Abstract: A detergent for cleaning media is provided. The detergent comprises deionized water, between about 1% and about 5% by weight of a nonionic surfactant having an hydrophile/lipophile balance (HLB) value between about 10 and about 20, and an ethoxylation level between about 5 and about 20, between about 1% and about 5% by weight of a dispersing agent, between about 3% and about 10% by weight of a chelating agent comprising phosphonic acid, and between about 2% and about 6% by weight of an inorganic salt.

Abstract: A method for the reduction of caking of excess liquid developer dispersion that remains present on the surface of a member after transfer of liquid developer dispersion from one member to another member in a digital printing apparatus, comprising the step of adding a dispersing composition to the excess liquid developer dispersion, wherein the dispersing composition comprises a dispersing agent.

Abstract: Provided is a maintenance liquid for inkjet printers, which comprises at least one of glycol ethers and glycol esters represented by the following general formulas (1) to (3), and 45 to 10 mg/L of dissolved oxygen: R1CO(OR2)xOR3??General formula (1) R4CO(OR5)YOCOR6??General formula (2) R7(OR8)ZOR9??General formula (3) wherein R2, R5, and R8 each independently represent an ethylene group or a propylene group, R1, R3, R4, and R6 each independently represent an alkyl group having 1 to 4 carbon atoms, R7 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and X, Y, and Z each independently represent an integer of 1 to 4.

Abstract: An alkaline detergent composition for hard surface comprises an alkaline agent (component A), a nonionic surfactant (component B), a chelating agent (component C), water (component D), at least one carboxylic acid compound (component E) selected from the group consisting of compounds represented by general formula (1) and general formula (2), and at least one anionic surfactant (component F) selected from the group consisting of surfactants represented by general formula (3) and salts thereof. Therein, the content ratio [component E (weight %)/component B (weight %)] is 1/1.5-15/1, the content ratio [component F (weight %)/component B (weight %)] is 10/1-1/5, and the pH at 25° C. is 12 or greater.

Abstract: A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.

Abstract: A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.

Abstract: Embodiments relate generally to an imaging member that facilitates removal of the imaging member coating layers disposed over the imaging member and environmentally or “green” methods for using the same. More specifically, the present embodiments disclose an electrophotographic photoreceptor that includes a specifically formulated undercoat layer that allows easy removal of the photoreceptor layers disposed on top of the undercoat layer. The present embodiments provide a simple yet efficient method for reclaiming recycling or remanufacturing electrophotographic photoreceptors.

Abstract: A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a hard disk media substrate, or an imprint mold used in the manufacturing of the hard disk media or a read/write head assembly part. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.

Abstract: A detergent composition is disclosed, which comprises: (A) an alkali metal hydroxyl compound in an amount of 0.1 to 20 parts by weight; (B) a nonionic surfactant represented by the following formula (I) in an amount of 0.1 to 30 parts by weight: wherein R1 is hydrogen or methyl; R2 is hydrogen or methyl; n is an integer from 0 to 10; and m is an integer from 4 to 20; (C) an anionic surfactant in an amount of 0.1 to 10 parts by weight; (D) a chelating agent in an amount of 0.1 to 20 parts by weight; (E) an additive in an amount of 0.1 to 20 parts by weight; and (F) water of remaining parts based on 100 parts by weight of the detergent composition.

Abstract: Composite materials, and fuser members incorporating the composite materials comprise a polyimide substrate, a metal layer, and a primer layer between the polyimide substrate and the metal layer. The primer layer comprises metal particles dispersed in a polymer, and adheres the metal layer to the polyimide substrate.

Abstract: A solvent composition comprising 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane (R52-13), trans-1,2-dichloroethylene (tDCE) and a C1-3 alcohol, wherein the content of R52-13 is from 25.0 to 75.0% (by mass, and the same applies hereinafter), the content of tDCE is from 15.0 to 74.9% and the content of the C1-3 alcohol is from 0.1 to 10.0%, to the total amount of R52-13, tDCE and the C1-3 alcohol. This solvent composition can remove oils and greases and flux with a high cleaning performance.

Abstract: A solvent composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether in an amount of from 25.0 to 75.0% (by mass, and the same applies hereinafter), trans-1,2-dichloroethylene in an amount of from 15.0 to 74.9%, and a C1-3 alcohol in an amount of from 0.1 to 10.0%, to the total amount of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, the trans-1,2-dichloroethylene and the C1-3 alcohol. The solvent composition of the present invention can remove soil such as flux with a high cleaning performance.

Abstract: A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device, wherein cleaning is carried out by immersion or jet flow using the cleaning solution.

Abstract: Methods for cleaning screw extruder, especially powder-coating extruders, include filling the extruder barrel with a gel purge formulation comprised of a high-boiling pyrrolidone or piperidone (lactam) solvent (most preferably N-methyl pyrrolidone (NMP)), thickened with 5-50 wt. % of a thermoplastic resin thickening agent, most preferably polystyrene (PS). Once the extruder barrel is filled with the gel purge formulation, the screws are stopped and the gel allowed to soak for between about 10 to about 30 minutes. The screws are then restarted and the gel is discharged from the extruder. Immediately after the gel purge formulation exits the machine, a small amount of a thermoplastic “rinse” polymer (e.g., polyethylene) may be added so as to remove any vestigial amount of the gel purge formulation therefrom.

Abstract: A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

Abstract: A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

Abstract: A liquid cleaning composition comprising a solvating agent and a rinsing agent, the ratio of the vapor pressure of said rinsing agent to the vapor pressure of said solvating agent being at least about 20 and the use thereof to clean substrates that have soil adhered thereto.

Abstract: A solvent composition comprising dichloropentafluoropropane and (perfluorobutyl) methyl ether, wherein the ratios of the dichloropentafluoropropane and the (perfluorobutyl) methyl ether in the solvent composition are from 10 to 50 wt % and from 50 to 90 wt %, respectively.

Abstract: A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: A cleaning solution for cleaning substrates such as imaging member substrates includes a weak acid, borax or a polyphosphate, an oil-soluble surfactant, and a water-soluble surfactant such as a water-soluble polysorbate, a polyethylene/polypropylene copolymer or a mixture thereof. The cleaning solution increases the cleaning capability of a corresponding cleaning process, and also improves the efficiency of the cleaning process by avoiding the necessity of neutralization and waste treatment operations.

Abstract: A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.

Abstract: The present invention relates to a cleaning liquid which is used for removing an image forming material containing a resin component from surface of a recording medium on which an image is formed by the image forming material in order to permit the recording medium serviceable again as a recording medium, characterized by comprising water, a gelatinizer or a swelling agent which is compatible with water and gelatinizes the resin component of the image forming material, and an enzyme.