Etching Of Semiconductor Precursor, Substrates, And Devices Used In An Electrical Function (156/625.1) Patents (Class 438/FOR100)

Foreign Patent Art Collections

Measuring, testing, or inspecting (156/626.1) (Class 438/FOR101)

By electrical means or of electrical property (156/627.1) (Class 438/FOR102)

Altering the etchability of a substrate by alloying, diffusing, or chemical reacting (156/628.1) (Class 438/FOR103)

With uniting of preforms (e.g., laminating, etc.) (156/629.1) (Class 438/FOR104)

With in situ activation or combining of etching components on surface (156/635.1) (Class 438/FOR110)

With thin film of etchant between relatively moving substrate and conforming surface (e.g., chemical lapping, etc.) (156/636.1) (Class 438/FOR111)

With relative movement between the substrate and a confined pool of etchant (156/637.1) (Class 438/FOR112)

Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant (156/640.1) (Class 438/FOR115)

Recycling or regenerating etchant (156/642.1) (Class 438/FOR116)

With treatment by high energy radiation or plasma (e.g., ion beam, etc.) (156/643.1) (Class 438/FOR117)

Forming or increasing the size of an aperture (156/644.1) (Class 438/FOR118)

With mechanical deformation, severing, or abrading of a substrate (156/ 645.1) (Class 438/FOR119)

Etchant is a gas (156/646.1) (Class 438/FOR120)

Etching according to crystalline planes (156/647.1) (Class 438/FOR121)

Etching isolates or modifies a junction in a barrier layer (156/648.1) (Class 438/FOR122)

Discrete junction isolated (e.g., mesa formation, etc.) (156/649.1) (Class 438/FOR123)

Sequential application of etchant material (156/650.1) (Class 438/FOR124)

Sequentially etching the same surface of a substrate (156/651.1) (Class 438/FOR125)

Differential etching of a substrate (156/654.1) (Class 438/FOR128)

Silicon, germanium, or gallium containing substrate (156/662.1) (Class 438/FOR134)

There are no patents to show for this class.