Abstract: The improvement in photoprinting on metallic surfaces which comprises masking the yellowish tint on the polyurethane coating on the metallic surface by including in the solution of the polyurethane coating being applied a Violet dye and a Dark Green dye.
Abstract: The invention provides a method by which a transparent defect (3) in a lithographic mask (1) can be effectively restored in a simple manner. For this purpose, the mask (1) is provided with a photosensitive layer (4) and is introduced into a solution of a metal ion (5). Subsequently, the mask is exposed at the area of the defect. The photosensitive layer (4) is capable of depositing the metal ion in the form of metal under the influence of the radiation (6) supplied. According to the invention, the exposure is continued until such a quantity of metal (7) has been deposited that the radiation can no longer penetrate to the photosensitive layer (4). At that instant, the metal deposition is stopped so that overgrowth of the metal deposit (7) is automatically counteracted in a simple manner.
March 1, 1991
Date of Patent:
March 2, 1993
U.S. Philips Corporation
Johannes W. M. Jacobs, Christiaan J. C. M. Nillesen, Johannes M. G. Rikken
Abstract: A method and apparatus for inspecting and repairing a mask usable in the manufacture of semiconductor microcircuits, by using an electron beam is disclosed. The inspection and repair of a mask pattern are made in a single apparatus, by using a controlled current of an electron beam. For inspection, the surface of a mask having a mask pattern and a radiation-sensitive layer, covering it, is scanned with an electron beam and, by detecting secondary electrons or reflected electrons caused at that time, the state of the pattern is inspected. If any defect is detected, the portion of the radiation-sensitive layer on the detected defect is irradiated with an electron beam of greater magnitude than that for the inspection and, thereafter, the exposed portion of the radiation-sensitive layer is removed. Then, etching or plating is made to the thus uncovered portion, whereby repair of the mask pattern is made.
Abstract: A method and apparatus for repairing defect portions of a photomask. A complex material from which a light shading material can be deposited is applied over the photomask. A white (blank) defect region is irradiated with a continuous wave laser light beam projected in a slit-like light image to thereby convert the complex material into the shading material. After washing, a half-deposited portion formed in a peripheral portion of the light shading region is further deposited by a post-baking process. Those portions of the light shading film which depart from the desired mask pattern are removed together with black (solid) defect portion originally present in the photomask through irradiation with a pulse laser light beam. The pulse laser is constituted by a Dye-laser, while the continuous wave laser is constituted by an Ar-laser. A specific half-mirror which transmits therethrough Ar-laser light while reflecting Dye-laser light is displaceable provided.
Abstract: Radiation-curable compositions useful for restorative and/or protective treatment of photographic elements are comprised of a polymerizable epoxy compound, a cationic initiator for initiating polymerization of the epoxy compound, a polymerizable acrylic compound, a haloalkylated aromatic ketone which serves as a free-radical initiator for initiating polymerization of the acrylic compound, and a polymerizable organofunctional silane. Photographic elements, such as still films, motion picture films, paper prints, microfiche, and the like, are provided with a protective overcoat layer which is permanently bonded to the element, and serves to protect it from abrasion and scratches, by coating the element with the radiation-curable composition and irradiating the coating to bond it to the element and cure it to form a transparent, flexible, scratch-resistant, cross-linked polymeric layer.
September 22, 1982
Date of Patent:
January 17, 1984
Eastman Kodak Company
Louis P. Harasta, Gerald M. Leszyk, Edward D. Morrison
Abstract: Radiation-curable compositions useful for restorative and/or protective treatment of photographic elements are comprised of an acrylated urethane, an aliphatic ethylenically-unsaturated carboxylic acid, a multifunctional acrylate, and a siloxy-containing polycarbinol. Photographic elements, such as still films, motion picture films, paper prints, microfiche, and the like, are provided with a protective overcoat layer which is permanently bonded to the element, and serves to protect it from abrasion and scratches, by coating the element with the radiation-curable composition and irradiating the coating to bond it to the element and cure it to form a transparent, flexible, scratch-resistant, cross-linked polymeric layer. The protective overcoat layer can be applied to the image-bearing side of the element or to the support side of the element or to both sides.