Heating Or Heat Retaining Work Chamber Structure Patents (Class 432/247)
  • Patent number: 10959406
    Abstract: The invention provides an animal training aid or to for use in scent based animal training or activities. The aid or toy comprises: a housing comprising an interior cavity configured to contain a scented material that releases substantially no scent that is desirable to the animal in an unactivated state and releases a scent that is desirable to the animal in an activated state; one or more vents on an external surface of the housing, each vent in communication with the interior cavity so that a scent from the scented material can be released from the interior cavity to the exterior of the housing where it can be detected by the animal; and an activator for activating the scented material from the unactivated state to the activated state, the activator being operable from the external surface of the housing.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: March 30, 2021
    Assignee: MY CLEVER DOG PTY LTD
    Inventors: George Giles Campbell, Justin Anthony Daley
  • Patent number: 10767930
    Abstract: The invention relates to a charging installation (1) of a metallurgical reactor, with a cooling assembly (4) disposed for cooling a reactor side of the charging installation (1). In order to facilitate the installation and maintenance of a heat protection shield in a charging installation of a metallurgical reactor, the cooling assembly (4) comprises a plurality of cooling panels (10), each cooling panel (10) comprising at least one coolant channel (12). The channel (12) is formed as a groove in the base plate (11), which groove is covered by a cover plate (13) mounted on the base plate (11).
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: September 8, 2020
    Assignee: PAUL WURTH S.A.
    Inventors: Paul Tockert, Ernesto Pellegrino, René Hientgen
  • Patent number: 9039411
    Abstract: A disclosed thermal treatment apparatus includes a supporting member where plural substrates are supported in the form of shelves; a reaction tube that accommodates the supporting member within the reaction tube, and is provided with plural gas supplying pipes arranged in a side part of the reaction tube, thereby allowing a gas to flow into the reaction tube through the plural gas supplying pipes; and a first heating part that heats the plural substrates supported by the supporting member accommodated within the reaction tube, wherein the first heating part includes a slit that extends from a bottom end to a top end of the first heating part and allows the plural gas supplying pipes to go therethrough, and wherein an entire inner surface, except for the slit, of the heating part faces the side part of the reaction tube.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: May 26, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Masato Kadobe, Naomi Onodera, Kazuhiko Kato
  • Patent number: 9018567
    Abstract: A semiconductor substrate processing apparatus (1), comprising a substrate support assembly (30), including a substrate support (32) defining an outer support surface (34) for supporting a substrate or substrate carrier (24) thereon, and a heater (50) comprising a heat dissipating portion (54) that is disposed within the substrate support (32) and that extends underneath and substantially parallel to the support surface (34), said substrate support (32) being rotatably mounted around a rotation axis (L) that extends through said support surface (34), such that the support surface (34) is rotatable relative to the heat dissipating portion (54) of the heater (50).
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: April 28, 2015
    Assignee: ASM International N.V.
    Inventors: Chris G. M. de Ridder, Klaas P. Boonstra, Theodorus G. M. Oosterlaken, Barend J. T. Ravenhorst
  • Patent number: 8998606
    Abstract: An apparatus for uniform reactive thermal treatment of thin-film materials includes a chamber enclosing a tube shaped space filled with a work gas and heaters disposed outside the chamber. The apparatus further includes a loading configuration for subjecting a plurality of planar substrates to the work gas in the tube shaped space. Baffles are disposed above and below the loading configuration.
    Type: Grant
    Filed: January 4, 2012
    Date of Patent: April 7, 2015
    Assignee: Stion Corporation
    Inventors: Paul Alexander, Steven Aragon
  • Patent number: 8959793
    Abstract: An oven configured for drying a container. The oven includes a housing defining an interior space including a supply chamber and a return chamber. A conveyor is configured for movement within a portion of the interior space of the housing defined by a plurality of semi-circular shaped duct sections connected at each end of the semi-circular shaped duct sections to a straight duct section. Each duct section includes two side walls coupled to a back wall defining a continuous U-shaped duct path through which the conveyor moves. The oven is further configured to provide a temperature difference between any two points within the interior space of the oven housing controlled to plus or minus two degrees Fahrenheit, by a uniform air flow throughout the oven. The uniform air flow is facilitated by the sizing and spacing of various circular orifices and slotted orifices in the continuous duct path.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: February 24, 2015
    Assignee: International Thermal Systems, Inc.
    Inventors: John Zea, Yougui Zhao, Dan Bein
  • Publication number: 20150010294
    Abstract: Known devices for heat treatment comprise a process space surrounded by a furnace lining made of quartz glass, a heating facility, and a reflector. In order to provide, on this basis, a device for heat treatment having a furnace lining that can be manufactured easily and in variable shapes and enables rapid heating and cooling of the material to be heated and short process times and is characterised by its long service life, the invention proposes that the furnace lining comprises multiple wall elements having a side facing the process space and a side facing away from the process space, and that at least one of the wall elements comprises multiple quartz glass tubes that are connected to each other by means of an SiO2-containing connecting mass.
    Type: Application
    Filed: January 12, 2013
    Publication date: January 8, 2015
    Applicant: Heraeus Noblelight GmbH
    Inventors: Jürgen Weber, Frank Diehl, Sven Linow
  • Patent number: 8926321
    Abstract: The present invention discloses a heating method for maintaining a stable thermal budget. By following the primary procedure with a virtual procedure in such a manner that the total duration of the whole heating process remains constant, it is beneficial to maintain a stable thermal budget and further to maintain a stable device performance.
    Type: Grant
    Filed: August 9, 2011
    Date of Patent: January 6, 2015
    Assignee: Institute of Microelectronics, Chinese Academy of Sciences
    Inventor: Chunlong Li
  • Publication number: 20140338590
    Abstract: A high temperature furnace comprising hot zone insulation having at least one shaped thermocouple assembly port to reduce temperature measurement variability is disclosed. The shaped thermocouple assembly port has an opening in the insulation facing the hot zone that is larger than the opening on the furnace shell side of the insulation. A method for producing a crystalline ingot in a high temperature furnace utilizing insulation having a shaped thermocouple assembly port is also disclosed.
    Type: Application
    Filed: July 30, 2014
    Publication date: November 20, 2014
    Inventors: Ning Duanmu, Dean C. Skelton, Menahem Lowy, Dzung D. Nguyen
  • Patent number: 8851886
    Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a non-metallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold includes a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: October 7, 2014
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Shinya Morita, Akihiro Sato, Akinori Tanaka, Shigeo Nakada, Takayuki Nakada, Shuhei Saido, Tomoyuki Matsuda
  • Patent number: 8847125
    Abstract: A local resistance heating device, with a controlled atmosphere, includes two end members and a mid member. The two end members are respectively connected with an anode pole and a cathode pole. Each end member has an air channel. The air channel of one of the end members is adapted to connect with an output terminal of a gas supplier, and the air channel of the other one of the end members is adapted to connect with a sucking terminal of the gas supplier. The mid member is arranged between the two end members. The two end members and the mid member jointly define a heating room communicating with the air channels of the two end members.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: September 30, 2014
    Assignee: National Pingtung University of Science & Technology
    Inventors: Kuang-Hung Tseng, Jie-Meng Huang
  • Publication number: 20140256890
    Abstract: The present invention relates to slurry polymerisation, and in particular, to a slurry heater apparatus comprising at least two heating sections connected in fluid communication in series to form an initial slurry heater, wherein the slurry heater apparatus is adapted such that it can be reconfigured to form a subsequent slurry heater also comprising at least two heating sections connected in fluid communication in series, wherein the subsequent slurry heater has a different total length and/or a different average internal diameter than the initial slurry heater.
    Type: Application
    Filed: October 9, 2012
    Publication date: September 11, 2014
    Inventors: Marc Parisel, Brent R. Walworth
  • Publication number: 20140234793
    Abstract: A novel moist steam heating cabinet unit is used as a medical device for humidification, hydration, and dispensing of medicinal hot packs. The technology provides multifunctional options from both medicine and non-medicinal hot pack treatment, as well as for other applications and uses, for example—including creation, manufacturing, and curing of pharmaceutical compounds that require a controlled steam process and method. A moist heating device is a unit designed and constructed to deliver a timed, heated fluidic steam coming from a moisture-heating source. This moist heating by employing steam heat activates the therapeutic potential of a portable topical compress or hot pack with a applicator of various shapes and sizes, for transdermal use and neat applications of a “wet medicinal dressing.” The moisture provides the activating liquid and fluidic environment for the flowing through, titrating, and permeating delivery of hydrous and anhydrous drugs or medicaments held within a medicinal pack.
    Type: Application
    Filed: February 18, 2014
    Publication date: August 21, 2014
    Inventor: Alvin Stewart Ostrow
  • Publication number: 20140193763
    Abstract: A raku kiln has a fire ring with a cylindrical sidewall and bottom made of refractory material with a kiln shelf supported a few inches above the bottom to enclose a space that is superheated by burners. A firing-chamber rests on the fire ring and is lifted by a two aligned pulleys on top of a pole which rotates to move the chamber out of the way. A vertical pole mates with tubes on the chamber for vertical guidance during raising and lowering of the chamber. Flanges on the lower end of the chamber allow adding an extension chamber.
    Type: Application
    Filed: March 15, 2013
    Publication date: July 10, 2014
    Inventor: Kellogg S. Johnson
  • Publication number: 20140193764
    Abstract: The invention provides aromatherapy devices that may be used to break a capsule containing a desired aromatic liquid, and then control the release of the aroma as the volatile aromatic liquid evaporates. The devices may be used, for example, in aromatherapy, including to control nausea or to mask unpleasant scents.
    Type: Application
    Filed: March 13, 2014
    Publication date: July 10, 2014
    Applicant: Institute for Cancer Research d/b/a The Research Institute of Fox Chase Cancer Center
    Inventor: Mark-Alan Pizzini
  • Patent number: 8734148
    Abstract: A heat treatment apparatus capable of achieving high-accuracy processing and high safety and a method of manufacturing a substrate are provided. The heat treatment apparatus 10 includes a reaction tube 42 for processing a substrate, a manifold 44 for supporting the reaction tube 42, a heater 46 installed around the reaction tube 42 to heat an inner part of the reaction tube 42, a surrounding member 500 installed to surround a side portion of the reaction tube 42 arranged in a lower portion than the heater 46; an exhaust device 301 for forcibly exhausting a gap 506 between the surrounding member 500 and the reaction tube 42; and a sealing member 150 installed in a contacting portion between the reaction tube 42 and the manifold 44. Here, an inlet hole 501 through which the exhaust device inhales an atmosphere outside the surrounding member 500 to the gap 506 is installed in the surrounding member 500.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: May 27, 2014
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Keishin Yamazaki, Akira Hayashida, Masaaki Ueno, Manabu Izumi, Katsuaki Nogami
  • Publication number: 20140134559
    Abstract: A heat exchanger arrangement, especially for a vehicle heater, includes a pot-like heat exchanger housing (12) with an inner wall (22, 24) and with an outer wall (18, 20). A heat carrier medium flow space is formed between the inner wall (22, 24) and the outer wall (18, 20). A first flow opening (54) is provided on the outer wall (18, 20) and, adjoining this, a pump housing (58) made integrally with the outer wall (18, 20) for a heat carrier medium pump is provided.
    Type: Application
    Filed: November 13, 2013
    Publication date: May 15, 2014
    Applicant: Eberspächer Climate Control Systems GmbH & Co. KG
    Inventor: Michael HUMBURG
  • Publication number: 20140134555
    Abstract: Rotary furnaces and processes for heat treating a workpiece generally include an external shell wall and a refractory lining abutting the shell wall to define a substantially cylindrically shaped interior chamber for treating one or more workpieces; an opening in the an external shell wall and a refractory lining for loading and unloading the workpieces; a rotatable hearth for receiving and rotating the workpieces within the substantially cylindrically shaped interior chamber; and a plurality of thermal isolation walls, wherein adjacent thermal isolation walls define a space effective to accommodate and thermally shield each one of the workpieces to be treated and have a height at least equal to a height of the workpiece. The presence of the thermal isolation walls substantially prevents heat transfer between the workpieces being treated.
    Type: Application
    Filed: November 14, 2012
    Publication date: May 15, 2014
    Applicant: FIRTH RIXSON
    Inventors: David Hebert, Matthew J. Villani
  • Patent number: 8696350
    Abstract: A heat treating furnace capable of continuously performing binder removal and subsequent firing without requiring a complicated configuration and increasing the equipment size and cost, for example, for degreasing a ceramic molding which is to be fired in a process for manufacturing a ceramic electronic component. A heat insulator is disposed to surround a heat treatment region in a case, and a reflector is disposed between the inner wall of the case and the insulator in order to reflect heat transferred from the heat treatment region through the heat insulator. A module heater including a heater embedded in the insulator is used. As the reflector, there is used a reflector having a structure in which a plurality of thin plates is arranged so that the main surfaces are arranged in parallel to each other with a predetermined space between the adjacent main surfaces.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: April 15, 2014
    Assignee: Murata Manufaturing Co., Ltd.
    Inventor: Takashi Ohara
  • Patent number: 8678815
    Abstract: In a method of heating a structure, an interior space of a furnace is heated to an interior temperature which is greater than a desired temperature to which a structure is intended to be heated. The structure is then placed into the furnace while the interior space is at least at the interior temperature at all times. When the structure has been heated to the desired temperature, it can be removed from the furnace at the desired temperature which is lower than the interior furnace temperature.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: March 25, 2014
    Assignee: Benteler Automobiltechnik GmbH
    Inventor: Georg Frost
  • Publication number: 20130337394
    Abstract: According to one aspect of the present disclosure, provided is a heat treatment apparatus configured to heat treat a plurality of objects to be treated which are held and supported by a holding and supporting unit while an inert gas is allowed to flow in a vertical type processing chamber from a bottom to a top thereof, wherein the processing chamber has a heating unit installed therearound. The heat treatment apparatus includes a gas supply system configured to supply the inert gas, wherein the gas supply system includes a gas supply header portion located in a lower end of the processing chamber to allow the inert gas to flow along a circumferential direction of the lower end; and a gas introduction portion in communication with the gas supply header portion to introduce the inert gas into the processing chamber.
    Type: Application
    Filed: June 14, 2013
    Publication date: December 19, 2013
    Inventors: Shinji ASARI, Hidekazu SATO, Hideki TAKAHASHI
  • Publication number: 20130323662
    Abstract: A household appliance includes a thermostat retainer for supporting a thermostat in an opening in a support plate. The thermostat retainer includes a first body portion having a first width dimension in a direction perpendicular to an axial direction of the first body portion, and a second body portion arranged in series with the first body portion in the axial direction of the thermostat retainer. The second body portion has a second width dimension in the direction perpendicular to the axial direction that is greater than the first width dimension. The first body portion and the second body portion cooperate to form a shoulder that prevents the second body portion from passing through the opening in the support plate. The first body portion or the second body portion includes means for preventing rotation of the thermostat retainer in the opening in the support plate.
    Type: Application
    Filed: May 30, 2012
    Publication date: December 5, 2013
    Applicant: BSH HOME APPLIANCES CORPORATION
    Inventors: William Bringe, Samuel Harward, Michael Rutherford
  • Publication number: 20130323663
    Abstract: A household appliance includes a warming drawer housing having an interior chamber and a warming drawer module having a warming area for placing items to be warmed and a heating device that heats the area. The warming drawer module is movable between a first position in which the warming drawer module is in the interior chamber of the warming drawer housing and the warming area is concealed from an outside of the warming drawer housing by the warming drawer housing, and a second position in which a part of the warming drawer module is outside the warming drawer housing and a portion of the warming area is exposed to the outside of the warming drawer housing. The heating device is coupled to and movable with the warming drawer module between the first position and the second position.
    Type: Application
    Filed: May 30, 2012
    Publication date: December 5, 2013
    Applicant: BSH HOME APPLIANCES CORPORATION
    Inventors: Samuel Harward, Rose Marie Parker, Michael Rutherford
  • Patent number: 8597384
    Abstract: A system, in certain embodiments, includes a gasification cooling system having an annular seal with a bellows. For example, the gasification cooling system may include a housing with an inlet, an outlet, and an interior between the inlet and the outlet, wherein the interior has a throat adjacent the inlet, and the throat expands in a flow direction from the inlet toward the outlet. The annular seal may be disposed in the throat of the housing, wherein the annular seal includes the bellows.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: December 3, 2013
    Assignee: General Electric Company
    Inventors: Yasir Hafeez Abbasi, Cliff Yi Guo, Wade Albert Taber, Xinyuan Zhang
  • Patent number: 8591224
    Abstract: A substrate processing apparatus includes heat treatment apparatus blocks each comprised of stacked heat treatment apparatuses HP each having temperature adjustment mechanism 70 configured to be able to move a substrate to a heating mechanism and adjust the temperature of the substrate, and includes a cooling liquid supply mechanism 81 that supplies a cooling liquid set for a predetermined temperature to be supplied for each of the heat treatment apparatus blocks HPB, a supply mechanism 99 which branches the cooling liquid supplied from cooling liquid supply mechanism 81 and supplies the cooling liquid to each temperature adjustment mechanism 70 of heating mechanisms in one of the heat treatment apparatus blocks.
    Type: Grant
    Filed: March 22, 2010
    Date of Patent: November 26, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Kim Dong-Hun
  • Patent number: 8573141
    Abstract: A reversible jamb block for a furnace, oven or kiln, having an attachment side adapted to removably attach to the first side of a doorway for the furnace, oven or kiln, and adapted to removably attach to the second side of the doorway, such that one face of the jamb block is directed away from the furnace when the attachment side of the jamb block is attached to the first side of the doorway, and a second face opposite the first face, is directed away from the furnace when the attachment side of the jamb block is attached to the second side of the doorway.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: November 5, 2013
    Assignee: Gillespie + Powers, Inc.
    Inventor: John M. Peterman
  • Publication number: 20130264336
    Abstract: A system and method of restoring material properties is disclosed. A subject material may have one or more of its material properties restored by contacting a packed bed of a reactive material contained within a container with the subject material in which material properties are desired to be restored. The packed bed and the subject material may be heated to restore the material properties. The packed bed may be formed from boron, silicon or other appropriate materials. An inert atmosphere system may have an argon injection system or a helium injection system in communication with the container. A deoxidizing system may be in communication with the container for creating a vacuum within the container or injecting hydrogen into the container.
    Type: Application
    Filed: April 6, 2012
    Publication date: October 10, 2013
    Inventor: GERALD J. BRUCK
  • Publication number: 20130252189
    Abstract: An apparatus, a system and a method are disclosed. An exemplary apparatus includes a first portion configured to hold an overlying wafer. The first portion includes a central region and an edge region circumscribing the central region. The first portion further including an upper surface and a lower surface. The apparatus further includes a second portion extending beyond an outer radius of the wafer. The second portion including an upper surface and a lower surface. The lower surface of the first portion in the central region has a first reflective characteristic. The lower surface of the first portion in the edge region and the second portion have a second reflective characteristic.
    Type: Application
    Filed: March 23, 2012
    Publication date: September 26, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi-Hung Lin, Li-Ting Wang, Tze-Liang Lee
  • Publication number: 20130209950
    Abstract: The invention relates to an oven for heat treatment of a multiplicity of objects. The oven comprises a support stand, which is realized as a three-dimensional frame, an elongate heating chamber, which is arranged vertically or horizontally in a central region of the support stand, and a plurality of elongate combustion chambers, which are arranged vertically or horizontally inside the support stand. The oven additionally comprises a heating element, which is assigned to the heating chamber, and at least one fan for generating an air stream from the heating chamber to the combustion chambers. The combustion chambers are provided to receive the objects to be treated. The support stand is provided to support the heating chamber and the combustion chambers. The invention additionally relates to an oven installation having a multiplicity of such ovens.
    Type: Application
    Filed: March 25, 2011
    Publication date: August 15, 2013
    Inventor: Stefan Mohr
  • Publication number: 20130137056
    Abstract: A heat chamber having multiple segments formed from castable material.
    Type: Application
    Filed: November 28, 2012
    Publication date: May 30, 2013
    Inventors: David Vardy, Dave Condon
  • Publication number: 20130101950
    Abstract: A heat-collecting kiln device includes a housing assembly including a single housing or a plurality of housings having a same height or different heights, with the housings stackable one upon another. A top lid is mounted on a top of the housing assembly to seal the housing assembly and includes an observation hole. A base is mounted to a bottom of the housing assembly to seal the housing assembly. A cover is mounted to the top lid to seal the observation hole. The cover is removable to reveal the observation hole. The heat-colleting kiln device further includes a net and at least one leg. Each housing is comprised of four modular elements each having a mortise engaged with a tenon of another modular element. One of the modular elements includes a temperature detection hole.
    Type: Application
    Filed: October 24, 2011
    Publication date: April 25, 2013
    Inventors: Kang-Ming Huang, Tsung-Wei Huang
  • Patent number: 8417394
    Abstract: Provided are a substrate processing apparatus, a semiconductor device manufacturing method, and a temperature controlling method, which are adapted to improve equipment operational rate. A calculation parameter computing unit computes a calculation parameter using at least a first calculation parameter correction value determined by a first calculation parameter setting unit based on an accumulated film thickness on a reaction vessel, a second calculation parameter correction value determined by a second calculation parameter setting unit based on an accumulated film thickness on a filler wafer, and a third calculation parameter correction value determined by a third calculation parameter setting unit based on the number of filler wafers.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: April 9, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Masashi Sugishita, Masaaki Ueno, Tsukasa Iida, Susumu Nishiura, Masao Aoyama, Kenichi Fujimoto, Yoshihiko Nakagawa, Hiroyuki Mitsui
  • Publication number: 20130068756
    Abstract: In a method for heating a metal plate, the metal plate is placed between an lower contact element and an upper contact element. The contact elements are provided with heating units and integrated in mounts. At least one of the contact elements is shaped to suit a contour of the metal plate and made of a heat conducting material with a conductivity of at least 150 W/mK. The metal plate is heated between the contact elements to a temperature of 200° C. to 450° C. for a time period of less than 120 s in the presence of a contact pressure.
    Type: Application
    Filed: September 17, 2012
    Publication date: March 21, 2013
    Applicant: Benteler Automobiltechnik GmbH
    Inventor: Benteler Automobiltechnik GmbH
  • Publication number: 20130034821
    Abstract: A conveyor oven is described. The conveyor oven includes a frame made of load-bearing structural members. The conveyor oven has a modular construction, with the structural members defining a rectangular prism. Blocks of insulation are placed in the frame openings, and a flexible insulating material, such as a multi-layer insulating textile, is used to cover joints between adjacent modules. Along the length of the conveyor oven, idler rollers that support the conveyor belt have ends that penetrate the sides of the oven and are supported such that the rollers can shift as the oven expands and contracts without creating openings for heat or air leakage. Air flow within the oven is managed using sets of adjustable baffle plates above and below the conveyor belt.
    Type: Application
    Filed: June 7, 2012
    Publication date: February 7, 2013
    Applicant: Brunnschweiler S.A.
    Inventors: Oscar Lopez, Raul Esteban, James Schrader
  • Publication number: 20130034819
    Abstract: A delayed coking heater for heating a feedstock to delayed coking temperature is disclosed. The delayed coking heater may include: a heater including a radiant heating zone comprising a lower portion including a hearth burner section and an upper portion including a wall burner section, the hearth burner section comprising a plurality of hearth burners located adjacent to the bottom hearth for firing in the radiant heating zone; and the wall burner section comprising a plurality of wall burners located adjacent to opposing walls; and a multiple parallel serpentine heating coil located in the radiant heating zone.
    Type: Application
    Filed: April 8, 2011
    Publication date: February 7, 2013
    Applicant: LUMMUS TECHNOLOGY INC.
    Inventor: Kenneth A. Catala
  • Patent number: 8367550
    Abstract: A conductive layer may be fabricated on a semiconductor substrate by loading a silicon substrate in to a chamber whose inside temperature is at a loading temperature in the range of approximately 250° C. to approximately 300° C., increasing the inside temperature of the chamber from the loading temperature to a process temperature, and sequentially stacking a single crystalline silicon layer and a polycrystalline silicon layer over the silicon substrate by supplying a silicon source gas and an impurity source gas in to the chamber, where the chamber may be, for example, a CVD chamber or a LPCVD chamber.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: February 5, 2013
    Assignee: SK Hynix Inc.
    Inventors: Jong Bum Park, Chun Ho Kang, Young Seung Kim
  • Publication number: 20130017505
    Abstract: The invention relates to an oven for heat treatment of a multiplicity of objects. The oven comprises a support stand, which is realized as a three-dimensional frame, an elongate heating chamber, which is arranged vertically or horizontally in a central region of the support stand, and a plurality of elongate combustion chambers, which are arranged vertically or horizontally inside the support stand. The oven additionally comprises a heating element, which is assigned to the heating chamber, and at least one fan for generating an air stream from the heating chamber to the combustion chambers. The combustion chambers are provided to receive the objects to be treated. The support stand is provided to support the heating chamber and the combustion chambers. The invention additionally relates to an oven installation having a multiplicity of such ovens.
    Type: Application
    Filed: March 25, 2011
    Publication date: January 17, 2013
    Inventor: Stefan Mohr
  • Publication number: 20120318853
    Abstract: A heater block for a wire bonding system includes a mounting base configured to receive a lead frame and a semiconductor die mounted on the lead frame. A heating structure is removably coupled to a top surface of the mounting base. The heating structure includes a central heating surface and side heating panels surrounding the central heating surface. The heating structure selectively heats wire bonding areas of the lead frame.
    Type: Application
    Filed: June 15, 2011
    Publication date: December 20, 2012
    Applicant: FREESCALE SEMICONDUCTOR, INC
    Inventors: Wai Keong Wong, Jimmy Low, Raymund Francis Xavier
  • Patent number: 8328942
    Abstract: In one of the many embodiments, an apparatus for processing a substrate is provided which includes a substrate processing chamber where the substrate is positioned within the substrate processing chamber so the substrate at least partially separates the substrate processing chamber into a first chamber and a second chamber. The apparatus further includes a first chamber inlet configured to input a first fluid of a first temperature into the first chamber at a first pressure and a second chamber inlet configured to input a second fluid of a second temperature into the second chamber at a second pressure wherein the first pressure and the second pressure are substantially equal. The second temperature is capable of being utilized to manage substrate temperature.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: December 11, 2012
    Assignee: Lam Research Corporation
    Inventors: Ben Mooring, John Parks, Diane J. Hymes
  • Publication number: 20120295785
    Abstract: A fused and cast refractory product containing, in weight percentages on the basis of the oxides and for a total of 100%: ZrO2: remainder up to 100% Hf2O: <5% SiO2: 2% to 10% 0.9%<Y2O3+CeO2+CaO+MgO?4.0% B2O3: ?4.5% B2O3: ?0.09×(Y2O3+?(CeO2+CaO+MgO))×SiO2 Al2O3: 0.3% to 2.0% Na2O+K2O: ?0.5% P2O5: <0.05% Fe2O3 TiO2: <0.55% other species: <1.0%, as long as the Y2O3 content is no lower than 0.5% and the CeO2 +CaO+MgO content is no lower than 2%.
    Type: Application
    Filed: December 16, 2010
    Publication date: November 22, 2012
    Inventors: Michel Gaubil, Ludovic Massard, Isabelle Cabodi
  • Publication number: 20120251968
    Abstract: A process for producing a semiconductor device, includes: first melting by heating only a superior portion of a bump formed on an electrode on one principle surface of a semiconductor substrate; and second melting the entire bump by also heating an inferior portion of the bump.
    Type: Application
    Filed: June 14, 2012
    Publication date: October 4, 2012
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Hiroyuki MATSUI, Yutaka Makino, Yoshito Akutagawa
  • Publication number: 20120251967
    Abstract: A loading unit is provided under a processing unit for performing a thermal treatment process on a substrate, loads/unloads a substrate holding mechanism by which substrates are held to the processing unit, and transfers the substrates to the substrate holding mechanism. The loading unit includes a loading case provided to be connected to the processing unit and surrounds the entire processing unit; an elevator mechanism that has a holding arm for holding a lower portion of the substrate holding mechanism and moves up/down the substrate holding mechanism; a substrate transfer mechanism which transfers the substrates to the substrate holding mechanism; and a substrate holding mechanism accommodating recess portion provided in a lower portion of the loading case corresponding to the lower portion of the substrate holding mechanism and is provided to protrude downward to accommodate a lower end portion of the substrate holding mechanism.
    Type: Application
    Filed: February 29, 2012
    Publication date: October 4, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Hiroyuki MATSUURA
  • Publication number: 20120244448
    Abstract: Methods of heat treating at least one component of a solid oxide fuel cell (SOFC) system. The method includes heating the at least one component with a rapid thermal process, wherein the rapid thermal process heats at least a portion of the component at a rate of approximately 50° C./sec or more.
    Type: Application
    Filed: March 23, 2012
    Publication date: September 27, 2012
    Applicant: Bloom Energy Corporation
    Inventors: Ryan Hallum, Michael Gasda, Arne Ballantine, Ravi Oswal
  • Publication number: 20120231407
    Abstract: A disclosed thermal treatment apparatus includes a supporting member where plural substrates are supported in the form of shelves; a reaction tube that accommodates the supporting member within the reaction tube, and is provided with plural gas supplying pipes arranged in a side part of the reaction tube, thereby allowing a gas to flow into the reaction tube through the plural gas supplying pipes; and a first heating part that heats the plural substrates supported by the supporting member accommodated within the reaction tube, wherein the first heating part includes a slit that extends from a bottom end to a top end of the first heating part and allows the plural gas supplying pipes to go therethrough, and wherein an entire inner surface, except for the slit, of the heating part faces the side part of the reaction tube.
    Type: Application
    Filed: March 1, 2012
    Publication date: September 13, 2012
    Inventors: Masato KADOBE, Naomi Onodera, Kazuhiko Kato
  • Publication number: 20120222354
    Abstract: A refractory wall comprises a hotface layer comprising a hotface surface configured to be adjacent to a carbonaceous gasification environment, a backing layer facing the hotface layer, and a cooling layer facing the backing layer and configured to cool the hotface layer via the backing layer. A gasification device and a gasification process are also presented.
    Type: Application
    Filed: March 1, 2011
    Publication date: September 6, 2012
    Inventors: Wei CHEN, Honghai Dong, Zhaohui Yang, Minggang She, Lishun Hu, Ke Liu, Xianglong Zhao
  • Publication number: 20120207884
    Abstract: Described herein are edible glues and customized applicators for delivering the same.
    Type: Application
    Filed: January 31, 2012
    Publication date: August 16, 2012
    Applicant: Get Sassie, Inc.
    Inventors: Amy Stevens Adams, John R. Sedivy, Victor J. Temple
  • Patent number: 8231381
    Abstract: To provide a processing system for a process object capable of preventing a transport arm mechanism from being thermally damaged, so as to effectively perform a transport operation of the process object. A processing system 2, which takes out a process object W from a storage box 6 for process object, and thermally process the process object, includes: a vertical processing unit 24; a process-object transport area 10 disposed below the processing unit; a plurality of process-object boats 20 configured to hold the process objects; a boat elevating means 68 configured to vertically move the process-object boat 20; a boat table for transport 52, on which the process-object boat can be placed; and a transport arm mechanism configured to transport the process objects between the storage box 6 and the process-object boat 20 placed on the boat table for transport 52. The transport arm mechanism 56 is vertically moved by an arm elevating means 58.
    Type: Grant
    Filed: October 1, 2008
    Date of Patent: July 31, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Katsuyuki Hishiya, Kiichi Takahashi
  • Publication number: 20120064472
    Abstract: A heat treatment apparatus and control method enabling the apparatus to settle down an internal temperature of a treating vessel to a target temperature accurately and quickly. The heat treatment apparatus includes a furnace body with a heater on an inner circumferential surface thereof, the treating vessel disposed inside the furnace body, a cooling medium supply blower and cooling medium release blower each connected to the furnace body, and a temperature sensor provided inside the treating vessel. A signal from the temperature sensor is sent to a heater output computing unit and blower output computing unit included in a controller. The heater output computing unit determines a heater output level based on a heater output numerical model and the signal from the temperature sensor. The blower output computing unit determines a blower output level based on a blower output numerical model and the signal from the temperature sensor.
    Type: Application
    Filed: September 6, 2011
    Publication date: March 15, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Koji YOSHII, Tatsuya Yamaguchi, Wenling Wang, Takanori Saito
  • Patent number: 8129663
    Abstract: Deterioration of an O ring due to radiation heating in a vacuum heating apparatus is prevented to allow heat treatment of a substrate with good annealing properties. The vacuum heating apparatus 1 includes a vacuum chamber 2 constituted by flanges 11 and 12 having an opening portion 9 and joined together, a turbo molecular pump 17 for exhausting gas from the vacuum chamber 2, and a heater base 3 for heating a substrate 5 placed in the vacuum chamber 2. Joint surfaces of the flanges 11 and 12 are sealed by an O ring 10. Further, bonding steps 13 are formed between the heater base 3 and the O ring 10 on the joint surfaces of the flanges 11 and 12, thereby preventing thermo-radiation from the heater base 3 from reaching the O ring 10 through the joint surfaces of the flanges 11 and 12.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: March 6, 2012
    Assignee: Canon Anelva Corporation
    Inventors: Nobuyuki Masaki, Yuichi Sasuga, Masami Shibagaki, Hiroshi Doi
  • Patent number: 8088328
    Abstract: A heat treating furnace is disclosed for nitride case hardening and gas cooling a stationary workload in the same furnace which is comprised of a single chamber and an access door. The chamber is segregated into an outer portion and an inner portion, with the inner portion being adapted to receive the workload to be nitride case hardened through the access door. The inner portion is surrounded by graphite insulation to retain the gas used to nitride case harden the workload. The inner portion further includes a plurality of graphite resistance heating elements and a plurality of graphite plates juxtaposed in near proximity to the graphite resistance heating elements forming a conduit or plenum between them. The inner portion further includes a fan assembly including a graphite radial fan wheel adapted to circulate the nitriding gas within the inner portion and through the conduit to provide uniform nitride case hardening of the workload.
    Type: Grant
    Filed: June 13, 2008
    Date of Patent: January 3, 2012
    Inventor: William R. Jones