Alkali Metal Hydroxide Component Patents (Class 510/272)
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Patent number: 10611986Abstract: Disclosed herein are cleaning compositions including water, at least one cationic surfactant, and at least one nonionic surfactant.Type: GrantFiled: March 13, 2019Date of Patent: April 7, 2020Assignee: Earthcare Labs, LLCInventor: Gary E. Schultz
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Patent number: 9023780Abstract: The use of ferric hydroxycarboxylate as a chelator and builder for cleaning compositions is disclosed. The cleaning composition may be formulated for warewashing, laundering, and for other means of removing soils and includes a ferric hydroxycarboxylate, an alkalinity source and a surfactant system. The cleaning composition has a pH of between about 9 and about 12.Type: GrantFiled: August 27, 2013Date of Patent: May 5, 2015Assignee: Ecolab USA Inc.Inventor: Altony Miralles
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Publication number: 20150118399Abstract: The present invention relates to a galvanization process that comprises a residue cleanup step which aims to provide many improvements and facilities to manufacturers and processors of metal wires in general. The process of this invention removes the use of lead of the conventional wire cleaning process for galvanization and incorporates a step with a stearate removing composition which maximizes the galvanization efficiency and reduces lead acquisition and energy costs to heat said lead, and avoids handling of lead and oxide formed on its surface. Thus, the process of this invention makes the environment less insalubrious and reduces the impact of this activity on the environment.Type: ApplicationFiled: May 7, 2013Publication date: April 30, 2015Applicant: OXIPRANA INDUSTRIA QUIMICA LTDAInventor: Luiz Guerra Galvão Filho
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Patent number: 8945314Abstract: A solid composition includes a polysaccharide hybrid polymer composition and a hydratable salt. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from approximately 5% to 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from approximately 10% to 75% by weight of the polysaccharide hybrid polymer composition.Type: GrantFiled: July 30, 2012Date of Patent: February 3, 2015Assignee: Ecolab USA Inc.Inventors: Kerrie E. Walters, Carter Silvernail
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Publication number: 20150018262Abstract: A presoak cleaning compound and cleaning process developed for compatible application to aluminum and common cooking surfaces including stainless steel, steel, ferrous, plastic or coated cooking surfaces including baking pans and sheet pans, or commonly used substrate materials for food preparation and cooking surfaces of food stuffs for the removal of food soils, baked on food soils, and soils resulting from the preparation and cooking of food stuffs without discoloration, tarnishing, or pitting of the surface.Type: ApplicationFiled: July 10, 2014Publication date: January 15, 2015Inventors: Suhall Massad, Bin Wu, Chris Allan Shewmaker, Sekhar Katta, Enrique Francis, Robert Beach, Teresa Wolf, Clark Miller, Stanley R. Weller
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Patent number: 8883711Abstract: The invention relates to a cleaning composition with improved stain removal. The alkaline composition contains a hydrolysable dispersing polymer which is selected from carboxylated fructans and one or more biodegradable aminocarboxylate chelating agents.Type: GrantFiled: May 19, 2011Date of Patent: November 11, 2014Assignee: Italmatch Chemicals SpAInventors: Isabelle Leonard, Valerie Kochowski, Genevieve Bonnechere-Delstanche, Olivier Henry
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Patent number: 8871699Abstract: Detergent compositions effective for controlling hard water scale accumulation are disclosed. Detergent compositions employing phosphinosuccinic acid and mono-, bis- and oligomeric phosphinosuccinic acid (PSO) derivatives with alkali metal carbonate and/or alkali metal hydroxide reduce had water scale accumulation on treated surfaces at alkaline conditions between about pH of 9 and 12.5. Methods employing the detergent compositions and preventing hard water scale accumulation are also provided.Type: GrantFiled: September 13, 2012Date of Patent: October 28, 2014Assignee: Ecolab USA Inc.Inventors: Carter Martin Silvernail, Erik C. Olson
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Patent number: 8853144Abstract: A composition includes a polysaccharide graft polymer composition. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition.Type: GrantFiled: July 30, 2012Date of Patent: October 7, 2014Assignee: Ecolab USA Inc.Inventors: Carter Silvernail, Erik C. Olson, Klin Rodrigues
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Patent number: 8841246Abstract: A composition includes a polysaccharide hybrid polymer composition. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide hybrid polymer composition.Type: GrantFiled: July 30, 2012Date of Patent: September 23, 2014Assignee: Ecolab USA Inc.Inventors: Carter Silvernail, Erik C. Olson, Klin Rodrigues
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Patent number: 8679366Abstract: A composition includes a polysaccharide graft polymer composition and 2-phosphonobutane-1,2,4-tricarboxylic acid. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from approximately 5% to approximately 90% by weight of the polysaccharide graft polymer composition and a residue of acrylic acid, methacrylic acid or a combination thereof present in an amount from approximately 10% to approximately 75% by weight of the polysaccharide graft polymer composition.Type: GrantFiled: July 30, 2012Date of Patent: March 25, 2014Assignee: Ecolab USA Inc.Inventors: Carter Silvernail, Erik C. Olson
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Publication number: 20140073549Abstract: Detergent compositions effective for controlling hard water scale accumulation are disclosed. Detergent compositions employing phosphinosuccinic acid and mono-, bis- and oligomeric phosphinosuccinic acid (PSO) derivatives with alkali metal carbonate and/or alkali metal hydroxide reduce had water scale accumulation on treated surfaces at alkaline conditions between about pH of 9 and 12.5. Methods employing the detergent compositions and preventing hard water scale accumulation are also provided.Type: ApplicationFiled: September 13, 2012Publication date: March 13, 2014Applicant: ECOLAB USA INC.Inventors: Carter Martin Silvernail, Erik C. Olson
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Patent number: 8636918Abstract: A composition includes an anionic polysaccharide hybrid polymer composition and 2-phosphonobutane-1,2,4-tricarboxylic acid. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from approximately 5% to approximately 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from approximately 10% to approximately 75% by weight of the polysaccharide hybrid polymer composition.Type: GrantFiled: July 30, 2012Date of Patent: January 28, 2014Assignee: Ecolab USA Inc.Inventors: Carter Silvernail, Erik C. Olson
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Patent number: 8632955Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.Type: GrantFiled: June 15, 2012Date of Patent: January 21, 2014Assignee: Hydro Aluminium Deutschland GmbHInventors: Bernhard Kernig, Henk Jan Brinkman
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Patent number: 8536106Abstract: The use of ferric hydroxycarboxylate as a chelator and builder for cleaning compositions is disclosed. The cleaning composition may be formulated for warewashing, laundering, and for other means of removing soils and includes a ferric hydroxycarboxylate, an alkalinity source and a surfactant system. The cleaning composition has a pH of between about 9 and about 12.Type: GrantFiled: April 14, 2010Date of Patent: September 17, 2013Assignee: Ecolab USA Inc.Inventor: Altony Miralles
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Patent number: 8426349Abstract: A chlorinated alkaline cleaning agent and methods for removing food soils with no resultant increase in foam generation. Particularly advantageous is that the addition of methanesulfonic acid in removing food soils with no resultant increase in foam generation.Type: GrantFiled: May 29, 2009Date of Patent: April 23, 2013Assignee: DeLaval Holding ABInventor: Alan Monken
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Patent number: 8354365Abstract: Provided are a cleaning liquid for lithography that exhibits excellent corrosion suppression performance in relation to ILD materials, and excellent removal performance in relation to a resist film and a bottom antireflective coating film, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for lithography according to the present invention includes a quaternary ammonium hydroxide, a water soluble organic solvent, water, and an inorganic base. The water soluble organic solvent contains a highly polar solvent having a dipole moment of no less than 3.0 D, a glycol ether solvent and a polyhydric alcohol, and the total content of the highly polar solvent and the glycol ether solvent is no less than 30% by mass relative to the total mass of the liquid for lithography.Type: GrantFiled: January 28, 2011Date of Patent: January 15, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takuya Ohhashi, Masaru Takahama, Takahiro Eto, Daijiro Mori, Shigeru Yokoi
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Patent number: 8343903Abstract: There is disclosed a cleaning composition comprising (i) 0.1 to 10 percent by weight of the cleaning composition of a biofilm removing detergent solution comprising a combination of an alkyl (C8-18) polysaccharide, a non-ionic surfactant and a nitrogen containing surfactant-biocide (ii) 2 to 80 percent by weight of the cleaning composition of one or more polar solvent (iii) 0.5 to 15 percent by weight of the cleaning composition of one or more primary amine (iv) two or more chelating agents (v) 0.1 to 5.0 percent by weight of the cleaning composition of an alkaline buffer system providing a pH of about 11.5 to 13.3 in aqueous solution (vi) 0.005 to 5.0 percent by weight of the cleaning composition of an alkoxyaminosilane. Also disclosed is a process of cleaning, decontaminating and/or passivating metallic surgical instruments and/or equipment using the composition of the invention.Type: GrantFiled: July 16, 2009Date of Patent: January 1, 2013Assignee: Whiteley Holdings Pty LtdInventor: Reginald Keith Whiteley
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Patent number: 8282743Abstract: Alkaline cleaning compositions that are useful to remove burnt-on and/or baked-on soil deposits and grease are described. The alkaline cleaning compositions comprise a buffering system of a strong base and an organic acid such that the pH is maintained in the range of about 10 to about 11.2. Also described are methods of removing burnt-on or baked on soil deposits or grease.Type: GrantFiled: December 18, 2007Date of Patent: October 9, 2012Assignee: Colgate-Palmolive CompanyInventors: Genevieve Bonnechere, Baudouin Mertens
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Patent number: 8211622Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.Type: GrantFiled: April 5, 2006Date of Patent: July 3, 2012Assignee: Hydro Aluminium Deutschland GmbHInventors: Bernhard Kernig, Henk Jan Brinkman
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Patent number: 8206509Abstract: Provided are a cleaning liquid for lithography that exhibits excellent corrosion suppression performance in relation to tungsten, and excellent removal performance in relation to a resist film or the like, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for lithography according to the present invention includes a quaternary ammonium hydroxide, a water-soluble organic solvent, water, an inorganic salt and an anti-corrosion agent represented by a general formula (1) below. In the general formula (1), R1 represents an alkyl group or an aryl group having 1-17 carbon atoms, and R2 represents an alkyl group having 1-13 carbon atoms.Type: GrantFiled: December 1, 2010Date of Patent: June 26, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Eto, Takuya Ohhashi, Masaru Takahama, Daijiro Mori, Akira Kumazawa
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Publication number: 20120115766Abstract: As a method for producing a degreasing composition in the form of a slurry, crystallization of the composition during low-temperature storage being suppressed and the composition being used for preparing a cleaning liquid having little environmental impact, provided is a method including a step of obtaining a slurry by mixing a first liquid and a powdery silicate having a particle diameter ranging from 0.2 mm to 10 mm, wherein the first liquid contains an alkaline component composed of at least one of sodium hydroxide and potassium hydroxide, an alcohol having three or fewer carbon atoms, and water; and the degreasing composition contains, with respect to the total composition, 10 mass % to 60 mass % of the alkaline component, 0.1 mass % to 5 mass % of the alcohol, 1 mass % to 50 mass % of the silicate, and 20 mass % to 50 mass % of water including hydration water of the silicate, and contains no chelating agent.Type: ApplicationFiled: May 31, 2010Publication date: May 10, 2012Applicant: Yuken Industry Co., Ltd.Inventors: Naruhiko Nojima, Yusaku Ishihara, Hideyuki Yamamoto
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Patent number: 7998917Abstract: A visually enhancing degreaser/cleaning composition for removing grease stains adhering to metallic surfaces in the kitchen. The cleaning composition in powder form includes an alkali metal hydroxide, trialkali phosphates, and either polychlorinated copper phthalocyanine or hydrated chromium sesquioxide.Type: GrantFiled: June 18, 2009Date of Patent: August 16, 2011Inventor: Joel F. Palmore
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Patent number: 7879787Abstract: An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.Type: GrantFiled: May 27, 2010Date of Patent: February 1, 2011Assignee: American Sterilizer CompanyInventors: Stavroula Maria Heintz, Shannon K. Campbell, Gurusamy Manivannan
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Patent number: 7781388Abstract: An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.Type: GrantFiled: May 4, 2006Date of Patent: August 24, 2010Assignee: American Sterilizer CompanyInventors: Stavroula Maria Heintz, Shannon K. Campbell, Gurusamy Manivannan
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Patent number: 7709435Abstract: There is provided an alkaline cleaning of aluminum alloy, in which the attained corrosion resistance is equal or superior to the acidic cleaning agent, and which mitigates the disadvantages of the acidic cleaning agent, such as corrosion of plant, processing of the waste liquid, and energy cost, and which attains improved productivity. The cleaning liquid from 0.5 to 40 g/L in total of one or more alkali builders selected from alkali metal hydroxide, alkali metal carbonate, inorganic alkali metal phosphate and alkali metal silicate, from 0.2 to 10 g/L of one or more of organic phosphonic acid and its salt (A), from 0.001 to 2 g/L of one or more metallic ions (B) selected from metallic ions having from 5.0 to 14.0 of stability constant with the organic phosphonic acid and its salt, and from 0.1 to 10 g/L of surfactant. Particularly, the weight ratio of (A):(B) is in a range of from 100:0.05˜20.Type: GrantFiled: August 27, 2004Date of Patent: May 4, 2010Assignees: Nihon Parkerizing Co., Ltd., Tokyo Seikan Kaisha Ltd.Inventors: Kazuya Hino, Yasuo Iino, Ryoji Morita, Akio Shimizu, Kazuhisa Masuda, Shozo Ichinose, Shozo Sakurama
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Patent number: 7671006Abstract: The present invention relates to the use of phosphated 2-propylheptanol or a phosphated 2-propylheptanol alkoxylate as a hydrotrope in aqueous alkaline solutions for a C8-C18-alcohol alkoxylate containing 1-20 ethyleneoxy units. It also relates to a phosphated 2-propylheptanol alkoxylate per se, and an alkaline cleaning composition comprising a C8-C18-alcohol alkoxylate containing 1-20 ethyleneoxy units and phosphated 2-propylheptanol and/or a phosphated 2-propylheptanol alkoxylate as a hydrotrope. The cleaning compositions may be used for industrial cleaning of hard surfaces, for example for vehicle cleaning or machine dishwashing.Type: GrantFiled: November 10, 2008Date of Patent: March 2, 2010Assignee: Akzo Nobel N.V.Inventors: Mahnaz Company, Magnus Franck, Anette Thyberg
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Patent number: 7662238Abstract: Prepackaged cleaning compositions are described which are suitable for on-site dilution, and for cleaning substrates such as air conditioner coils.Type: GrantFiled: May 31, 2007Date of Patent: February 16, 2010Assignee: Germany Company, Inc.Inventors: Scott Garner, Joseph Raible
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Patent number: 7578968Abstract: Processes for effecting biocidal activity in subterranean oil and gas wells being drilled, completed, worked over or produced are described. In general the process comprises blending with aqueous well fluid a biocidally-effective amount of a sulfamate stabilized, bromine-based biocide. Compositions comprised of aqueous well fluid blended with such aqueous biocides are also described.Type: GrantFiled: May 3, 2002Date of Patent: August 25, 2009Assignee: Albemarle CorporationInventors: Christopher J. Nalepa, Joel F. Carpenter
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Patent number: 7498295Abstract: This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the wafer surface without significantly etching the metal, leaving deposits on the surface, or imparting significant contamination to the wafer while also protecting the metal from oxidation and corrosion. Additionally, at least one strong chelating agent is present to complex metal ions in solution, facilitating the removal of metal from the dielectric and preventing re-deposition onto the wafer.Type: GrantFiled: July 31, 2007Date of Patent: March 3, 2009Assignee: Air Liquide Electronics U.S. LPInventors: Matthew L. Fisher, Ashutosh Misra
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Patent number: 7456144Abstract: The present invention relates to the use of phosphated 2-propylheptanol or a phosphated 2-propylheptanol alkoxylate as a hydrotrope in aqueous alkaline solutions for a C8-C18-alcohol alkoxylate containing 1-20 ethyleneoxy units. It also relates to a phosphated 2-propylheptanol alkoxylate per se, and an alkaline cleaning composition comprising a C8-C18-alcohol alkoxylate containing 1-20 ethyleneoxy units and phosphated 2-propylheptanol and/or a phosphated 2-propylheptanol alkoxylate as a hydrotrope. The cleaning compositions may be used for industrial cleaning of hard surfaces, for example for vehicle cleaning or machine dishwashing.Type: GrantFiled: July 8, 2005Date of Patent: November 25, 2008Assignee: Akzo Nobel N.V.Inventors: Mahnaz Company, Magnus Franck, Anette Thyberg
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Patent number: 7442675Abstract: A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresist film, a buried material, a metallic residue from the surface of a semiconductor substrate.Type: GrantFiled: June 10, 2004Date of Patent: October 28, 2008Assignees: Tokyo Ohka Kogyo Co., Ltd., Intel CorporationInventors: Shigeru Yokoi, Kazumasa Wakiya, Takayuki Haraguchi, Makarem A. Hussein, Lana I. Jong, Shan Christopher Clark
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Patent number: 7435712Abstract: This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the wafer surface without significantly etching the metal, leaving deposits on the surface, or imparting significant contamination to the wafer while also protecting the metal from oxidation and corrosion. Additionally, at least one strong chelating agent is present to complex metal ions in solution, facilitating the removal of metal from the dielectric and preventing re-deposition onto the wafer.Type: GrantFiled: October 1, 2004Date of Patent: October 14, 2008Assignee: Air Liquide America, L.P.Inventors: Ashutosh Misra, Matthew L. Fisher
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Publication number: 20080221006Abstract: An aqueous, alkaline cleaning composition for use on hard-to-clean soils, encountered in pharmaceutical, personal care, food and cosmetic manufacturing, comprising a source of alkalinity, a biodegradable surfactant system further comprising one or more surfactants, one or more hydrotropes, and a UV-analyzable surfactant, and a biodegradable chelating agent. The composition offers unique advantages of stability over the expected shelf life, low-foaming property, phosphate-free and biodegradable components, and unexpectedly enhanced antimicrobial, including virucidal, activity in one cleaning composition. The UV-analyzable surfactant allows for validation of cleaning processes using known techniques for manufacturers who are required or desire to do so.Type: ApplicationFiled: March 8, 2007Publication date: September 11, 2008Inventors: Christopher C. Heisig, Shahin Keller, John Macauley, Gurusamy Manivannan, Daniel Klein, Michael Ebers
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Patent number: 7384902Abstract: The present invention provides a metal brightener and surface cleaner, which provides significant etching of aluminum and other metals, without detrimentally affecting other surfaces such as painted surfaces, glass, rubber and plastic. The inventive composition is especially suited for aluminum brightening for large vehicles, and may be utilized in an alkaline step of a multi-step vehicle wash. One of the exemplary compositions includes an alkali metal hydroxide; a polycarboxylic acid; an alkali metal salt of an organic acid; a first, amphoteric surfactant; a second, betaine surfactant; and a third, nonionic surfactant.Type: GrantFiled: May 14, 2004Date of Patent: June 10, 2008Assignee: Cleaning Systems, Inc.Inventors: Vladimir Chernin, Ronald W. Kubala, Richard Martens
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Patent number: 7323436Abstract: An adduct that has an acidic solution of sparingly-soluble Group IIA complexes (“AGIIS”) and at least one additive. The AGIIS can be prepared by mixing a mineral acid (such as sulfuric acid), and a Group IIA hydroxide (such as calcium hydroxide) or a Group IIA salt of a dibasic acid (such as calcium sulfate), or a mixture of the two Group IIA compounds, followed by removing the solid formed. The additives can be an alcohol, an organic acid or a surface active agent. The composition has various uses, including cleaning, food production, decontamination, bioremediation, agricultural application, medical application, and detoxification of substances.Type: GrantFiled: August 19, 2002Date of Patent: January 29, 2008Assignee: Mionix CorporationInventors: Maurice Clarence Kemp, Robert B. Lalum, Zhong Wei Xie, Michael A. Cunha, Robert H. Carpenter, Zhang Shu, Yao Yu, David E. Lewis
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Patent number: 7312186Abstract: A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator: CH3—(CH2)l—O—(CmH2mO)n—X ??(1) wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group; CH3—(CH2)a—O—(CbH2bO)d—(CxH2xO)y—X ??(2) wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.Type: GrantFiled: January 5, 2004Date of Patent: December 25, 2007Assignees: Kanto Chemical Co., Inc., NEC Electronics CorporationInventors: Masayuki Takashima, Yoshiko Kasama, Hiroaki Tomimori, Hidemitsu Aoki
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Patent number: 7151080Abstract: A composition for stripping and cleaning organic coatings from substrates, comprising a solution of high-boiling alcohols, preferably polyglycols, a surfactant, preferably a nonylphenol ethoxylate, and an alkali metal hydroxide, said composition being essentially free of any amines. The composition aggressively and effectively strips paints and other organic coatings without harming underlying substrates damaged by prior art strippers, over conventional or lower time periods, and at conventional or lower temperatures. One embodiment of the invention comprises from about 40% to about 98.9% by weight of a high-boiling alcohol; from about 1% to about 60% of a non-ionic surfactant; and from about 0.1% to about 10% of an alkali hydroxide or mixture of alkali hydroxide.Type: GrantFiled: February 14, 2005Date of Patent: December 19, 2006Assignee: Kolene CorporationInventors: Rick Anthony Dostie, James Christopher Malloy
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Patent number: 7071153Abstract: The present invention is directed to a method of enhancing the appearance of a soiled porous surface. The inventive method includes applying a concentrated, alkaline, cleaning composition to the soiled porous surface. This concentrated, alkaline, cleaning composition is then allowed to remain on the surface for a period of time before it is rinsed with water. After drying, a maintainer composition is then applied to the surface. The maintainer composition includes a pore-filling component. The cleaning composition includes an alkaline source and, optionally, a solvent.Type: GrantFiled: April 29, 2004Date of Patent: July 4, 2006Assignee: JohnsonDiversey, Inc.Inventors: Paul F. Lewis, Nathan E. Ludtke
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Patent number: 6984614Abstract: A composition for removing paraffin, wax, or asphaltine deposits from the surface of a crude oil transmission system, such as a downhole tubular, a pipeline, or a surface tank, includes an aqueous sodium hydroxide solution containing from 18% to 25% by weight sodium hydroxide. The composition further includes an acetic acid solution containing from 30% to 55% by weight acetic acid compared to the sodium hydroxide, and a liquid aromatic hydrocarbon having from 6 to 10 carbon atoms and from 15% to 40% by weight compared to the sodium hydroxide. According to the method of the invention, the aqueous sodium hydroxide solution may be metered in a downhole tubular or a pipeline separate from the acetic acid solution, such that heat generated by the mixed composition is generated within the downhole tubular or the pipeline.Type: GrantFiled: January 10, 2005Date of Patent: January 10, 2006Inventor: Jerome S. Als
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Patent number: 6946432Abstract: The anti-foaming preparations comprise aqueous formulations, which contain at least one substance, from the group of polyhydroxy compounds, non-ionic detergents and phosphoric acid esters and their salts, preferably alkyl polygluocosides, alkoxylated long-chain alcohols and an alkali salt of a phosphoric acid partial-ester. The particular advantage of said aqueous formulations is that they are stable when included in highly alkaline cleaning concentrates.Type: GrantFiled: November 30, 2000Date of Patent: September 20, 2005Assignee: Ecolab GmbH & Co. OHGInventors: Siegfried Bragulla, Peter Schwarz
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Patent number: 6727214Abstract: A process of cleaning very sparingly water soluble soaps off workpieces after cold forming them is made considerably more economical by using a cleaning solution that causes the removed soap anions to form a separate floating solid phase that can easily be skimmed from the surface of the cleaning solution. When such a separation is made, much longer intervals between replacement of the cleaning solution are possible while still obtaining satisfactory results. A preferred cleaning solution for such a process comprises hydroxides, neutral salts, polymeric quaternary ammonium cations, and a sequestering agent for the counterions of the soap anions to be cleaned.Type: GrantFiled: April 15, 2002Date of Patent: April 27, 2004Assignee: Henkel CorporationInventors: Richard J. Church, Paul A. Kulongowski
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Patent number: 6664220Abstract: A solution capable of removing adherent organic material from the surface of a solid substrate at room temperature. The solution includes a first solvent, preferably water, having dissolved therein: up to 2% alkali metal silicates, a source of alkalinity that is substantially free of alkali metal hydroxide ions, an organic solvent, and an amount of hydrotrope effective to render the organic solvent or solvents soluble in the solution, an amino alcohol may be included, at least one surfactant, and a corrosion inhibitor may be included. The solution should have an alkaline pH less than about 12. The solution is used to remove the adherent organic material by soaking the object having such material thereon in such a solution, preferably at room temperature.Type: GrantFiled: April 4, 2001Date of Patent: December 16, 2003Assignee: Kay Chemical, Inc.Inventors: Jennifer Riley Mayhall, Eddie D. Sowle, Charles Allen Hodge
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Patent number: 6475296Abstract: The present invention relates to a degreasing composition, to a liquid, to a gel and to a degreasing foam which comprise said composition. The composition according to the invention comprises a base, a polyethoxylated fatty alcohol, saturated or unsaturated, a copolymer of ethylene oxide and propylene oxide, and water. The invention also relates to a degreasing and/or decontamination process of a surface using said composition, said liquid, said gel, and/or said degreasing foam.Type: GrantFiled: January 25, 2001Date of Patent: November 5, 2002Assignees: Electricite de France, Commissariat A l'Energie Atomique, Compagnie Generale des Matieres NucleairesInventors: Jean-Paul Gauchon, Jacques Delagrange, Maria Faury, Bruno Fournel
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Patent number: 6448211Abstract: A composition for adding to an aqueous rinse which is applied to a ferrous metal surface after treatment of the ferrous metal surface with an aqueous acid solution is disclosed. The composition includes a base. The base is present in the composition in an amount sufficient to adjust the pH of the aqueous rinse to a value greater than 7.0 after the composition is added to the aqueous rinse. The composition also includes a salt of gluconic acid. The composition further includes a polyquaternium compound. An associated method for inhibiting stain formation on a ferrous metal surface is also disclosed.Type: GrantFiled: September 11, 2000Date of Patent: September 10, 2002Assignee: Crown Technology, Inc.Inventors: Joseph C. Peterson, Darren R. Bowman, Tucker D. Maurer
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Patent number: 6440917Abstract: Problems of extensive foaming and/or of sticky deposits on process equipment that often arise when metal soaps from metal articles that have been given a metal soap containing surface to aid in drawing are removed with aqueous alkaline clearners can be avoided by including in the cleaners used anions such as calcium and magnesium that are capable of precipitating the anions of the metal soaps. The cleaners advantageously also contain chelants, a mixture of nonionic and anionic surfactants, and phosphorus containing anions. Anions from the metal soaps are eventually precipitated from the cleaners used as non-sticky sludge that can be easily separated from the cleaners.Type: GrantFiled: April 27, 2000Date of Patent: August 27, 2002Assignee: Henkel CorporationInventors: Richard J. Church, Kenneth J. Hacias
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Patent number: 6436891Abstract: An adduct that has an acidic solution of sparingly-soluble Group IIA complexes (“AGIIS”) and at least one additive. The AGIIS can be prepared by mixing a mineral acid (such as sulfuric acid), and a Group IIA hydroxide (such as calcium hydroxide) or a Group IIA salt of a dibasic acid (such as calcium sulfate), or a mixture of the two Group IIA compounds, followed by removing the solid formed. The additives can be an alcohol, an organic acid or a surface active agent. The composition has various uses, including cleaning, food production, decontamination, bioremediation, agricultural application, medical application, and detoxification of substances.Type: GrantFiled: February 9, 2000Date of Patent: August 20, 2002Assignee: Mionix CorporationInventors: Maurice Clarence Kemp, Robert B. Lalum, Zhong Wei Xie, Michael A. Cunha, Robert H. Carpenter, Zhang Shu, Yao Yu, David E. Lewis
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Patent number: 6432899Abstract: Cleaning and deoxidizing aluminum surfaces can be accomplished simultaneously by contacting the surfaces with an aqueous liquid composition that contains as its cleaning active ingredients (i) alcohols and/or ether alcohols, (ii) alkaline builders, and (iii) alkali stable surfactants, and, optionally but preferably, also contains fluoride and chelating agents.Type: GrantFiled: July 13, 2000Date of Patent: August 13, 2002Assignee: Henkel CorporationInventor: Terry D. Sjostrom
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Patent number: 6331514Abstract: A method and application of a disinfecting solution which comprises adding to an acid the chemical equivalent of a metal chloride plus a metal compound wherein the metal compound is one of a hydride, oxide or hydroxide and the metal is selected to form a precipitate with said acid. The precipitate is filtered from the solution leaving a deanionated chlorided hydronium complex that is non corrosive to human tissue yet has powerful disinfecting properties. Calcium is the preferred metal.Type: GrantFiled: May 7, 1999Date of Patent: December 18, 2001Inventors: Stephen R. Wurzburger, James Michael Overton
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Patent number: 6303554Abstract: A method for pretreating a plastic surface in a coating process. The plastic surface is immersed in a solution containing iso-propanol, or another light alcohol, and potassium hydroxide (KOH). The method and the solution according to the present invention are particularly useful for cleaning and etching plastic surfaces (e.g. PU or PVC) with a heavy organic chemical contamination (e.g. silicone).Type: GrantFiled: June 13, 2000Date of Patent: October 16, 2001Assignee: International Business Machines CorporationInventors: Donato Casati, Fabio Mauri, Silvano Passagrilli
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Patent number: 6300300Abstract: The present invention relates to cleaning and degreasing compositions. It is an aqueous concentrate comprising caustic soda, a metal salt of silica, three surfactants, and a bonding agent. The concentrate can be diluted to provide a reusable, low foaming, non-toxic and biodegradable composition useful for degreasing, cleaning, and disinfecting, and for separating solids, oils, and greases suspended in water. Methods of use are also provided.Type: GrantFiled: March 9, 2001Date of Patent: October 9, 2001Assignee: MWJ, L.L.C.Inventor: Michael J. Sanchez