Abstract: The present invention relates to a water based nail polish remover composition comprising an anionic surfactant, a water soluble solvent, and water; wherein the anionic surfactant is selected from the group consisting of secondary C6-C22-alkane sulfonate trialcohol amine salts and mixtures thereof. The invention also relates to the use of the composition for removing nail polish.

Abstract: The present invention relates to a stable mixture comprising surface-modified particles which are obtained by reacting metal oxide or semimetal oxide particles with at least one compound selected from among silicon-comprising compounds bearing one, two or three alkoxy radicals and at least one solvent, at least one surface-active substance or a mixture thereof, the use of these particles in systems in which they are brought into contact with at least one solvent, where the mass ratio of solvent to modified particle is greater than 500, and also the use of these particles in agglomeration-deagglomeration cycles.

Abstract: The antimicrobial composition of the present invention comprises a cationic active ingredient, a quaternized sugar-derived surfactant, and an optional foam boosting surfactant. These formulations have a high cidal activity in a short amount of time and provide stable copious foam. The formulations of the present invention also exhibit enhanced tissue (e.g. skin) compatibility as defined by an in vitro whole toxicology assessment method.

Abstract: Various low VOC compositions of the present disclosure may be suitable for use as surface cleaners. In an exemplary embodiment, the disclosed composition may be used to clean membranes used on roofs and in the roofing industry. In an exemplary embodiment, the disclosed composition comprises various concentrations of soy extract and parachlorobenzotrifluoride (PCBTF). In an embodiment, the composition may further include a VOC and a filler.

Abstract: A liquefied-gas aerosol dusting composition for preventing inhalation abuse incidents. The composition comprises at least one liquefied gas and Sucrose Octaacetate wherein the concentration of said aerosol dusting composition ranges from 5 ppm to about 50 ppm.

Abstract: Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z—R1CH?CHR2, wherein R1 and R2 are, independently, C1 to C6 perfluoroalkyl groups, or C1 to C6 hydrofluoroalkyl groups, and recovering the surface from the composition.

Abstract: Graffiti removal compositions has been developed and are disclosed that when coupled with reliable methods: a) consistently removes graffiti and other unwanted or undesirable paint, inks or permanent markers from a surface, b) is packaged such that it is easily transported, c) is easy to use and requires no additional on-site additives or special equipment, and d) utilizes less harmful chemicals and lower concentrations of chemicals that may be considered harmful. Graffiti removal compositions are described that include: at least one alcohol-based compound, at least one aromatic compound, at least one halogenated compound, at least one hydrocarbon; and at least one lactam-based compound.

Abstract: The present invention relates to perfluorobutyl ether mixtures or compositions that are azeotropic or of azeotropic type. More particularly, one subject of the invention is compositions comprising at least one nonafluorobutyl alkyl ether and a biodegradable compound, capable of being used as a solvent or refrigerant.

Abstract: A composition and methods of use for the decontamination of chemical agents, including chemical warfare agents. The decontamination composition is nontoxic, nonflammable and non-corrosive and includes an effective amount of a perfluorinated alkyl bromide or reactive perfluorinated alkyl bromide. The decontamination composition may include an oxidizer and a solvent.

Abstract: Disclosed are compositions and methods for cleaning contaminated articles based on the provision of a zeotropic composition comprising (a) at least one flammable solvent having a boiling point at a first pressure; (b) at least one first nonflammable solvent having a boiling point at said first pressure which is less than about said first pressure boiling point of said flammable solvent; and (c) at least one second nonflammable solvent having a boiling point at said first pressure which is greater than about the first pressure boiling point of said flammable solvent.

Abstract: A process and a composition are disclosed for producing surfaces that are self-cleaning by water, and in particular, there is disclosed an aqueous system for forming transparent self-cleaning surfaces. In the process, an aqueous mixture comprising (i) nanoparticles having a particle size of less than 300 nanometers and (ii) a surface modifier selected from the group consisting of water-soluble hydrophobic surface modifiers and water-dispersable hydrophobic surface modifiers capable of forming a continuous film from an aqueous solution is provided. The aqueous mixture is applied to a surface, and a self-cleaning transparent coating is formed on the surface upon water evaporation. In one embodiment, the aqueous mixture is essentially free of organic solvents other than coalescing solvents.

Abstract: A water-in-oil emulsion composition is disclosed. The composition contains (A) a solvent, (B) water, and (C) a surfactant. This composition is suitable for removing non-aqueous coatings such as paints and the like as well as waxes and greases from substrates.

Abstract: A solvent composition for dissolving plastic comprises at least either isopropyl bromide or n-propyl bromide, and at least either nitromethane or nitroethane. The content of the above-mentioned at least either nitromethane or nitroethane is 5 through 50 wt % with respect to the entire amount of the solvent.

Abstract: Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing aqueous composition comprising a fluoride containing compound; a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof.

Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

Abstract: The invention provides azeotrope-like compositions consisting essentially of 1,1,1,3,3-pentafluorobutane and a fluorinated ketone, RfC(O)CF(CF3)2, where Rf is CF3CF2, CF3CF2CF2, or (CF3)2CF.

Abstract: Compounds each having a —CH2—CHF— group and a number of carbon atoms of 4 or above are prepared by hydrogenating a compound having a —CCl═CF— group and a number of carbon atoms of 4 or above in the presence of a noble metal catalyst in a liquid or gas phase. The compound having a —CCl═CF— group and a number of carbon atoms of 4 or above is preferably a C4-C10 alicyclic one, and can be prepared by reacting a compound having a —CCl═CCl— group and a number of carbon atoms of 4 or above with a fluorinating agent.

Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

Abstract: This invention provides an improved composition and process for pretreatment of aluminum prior to electroplating. The invention is an aqueous composition comprised of an acid, an oxidizing agent, and, optionally, a halogenated compound.

Abstract: An aqueous composition comprising ammonium hydroxide in an amount of about 1 to about 30% by weight calculated as NH3 and a surface active agent represented by the formula XF2C(CFY)nSO3A wherein X=F, OH or SO3A; Y=F, H, OH or may be omitted thereby creating a double bond; n=1-12; A=NH4+, H+, Na+, K+, Li+, R+ or organic amine cation and R is 1-4 straight chain alkyl group; and wherein the fluoroalkyl group is a linear group; and wherein the surface active agent is present in an amount of about 5 ppm to about 2000 ppm is useful for cleaning photomasks and especially chromium photomasks.

Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: A process for the removal of poly(arylene sulfide) based deposits from an article by contacting said poly(arylene sulfide) based deposits with a polar aprotic compound, a base, an organosulfur compound having the formula:R.sub.1 --S--S--R.sub.2,wherein R.sub.1 and R.sub.2 are hydrocarbon radicals having from 1 to 50 carbon atoms per radical, and optionally, a halogenated aromatic compound.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: Use of solvents capable of removing oily substances without solubilizing them, consisting of hydrofluoropolyethers having the general formulaHF.sub.2 CO(CF.sub.2 O).sub.n (CF.sub.2 CF.sub.2 O).sub.m CF.sub.2 Hwherein n and m are integers comprised between 0 and 20, excluding when m and n are contemporaneously 0, and having boiling point from 30.degree. to 200.degree. C. and having a molar ratio 0/C comprised between 0.5-1.

Abstract: A paint-stripping composition comprises, on a weight basis, at least 20% of a benzyl alcohol, together with 5-30% of methylene chloride, 1-10% of hydrogen peroxide and 10-60% of water. The composition may also include auxiliary ingredients such as thickeners, evaporation retardants, surfactants, pH control agents, accelerators, corrosion inhibitors, preservatives, coloring agents, and fragrances.

Abstract: There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

Abstract: Reworkable encapsulant formulations are being developed to allow recovery of part-good microelectronic assemblies. According to this invention, a gelled form of the solvent is useful for removing the reworkable encapsulant from a specific region of the assemblies without affecting components on the assembly which do not need to be reworked. This novel method eliminates expensive tooling that would otherwise be required to handle the solvent.

Abstract: A cleaning agent characterized in that the agent comprises 0.1 to 4 wt. % of hydrofluoric acid, a surfactant of the following formula (1) in a concentration of 50 to 1500 ppm or a surfactant of the following formula (2) or (3) in a concentration of 50 to 100000 ppm, and the balance water, and a cleaning method of the surfaces of silicon wafers and the like using the agentRfCOONH.sub.4 (1)wherein Rf is a fluorine-containing hydrocarbon group having 5 to 9 carbon atomsRf'O(CH.sub.2 CH.sub.2 O)nR (2)Rf'(CH.sub.2 CH.sub.2 O)nR (3)wherein Rf' is a fluorine-containing hydrocarbon group having 5 to 15 carbon atoms, R is hydrogen or alkyl having 1 to 4 carbon atoms, and n is 5 to 20.

Abstract: Disclosed is a single phase liquid composition comprising 0.5 to 30 wt % of a benzotrifluoride solvent, about 0.5 to about 50 wt % of a glycol ether cosolvent, up to about 50 wt % of an alkanol, up to about 10 wt % of a surfactant, and the remainder water. The composition is effective in cleaning hard surfaces, stripping paint, and as a carrier.

Abstract: A solvent that will remove all types of commercially available water soluble polymers by breaking the covalent bonds within the polymer molecules such that these polymers can then be removed from all surfaces and equipment completely and safely by washing away with water.The solvent consists of (in a 21/2 gallon concentrated solution) 4% of ammonium chloride, 29% of ammonium hydroxide, and 67% water.