Abstract: There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

Abstract: Compositions useful for polishing wafers to be used in microelectronic devices comprise silicon dioxide, aluminum oxide, sodium hydroxide, and water. Cleaning compositions for removing electron wax from wafers to be used in microelectronic devices comprise from about 2 to about 6 percent by weight of ammonium hydroxide, from about 10 to about 22 percent by weight of hydrogen peroxide, and water.

Abstract: A terpene-free hard surface cleaning composition containing: (a) a nonionic surfactant; (b) an anionic surfactant; (c) a primary solvent consisting of a C.sub.6 -C.sub.14 methyl ester; (d) a short-chain cosurfactant; and (e) water, all weights being based on the total weight of the composition.

Abstract: The caustic cleaner of the present invention has a freezing point of no more than about 40.degree. F. The caustic cleaner is a mixture of aqueous sodium hydroxide and an organic salt derived from the reaction of sodium hydroxide and gluconic acid at elevated temperatures.

Abstract: A detergent composition comprising an alkaline metal hydroxide, an alkaline metal salt of L-aspartic-N,N-diacetic acid, optionally a scale inhibitor and/or an alkaline metal salt of gluconic acid. This detergent composition is used for removing soils, stains and other contaminants adhering to or deposited on the surfaces of glass, plastics, metals, etc., specifically the hard surfaces of, for example, containers for foodstuffs such as drinks and process foods, container boxes, piping of food production equipment, tanks, sterilizing plates, plate heat exchangers, filling machines and the like, by such means as soaking the parts to be cleaned in a cleaning solution, circulating a cleaning solution in the facilities to be cleaned, or spraying a cleaning solution over the surfaces to be cleaned. This detergent composition has excellent cleaning performance and excellent biodegradability.

Abstract: The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:(a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25.degree. C., and mixtures of such solvents;(b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR1## wherein R.sup.1 is C.sub.5-20 alkyl, R.sup.2 and R.sup.3 are both C.sub.1-4 alkyl, or --(CH.sub.2).sub.p --OH, although R.sup.2 and R.sup.3 do not have to be equal, and p is 1-6;(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and(d) the remainder as substantially all water.

Abstract: Disclosed are hard surface cleaners such as glass window cleaners. A silicate/hydrophobic acrylic polymer/surfactant composition is used to reduce water spotting, filming or streaking. These cleaners can also include a base and a sequestrant.

Abstract: An improved compound for use as a spray wax and drying aid in automatic vehicle-washing devices. The invention includes an olefin constituent having the general structural formula: ##STR1## wherein R.sub.1 is an alkyl group having between 4 to 28 carbon atoms and a first emulsifier having a cationic constituent. Certain preferred embodiments include a second emulsifier and a coupling agent.

Abstract: A coating composition of an alkoxy silane reacted with the surface of a glass substrate and a cleaning composition and method for cleaning said glass area is disclosed. The coating provides water repellency, durability and ease of cleaning to a glass or other siliceous surface. The coating is formed by applying an excess of an alkoxy solution containing a sulfuric acid to a glass surface with an excess of solution being applied. Preparatory to such coating application, the glass, especially if its surface is a weathered (non-virgin) surface, is cleaned vigorously with a cleaning solution containing water, phosphoric acid, hydrofluoric acid and sulfuric acid.

Abstract: Aqueous, liquid hard surface detergent compositions having improved cleaning and good filming/streaking characteristics contain an amine oxide polymer at critical levels. Preferred formulas contain an amount of PVNO effective to provide an improvement in spotting/filming after at least three rewettings of the glass; hydrophobic solvent; detergent surfactant selected from the group consisting of anionic surfactants, amphoteric detergent surfactants including zwitterionic surfactants; and mixtures thereof; and the balance being an aqueous solvent system comprising water and, optionally, non-aqueous polar solvent.

Abstract: Aqueous glass cleaning compositions with optimal antifog properties contain a quaternary compound and an amphoteric surfactant having the formula ##STR1## wherein: R.sup.1 and R.sup.2 are independently alkyl groups or R.sup.2 is a single bond (wherein R.sup.1 +R.sup.2 is C.sub.6-14), k is 0 or 1, l is 1-6, m is 1-4,R.sup.3 is --CH.sub.2 OH or --COOM (wherein M is H or alkali metal), n is 1-4, p is 1-4 and R.sup.4 is --COOM.

Abstract: The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising:(a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25.degree. C., and mixtures of such solvents;(b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR1## wherein R.sup.1 is C.sub.5-20 alkyl, R.sup.2 and R.sup.3 are both C.sub.1-4 alkyl, ##STR2## or --(CH.sub.2).sub.p --OH, although R.sup.2 and R.sup.3 do not have to be equal, and n is 1-5, and p is 1-6;(c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and(d) the remainder as substantially all water.

Abstract: A cleaning composition comprises water, liquid soap, a polishing agent such as Rottenstone, and alcohol. The cleaning composition is effective for removal of dirt and grime from glass, plastic, floors and other similar surfaces. The cleaning composition disinfects and leaves a shiny surface. The cleaning composition is relatively environmentally friendly.

Abstract: A cleaning solution consisting essentially of dimethyl ester, water and one or more organic solvents completely miscible at 23.degree. C. with dimethyl ester and water, said water present at at least ten weight percent based on the weight of solution components.

Abstract: Detergent compositions comprising nonionic detergent surfactant; unsaturated soap, i.e., oleate and/or ricinoleate; hydrophobic cleaning solvent; and aqueous solvent system. The compositions have excellent detergency properties and excellent filming/streaking properties. Preferred soaps are specific betaaminoalkanolammonium soaps, which provide superior filming/streaking properties as compared to, e.g., sodium soap.

Abstract: Detergent compositions comprising a hydrocarbyl-amidoalkyl-enebetaine synthetic detergent surfactant; cleaning solvent; and buffer provide superior filming/streaking and good cleaning of hard to remove grease soils. Preferred compositions contain at least one cosurfactant. The compositions can be used to clean glass as well as for general cleaning purposes.

Abstract: Aqueous, liquid hard surface detergent compositions contain zwitterionic detergent surfactant and monoethanolamine and/or other specific beta-aminoalkanols as solvents and/or buffers for improved spotting/filming and good cleaning. Some formulas do not contain large amounts of builders and are suitable for general purpose cleaning including cleaning of glass.

Abstract: Detergent compositions having good filming/streaking characteristics contain effective amounts of specific substantive materials to increase the hydrophilicity of the glass. Preferred formulas contain a amphoteric, including zwitterionic, and optionally, but preferably, anionic detergent surfactant at levels (e.g., from about 0.02 to about 15%); hydrophobic solvent; alkaline material, especially volatile alkaline materials comprising monoethanolamine or certain beta-amino-alkanol compounds; and salt of polycarboxylate, preferably polyacrylate, polymer at effective levels (e.g., from about 0.01% to about 10%, by weight of the composition).

Abstract: Aqueous, liquid hard surface detergent compositions having improved cleaning and good filming/streaking characteristics contain specific polycarboxylate detergent builders at critical levels. Preferred formulas contain a zwitterionic/anionic detergent surfactant mixture at levels (e.g., from about 0.02 to about 15%); hydrophobic solvent; alkaline material, especially volatile alkaline materials comprising monoethanolamine or certain beta-amino-alkanol compounds; and salt of ethylenediaminetetraacetic acid as the detergent builder in levels (e.g., from about 0.05% to about 0.5%, by weight of the composition).