Abstract: A cleaning agent for an alloy material is provided. The cleaning agent has a pH in a range between 1.5 and 4, inclusive, and contains an anionic surfactant having an SO3M group (where M represents a counter ion). It is preferable that the cleaning agent for an alloy material further contains an organic acid. A method for producing an alloy material is also provided. The method includes a step for cleaning the alloy material using the cleaning agent for an alloy material.

Abstract: A photoresist and post etch cleaning solution for semiconductor wafers comprising: A. a polar aprotic solvent, B. an inorganic base; C. a co-solvent for said inorganic base; D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group; E. an organic base comprising an amine compound; and F. a nonionic surfactant bearing at least one ether group. The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.

Abstract: The invention relates to compositions containing a) 45 to 65 wt. % of one or more secondary paraffin sulfonates with 8 to 22 carbon atoms, b) 1 to 10 wt. % of one or more alcohol alkoxylates which are produced from the reaction of alcohols R—OH, wherein R is an alkyl group with 4 to 8 carbon atoms, with alkoxylating agents selected from ethylene oxide, propylene oxide, or mixtures thereof and which contain on average 1 to 10 mol of structural units derived from the alkoxylating agents per 1 mol of structural units derived from the alcohols, and c) 25 to 52 wt. % water, in relation to the total weight of the composition in each case. The compositions can be used in an advantageous manner for producing washing and cleaning agents.

Abstract: Compositions and methods for treating biofilm formation and growth on a substrate are provided. The composition comprises 1 ppb to 1,000 ppm of at least one D-amino acid and 1 ppm to 60,000 ppm of at least one biocide. The method comprises contacting the substrate with 1 ppb to 1,000 ppm of at least one D-amino acid and 1 ppm to 60,000 ppm of at least one biocide. The compositions and methods are effective for preventing, reducing or eliminating biofilm formation or biofilm growth or both, as well as eradicating established, recalcitrant biofilms, particularly biofilms comprising sulfate reducing bacteria that are known to cause microbiologically influenced corrosion, biofouling, or both.

Abstract: Compositions comprising an alkanesulfonic acid and an organic nitrogenous base, and related methods of use.

Abstract: An adhesion bond strength enhancer for cementitious adhesive mortar is disclosed. The adhesion enhancer improves bond strength between the mortar and relatively hydrophobic plastic material, such as extruded polystyrene boards and expanded polystyrene boards of the type generally employed in Exterior Insulation Finishing Systems (“EIFS”). Preparation of non-caking, free-flowing, solid dialkyl sulfosuccinate compositions for use as the adhesion enhancer is also disclosed. The adhesion enhancer is attractive for large-scale application in mineral mortar dry-mixes or other solid construction materials. The invention can be used to improve the strength of an adhesive bond between a) gypsum based plaster or stucco and concrete or bricks, b) tile adhesives and concrete, and c) mineral mortars on polystyrene boards, among others.

Abstract: Multipurpose cleaners are comprised of an alkoxylated carboxylic acid ester corresponding to the formula (I): wherein R1CO is an aliphatic acyl group, AlkO is CH2CH2O, CHCH3CH2O, CH2CHCH3O, or a combination thereof, n is a number from 1 to 20 and R2 is an aliphatic alkyl group, and a betaine, an amine oxide or a combination thereof.

Abstract: Compositions suitable for removing photoresist, probing ink and wafer bonding adhesive from a substrate containing one or more (C6-C16)olefins, one or more (C1-C6)alkoxybenzenes, and one or more organic sulfonic acid compounds are provided. Such compositions show reduced metal corrosion, low toxicity and rapid removal rates of both photoresists and probing inks.

Abstract: The present invention describes liquid acidic cleaning compositions suitable for cleaning bathroom surfaces comprising a homo- or copolymer or vinylpyrrolidone, or a mixture thereof, a polysaccharide polymer, or a mixture thereof, an anionic surfactant, and an acid. These compositions deliver improved shine to the treated surface as well as improved next-time cleaning benefit on said surface.

Abstract: Aqueous cleaning solution concentrates with elevated levels of N-alkyl-2-pyrrolidone solubilized therein, comprising a surfactant formulation incorporating at least one N-alkyl-2-pyrrolidone, the alkyl group of which has 6 to 12 carbon atoms, and a C6-10 alkane sulfonate hydrotrope for the N-alkyl-2-pyrrolidone in a hydrotrope/pyrrolidone weight ratio of 0.9 to 5.0%.

Abstract: Compositions are disclosed which are suitable for the safe cleaning of delicate surfaces, i.e. marble and lacquered surfaces, e.g. lacquered wooden floors. The compositions disclosed herein comprise at least one anionic surfactant, they are free of strong builders, they are formulated in the mildly acidic to mildly alkaline pH range, and they comprise positive divalent ions in amounts so as to saturate the anionic surfactant in the composition.

Abstract: The process for removing a soap-contaminated conversion layer remaining on a metal workpiece after cold-forming with an aqueous acidic cleaning composition containing water, a surfactant such as an alkyl amine ethoxylate and nitric acid, phosphoric acid and/or amidosulphonic acid includes immersing the contaminated metal workpiece in the aqueous acidic cleaning composition at a temperature above 60.degree. C. until it has a clean bright surface and a fatty acid formed by reaction of the soap in the conversion layer is dispersed in the cleaning composition and then subsequently separating the metal workpiece from the cleaning solution and, after the separating, cooling the recovered aqueous acidic cleaning composition to a temperature below 55.degree. C. until a fatty acid layer including the fatty acid is separated from the aqueous acidic cleaning composition.

Abstract: Compositions and methods are provided for cleaning and de-oiling metal parts and then degrading the removed oils or other organic compounds in an environmentally-friendly manner. The compositions generally contain surfactants to remove the oils and enzymes to degrade the oils. Generally, both aliphatic and aromatic compounds normally present in standard oils, lubricants, cutting oils, and greases are removed from the metal parts (i.e., "solubilized") by surfactants (although the enzymes may also assist in this process) and then ultimately broken down into relatively short-chain fatty acids by enzymes, both processes being carried out in an aqueous medium. The surfactants include (a) one or more alkylphenol ethoxylates; (b) one or more alkaline metal salts of an alkane sulfonic acid; and (c) one or more alkanolamines in aqueous solution. Suitable enzymes include monomethanoxigenase, alcoholdehydrogenase, and aldehydehydrogenase.

Abstract: A hose and wire casing adapted to withstand biological and chemical attacks. The hose/wire casing is manufactured by placing a barrier wrap of elastomer and ultra-high-molecular-weight-polyethylene around a hose body or conductor bundle. The two parts are then cured into a single unit using high temperature and high pressure. The combination of high temperature and high pressure minimize the porosity of the high-molecular-weight-polyethylene. The resulting hose/wire casing is particularly immune to chemical and biological attacks by an enemy and is easily cleaned of such agents using a variety of cleansing and neutralizing agents such as DS2, bleach, and strong bases. This cleaning results in a hose which may be handled safely with bare hands after decontamination.

Abstract: An aqueous liquid composition containing dihydrogen phosphate salt, surfactant(s), and a dual coordinate bonding agent for iron cleans soiled metal surfaces without damaging any plastic parts that come into contact with the composition, supporting the growth of bacteria that cause unpleasant odors, or obscuring the transparency of any transparent window that it contacts. The composition is particularly useful for cleaning unpainted aluminum sided rail transport cars that have polycarbonate housings insulating electrical contact points that provide motive electric power to the cars; many conventional aqueous alkaline and acid cleaners promote stress cracking of polycarbonate plastics.

Abstract: A scouring pad is disclosed for cleaning and polishing delicate surfaces. The pad includes a three dimensional lofty nonwoven web made out of a plurality of polyester fibers and a cleansing composition which is present in the voids within the web in dry form. The cleansing composition is, preferably, a surfactant blend containing suitable amounts of stearic monoethanolamide, coconut monoethanolamide, dodecylbenzene sulfonic acid, sodium xylene sulfonate, sodium hydroxide, sodium lauryl sulfate, and water or suitable substitutes of the above. The cleansing composition may be a fatty acid based soap also.

Abstract: An aqueous liquid composition containing dihydrogen phosphate salt, sulfur containing surfactant, and preferably a small amount of phosphoric acid cleans soiled metal surfaces without damaging any plastic parts that come into contact with the composition with the composition and without supporting the growth of bacteria that cause unpleasant odors. The composition is particularly useful for cleaning unpainted aluminum sided rail transport cars that have polycarbonate housings insulating electrical contact points that provide motive electric power to the cars; many conventional aqueous alkaline and acid cleaners promote stress cracking of polycarbonate plastics.

Abstract: An emulsifier composition containing: (a) from about 7 to about 15% by weight of an alkyl polyglycoside of formula I:R.sub.1 O(R.sub.2 O).sub.b (Z).sub.a (I)wherein R.sub.1 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R.sub.2 is a divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbon atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6; (b) from about 9 to about 17% by weight of an alkoxylated linear alcohol; (c) from about 11 to about 19% by weight of linear alkyl sulfonate; (d) from about 1 to about 5% by weight of a monoethanolamine; and (e) remainder, water, all weights being based on the total weight of the composition.

Abstract: Substantially nonaqueous concentrates for use in preparing stable, aqueous cleaner/degreaser compositions in the form of totally water soluble solutions comprise (a) at least one sparingly water soluble organic solvent having certain defined characteristics; (b) a solubilizing additive consisting of from approximately 0.1 to approximately 100 weight percent of a surfactant and from 0 to approximately 99.9 weight percent of a coupler, the solubilizing additive being present in an amount of approximately 3% to approximately 15% by weight excess over that minimally required to form a clear solution when the concentrate is combined with water; and (c) not more than 10.0 weight percent of water; (d) the concentrate forming a barely clear, totally water soluble solution when diluted with water to produce a solution having the desired cleaning/degreasing strength.

Abstract: Hydrogen peroxide rinse aid solutions of the present invention added to hydrochloric acid rinse baths for acid pickled stainless steel enables hydrochloric acid rinse baths to easily remove stainless steel oxides and smutt from the surfaces of acid pickled stainless steel to produce a bright and clean finish that is comparable to the finish produced by nitric/hydrofluoric acid rinse systems.

Abstract: Superior high water containing oil continuous microemulsions and emulsions for cleaning contain defined amounts of water, one or more ionic surfactants, and one or more organic solvents so that the compositions have a low conductivity and low viscosity.

Abstract: Limescale removing compositions contain a low level of surfactant, i.e., less than about 1% and maleic acid and have a pH of from about 0.1 to about 4.5. The surfactant can be anionic, nonionic, amphoteric, or cationic, but is preferably cationic. The composition can be used neat, or diluted, by applying it to the surface to be treated, leaving it to react, and then rinsing.

Abstract: Improved compositions containing a visible coloring agent, such as a pigment or dye, together with a polymer or hydroxylated aliphate alcohol, and an active ingredient defined as a surfactant, a therapeutic agent or biocide, are disclosed. The detectable agent is readily visible under normal white light, and provides a technique for monitoring disturbed and undisturbed areas on a surface. Such is useful in the described methods for cleaning and/or decontaminating a surface, such as in the decontamination of equipment and clothing used during hazardous spill response. The compositions are adherent to a variety of different materials, including Teflon.RTM.. This makes the preparations particularly useful in the cleaning and decontamination of non-flat and curved surfaces, such as on protective garments.

Abstract: According to the invention, an improved class of anionic surfactants having improved surfactant properties characterized as mild and environmentally safe have been provided comprising compounds of the formula: ##STR1## The anionic surfactants of the invention have at least two hydrophobic chains and at least two hydrophilic groups per molecule and are useful as emulsifiers, detergents, dispersant and solubilizing agents.

Abstract: An alkaline degreasing aqueous solution containing 0.01 to 10 g/l of a nonionic surface-active agent, and an organic substance exhibiting water solubility or water dispersibility at a pH value of at least 8, having a phenolic hydroxyl group with a molecular weight of at least 500, at a weight ratio of 0.1 to 2:1=(organic substance having a phenolic hydroxyl group):(nonionic surface-active agent). The alkaline degreasing aqueous solution has a pH value of at least 8.

Abstract: Superior high water containing oil continuous microemulsions and emulsions for cleaning contain defined amounts of water, one or more ionic surfactants, and one or more organic solvents so that the compositions have a low conductivity and low viscosity.

Abstract: A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises:(a) an organic polar solvent;(b) an organic aliphatic or aromatic amine, or an organic amino alcohol; and(c) either polyethylene glycol or polypropylene glycol in an amount to provide a caging effect. The composition also preferably includes a biodegradable organic solvent.

Abstract: The present invention is directed to compositions useful for removing products of metal corrosion from corroded metals which consists essentially of an aqueous liquid solution of malonic acid, a surfactant and an organic solvent selected from the group consisting of formamide, dimethylformamide, and dimethylsulfoxide.