Vapor Deposition Patents (Class 505/447)
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Patent number: 11611031Abstract: A superconducting composition of matter including overlapping first and second regions. The regions comprise unit cells of a solid, the first region comprises an electrical insulator or semiconductor, and the second region comprises a metallic electrical conductor. The second region extends through the solid and a subset of said second region comprise surface metal unit cells that are adjacent to at least one unit cell from the first region. The ratio of the number of said surface metal unit cells to the total number of unit cells in the second region being at least 20 percent.Type: GrantFiled: February 14, 2018Date of Patent: March 21, 2023Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventor: Jamil Tahir-Kheli
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Patent number: 9643144Abstract: A method of making a nanostructure-reinforced composite comprises providing matrix particles in a reactor; fluidizing the matrix particles; introducing a nanostructure material into the reactor; homogeneously dispersing the nanostructure material; uniformly depositing the nanostructure material on the matrix particles to form a composite powder; generating a nanostructure on the matrix particles from the nanostructure material; and processing the composite powder to form the nanostructure-reinforced composite having a matrix formed from the matrix particles. The nanostructures are evenly distributed in the matrix of the nanostructure-reinforced composite.Type: GrantFiled: September 2, 2011Date of Patent: May 9, 2017Assignee: BAKER HUGHES INCORPORATEDInventors: Zhiyue Xu, Gaurav Agrawal
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Patent number: 8673821Abstract: A coated conductor comprising an improved buffer layer architecture where the buffer layers are obtainable by chemical solution deposition and where the buffer layers essentially adopt the degree of texture of the substrate.Type: GrantFiled: December 28, 2010Date of Patent: March 18, 2014Assignee: NexansInventors: Joachim Bock, Jürgen Ehrenberg, Mark O. Rikel
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Patent number: 8658571Abstract: The invention relates to a method for the wet chemical production of an HTSL on a carrier, wherein an HTSL precursor solution comprising no trifluoroacetate may be utilized if the same is heated to a temperature Ts during the heat treatment of the HTSL precursor, wherein the remaining substances of the HTSL precursor solution form at least a partial melt, which is below the temperature at which RE2BaCuOx is formed, and which is deposited from the liquid phase while forming a peritectic.Type: GrantFiled: March 18, 2010Date of Patent: February 25, 2014Assignee: BASF SEInventors: Isabel van Driessche, Pieter Vermeir, Serge Hoste, Michael Baecker
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Patent number: 8604231Abstract: The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapor deposition of metal platinum. The chemical vapor deposition of platinum onto a substrate is made from a platinum organo-metal compound the includes a ligand with a cyclic structure including at least two non-adjacent C?C double bonds, and the platinum organo-metal compound has a square-lane structure in which the platinum is bonded to each of the C?C double bonds of the ligand, thereby forming a (C?C)—Pt—(C?C) of 60° to 70°.Type: GrantFiled: January 8, 2010Date of Patent: December 10, 2013Assignee: Centre National de la Recherche ScientifiqueInventors: Pascal Doppelt, Cyril Thurier
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Patent number: 8119187Abstract: In a chemical vapor deposition process simple precursors such as a rare earth nitrate or acetate, Ba-nitrate or acetate and Cu-nitrate or acetate are dissolved in an appropriate solvent, preferably water, to form a solution, nebulized into a fine mist and applied to a substrate.Type: GrantFiled: December 15, 2003Date of Patent: February 21, 2012Assignee: Superpower, Inc.Inventor: Venkat Selvamanickam
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Publication number: 20110294672Abstract: The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapour deposition of metal platinum. The chemical vapour deposition of platinum onto a substrate is made from a platinum organometallic compound that includes a ligand with a cyclic structure including at least two non-adjacent C?C double bonds, and the platinum organometallic compound has a square-plane structure in which the platinum is bonded to each of the C?C double bonds of the ligand, thereby forming a (C?C)—Pt—(C?C) of 60° to 70°.Type: ApplicationFiled: January 8, 2010Publication date: December 1, 2011Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUEInventors: Pascal Doppelt, Cyril Thurier
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Patent number: 7910155Abstract: A method for manufacturing a high-temperature superconducting conductor includes translating an elongated substrate through a reactor. Further, a high temperature superconducting layer is formed on the substrate translating through the reactor by deposition of a reaction product of metalorganic precursor materials onto the substrate. Further, partial pressure of oxygen is monitored to indirectly monitor supply of metalorganic precursors into the reactor.Type: GrantFiled: January 6, 2006Date of Patent: March 22, 2011Assignee: Superpower, Inc.Inventors: Hee-Gyoun Lee, Venkat Selvamanickam
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Publication number: 20100173785Abstract: The invention relates to a method for the wet chemical production of an HTSL on a carrier, wherein an HTSL precursor solution comprising no trifluoroacetate may be utilized if the same is heated to a temperature Ts during the heat treatment of the HTSL precursor, wherein the remaining substances of the HTSL precursor solution form at least a partial melt, which is below the temperature at which RE2BaCuOx is formed, and which is deposited from the liquid phase while forming a peritectic.Type: ApplicationFiled: March 18, 2010Publication date: July 8, 2010Applicant: ZENERGY POWER GMBHInventors: Isabel van Driessche, Pieter Vermeir, Serge Hoste, Michael Baecker
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Patent number: 7387811Abstract: A CVD apparatus capable of substantially simultaneously processing multiple portions of at least one substrate or substantially simultaneously processing portions of multiple substrates or substantially simultaneously processing multiple portions of at least one substrate and portions of multiple substrates, the CVD apparatus is described. The CVD apparatus includes a reactor, at least one substrate heater, at least one precursor supply system, at least one precursor injector, optionally, communicating with at least one temperature regulated manifold, at least one reactants mixer, and, optionally, at least one controller communicating with at least one substrate heater, the at least one precursor supply system, the at least one precursor injector, the at least one temperature regulated manifold, and combinations thereof.Type: GrantFiled: September 21, 2004Date of Patent: June 17, 2008Assignee: Superpower, Inc.Inventor: Venkat Selvamanickam
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Patent number: 7361377Abstract: This invention provides a method of making a fluorinated precursor of a superconducting ceramic. The method comprises providing a solution comprising a rare earth salt, an alkaline earth metal salt and a copper salt; spraying the solution onto a substrate to provide a film-covered substrate; and heating the film-covered substrate in an atmosphere containing fluorinated gas to provide the fluorinated precursor.Type: GrantFiled: July 18, 2003Date of Patent: April 22, 2008Assignee: Brookhaven Science Associates, LLCInventors: Harold Wiesmann, Vyacheslav Solovyov
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Patent number: 6743531Abstract: The object of the present invention is to provide an oxide superconducting conductor having superior strength and superconductor characteristics, and its production method.Type: GrantFiled: June 19, 2002Date of Patent: June 1, 2004Assignees: Fujikura Ltd., Chubu Electric Power Company IncorporatedInventors: Kazunori Onabe, Takashi Saito, Naoji Kashima, Shigeo Nagaya
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Publication number: 20030162667Abstract: A method for forming an electronically active biaxially textured article includes the steps of providing a substrate having a single crystal metal or metal alloy surface, deforming the substrate to form an elongated substrate surface having biaxial texture and depositing an epitaxial electronically active layer on the biaxially textured surface. The method can include at least one annealing step after the deforming step to produce the biaxially textured substrate surface. The invention can be used to form improved biaxially textured articles, such as superconducting wire and tape articles having improved JC values.Type: ApplicationFiled: February 22, 2002Publication date: August 28, 2003Inventors: Amit Goyal, Donald M. Kroeger
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Publication number: 20030130129Abstract: A method of producing an oriented oxide superconducting film. A metal oxyfluoride film is provided on a substrate. The metal oxyfluoride film comprises the constituent metallic elements of an oxide superconductor in substantially stoichiometric proportions. The film is then converted into the oxide superconductor in a processing gas having a total pressure less than atmospheric pressure.Type: ApplicationFiled: July 13, 2002Publication date: July 10, 2003Applicant: Massachusetts Institute of TechnologyInventors: Igor Seleznev, Michael J. Cima
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Patent number: 6512297Abstract: A CVD source material which can be stably tramsported to a reactor in order to form a platinum metal, Cu, or an oxide of them as an electrode. An organometallic compound including a platinum metal (Ru, Pt, Ir, Pd, Os, Rh, Re) or Cu, is dissolved into tetrahydrofuran or a solvent containing tetrahydrofuran to obtain the CVD source material. In this material, the amount of moisture is preferably not more than 200 ppm. A film is formed by CVD employing this source material, the material is supplied stably, and the properties of the electrode film are improved. The capacitance property of the film is improved. Wiring of an electrical device may be formed by employing source material.Type: GrantFiled: March 26, 1999Date of Patent: January 28, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeru Matsuno, Fusaoki Uchikawa, Takehiko Sato, Akira Yamada
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Publication number: 20020132739Abstract: A superconducting magnesium diboride (MgB2) thin film having c-axial orientation and a method and apparatus for fabricating the same are provided. The fabrication method includes forming a boron thin film on a substrate and thermally processing the substrate on which the boron thin film is formed along with a magnesium source and cooling the resulting structure. The superconducting magnesium diboride thin film can be used in a variety of electronic devices employing superconducting thin films, such as precision medical diagnosis equipment using superconducting quantum interface devices (SQUIDs) capable of sensing weak magnetic fields, microwave communications equipment used for satellite communications, and Josephson devices. Computer systems with 100 times greater computing speed can be implemented with the superconducting magnesium diboride thin film.Type: ApplicationFiled: March 15, 2002Publication date: September 19, 2002Inventors: Won nam Kang, Sung-Ik Lee, Eun-Mi Choi, Hyeong-Jin Kim
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Patent number: 6344079Abstract: A solvent composition for liquid delivery chemical vapor deposition of metal organic precursors, to form metal-containing films such as SrBi2Ta2O9 (SBT) films for memory devices. An SBT film may be formed using precursors such as Sr(thd)2(pmdeta), Ta(OiPr)4(thd) and Bi(thd)3(pmdeta) which are dissolved in a solvent medium comprising one or more alkanes. Specific alkane solvent compositions may advantageously used for MOCVD of metal organic compound(s) such as &bgr;-diketonate compounds or complexes, compound(s) including alkoxide ligands, and compound(s) including alkyl and/or aryl groups at their outer (molecular) surface, or compound(s) including other ligand coordination species and specific metal constituents.Type: GrantFiled: December 3, 1999Date of Patent: February 5, 2002Assignee: Advanced Technology Materials, Inc.Inventor: Thomas H. Baum
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Patent number: 6172009Abstract: An oxide superconductor article is provided having an oxide superconductor film having a thickness of greater than 0.5 microns disposed on a substrate, said article having a transport critical current density (Jc) of greater than or equal to about 105 A/cm2 at 77 K, zero field. The oxide superconductor film is characterized by high Jc and high volume percent of c-axis epitaxial oxide grains, even with thicknesses of up to 1 micron.Type: GrantFiled: December 22, 1999Date of Patent: January 9, 2001Assignee: Massachusetts Institute of TechnologyInventors: John A. Smith, Michael J. Cima, Neville Sonnenberg
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Patent number: 5968877Abstract: A superconducting article includes a biaxially-textured Ni substrate, and epitaxial buffer layers of Pd (optional), CeO.sub.2 and YSZ, and a top layer of in-plane aligned, c-axis oriented YBCO having a critical current density (J.sub.c) in the range of at least 100,000 A/cm.sup.2 at 77 K.Type: GrantFiled: June 26, 1996Date of Patent: October 19, 1999Assignee: Lockheed Martin Energy Research CorpInventors: John D. Budai, David K. Christen, Amit Goyal, Qing He, Donald M. Kroeger, Dominic F. Lee, Frederick A. List, III, David P. Norton, Mariappan Paranthaman, Brian C. Sales, Eliot D. Specht
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Patent number: 5686151Abstract: Disclosed is method of forming a metal oxide film including the steps of introducing a gas containing a metal compound having at least one element selected from the group consisting of carbon and a halogen element, into a process chamber accommodating a substrate, introducing a gas containing a compound having a hydroxyl group into the process chamber, introducing a gas containing oxygen which has been converted to a plasma state, into the process chamber, and forming the metal oxide film on the substrate using the gas containing a metal compound, the gas containing a compound having a hydroxyl group, and the gas containing oxygen which has been converted to a plasma state.Type: GrantFiled: February 20, 1996Date of Patent: November 11, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Keitaro Imai, Masahiro Kiyotoshi, Haruo Okano
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Patent number: 5451434Abstract: Alkaline earth metal heptane dionates which have uniform evaporation properties in a vacuum and are therefore highly suitable for use in CVD synthesis for depositing layers containing alkaline earth metal useful in fields such as the production of high temperature superconductors.Type: GrantFiled: November 29, 1993Date of Patent: September 19, 1995Assignee: Solvay Barium Strontium GmbHInventor: Guenther Doellein
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Patent number: 5447909Abstract: A superconducting thin oxide film is formed by the steps of mixing a gas of the organometal compound of the alkali earth metal, a gas of at least one organometal compound of the element of the group IIIa and/or a halogenide thereof, and a gas of at least one organometal compound of a transition metal and/or a halogenide thereof, with an inert gas, to produce a gas mixture; mixing an oxygen-containing gas to said gas mixture to produce a gas mixture having a predetermined oxygen partial pressure; and thermally decomposing said gas mixture having the predetermined oxygen partial pressure on a substrate to form a thin film of a complex oxide on said substrate.Type: GrantFiled: September 9, 1991Date of Patent: September 5, 1995Assignee: Kawasaki Steel CorporationInventors: Makoto Takahashi, Hiroshi Umino
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Patent number: 5439876Abstract: A method for making layered structures of artificial high T.sub.c superconductor compounds by which on top of a seed crystal having a lattice structure matching the lattice structure of the superconductor compound to be made, oxide layers of all constituent components are epitaxially grown in a predetermined sequence so as to create a sandwich structure not found in natural crystals. The epitaxial deposition of the constituent components is performed in a reaction chamber having evaporation facilities, inlets for metal-organic gases, and inlets for background gases including oxygen.Type: GrantFiled: August 16, 1993Date of Patent: August 8, 1995Assignee: International Business Machines CorporationInventors: Volker Graf, Carl A. Mueller
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Patent number: 5413986Abstract: A method for producing a thin oxide superconducting film possessing high crystallinity and excellent quality and a novel single crystal as a substrate allowing easy formation of an epitaxial film of high quality usable for the method are provided. The method for the production of the thin oxide superconducting film is characterized by using as a substrate a single crystal of SrLaGaO.sub.4 which is a high-melting oxide and effecting epitaxial growth of a thin oxide superconducting film on the substrate. The single crystal used as a substrate is an oxide single crystal possessing a crystal structure of the K.sub.2 NiF.sub.4 type and having a composition of Sr.sub.1-X La.sub.1-Y Ga.sub.1-Z O.sub.4-W (wherein X, Y, Z, and W fall in the following respective ranges; -0.1<X<0.1, -0.1<Y<0.1, -0.1<Z<0.1, and -0.4<W<0.4).Type: GrantFiled: June 21, 1991Date of Patent: May 9, 1995Assignee: Kabushiki Kaisha Komatsu SeisakushoInventor: Kozo Nakamura
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Patent number: 5350453Abstract: In the device for producing thin films of metal oxides from organic metal compounds on a substrate, there is a truncated pyramidal hollow body (3) in an evacuable housing (1). Disposed concentrically with respect to the axis of symmetry (16) of the hollow body (3) in its base (7) are at least three furnaces (8) which have reception devices (9) for the metal compounds (10) to be evaporated. The reception devices (9) are provided with guide pipes (11) which project into the hollow interior of the hollow body (3) and are inclined towards its axis of symmetry (16). The casing (12) of the truncated pyramid merges into a pipe (13) above whose end there is disposed a heatable reception device (5) for the substrate (4). A gas feed pipe (6) terminates in the hollow interior [sic] of the hollow body (3) between the guide pipes (11) and the end of the pipe (13).Type: GrantFiled: September 23, 1992Date of Patent: September 27, 1994Assignee: Hoechst AktiengesellschaftInventor: Ernst-Gunther Schlosser
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Patent number: 5314866Abstract: A CVD process for forming a layer or layers of superconducting materials on a semiconductor substrate in which volatile organometallic compounds of bismuth, strontium, calcium and copper are heated in the presence of a carrier gas in a first chamber free of hydrolyzing agents. Under conditions free of hydrolyzing agents, the carrier gas transports a predetermined quantity of the volatile organometallic compounds of the bismuth, strontium, calcium and copper to a deposition chamber. The compounds are decomposed and deposit mixed oxides on the substrate. Subsequent to deposition of the mixed oxides of the desired elements the layer is sintered in an oxygen-rich atmosphere, and formed into a superconducting film by subsequent slow cooling still in an oxygen-rich atmosphere.Type: GrantFiled: May 16, 1989Date of Patent: May 24, 1994Assignee: The United States of America as represented by the Secretary of the NavyInventors: Alan D. Berry, David K. Gaskill, Ronald T. Holm, Edward J. Cukauskas, Raphael Kaplan, Richard L. Henry