Abstract: A technique for reducing cooling time for a substrate includes a substrate processing apparatus that may include: a substrate retainer configured to support a substrate; a heat-insulating unit; a transfer chamber; and a gas supply mechanism to supply a gas into the transfer chamber, the gas supply mechanism including: a first gas supply mechanism to supply the gas into an upper region of the transfer chamber. The substrate retainer is disposed such that the gas flows horizontally through the upper region; and a second gas supply mechanism to supply the gas into a lower region of the transfer chamber. The heat-insulating unit is provided such that the gas flows downward through the lower region. The first gas supply mechanism and the second gas supply mechanism are disposed along a first sidewall of the transfer chamber, and the second gas supply mechanism is disposed lower than the first gas supply mechanism.

Abstract: A substrate processing method in which processes with respect to substrates are performed comprises: stacking the substrates on a substrate holder disposed in a staking space formed within a lower chamber through a passage formed in a side of the lower chamber, exhausting the stacking space through an auxiliary exhaust port connected to the stacking space, moving the substrate holder into an external reaction tube closing an opened upper side of the lower chamber to provide a process space in which the processes are performed, and supplying a reaction gas into the process space using a supply nozzle connected to the process space and exhausting the process space using an exhaust nozzle connected to the process space and an exhaust port connected to the exhaust nozzle.

Abstract: Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.

Abstract: Provided is a heat treatment furnace, which includes a processing vessel configured to accommodate at least one object to be processed, a heat insulating member configured to cover a periphery of the processing vessel, and a heating unit configured to be arranged along an inner peripheral surface of the heat insulating member. The heat insulating member includes an inner heat insulating member and an outer heat insulating member formed independently of the inner heat insulating member. The outer heat insulating member contains a finely-powdered compressed silica material, and at least an outer surface thereof is covered with an anti-scattering member configured to prevent the finely-powdered compressed silica material from being scattered.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a non-metallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold includes a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.

Abstract: The invention relates to the field of what are called multiple-chamber ring furnaces, for the baking of carbon blocks, and more particularly to a shutter (13) with inflatable seal (15), for sealing off a port (8) of a hollow partition (7) in a multiple-chamber ring furnace, characterized in that its shutter comprises: a rigid core (14) of a substantially rectangular elongated shape, intended to be placed opposite a port (8) of a hollow partition (7) in said furnace, so as to shut off most of the flow area for gas entering via said port (8); and at least one inflatable air chamber (15), retracted in the deflated state in a housing of the core (14) and forming, in the inflated state, a peripheral seal (16) projecting around the perimeter of the core (15) such that said seal (16) extends around its entire periphery in order to complete the sealing off of said port (8).

Abstract: The present invention relates to an opening and closing device of an autoclave and the autoclave, wherein: supplying and discharging of a product to a chamber having a sealed structure can be performed automatically, and the occurrence of accidents caused by back pressure is structurally prevented; and a product bonded by pre-load is heated and transferred whereby energy loss is minimized and the product is cooled off uniformly, thereby improving the quality of the product.

Abstract: A closure device associable with the opening of the cooking chamber of an oven of the type with trolley is described, the oven including a closure door associated with the chamber, for the sealed closure of the cooking chamber in the absence of the trolley, the device includes a closure element capable of being placed to close a portion of the opening of the chamber that is not involved by the closure door, the portion of opening being capable of permitting the closure of the door when the trolley is inserted into the cooking chamber, the closure element co-operating in a sealed manner with respective sections of gaskets arranged at the opening, for the sealed closure of the cooking chamber when the trolley is not inserted in the chamber.

Abstract: A curing oven includes a set of pivoting, rotating trays within a curing chamber. The trays are attached to a mechanism that rotates the trays through a curing cycle, and the speed and timing of the rotation may be set by an operator, as desired. In a preferred embodiment, the oven includes a plurality of heating elements, a commercial dehumidifier, a recirculating fan and system, temperature and humidity sensors, and a series of pivoting trays attached to a motorized rotational assembly. The oven is controlled by a various controllers, which may be programmed to set the temperature, humidity levels, rotation speed and cycle time, and other aspects of oven operation. A loading and unloading chamber is effectively sealed off from the curing chamber within the oven, preventing or reducing a transfer of air between the curing chamber and the ambient air outside of the oven.

Abstract: Provided is a heat treatment furnace, which includes a processing vessel configured to accommodate at least one object to be processed, a heat insulating member configured to cover a periphery of the processing vessel, and a heating unit configured to be arranged along an inner peripheral surface of the heat insulating member. The heat insulating member includes an inner heat insulating member and an outer heat insulating member formed independently of the inner heat insulating member. The outer heat insulating member contains a finely-powdered compressed silica material, and at least an outer surface thereof is covered with an anti-scattering member configured to prevent the finely-powdered compressed silica material from being scattered.

Abstract: In a loading area below a vertical furnace of a thermal treatment apparatus, a gas stream flows along a first direction from one side to the other side of the loading area into a first evacuation opening provided in the other side of the loading area. A thermal evacuation part is located, along the first direction, between a first evacuation opening and an upstream end of a substrate holding member located at an unload position that is located between the one side and the other side of the loading area. The thermal evacuation part includes a second evacuation opening that is arranged to oppose at least an upper part of the substrate holding member located at the unload position and evacuates an environment around the substrate holding member located at the unload position.

Abstract: A material feed system for melter kettles which provides an area for a tender to load material to be charged into a melter kettle at a location which is safely remote from a flame conductor assembly that allows any flames or gasses that build up in melter kettle to be released. The material feed system also includes an air intake duct through which free air is allowed to enter into the melter kettle so as to equalize pressure with the atmosphere and/or burn off any superheated material.

Abstract: A safety door for covering openings in a rotary kiln during maintenance operations on the rotary kiln. The door is affixed to the exterior surface of the rotary kiln and includes a hatch pivotally secured at one side edge thereof by a pivot rod to a frame. A plurality of tension coil springs are disposed on the pivot rod and continuously bias the hatch toward the opening with a force of approximately 400 pounds.

Abstract: A material feed system for melter kettles which provides an area for a tender to load material to be charged into a melter kettle at a location which is safely remote from a flame conductor assembly that allows any flames or gasses that build up in melter kettle to be released. The material feed system also includes an air intake duct through which free air is allowed to enter into the melter kettle so as to equalize pressure with the atmosphere and/or burn off any superheated material.

Abstract: The industrial oven according to the invention has a rotary pipe and a fixed material supply device which is connected in the region of a front-face opening of the rotary pipe, there being provided between the rotary pipe and the material supply device a sealing arrangement which comprises a gas seal which is delimited from the operating chamber of the rotary pipe acted upon with material by at least a first gap between the rotary pipe and the material supply device. The sealing arrangement further has an annular chamber which is provided between the first gap and the gas seal and which has a discharge opening which is connected to the operating chamber. A lifting device is further provided in the annular chamber in order to lift out of the operating chamber material which has become introduced into the annular chamber through the first gap and to convey it back to the operating chamber through the discharge opening.

Abstract: A heat-treating apparatus capable of realizing a highly precise processing maintaining a high degree of safety, and a method of producing substrates are provided. The heat-treating apparatus comprises a reaction tube for treating substrates; a manifold for supporting the reaction tube; and a heater provided surrounding the reaction tube to heat the interior of reaction tube; wherein the reaction tube and the manifold are in contact with each other as their continuous flat surfaces come in contact with each other; a cover member is provided to cover the contact portion between the reaction tube and the manifold from the outer side; and the cover member is provided with at least either a gas feed port or an exhaust port communicated with a space formed among the cover member, the reaction tube and the manifold.

Abstract: Disclosed is a heat treatment apparatus which includes a processing vessel having a furnace throat at its bottom and adapted to accommodate process objects therein to perform a heat treatment to the process objects under reduced pressure, the processing vessel having a vessel main body made of quartz, a metallic lid adapted to support thereon a holder for holding a plurality of process objects so as to load and unload the holder into and from the processing vessel and to close and open the furnace throat, and an annular sealing member disposed on the lid to seal a gap between the lid and the furnace throat. A contact-preventing member is disposed between the lid and the furnace throat to prevent contact of the lid with the furnace throat due to squashing of the sealing member that would otherwise occur when an internal pressure of the processing vessel is reduced.

Abstract: A system used in a vertical furnace is provided that includes a tube. The tube includes a tube flange at its lower end. The tube flange provides a first sealing surface at its lower end. Further, there is a structural member at the lower surface of the tube flange. This structural member extends vertically away from the lower surface of the tube flange at a position that is displaced inwardly from the first sealing surface. The system also includes a removable door plate that provides a second sealing surface at its upper surface. The second sealing surface of the removable door plate is sealed with the first sealing surface of the tube flange.

Abstract: A safety door for covering openings in a rotary kiln during maintenance operations on the rotary kiln. The door is affixed to the exterior surface of the rotary kiln and includes a hatch pivotally secured at one side edge thereof by a pivot rod to a frame. A plurality of tension coil springs are disposed on the pivot rod and continuously bias the hatch toward the opening with a force of approximately 400 pounds.

Abstract: A method and apparatus processing materials including medical waste, municipal waste, along with other wastes, and processing materials; the apparatus comprising an elongate pressure vessel of generally cylindrical configuration having an inlet end, and an end cap for the inlet.

Abstract: A slide arrangement for blocking or closing off a channel disposed between a coal pulverizer and coal dust burners, and conveying a gas having a high proportion of coal dust. The slide arrangement includes a housing disposed in the channel wall and a shroud or steel structure laterally connected to the housing. A passage for a slide plate is provided in a wall of the housing facing the shroud or steel structure. The passage can be closed off by a closure member except for a narrow gap. The closure member has a circumferential seal that rests against the rearward side of the housing wall. The closure member also has a wear plate that when the closure member is closed is flush with the inner side of the housing wall and forms a smooth passageway.

Abstract: The process chamber of a vertical furnace is provided with a closure, or door, comprising an upper and a lower door plate. The upper door plate has a gas exhaust opening proximate its center, thereby allowing for a symmetrical flow of process gases through the process chamber and into the gas exhaust opening. The upper door plate is spaced from the lower door plate to form a sealing chamber, which is purged with inert gas. Optionally, both the gas exhaust opening and the sealing chamber empty into a gas exhaust channel formed inside the upper door plate. The gas exhaust channel leads to an exhaust which exhausts gases from the furnace and separates the flow path of corrosive process gases from surfaces of the lower door plate, which may be formed of relatively easily-corroded metal.

Abstract: An air conveyor for handling workpieces in a food grade environment has a cylindrical pipe with an elongated slot that extends along an axial length of the pipe. A track is snap fit in the elongated slot and has a base for supporting the workpieces. The base has air vents that provide directional airflow for pushing the workpieces along an axial length of the track on a cushion of air. A movable hanger assembly supports the pipe from above and captures the workpieces in the track.

Abstract: A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is located on one of the first chamber and the second chamber at the interface and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a fastening device for fastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed of Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.

Abstract: A semiconductor processing reactor comprises a reaction chamber with a gas exhaust and a mechanical seal at one end of the chamber. The seal seals off the chamber from the ambient environment and is purged with gas to prevent diffusion of ambient gases into the reaction chamber. Because the purge gas can diffuse through the seal into the reaction chamber, the purge gas is chosen based upon the process gas and the location of the seal and exhaust so that the molecular weight of the purge gas causes the purge gas, by the force of gravity or buoyancy, to remain in the portion of the reaction chamber containing the seal and the gas exhaust. Advantageously, keeping the purge gas at the same end of the chamber as the gas exhaust minimizes dilution of the process gas with the purge gas, thereby preventing the purge gas from detrimentally effecting process results.

Abstract: A thermal treatment system for semiconductors comprises an outer tube made of silicon carbide, a base hermetically supporting a lower portion of the outer tube, a lid selectively opening and closing an opening formed in a central portion of the base, and a reactor wall surrounding an outer peripheral wall and the like of the outer tube and having a heater provided on an inner side, wherein an annular sealing member and an annular supporting member are interposed between the outer tube and the base, and wherein the supporting member has an effective heat transfer coefficient of 50 to 2,000 W/(m2·K).

Abstract: A heat tunnel for applying heated air to articles enclosed in shrink-wrap film. The heat tunnel includes at least one air supply unit, the air supply unit further having a source of heated air, a fan, a heated air plenum, air ducts, and a return air plenum; a conveyor chain; and a heat shroud spaced from the conveyor chain. Multiple air supply units can be provided along the conveyor to create a heat tunnel of desired length.

Abstract: An oxidation oven for use in the production of carbon fibers from a polyacrylonitrile precursor fiber. The oven has an oven chamber formed by sides and ends. At least one of the ends has a first opening and a second opening. The product passes through the openings for treatment in the oven chamber. The oven is also provided with a first nozzle adjacent the first opening, a second nozzle adjacent the second opening, and respective first and second diffusers adjacent the first and second openings. The diffusers cooperate with the first and second nozzles respectively to provide first and second inductors. Each nozzle is effective for discharging air from an air flow pathway into the throat of the associate diffuser to thereby induce a positive pressure inducted air flow of ambient air toward the opening to which it is adjacent.

Abstract: A warp resistant fuel feed door assembly for use in injecting supplemental fuel into a high temperature combustion chamber such as a rotating cement kiln without substantial loss of heat or combustion gases. The apparatus, which is positioned on the exterior side of a fuel passage transecting the wall of a rotating kiln, opens to receive fuel and then seals during the balance of the rotation of the kiln. Warping, bearing fracture, shaft distortion and jamming due to exposure to extreme heat and cooling are minimized by the sectional construction of the doors. The door includes a plate positioned over the mouth of the passage, a plurality of support arms attached to the plate and a hinge shaft attached to the arms. Stresses on the door structure from inconsistent expansion of the plate are reduced due to symmetrically spaced oblong and oversized bolt attachment bores in the support arms. Synchronous opening of the feed doors is achieved by levered rotation of the hinge shafts by an electric motor.

Abstract: A system for sealing a lower edge of a temperature control chamber door to a temperature control chamber housing when the door is closed has a pair of opposed radiused corners provided at opposed lower corners of the door opening, and a resilient seal member having opposed radiused corners substantially complimentary in shape to the radiused corners of the opening.

Abstract: A processing system is provided including a process chamber defining a process chamber opening, and an apparatus for isolating the process chamber. The apparatus includes a gate member, which defines a first opening, mounted to the process chamber such that the first opening and the process chamber opening are substantially concentric. The apparatus also includes a door having a first door portion defining a second opening. The door is configured to be moveable into a first position, where the first door portion is moved over the process chamber opening until the second opening is substantially concentric with the first opening and the process chamber. The door is also configured to be moveable into a second position, where the second door portion is moved over the first opening and the process chamber opening to provide a closure for the first opening and the process chamber opening.

Abstract: A pedestal for use in a high temperature vertical furnace for the processing of semiconductor wafers provides a closure and heat insulation for the lower end of the furnace and is a wafer boat support. The pedestal, comprising quartz-enveloped insulation material, supports a wafer boat at a boat support level and is provided with an upper section disposed above the boat support level. The upper section comprises enveloped insulating material. The envelope of the upper section is also formed of quartz and the insulating material in the upper section has a lower thermal conductance than the insulating material in a lower quartz enveloped section.

Abstract: A support sleeve for supporting a high temperature process tube comprises one or more circumferential channels, each channel connected to either a feed for gas or a vacuum exhaust. One circumferential channel opens to the top surface of the sleeve, on which the process tube is supported to provide a gas/vacuum seal between the process tube and support sleeve. Another circumferential channel is connected to a gas feed and provided with gas injection holes, evenly distributed along the support sleeve perimeter to provide a cylindrically symmetrical injection of process gas into the process tube. Another circumferential channel is connected to an exhaust for gas and provided with gas exhaust holes, evenly distributed along the circumference of the support sleeve, to provide a cylindrically symmetric exhaust of process gases from the process tube.

Abstract: A system for sealing a lower edge of a temperature control chamber door to a temperature control chamber housing when the door is closed has a pair of opposed radiused corners provided at opposed lower corners of the door opening, and a resilient seal member having opposed radiused corners substantially complimentary in shape to the radiused corners of the opening.

Abstract: An apparatus and a method for manufacturing a semiconductor device can provide a good quality film growth in a highly clean reaction atmosphere unaffected by contamination from a furnace opening portion. A reverse-diffusion preventing body 8 is provided between a furnace opening flange 7 and a boat susceptor 19 so that a substrate processing space 20 is isolated from a furnace opening portion space 21 to thereby prevent reverse-diffusion of a contaminant which occurs at a furnace opening portion B, to the substrate processing space 20. At a furnace opening flange 7, a furnace opening exhausting tube 15 is provided which constitutes a furnace opening system for exhausting the space 21 independently of the space 20 so that the space 21 is exhausted while being purged by supplying a purge gas into the space 21, to thereby remove a contaminant from the space 21.

Abstract: A thermal treatment furnace is described in which gas leakage does not occur during thermal treatment at a high temperature. A thermal treatment furnace having a reaction tube is provided with an opening at one end and a flange surrounding the opening and covered by a cap abutting on the reaction tube at the flange to cover the opening. The flange is provided with a feature which introduces an inert gas to provide back pressure into the joint portion between the flange and the cap, thus preventing reaction gas from leaking to the outside of the furnace through the gap between the flange and the cap. The flange may be further modified to discharge gas under back pressure from between the joint surfaces of the flange and the cap to prevent the inert gas from affecting the reaction in the tube.

Abstract: The self-anchoring expansion gap assembly for refractory lined vessels such as a gasifier includes a substantially annular insulating blanket structure formed of compressible refractory material. A coil of rope formed of relatively incompressible refractory material is positioned proximate an outer periphery of the insulating blanket structure. The expansion gap assembly is placed in an expansion gap of a gasifier, for example, such that the coil of rope aligns with an annular channel formed in the refractory lining of the gasifier at the expansion gap. Compression of the expansion gap assembly locks the coil of rope in the annular channel of the expansion gap thereby resisting vacuum pullout. The coil of rope can be formed as a single coil or a plurality of substantially concentric coils preferably from a single length of refractory rope.

Abstract: An apparatus and a method for manufacturing a semiconductor device can provide a good quality film growth in a highly clean reaction atmosphere unaffected by contamination from a furnace opening portion. A reverse-diffusion preventing body 8 is provided between a furnace opening flange 7 and a boat susceptor 19 so that a substrate processing space 20 is isolated from a furnace opening portion space 21 to thereby prevent reverse-diffusion of a contaminant which occurs at a furnace opening portion B, to the substrate processing space 20. At a furnace opening flange 7, a furnace opening exhausting tube 15 is provided which constitutes a furnace opening system for exhausting the space 21 independently of the space 20 so that the space 21 is exhausted while being purged by supplying a purge gas into the space 21, to thereby remove a contaminant from the space 21.

Abstract: A seal roll apparatus and method hermetically seals boundaries between a plurality of heat-treating sections for continuously heating and cooling a strip material in a continuous heat-treatment furnace. The seal roll apparatus includes a seal roll room including at least a pair of water-cooled seal rolls opposed to each other with a gap therebetween for passing the strip material, and partitions having an opening for passing the strip material, a partition being provided at the inlet side and at the outlet side of the seal rolls.

Abstract: The invention relates to an oven for sealing a panel to a funnel, thus forming an envelope suitable for use in a display tube, comprising a tunnel structure 9 and at least one mount for conveying an assembly of a panel and a funnel through the tunnel structure 9. The tunnel structure 9 is provided with a longitudinal slot 16A and the components of the mount for guiding the mount along and through the tunnel structure 9 are placed outside the tunnel structure. It is preferred that the components comprise a means, such as a pump or compressor 24, for flushing the interior of the assembly 22 with a fluid obtained from a source which is substantially separated from the gas(es) circulating in the oven 1, e.g. from the surroundings of the oven 1.

Abstract: A load-lock mechanism according to the invention comprises a vacuum chamber 31 arranged between a vacuum first transferring chamber 20 and atmospheric second transferring chambers 40. The vacuum chamber 31 has a first opening 31A facing the first transferring chamber 20, a vertical pair of second openings 31B facing the second transferring chambers 40 and open-close mechanisms 34A, 34B to open and close each of the second opening 31B. One vertical pair of load-lock chambers 32, 33 are movably housed in the vacuum chamber 31. The supply-discharge passageways 31G, 31H are provided in the vacuum chamber 31 to supply and discharge air into and out of each of the load-lock chambers 32, 33. Each of the load-lock chamber 32, 33 has a first port 32A, 33A which can communicate with the first opening 31A, a second port 32B, 33B which can communicate with the corresponding second opening 31B.

Abstract: A thermal treatment furnace is described in which gas leakage does not occur during thermal treatment at a high temperature. A thermal treatment furnace having a reaction tube is provided with an opening at one end and a flange surrounding the opening and covered by a cap abutting on the reaction tube at the flange to cover the opening. The flange is provided with a feature which introduces an inert gas to provide back pressure into the joint portion between the flange and the cap, thus preventing reaction gas from leaking to the outside of the furnace through the gap between the flange and the cap. The flange may be further modified to discharge gas under back pressure from between the joint surfaces of the flange and the cap to prevent the inert gas from affecting the reaction in the tube.

Abstract: An apparatus for opening/closing a process chamber door of an oven for manufacturing a semiconductor device includes a boss formed at one side of an opening of the process chamber, a shaft which passes freely through the center of the boss, bearings attached to the process chamber and rotatably supporting the ends of the shaft, a driver for rotating the shaft in opposite directions over a predetermined angle, and a door that seals the opening, one side of the door being attached to the shaft so as to be moved when the shaft rotates. Alternatively, the present invention provides a pair of bearings disposed beside one side of an opening of the process chamber, a shaft whose ends are rotatably supported by the bearings, a bracket having one end fixed to the shaft, and another end fixed to the door. A driver also rotates the shaft over a predetermined angle that opens and closes the door.

Abstract: A hot walled, industrial, batch-type vacuum furnace constructed with a cylindrical furnace casing having a closed spherical end and an open end adapted to be closed by a sealable door. Furnace insulation is applied to the outside of the door and furnace casing so that the inside of the furnace is impervious to the furnace gases. Special mounting arrangements are used to seal furnace components extending into the casing as well as the door by elastomer seals which are air cooled.

Abstract: A continuous heat treatment furnace having one of a plurality of furnace zones except for first and last zones as a rapid cooling zone 11 for rapidly cooling a material by blowing an atmospheric gas, which comprises a roll-sealed chamber 3 partitioned at the inlet by first and second roll sealing devices 4A and 4B from the upstream and a third roll sealing device 4C at the outlet as sealing means for atmospheric gas, and in which the inlet of the first roll sealing device and the outlet of the third roll sealing device are connected, and/or the roll-sealed chamber and an uppermost stream portion 6 in the rapid cooling zone are connected, and in which the hydrogen concentration in the furnace is controlled to 10% or higher in the rapid cooling zone and is controlled to 10% or lower in the furnace zone at the inlet of the rapid cooling zone.

Abstract: A device for sealing a passageway in a flue from a carbon anode baking furnace, the flue being generally rectangular in shape and comprising a flue top and bottom, a headwall on either end of the flue, two walls, an opening in the flue top, at least one baffle, and a plurality of spacers which are connected to both walls of the flue, the headwall, the two walls and the flue top define a headwall port which permits fluid passage between adjoining flues; the sealing device comprises; an inflatable bladder; a means to deliver air under pressure connected to the inflatable bladder by a seal to prevent air leakage between the means to deliver air under pressure and the inflatable bladder; the inflatable bladder is long enough to extend from the flue top to a headwall and seal off the communication between flues at the headwall port when inflated.

Abstract: A vertically oriented thermal processor supports semiconductor wafers within a vertical process chamber within a process tube about which a furnace heater is supported. A base plate support assembly mates with a processing vessel such that the interior surface in proximate fluid adjoining relation with the processing chamber is formed from substantially-inert materials. Additionally, the base plate support assembly includes fluid cooling features that protect seals formed by devices passing through the base plate assembly into the processing chamber for delivery of processing gases and monitoring of thermal conditions therein. Additionally, cooling features are provided in a base plate in order to prevent components from becoming heat sinks or heat sources in relation to the processing chamber.

Abstract: The process tube of a vertical heat-treating apparatus for semiconductor wafers has a port at the bottom to be opened and closed by a lid. A sealing mechanism is arranged to seal the connecting portion between the flange of the port and the flange of the lid. The flanges are provided with annular mirror surfaces on the inner side, which face and contact each other to form an inner seal. The flanges are also provided with annular counter surfaces on the outer side, which face each other with a gap therebetween. A metal sheet member is arranged in the gap such that an outer seal is formed by the metal sheet member and the counter surfaces. The metal sheet member has sheets vacuum-stuck onto the counter surfaces, respectively. A buffer space is formed between the inner and outer seals, and is vacuum-exhausted by an exhaust unit.

Abstract: A coal-burning utility electrical power generation plant includes a mill pulverizing coal and supplying same to a boiler for combustion. The boiler has a bottom ash hopper for receiving combustion products including clinkers, and a clinker grinder for grinding the clinkers. The clinker grinder includes a rotary drum in a grinding chamber and having grinding teeth and driven by a rotary shaft extending through a stuffing box assembly. The stuffing box assembly has a flushing fitting for supplying flushing fluid thereto and along the shaft and into the grinding chamber. A seal permits flushing fluid flow from the flushing fitting into the grinding chamber, and blocks reverse flow. Long life is provided without a grease fitting, and leakage is substantially reduced.

Abstract: An oxidation oven for use in the production of carbon fibers from a polyacrylonitrile precursor fiber. The oven has an oven chamber formed by sides and ends. At least one of the ends has a first opening and a second opening. The product passes through the openings for treatment in the oven chamber. The oven is also provided with a first nozzle adjacent the first opening and a second nozzle adjacent the second opening. Each nozzle is effective for discharging air from an air flow pathway into the oven chamber and forming an air curtain at the opening to which it is adjacent. An air bar defines the air flow pathway.