Nitrogen Compound Containing Patents (Class 430/919)
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Patent number: 5208135Abstract: Compounds having a utility as photosensitive dyes in photocurable polymer based imaging systems having a nucleus of general formula (I): ##STR1## wherein: n is 1 or 2,Y is selected from the group consisting of 0 and ##STR2## Z is selected from the group consisting of 0.sup..crclbar. and ##STR3## M.sup..sym. is a cation.Type: GrantFiled: February 11, 1991Date of Patent: May 4, 1993Assignee: Minnesota Mining and Manufacturing CompanyInventors: Ranjan C. Patel, Tran V. Thien, David Warner
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Patent number: 5206117Abstract: The present invention relates to photosensitive negative and positive tone compositions for imagewise deposition of polyimide on a substrate.Type: GrantFiled: March 13, 1992Date of Patent: April 27, 1993Inventors: Jeffrey W. Labadie, Dennis R. McKean, Willi Volksen, Gregory M. Wallraff
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Patent number: 5175076Abstract: A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises:(A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) and .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components;(B) a basic nitrogen atom-containing compound;(C) an ethylenically unsaturated monomer; and(D) a photopolymerization initiator.Type: GrantFiled: December 17, 1991Date of Patent: December 29, 1992Assignee: Nippon Paint Co., Ltd.Inventors: Katsukiyo Ishikawa, Hidefumi Kusuda, Katsuji Konishi
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Patent number: 5143818Abstract: This invention relates to initiator systems for photopolymerizable compositions. More particularly, this invention pertains to photopolymerizable compositions in which the initiator system comprises an anionic dye in combination with a borate anion coinitiator.Type: GrantFiled: February 1, 1991Date of Patent: September 1, 1992Assignee: E. I. Du Pont de Nemours and CompanyInventors: Gregory C. Weed, Bruce M. Monroe
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Patent number: 5130227Abstract: A radiation sensitive plate comprises a substrate coated with a photopolymerizable composition. The composition comprises a polymerizable compound containing ethylenic unsaturation, a perester photoinitiator and optionally an optical sensitiser. The substrate may be a sheet of grained and anodized aluminum and the plate is useful in the production of lithographic printing plates.Type: GrantFiled: October 5, 1989Date of Patent: July 14, 1992Assignee: Vickers PlcInventors: John R. Wade, Rodney M. Potts, Michael J. Pratt
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Patent number: 5128231Abstract: A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.Type: GrantFiled: November 29, 1991Date of Patent: July 7, 1992Assignees: Oki Electric Industry Co., Ltd., Fuji Chemicals Industrial Co., Ltd.Inventors: Toshio Itoh, Miwa Sakata, Yoshio Yamashita, Takateru Asano, Yuuzi Kosuga, Hiroshi Umehara
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Patent number: 5102773Abstract: A photosensitive recording material contains a mixture of carboxyl-containing polymers having ethylenically unsaturated side groups, one or more ethylenically unsaturated monomeric compounds, a photoinitiator and a .beta.-aminoalcohol.It is suitable for the production of printing plates.Type: GrantFiled: October 20, 1989Date of Patent: April 7, 1992Assignee: BASF AktiengesellschaftInventors: Dieter Littmann, Thomas Telser, Horst Koch, Wolfgang Huemmer, Martin Meister
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Patent number: 5102775Abstract: A composition for visible light sensitive electrodeposition coating which comprises (A) a photocurable resin having light sensitive groups capable of being crosslinked or polymerized by light irradiation and ionic groups, (B) a sensitizer which is excited by absorption of visible light and has a property to interact with the resin (A), (C) a water-insoluble polymerization initiator, and optionally, (D) at least one specific nitrogen-containing compound; and an image-forming method which comprises (i) coating the surface of a conductor by electrodeposition with the aforesaid composition, (ii) exposing the resulting film by electrodeposition by partially irradiating the film with visible light, and then (iii) contacting the resulting film with a developing solution to remove the unexposed areas.Type: GrantFiled: September 28, 1989Date of Patent: April 7, 1992Assignee: Kansai Paint Co., Ltd.Inventors: Motoko Okuhara, Ichiro Yoshihara, Yasuo Doi, Takao Yamamoto, Kenji Seko, Yutaka Yoshikawa, Naozumi Iwasawa
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Patent number: 5068371Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by a pyrrylalkyl group, amidoalkyl group or imidoalkyl group, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.Type: GrantFiled: May 23, 1990Date of Patent: November 26, 1991Assignee: Ciba-Geigy CorporationInventors: Eginhard Steiner, Harry Beyeler, Rinaldo Husler
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Patent number: 5055372Abstract: A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound and an aromatic ketone and a borate salt; and photosensitive materials employing the composition where in one embodiment the composition is microencapsulated.Type: GrantFiled: April 23, 1990Date of Patent: October 8, 1991Assignee: The Mead CorporationInventors: Michael S. Shanklin, Peter Gottschalk, Paul C. Adair
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Patent number: 5041368Abstract: Radiation sensitive thermally developable imaging elements comprise:(a) photosensitive silver halide,(b) light insensitive silver salt oxidizing agent,(c) reducing agent for silver ions, and(d) an antifoggant or speed enhancing compound comprising iodophthalazinone compounds. The antifoggants are effective in reducing spurious background image densities.Type: GrantFiled: June 7, 1990Date of Patent: August 20, 1991Assignee: Minnesota Mining and Manufacturing CompanyInventor: Oanh V. Pham
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Patent number: 5011755Abstract: The present invention relates to compositions comprising(a) a titanocene photoinitiator of the formula I ##STR1## (b) a 3-ketocoumarin of the formula II ##STR2## in which both R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, R.sup.4 is a radical of the formula V ##STR3## R.sup.5 is C.sub.1 -C.sub.20 alkyl, cycloalkyl having 5-7 ring carbon atoms, phenyl or naphthyl which are unsubstituted or substituted by one to three C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms or by one diphenylamino or C.sub.1 -C.sub.6 dialkylamino group, or is C.sub.7 -C.sub.9 aralkyl, a radical --(CH.dbd.CH).sub.a --C.sub.6 H.sub.5 or a radical of the formula V, a is 1 or 2, preferably 1, and R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy, phenyl, tolyl, xylyl or benzyl, and R.sup.11 can additionally also be a group --NR.sup.15 R.sup.16 or --OR.sup.15, wherein R.sup.15 and R.sup.Type: GrantFiled: January 30, 1990Date of Patent: April 30, 1991Assignee: Ciba-Geigy CorporationInventors: Ottmar Rohde, Armin Schaffner, Martin Riediker, Kurt Meier
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Patent number: 4987057Abstract: A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.Type: GrantFiled: May 22, 1989Date of Patent: January 22, 1991Assignee: Hitachi Chemical Co., Ltd.Inventors: Makoto Kaji, Nobuyuki Hayashi
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Patent number: 4980266Abstract: A photosensitive resin composition comprising (A) a carboxyl group-containing film-forming property imparting polymer, (B) a copolymerizable vinyl compound, (C) a photopolymerization initiator, and (D) a 1,2,3-benzotriazole derivative is useful for forming a photosensitive film excellent in resistance to plating and stability.Type: GrantFiled: May 15, 1990Date of Patent: December 25, 1990Assignee: Hitachi Chemical Company, Ltd.Inventors: Taku Kawaguchi, Yoshitaka Minami, Tatsuya Ichikawa
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Patent number: 4970136Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.Type: GrantFiled: June 5, 1989Date of Patent: November 13, 1990Assignee: Ciba-Geigy CorporationInventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Franciszek Sitek
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Patent number: 4962012Abstract: Titanocenes containing .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are attached to the metal atom, said aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bonds, are suitable photoinitiators for the photopolymerization of ethylenically unsaturated substrates. They are distinguished by high sensitivity, stability to air and heat, and are very effective in the range from UV light to visible light.Type: GrantFiled: January 3, 1990Date of Patent: October 9, 1990Assignee: Ciba-Geigy CorporationInventors: Martin Riediker, Martin Roth, Niklaus Buhler, Joseph Berger
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Patent number: 4950581Abstract: A photopolymerizable composition is provided containing a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, and if necessary, a linear organic high molecular weight polymer. The photopolymerization initiator comprises a combination of (a) an organic compound represented by formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, and R.sup.4, which may be the same or different, each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group, and at least two of said R.sup.1, R.sup.2, R.sup.3, and R.sup.4 may combine to form a cyclic structure, with the proviso that at least one of R.sup.1, R.sup.2, R.sup.3, and R.sup.4 is an alkyl group, and wherein Z.sym. represents an alkali metal cation or a quaternary ammonium cation, and (b) an organic dye having no counter anion.Type: GrantFiled: July 5, 1988Date of Patent: August 21, 1990Assignee: Fuji Photo Film Co., Ltd.Inventors: Mitsuru Koike, Nobuyuki Kita
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Patent number: 4948694Abstract: A recording medium comprising a substrate and a transfer recording layer containing a photo-initiator comprising camphorquinone and a coumarin derivative. Such photo-initiator aids in realizing high sensitivity without lowering storage stability of the recording medium. The transfer recording layer causes a change in transfer characteristic when provided with light energy and heat energy, at least one of which is applied imagewise, to provide a transferable portion therein. The transferable portion is then transferred to a transfer-receiving medium such as plain paper to form a transferred image thereon.Type: GrantFiled: September 11, 1989Date of Patent: August 14, 1990Assignee: Canon Kabushiki KaishaInventors: Norio Ohkuma, Masanori Takenouchi, Masashi Miyagawa, Hiroshi Hayashi, Tooru Minami, Hiroharu Oobayashi
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Patent number: 4946760Abstract: A radiation-sensitive mixture, in particular photosensitive mixture, is disclosed that contains a compound which forms a strong acid on exposure to actinic radiation and a polymeric reaction product of (i) a polymeric organic compound containing free OH groups, (ii) an organic compound containing at least two isocyanate groups or at least two epoxy groups, and (iii) a compound containing repeating acid-cleavable acetal or ketal groups and at least one free OH group. The mixture yields printing plates or photoresists with a longer storage life.Type: GrantFiled: November 1, 1988Date of Patent: August 7, 1990Assignee: Hoechst AktiengesellschaftInventor: Andreas Elsaesser
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Patent number: 4940645Abstract: Imaging materials employing photosensitive microcapsules having improved film speed are disclosed wherein the microcapsules contain a photoinitiator system including an absorber, a coinitiator and an autoxidizer; the absorber is a compound such as an aromatic ketone, the coinitiator and the autoxidizer are different but may be compounds such as N,N-dialkylanilines; the coinitiator and autoxidizer are selected such that free radical generation and oxygen consumption occur with optimum efficiency thereby providing an imaging material having high film speed.Type: GrantFiled: January 19, 1989Date of Patent: July 10, 1990Assignee: The Mead CorporationInventors: Paul D. Davis, Gary F. Hillenbrand, Paul C. Adair
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Patent number: 4937175Abstract: Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free radically initiated changes initiated by exposing the substituted diazene to light and heat.Type: GrantFiled: January 23, 1989Date of Patent: June 26, 1990Assignee: The Dow Chemical CompanyInventors: Jerry E. White, Richard A. Wolf
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Patent number: 4927730Abstract: A light-sensitive material comprising a light-sensitive layer containing silver halide, a reducing agent, a polymerizable compound and a color image forming substance provided on a support, characterized in that the color image forming substance is a triazene compound having the following formula: ##STR1## in which Ar is an aryl group or a heterocyclic group, each of which may have one or more substituent groups; each of R.sup.1 and R.sup.2 independently is a group selected from the group consisting of hydrogen, an alkyl group, a cycloalkyl group, an aralkyl group, an alkenyl group, an aryl group and a heterocyclic group, each of which may have one or more substituent groups, or R.sup.1 and R.sup.2 form, together with the neighboring nitrogen, a heterocyclic group which may have one or more substituent groups; and n is 1, 2 or 3. An image forming method utilizing the light-sensitive material is also disclosed.Type: GrantFiled: April 27, 1987Date of Patent: May 22, 1990Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazo Sato
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Patent number: 4923781Abstract: A photopolymerizable composition comprises a polyfunctional monomer, a photopolymerization initiator, an organic halogen compound and a 3,6-diaminofluoran derivative. The 3,6-diaminofluoran has the formula (I): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 is hydrogen, an alkyl group, a cycloalkyl group, an aralkyl group, an aryl group or a heterocyclic group, R.sup.1 and R.sup.2 (also R.sup.3 and R.sup.4 may form a heterocyclic ring in conjunction with the adjoining nitrogen atom, provided that at least two of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are aryl groups, or at least one group of the group containing R.sup.1 and R.sup.2 and the group containing R.sup.3 and R.sup.4 forms in conjunction with the adjoining nitrogen atom a heterocyclic ring; each of R.sup.5, R.sup.6 and R.sup.Type: GrantFiled: October 23, 1989Date of Patent: May 8, 1990Assignee: Fuji Photo Film Co., Ltd.Inventors: Sadao Fujikura, Masayuki Iwasaki, Minoru Maeda, Ken Iwakura
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Patent number: 4910121Abstract: Titanocenes containing .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are attached to the metal atom, said aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bonds, are suitable photoinitiators for the photopolymerization of ethylenically unsaturated substrates. They are distinguished by high sensitivity, stability to air and heat, and are very effective in the range from UV light to visible light.Type: GrantFiled: July 28, 1987Date of Patent: March 20, 1990Assignee: Ciba-Geigy CorporationInventors: Martin Riediker, Martin Roth, Niklaus Buhler, Joseph Berger
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Patent number: 4894314Abstract: Photoinitiator compositions are disclosed which contain 3,3'-carbonyl bis(7-diethylaminocoumarin); an alkyl ester of a p-dialkylamino benzoic acid; and either camphorquinone or a 2,4,5-triphenylimidazolyl dimer. Photoinitiators are also provided which contain 3,3'-carbonyl bis(7-diethylaminocoumarin); an alkyl ester of a p-dialkylamino benzoic acid; camphorquinone and a 2,4,5-triphenylimidazolyl dimer. These latter photoinitiators are particularly useful in photopolymerizable compositions which are polymerized by exposure to visible laser light.Type: GrantFiled: November 16, 1988Date of Patent: January 16, 1990Assignee: Morton Thiokol, Inc.Inventors: Robert Barr, Leo Roos, Lawrence Crane
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Patent number: 4886735Abstract: Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system(a) one or more colorless or virtually colorless organic compounds which are oxidizable to colored compounds, and(b) a photooxidant for the colorless or virtually colorless organic compound(s) (a),wherein photooxidant (b) comprises an organic salt with a substituted or unsubstituted hetaromatic system, this hetaromatic system having one or more built-in groups of the general formula (I) ##STR1## where R is substituted or unsubstituted alkenyl, alkynyl, hetaryl, alkoxycarbonyl, carbamoyl, alkylsType: GrantFiled: May 17, 1988Date of Patent: December 12, 1989Assignee: BASF AktiengesellschaftInventors: Andreas Boettcher, Martin Fischer, Reinhard Aldag, Thomas Bluemel
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Patent number: 4876175Abstract: A photographic imaging system is disclosed comprised of a hardenable organic component containing ethylenic unsaturation sites and coinitiators for ethylenic addition. The coinitiators include an activator and a photosensitizer. The photosensitizer is a 6-tertiary amino-2-(Z--CH.dbd.)benzofuran dye, where Z represents the atoms providing an electron withdrawing carbonyl or sulfonyl group and completing a conjugated methine linkage extending from the electron withdrawing carbonyl group through the benzofuran to the electron donating 6-tertiary amino substituent to form a resonant dye chromophore. The photosensitizers bathochromically extend exposure response of the imaging system.Type: GrantFiled: May 9, 1988Date of Patent: October 24, 1989Assignee: Eastman Kodak CompanyInventors: Chin H. Chen, John L. Fox, Donald P. Specht, Samir Y. Farid
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Patent number: 4859568Abstract: A method for recording a photographic image on an image-recording material is provided, wherein an image-recording material formed by coating at least a photographic silver halide, a polymerizable vinyl monomer, and a hydrazine derivative represented by formula (I) ##STR1## wherein X represents a hydrogen atom, an alkyl group, or a group represented by ##STR2## positioned in an ortho-, meta-, or para-position on the benzene ring; Y represents ##STR3## or --SO.sub.2 --; R.sub.1, R.sub.2, R.sub.3, and R.sub.4 each represents a hydrogen atom, an unsubstituted alkyl group, or a substituted alkyl group, provided that R.sub.1 represents a hydrogen atom only when Y represents ##STR4## on a support is imagewise exposed to form a latent image in said photographic silver halide and then heated so as to polymerize said polymerizable vinyl monomer in the part having said latent image to form a polymer image therein.Type: GrantFiled: April 27, 1987Date of Patent: August 22, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Keiji Takeda, Yoshihide Hayakawa
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Patent number: 4824765Abstract: Substituted dibenzalketones useful as water-soluble photoinitiators have the formula: ##STR1## wherein R.sup.1 and R.sup.2 are 4, alkyl or, taken together, an aliphatic ring, n=0 or an integer and R.sup.3 and R.sup.4 either are both water-solubilizing groups (a) --X(CH.sub.2).sub.m N.sup.+ R.sup.5.sub.3, (b) --X(CH.sub.2).sub.m COO.sup.- M or (c) --X(CH.sub.2).sub.m SO.sup.-.sub.3 M.sub.5 or one is such a group and the other is (d) a group --NR.sup.5.sub.2, X is --CH.sub.2 --, --O-- or --S--, R.sup.5 is an alkyl group, M is H.sup.+ or a metal cation and m=0. Such a photoinitiator compound is associated with a polymerizable compound in an aqueous photopolymerizable composition.Type: GrantFiled: October 10, 1986Date of Patent: April 25, 1989Inventors: John A. Sperry, Ross A. Balfour
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Patent number: 4816375Abstract: A photosolubilizable composition contains both a compound capable of producing an acid by irradiation with actinic rays and a compound which has at least one silyl ether or silyl ester group capable of being decomposed by an acid; optionally, a compound having at least one silyl ether group has at least one hydrophilic group, providing for increased solubility in a developing solution under the action of an acid, thus enhancing the photosensitivity and the development latitude of the composition.Type: GrantFiled: April 30, 1987Date of Patent: March 28, 1989Assignee: Fuji Photo Film Co., Ltd.Inventor: Toshiaki Aoai
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Patent number: 4810618Abstract: A photopolymerizable composition comprises at least one polymerizable compound having at least one ethylenically unsaturated bond therein and at least one photopolymerization initiator and optionally at least one linear organic high molecular weight polymer and characterized in that the photopolymerization initiator comprises a specific combination of two kinds of compounds, for instance, 2,4,6-tris(trichloromethyl)-s-triazine and compound (12) represented by the following formula: ##STR1## The photopolymerizable composition exhibits a high sensitivity to extremely wide range of actinic rays extending from ultraviolet light to visible light and is useful for manufacturing PS plates and photoresist layer for use in making print circuit-boards or the like.Type: GrantFiled: January 11, 1988Date of Patent: March 7, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Mitsuru Koike, Koichi Kawamura
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Patent number: 4800152Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.Type: GrantFiled: March 16, 1987Date of Patent: January 24, 1989Assignee: International Business Machines CorporationInventors: Robert D. Allen, Jean M. J. Frechet, Robert J. Twieg, Carlton G. Willson
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Patent number: 4792506Abstract: This invention describes the preparation of some new Mannich polymers and copolymers and teaches their general use as photosensitizers for onium salts for use in the initiation of free radical polymerization of vinyl monomers. These Mannich polymers are unexpectedly more efficient as photosensitizers than are the non-polymeric photosensitizers.Type: GrantFiled: September 19, 1986Date of Patent: December 20, 1988Assignee: Minnesota Mining and Manufacturing CompanyInventors: Robert J. Devoe, Smarajit Mitra
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Patent number: 4791045Abstract: This invention describes the use of some Mannich bases as photosensitizers for iodonium salts for use in the initiation of free radical polymerization of vinyl monomers. These Mannich bases are unexpectedly more efficient as photosensitizers than are the conventional photosensitizers.Type: GrantFiled: January 25, 1988Date of Patent: December 13, 1988Assignee: Minnesota Mining and Manufacturing CompanyInventors: Smarajit Mitra, Robert J. DeVoe
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Patent number: 4786577Abstract: A photo-solubilizable composition is disclosed, comprising (a) a compound capable of producing an acid upon being irradiated with actinic light rays, and (b) a compound containing at least one silyl ether group represented by formula (I) ##STR1## that is capable of being decomposed with an acid and at least one group selected from among a urethane group, a ureido group, an amido group, and an ester group, and, according to a preferred embodiment at least one hydrophilic group.Type: GrantFiled: December 12, 1985Date of Patent: November 22, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aoai, Akihiko Kamiya
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Patent number: 4772531Abstract: A light-sensitive material comprising a light-sensitive layer which contains silver halide, a reducing agent and a polymerizable compound provided on a support, characterized in that the reducing agent is a hydrazine derivative having the following formula (I) or (II): ##STR1## in which R.sup.1 is a monovalent group selected from the group consisting of hydrogen, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group and a heterocyclic group, each of which may have one or more substituent groups; each of R.sup.2 and R.sup.3 independently is an aryl group which may have one or more substituent groups, or R.sup.2 and R.sup.3 form, together with the neighboring carbon, a condensed aromatic ring; R.sup.Type: GrantFiled: March 9, 1987Date of Patent: September 20, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Jiro Tsukahara, Kozo Sato
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Patent number: 4761360Abstract: A light-sensitive material comprising a light-sensitive layer which contains silver halide, a reducing agent and a polymerizable compound provided on a support, characterized in that the light-sensitive layer further contains a silver diazotate having the following formula:Ar--N.dbd.N--O--Ag(L).sub.nin which Ar is an aryl group or a heterocyclic group, each of which may have one or more substituent groups; L is a ligand; and n is 0, 1 or 2. Image-forming methods utilizing the light-sensitive materials are also disclosed.Type: GrantFiled: February 24, 1987Date of Patent: August 2, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Kozo Sato, Soichiro Yamamoto
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Patent number: 4755450Abstract: Spectral sensitizing dyes which sensitize photoinitiators and disperse in aqueous solutions are desirable in photosensitive systems where precise color rendition is important.Type: GrantFiled: April 22, 1986Date of Patent: July 5, 1988Assignee: Minnesota Mining and Manufacturing CompanyInventors: James F. Sanders, David B. Olson
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Patent number: 4753862Abstract: A light-sensitive material comprising a light-sensitive layer which contains silver halide, a reducing agent and a polymerizable compound provided on a support, characterized in that the light-sensitive layer further contains a triazenesilver having the following formula: ##STR1## in which Ar is an aryl group or a heterocyclic group, each of which may have one or more substituent groups; R is a monovalent group selected from the group consisting of an alkyl group, a cycloalkyl group, an aralkyl group, an aryl group and a heterocyclic group, each of which may have one or more substituent groups; L is a ligand; and n is 0, 1 or 2. Image-forming methods utilizing the light-sensitive materials are also disclosed.Type: GrantFiled: February 24, 1987Date of Patent: June 28, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Kozo Sato, Soichiro Yamamoto
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Patent number: 4752552Abstract: A photosolubilizable composition contains both a compound capable of producing an acid by irradiation with actinic rays and a compound which has at least one silyl ether or silyl ester group capable of being decomposed by an acid; optionally, a compound having at least one silyl ether group has at least one hydrophilic group, providing for increased solubility in a developing solution under the action of an acid, thus enhancing the photosensitivity and the development latitude of the composition.Type: GrantFiled: August 12, 1987Date of Patent: June 21, 1988Assignee: Fuji Photo Film Co., Ltd.Inventor: Toshiaki Aoai
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Patent number: 4743528Abstract: An imaging composition is disclosed comprised of an organic component containing ethylenic unsaturation sites and capable of selective hardening by addition at the sites of ethylenic unsaturation, an azinium salt activator, a photosensitizer having a reduction potential which in relation to the reduction potential of the azinium salt activator is at most 0.1 volt more positive, and an image enhancing amount of benzene substituted with an electron donating amino group and one or more groups capable of imparting a net Hammett sigma value electron withdrawing characteristic of at least +0.20 volt to said benzene ring.Type: GrantFiled: November 21, 1986Date of Patent: May 10, 1988Assignee: Eastman Kodak CompanyInventors: Samir Y. Farid, Neil F. Haley, Roger E. Moody, Donald P. Specht
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Patent number: 4743531Abstract: A photographic imaging system is disclosed comprised of an imaging dye or a precursor thereof, a hardenable organic component containing ethylenic unsaturation sites and capable of imagewise modulating mobility of the dye or dye precursor as a function of addition at the sites of ethylenic unsaturation, and coinitiators for ethylenic addition. The coinitiators include an azinium salt activator and a photosensitizer which is a dye exhibiting a reduction potential which in relation to that of said ionized azinium salt activator is at most 0.1 volt more positive, with the further proviso that, when the photosensitizer is a keto dye having its principal absorption peak at a wavelength shorter than 550 nm, it exhibits when excited by imaging radiation an intersystem crossing efficiency to a triplet state of less than 10 percent.Type: GrantFiled: November 21, 1986Date of Patent: May 10, 1988Assignee: Eastman Kodak CompanyInventors: Samir Y. Farid, Neil F. Haley, Roger E. Moody, Donald P. Specht
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Patent number: 4743529Abstract: A negative working photoresist is disclosed responsive to imaging radiation of a visible wavelength shorter longer than 550 nm comprised of an organic film forming component containing ethylenic unsaturation and capable of selective immobilization by addition at the site of ethylenic unsaturation and activator and photosensitizer coinitiators for ethylenic addition. The activator is an azinium salt activator, and the photosensitizer is a dye having its principal absorption peak at a wavelength shorter than 550 nm and having a reduction potential which in relation to that of said azinium salt activator is at most 0.1 volt more positive. When the dye is a keto dye, it exhibits when excited by imaging radiation an intersystem crossing efficiency to a triplet state of less than 10 percent.Type: GrantFiled: November 21, 1986Date of Patent: May 10, 1988Assignee: Eastman Kodak CompanyInventors: Samir Y. Farid, Neil F. Haley, Roger E. Moody, Donald P. Specht
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Patent number: 4698286Abstract: Disclosed are plasma developable photoresist compositions that possess photosensitivity to 436 n.m. light and maintain this photosensitivity for suitable periods of time after coating are obtainable. These compositions comprise perylene, certain perylene derivatives, or certain coumarin derivatives as photosensitizers in combination with N-vinyl monomers, haloalkene photoinitiators, and suitable polymeric binders in a suitable solvent.Type: GrantFiled: June 3, 1985Date of Patent: October 6, 1987Assignee: Hercules IncorporatedInventor: Wayne R. Messer
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Patent number: 4696876Abstract: Novel photopolymerizable compositions are provided which comprise a dye sensitizer, a linear polyethylenimine as a polymerization initiator and a free radical polymerizable ethylenic unsaturated monomer.In the preferred embodiments, the linear polyethylenimine is used in combination with lithium acrylate.Type: GrantFiled: May 12, 1986Date of Patent: September 29, 1987Assignee: Polaroid CorporationInventor: John J. Cael
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Patent number: 4684599Abstract: Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation.Type: GrantFiled: July 14, 1986Date of Patent: August 4, 1987Assignee: Eastman Kodak CompanyInventors: Thap DoMinh, James C. Fleming, Michael J. Lindstrom
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Patent number: 4683190Abstract: Process for lowering the viscosity of coating solutions containing a thixotropy-causing filler for the production of light-sensitive reproduction materials by adding at least one compound corresponding to one of the following formulas: ##STR1## wherein R is a linear saturated or unsaturated hydrocarbon chain having 2 to 12 carbon atoms, optionally substituted in which one or more carbon atoms can be replaced by N(R.sub.5), O, S, and/or an aromatic radial, or a 5 to 8 membered aliphatic ring.R.sub.1 to R.sub.4 are H, alkyl, aryl, and aralkyl, whereby R.sub.1 to R.sub.4 can be the same or different;R.sub.5 is R.sub.1 to R.sub.4 ;R.sub.6 and R.sub.7 are R.sub.1 to R.sub.4, --(CHR.sub.8).sub.p --OH;p is 1 to 6;q and r are 1 to 6 and can be the same or different;R.sub.8 is H, alkyl;R.sub.9 and R.sub.10 are H, alkyl, --(CHR.sub.8).sub.p --OH.Type: GrantFiled: December 18, 1985Date of Patent: July 28, 1987Assignee: E. I. Du Pont de Nemours and CompanyInventors: Manfred A. J. Sondergeld, Dietmar Dudek, Klaus Hossner
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Patent number: 4665006Abstract: A photoresist composition comprised of a radiation scissionable polymeric system having organopolysiloxane segments sensitized by an onium salt is disclosed. Useful organopolysiloxane containing polymers include polysiloxane-polycarbonate block copolymers, and polyorganosiloxane polyaryl esters. The resist films produced from the photoresist compositions exhibit high sensitivity, high thermal stability and resistance to oxygen reactive ion etching which makes them desirable for dry etching processes to enable submicron resolution.Type: GrantFiled: December 9, 1985Date of Patent: May 12, 1987Assignee: International Business Machines CorporationInventors: Krishna G. Sachdev, Ranee W. Kwong, Mahmoud M. Khojasteh, Harbans S. Sachdev
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Patent number: 4661434Abstract: A photopolymerizable composition comprising (A) an addition-polymerizable unsaturated compound having two or more ethylenically unsaturated double bonds and (B) a ternary photopolymerization initiator system, comprising a combination of a 4,4'-bis(dialkylamino)benzophenone represented by the following general formula (I), a carbonyl compound represented by the following general formula (IIa) or (IIb), and a compound having a group represented by the following general formula (III): ##STR1## wherein each R, which may be the same or different, represents an alkyl group, a cycloalkyl group or a hydroxyalkyl group, or may be bonded to another R substituent of the same nitrogen atom to form a tetramethylene group, a pentamethylene group or an oxybisethylene group; ##STR2## wherein X represents a single bond, an oxygen atom, a sulfur atom, a substituted or unsubstituted nitrogen atom or a carbonyl group, R.sup.1 and R.sup.Type: GrantFiled: August 16, 1984Date of Patent: April 28, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki
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Patent number: 4636459Abstract: A photopolymerizable composition containing an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator is disclosed, wherein the photopolymerizable composition contains at least one compound represented by following general formula (I) or (II) as the photopolymerization initiator: ##STR1## wherein, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group or a substituted allyl group, said R.sub.1 and R.sub.2 may combine with each other to form a ring together with the carbon atoms to which they are bonded; Y represents --O--, --S--, --Se--, --C(CH.sub.3).sub.2 -- or --CH.dbd.CH--; X.sub.1 represents an oxygen atom or a sulfur atom; R.sub.11, R.sub.12, R.sub.17, and R.sub.Type: GrantFiled: March 6, 1986Date of Patent: January 13, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamura, Yoshimasa Aotani, Akira Umehara, Seiji Horie