Free Radical Patents (Class 430/916)
  • Patent number: 9804490
    Abstract: The present invention provides a novel photopolymer formulation comprising matrix polymers, writing monomer and a photoinitiator and further comprising a compound of formula (1) where A1, A2 and A3 are each independently hydrogen, fluorine, chlorine, bromine or iodine, R1, R2, R3, R4 and R5 are each independently hydrogen, halogen, cyano, nitro, amino, alkylimino, azide, isonitrile, enamino, formyl, acyl, carboxyl, carboxylate, carboxamide, orthoester, sulphonate, phosphate, organosulphonyl, organosulphoxidyl, optionally fluorinated alkoxy or an optionally substituted aromatic, heteroaromatic, aliphatic, araliphatic, olefinic or acetylenic radical while suitable radicals may be connected together via bridge of any desired substitution, or in that two or more compounds of formula (I) may be connected together via at least one of the radicals R1, R2, R3, R4 and R5, in which case these radicals therein constitute a 2- to 4-tuply functional bridge, with the proviso that at least one of the radicals R1, R2, R3
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: October 31, 2017
    Assignee: Covestro Deutschland AG
    Inventors: Thomas Rölle, Horst Berneth, Friedrich-Karl Bruder, Dennis Hönel, Thomas Fäcke, Günther Walze, Rainer Hagen, Christian Diedrich
  • Patent number: 8956805
    Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.
    Type: Grant
    Filed: May 7, 2013
    Date of Patent: February 17, 2015
    Assignee: Georgia Tech Research Corporation
    Inventors: Paul A. Kohl, Sue Ann Bidstrup-Allen, Clifford Lee Henderson
  • Patent number: 8691352
    Abstract: Disclosed is a photopolymerizable composition which contains a photopolymerization initiator (A) that has a partial structure represented by the following Formula (1) and a polymerizable compound (B). In General formula (1), R3 and R4 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group or an alkoxy group; R3 and R4 may form a ring with each other; and X represents OR5, SR6, or NR17R18. The photopolymerizable composition is capable of forming a cured film that has high sensitivity, excellent intra-membrane curability and excellent adhesion to a support. The cured film is able to maintain a patterned shape even during post-heating after development and has good pattern formability, while coloring due to heating with passage of time being suppressed.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: April 8, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Masaomi Makino
  • Patent number: 8617786
    Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.
    Type: Grant
    Filed: February 11, 2011
    Date of Patent: December 31, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
  • Patent number: 8614366
    Abstract: In various embodiments, methods described herein comprise the use of water-soluble cationic fullerene derivatives for improving plant genetic transformation. Cationic Fullerene derivatives of the invention possess DNA binding and compaction activity and provide a new method to deliver DNA into plant cells for plant transformation. Water-soluble fullerene derivatives of the invention with anionic or non-polar substituents possess antioxidant (free radical scavenging) activity, provide improved yields and efficiency of plant transformation methods such as biolistic, Agrobacterium tumefaciens, or electroporation methods by limiting cellular damage and resulting cell death leading to higher yields of viable transformed cells in the process.
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: December 24, 2013
    Inventor: Stephen R. Wilson
  • Patent number: 8557498
    Abstract: A photosensitive resin composition is used that comprises a photosensitive silicone having a styryl group as a photosensitive group, and a photopolymerization initiator having a specific structure. As a result, a photosensitive resin composition capable of being cured in air by photopolymerization that is preferable for use as a buffer coat material or rewiring layer of an LSI chip, a method for forming a cured relief pattern using this photosensitive resin composition, and a semiconductor device comprising the cured relief pattern are provided.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: October 15, 2013
    Assignee: Asahi Kasei E-Materials Corporation
    Inventor: Tomohiro Yorisue
  • Patent number: 8455175
    Abstract: Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: June 4, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Mark R. Winkle, Jill E. Steeper, Xiang-Qian Liu, Janet Okada-Coakley, Scott A. Ibbitson
  • Patent number: 8445176
    Abstract: A lithographic printing plate precursor comprising an image-recording layer, said image-recording layer being photopolymerizable upon exposure to light having a wavelength of from 300 to 500 nm and containing a mixture of sensitizers.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: May 21, 2013
    Assignee: Agfa Graphics NV
    Inventors: Jan Venneman, Peter Hendrikx, Paul Callant, Alexander Williamson
  • Patent number: 8377634
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Patent number: 8361697
    Abstract: [Purpose] To provide a photosensitive resin composition having satisfactory compatibility during dry film formation, exhibiting similar sensitivity for exposure with both i-line radiation and h-line radiation type exposure devices, having excellent resolution and adhesiveness, allowing development with aqueous alkali solutions, and preferably, having no generation of aggregates during development. [Solution Means] A photosensitive resin composition comprising (a) 20-90 wt % of a thermoplastic copolymer having a specific copolymerizing component copolymerized, and having a carboxyl group content of 100-600 acid equivalents and a weight-average molecular weight of 5,000-500,000, (b) 5-75 wt % of an addition polymerizable monomer having at least one terminal ethylenic unsaturated group, (c) 0.01-30 wt % of a photopolymerization initiator containing a triarylimidazolyl dimer, and (d) 0.001-10 wt % of a pyrazoline compound.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: January 29, 2013
    Assignee: Asahi Kasei E-Materials Corporation
    Inventor: Yosuke Hata
  • Patent number: 8338074
    Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: December 25, 2012
    Assignees: CMET Inc., San-Apro Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
  • Patent number: 8304169
    Abstract: The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.
    Type: Grant
    Filed: February 11, 2008
    Date of Patent: November 6, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Min-Young Lim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Patent number: 8088560
    Abstract: A method of making a lithographic printing plate includes the steps of: (a) providing a lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer, and a coating on the support, the coating including (i) at least one image-recording layer which includes a photocurable composition, and (ii) on top thereof, an oxygen-barrier layer including a water-soluble or water-swellable polymer, b) image-wise exposing the coating, (c) optionally, heating the precursor in a pre-heating unit, (d) treating the image-wise exposed precursor with water or an aqueous solution to remove at least a portion of the oxygen-barrier layer, (e) mounting the treated precursor on a plate cylinder of a lithographic printing press, and (f) developing the precursor by rotating the plate cylinder while feeding dampening liquid and/or ink to the coating, thereby removing non-exposed areas of the image-recording layer.
    Type: Grant
    Filed: November 15, 2006
    Date of Patent: January 3, 2012
    Assignee: Agfa Graphics NV
    Inventor: Alexander Williamson
  • Patent number: 8048613
    Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: November 1, 2011
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Patent number: 8034538
    Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation absorbing compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: October 11, 2011
    Assignee: Eastman Kodak Company
    Inventors: Bernd Strehmel, Harald Baumann, Daniela Lummel
  • Patent number: 8012671
    Abstract: A curable composition in which polymerization inhibition due to oxygen is suppressed and which may be cured with high sensitivity by exposure to laser light or the like is provided. The curable composition includes: a polymerizable compound having an ethylenically unsaturated bond; a binder; a radical polymerization initiator; and at least one specific amine compound. Also provided is an image forming material and a negative-working planographic printing plate precursor including the curable composition.
    Type: Grant
    Filed: September 24, 2008
    Date of Patent: September 6, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Shigefumi Kanchiku
  • Patent number: 7977028
    Abstract: The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: July 12, 2011
    Assignee: Toray Industries, Inc.
    Inventors: Tomoyuki Yuba, Yoji Fujita, Masao Tomikawa
  • Patent number: 7927781
    Abstract: The present invention relates to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator; a preparation method thereof; and a dry film resist comprising the same.
    Type: Grant
    Filed: December 4, 2008
    Date of Patent: April 19, 2011
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: In-Ho Yoon, Bong-Gi Kim, Chang-Seok Rho, Sang-Ki Kang, Kyung-Rock Byun, Chan-Seok Park
  • Patent number: 7892720
    Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: February 22, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Takeshi Eriguchi, Hiromasa Yamamoto, Kaori Tsuruoka
  • Patent number: 7883826
    Abstract: A radiation-sensitive composition and negative-working imagable element includes a polymeric binder that has a hydrophobic backbone and pendant salt groups that comprise a cation covalently attached to the hydrophobic backbone and a boron-containing anion forming a salt with the cation. The use of these particular polymers provides fast digital speed (high imaging sensitivity) and good printability (good shelf-life) even when the preheat step normally used between exposure and development, is omitted.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: February 8, 2011
    Assignee: Eastman Kodak Company
    Inventors: Scott A. Beckley, Ting Tao, Jianbing Huang
  • Patent number: 7851124
    Abstract: A composition for forming a film for protecting wiring which in one aspect includes a polyimide precursor, a compound having at least two photopolymerizable groups, and a photopolymerization initiator, wherein the polyimide precursor includes a polyimide precursor obtained from a diamine component comprising a defined diamine compound. In other aspects, a dry film for forming a wiring-protecting film using the composition and a substrate having wiring protected by means of the dry film are provided.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: December 14, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Shuji Tahara, Kazuhito Fujita, Takeshi Tsuda, Etsuo Ohkawado
  • Patent number: 7741380
    Abstract: The invention provides (1) an ink composition including a polymerization initiator and at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, (2) an ink composition including a polymerization initiator, at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, and a monofunctional (meth)acrylic acid ester or amide having an alkylene oxide repeating unit in the molecule, and (3) an ink composition including a polymerization initiator and a monofunctional (meth)acrylic acid ester or amide having a basic group in the molecule; and an ink jet recording method, a method for producing a planographic printing plate and a planographic printing plate produced by the method for producing a planographic printing plate using the above-mentioned ink compositions.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: June 22, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Ippei Nakamura
  • Patent number: 7648815
    Abstract: Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light, The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.
    Type: Grant
    Filed: September 11, 2001
    Date of Patent: January 19, 2010
    Assignee: PI R&D Co., Ltd.
    Inventors: Hiroshi Itatani, Shunichi Matsumoto
  • Patent number: 7615323
    Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from a
    Type: Grant
    Filed: November 11, 2005
    Date of Patent: November 10, 2009
    Assignee: Kodak Graphic Communications, GmbH
    Inventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
  • Patent number: 7601482
    Abstract: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R? is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: October 13, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Georg Pawlowski, Chunwei Chen, Joseph Oberlander, Robert Plass
  • Patent number: 7592128
    Abstract: The present invention relates to negative-working imageable elements that can be used for the manufacture of printing plates. These imageable elements can be developed on on-press by the action of a lithographic printing ink used in combination with either water or a fountain solution. The imageable elements comprise an imageable layer that is not removable in water or fountain solution alone. The imageable layer includes a free radically polymerizable compound, a free radical initiator composition, an infrared radiation absorbing compound, and a polymeric binder comprising poly(alkylene oxide) pendant groups, and preferably additionally pendant cyano groups.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: September 22, 2009
    Assignee: Eastman Kodak Company
    Inventors: Jianbing Huang, Kevin B. Ray, Scott A. Beckley
  • Patent number: 7579134
    Abstract: The present invention is directed to coverlay compositions derived from two-layer polyamic acid-based composites having a cover layer and adjacent thereto an adhesive layer wherein the cover layer comprises polyamic acid and other additives allowing the composition to be photosensitive and aqueous base developable, and where the adhesive layer can form a polyimide having a glass transition temperature between 170 and 250° C. The two-layer coverlay compositions of the present invention are used to encapsulate metal circuit traces formed on a flexible printed circuit base substrate. These two-layer compositions are particularity useful due to having an overall in-plane CTE between 10 and 40 ppm/° C. a range that is useful in avoiding unwanted curling of a flexible printed circuit when used as a polyimide-based coverlay material.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: August 25, 2009
    Assignee: E. I. Dupont de Nemours and Company
    Inventors: Thomas Eugene Dueber, Brian C. Auman, Kuppusamy Kanakarajan
  • Patent number: 7569328
    Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A?) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B?) a compound that generates radicals when exposed to light or heat.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: August 4, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Fujimaki
  • Patent number: 7553605
    Abstract: An ink composition is provided that includes (A) an N-vinyllactam, (B) a monomer represented by Formula (I), and (C) a radical polymerization initiator, or includes (A) an N-vinyllactam, (B) a monomer represented by Formula (II), (C) a radical polymerization initiator, and phenoxyethyl acrylate.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: June 30, 2009
    Assignee: FUJIFILM Corporation
    Inventors: Yuuichi Hayata, Ippei Nakamura
  • Patent number: 7524614
    Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: April 28, 2009
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley
  • Patent number: 7498123
    Abstract: Disclosed are novel aminium, diimonium, and polymethine borate dyes that have at least one absorption maximum in the infrared spectral region between about 700 and 2000 nm and that are useful as infrared absorbers, the anionic borate moiety having the formula: [BXaYb]?, in which a and b are integers with a ranging from 0 to 3 and b ranging from 1 to 4 and a+b=4; X, which may be identical or different, are each a halogen atom, an OH functional group, or a C1 to C20 alkyl or alicyclic radical, and Y, which may be identical or different, are each a phenyl radical, at least one Y substituted by at least one element or electron-withdrawing substituent such as a perfluoroalkyl group, or by one or more halogen atoms, or an aryl radical containing at least two aromatic ring members, which may also be further substituted. Such dyes may be incorporated into films or bulk materials to form light filters for electromagnetic radiation, including laser radiation.
    Type: Grant
    Filed: March 3, 2005
    Date of Patent: March 3, 2009
    Assignee: Exciton, Inc.
    Inventor: Paul A. Cahill
  • Patent number: 7482111
    Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: January 27, 2009
    Assignee: JSR Corporation
    Inventors: Kouji Nishikawa, Tooru Kimura, Shin-ichiro Iwanaga
  • Patent number: 7476489
    Abstract: The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are particularly suitable for use in flexible circuit applications where low curl, low temperature curing, and good adhesion is a significant advantage.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: January 13, 2009
    Assignee: E.I. DuPont de Nemours
    Inventors: Thomas E. Dueber, Michael W. J. West, Kuppusamy Kanakarajan, Brian C. Auman
  • Patent number: 7432037
    Abstract: The invention provides a curable resin composition having an addition polymerization-based block copolymer (I) and an ethylenic unsaturated compound (II). Also provided is a flexographic plate material using the curable resin composition as its constituent. The flexographic plate material containing the curable resin composition of the present invention, can be cured to form strong and extendable areas and can be used to make flexographic plates that can form a sharp image plate surface even for a fine image. The flexographic plate material of the present invention is particularly useful in printing on cardboards, recycled paper or other paper articles with rough surfaces.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: October 7, 2008
    Assignee: Kuraray Co., Ltd.
    Inventors: Kenji Suzuki, Kenji Shachi, Mizuho Maeda
  • Patent number: 7416835
    Abstract: A polymerizable composition comprising: (A) a compound which causes at least one of decarboxylation and dehydration by heat; (B) a radical initiator; (C) a compound having at least one ethylenically unsaturated bond; and (D) an infrared ray absorber.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: August 26, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Fujimaki
  • Patent number: 7381516
    Abstract: A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconductor nanoparticle quantum dot that has at least one electronic excited state that is accessible by absorption of two or more photons, and (2) a composition, different from said reactive species, that is capable of interacting with the excited state of the semiconductor nanoparticle quantum dot to form at least one reaction-initiating species.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: June 3, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: David S. Arney, Catherine A. Leatherdale, Manoj Nirmal
  • Patent number: 7378223
    Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: May 27, 2008
    Assignee: Dongjin Semichem, Co., Ltd.
    Inventors: Bong-gi Kim, Sung-mun Ryu, Seong-mo Park, Chan-seok Park
  • Patent number: 7374861
    Abstract: The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The photoresist composition further contains b) monomers having a tertiary amino group and a C?C double bond, which form ionic bonds with the remaining hydroxyl groups of the polyimide. The photoresist composition further contains c) a photoinitiator which is also called photosensitizer. The components a) to c) are all dissolved in a solvent.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: May 20, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Jyh-Long Jeng, Jeng-Yu Tsai, Charng-Shing Lu, Jinn-Shing King
  • Patent number: 7368224
    Abstract: The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: May 6, 2008
    Assignee: Kyowa Hakko Chemical Co., Ltd.
    Inventors: Tsuguo Yamaoka, Ikuo Shimizu, Hiroshi Toyoda, Motoharu Kinugasa, Masanori Ikuta, Kyoko Katagi
  • Patent number: 7364834
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: April 29, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7361450
    Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: April 22, 2008
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
  • Patent number: 7341828
    Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: March 11, 2008
    Assignee: Showa Denko K.K.
    Inventors: Tsuyoshi Katoh, Hirotoshi Kamata, Mina Onishi
  • Patent number: 7338748
    Abstract: The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or —NR3— in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: March 4, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Sugasaki, Kazuto Kunita, Kazuhiro Fujimaki
  • Patent number: 7323290
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: January 29, 2008
    Assignee: Eternal Technology Corporation
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7312013
    Abstract: This invention provides a photoreactive composition in which reaction of a hydrolyzable metal compound takes place by irradiation of light. A photoreactive composition, which comprises a hydrolyzable metal compound (A) comprising a metal atom and a hydrolyzable functional group bonded to the metal atom and, a compound (B) promoting reaction, polymerization or crosslinking of the compound (A) in the presence of oxygen by irradiation of light.
    Type: Grant
    Filed: April 9, 2002
    Date of Patent: December 25, 2007
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Katsunori Takahashi, Hiroji Fukui, Kazuhiro Kawabata, Takeo Kuroda, Motokuni Ichitani, Yasuhiro Nakatani
  • Patent number: 7309550
    Abstract: This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one polyether diol, at least one aliphatic diisocyanate, at least one hydroxyl-functionalized mono-, di- and tri-(meth)acrylate, and a particular photoinitiator. The resulting photosensitive resin compositions have reduced rates and levels of yellowing if subjected to additional UV-light or sunlight after processing.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: December 18, 2007
    Assignee: Chemence, Inc.
    Inventors: Joe F. Rach, Krasimir Chorbadzhiev
  • Patent number: 7297460
    Abstract: A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each R is independently hydrogen, an inorganic group, an alkyl group, an alkylene group, an aryl group, an arylene group, or non-heterocyclic group-containing organo-functional derivatives of alkyl, alkylene, aryl or arylene groups; and a process for obtaining a colourless, monochrome or multicolour ink jet image comprising the steps of jetting one or more streams of ink droplets having the above-mentioned composition onto an ink-jet ink receiver material, and subjecting the obtained image to radiation curing.
    Type: Grant
    Filed: February 9, 2004
    Date of Patent: November 20, 2007
    Assignee: Agfa-Gevaert
    Inventors: Luc Vanmaele, Johan Loccufier, Roland Claes
  • Patent number: 7285375
    Abstract: Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
    Type: Grant
    Filed: May 31, 2004
    Date of Patent: October 23, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Toshiyuki Matsumura, Norio Miura
  • Patent number: 7261998
    Abstract: The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including both constitutional units having a pendant cyano group attached directly to the hydrophobic backbone, and constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. When the imageable element is imaged and developed, the resulting printing plate may exhibit improved on-press solvent resistance and longer press life.
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: August 28, 2007
    Assignee: Eastman Kodak Company
    Inventors: Kouji Hayashi, Heidi M. Munnelly, Ting Tao, Jianbing Huang, Shashikant Saraiya
  • Patent number: 7232651
    Abstract: A photopolymerisable system is disclosed which can be polymerised by exposure to UV light, for example, to form a solid, light-transmitting sheet material having volume refractive index variations defining an optical diffuser or a hologram, for example. The system includes a silicone monomer, prepolymer, macromonomer or co-monomer capable of undergoing free radical initiated polymerization and further includes a photoinitiator.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: June 19, 2007
    Assignee: Microsharp Holdings Limited
    Inventors: Robin J. T. Clabburn, Rifat Iqbal, Stephen Moratti