Sulfur In Heterocyclic Ring Patents (Class 430/922)
  • Positive resist for electron beam and x-ray lithography and method of using same
    Patent number: 4262083
    Abstract: Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.
    Type: Grant
    Filed: September 18, 1979
    Date of Patent: April 14, 1981
    Assignee: RCA Corporation
    Inventors: Thomas R. Pampalone, Nitin V. Desai, Eugene S. Poliniak