, oligonucleotides, and the like. In one embodiment, use of two-photon far field optics allows the formation of structures having X-Y dimensions of less than about 300 nm and a Z dimension of less than about 500 nm, while use of three-photon far field optics allows the formation of structures having X-Y dimensions of less than about 250 nm and a Z dimension of less than about 300 nm.

Abstract: This invention relates to the printing of transparent media often used for later projection, commonly referred to as Over Head Transparencies, or OHT's. These OHTs are used in several ways: They can be printed in advance and projected in sequence, created in the course of the presentation using marking pens, or a combination of he two, where a pre-printed OHT is edited or modified after printing or in the course of presentation using pens or other marking means. This third use is often compromised by incompatibilities between the marking technology used to create the pre-printed image and the marking pens used to edit the image later. This invention describes a technique for separating the two images, placing each on opposite sides of the transparent film, avoiding this conflict and producing a better solution for the user.

Abstract: A phase shifting mask repair process is described. The process uses an etching gas or a hydrofluoric acid solution to etch the quartz substrate and the characteristics of the phase shifter layer being only slightly etched when clean with a NH3/H2O2/H2O2 solution to calculate and adjust the respective processing time accordingly. As a result, the phase difference between the quartz substrate and the MoSiON phase shifter layer stays relatively the same before and after the repair process.

Abstract: To fabricate masks for deep ultra-violet lithography and for extreme ultra-violet lithography, a layer of material opaque to deep ultra-violet radiation and an extreme ultra-violet radiation absorbent layer are each deposited successively with a layer of silicon and a layer of metal on a respective transparent substrate. A focused electron beam is displaced on the superposed layers of metal and silicon to form a structure of etch-resistant metal/silicon compound. The deep ultra-violet mask is then formed by etching the three layers to leave on the substrate, the metal/silicon compound structure with the extreme ultra-violet absorbent layer beneath it.

Abstract: The placement accuracy and resolution of direct-write patterning tools, in particular the atomic force microscope (AFM), is considered for application to fabricating multi-passband integrated optical filters. Because of its simpler fabrication a grating structure is proposed that consists of identical stripes that are non-periodically spaced. The recently developed pseudorandom encoding method from the field of computer generated holography is modified to effectively assign analog reflectances at each point along the grating by selective withdrawal and offsetting of the stripes from a periodic spacing. An example filter designed by this method has two 1.5 nm bandwidth passbands and −23 dB of rejection for lightly coupled stripes. As with single band filters, the passbands broaden as the coupling increases.

Abstract: A method wherein small, two- or three- dimensional structures are formed by multiple-photon-absorbed photopolymerization and/or cross-linking of a precursor composition. Use of multi-photon excitation allows fabrication of structures and structural features having at least one dimension of less than about one micron, preferably less than about 500 nm, more preferably less than about 250 nm, and most preferably of less than about 100 nm, in bulk phase as well as in solution, and from a wide variety of organic and inorganic precursor subunits, including synthetic polymers and biological polymers such as proteins, lipids, oligonucleotides, and the like. In one embodiment, use of two-photon far field optics allows the formation of structures having X-Y dimensions of less than about 300 mn and a Z dimension of less than about 500 nm, while use of three-photon far field optics allows the formation of structures having X-Y dimensions of less than about 250 mn and a Z dimension of less than about 300 nm.

Abstract: A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using layout modification system technology based on a predetermined cost constraint, determining if all violations are corrected, and either changing the cost constraint to a higher cost constraint if violations still exist and repeating the process or terminating the conversion if all violations are corrected.

Abstract: Radiation-activated catalysts (RACs), autocatalytic reactions, and protective groups are employed to achieve a highly sensitive, high resolution, radiation directed combinatorial synthesis of pattern arrays of diverse polymers. When irradiated, RACs produce catalysts that can react with enhancers, such as those involved in autocatalytic reactions. The autocatalytic reactions produce at least one product that removes protecting groups from synthesis intermediates. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.