Abstract: A substantially transparent, liquid cleaning product for hard surfaces, comprising at least 15% by weight of a surfactant and one or more abrasive materials selected from the group consisting of polymers having a diameter of from 0.6 to 4 mm, natural materials having a diameter of from 0.05 to 4 mm, and mixtures thereof.

Abstract: The solution is useful for removing a barrier material from a semiconductor substrate. The solution comprises, by weight percent, 0.01 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal, 0 to 15 abrasive, 0 to 20 complexing agent for the nonferrous metal, 0.01 to 12 barrier removal agent and balance water. The barrier removal agent is selected from the group comprising imine derivative compounds, hydrazine derivative compounds and mixtures thereof.

Abstract: The invention relates to a compatibilizing dispersant used in a slurry composition comprising a strongly cationic component and a strongly anionic component. More specifically, the invention relates to stable aqueous slurries comprising suspended particles of sparingly soluble salts, oxide, and/or hydroxides of copper and/or zinc. The slurry further comprises a quaternary amine compound present in a biocidally effective amount when the slurry is used in a manner that provides the sparingly soluble copper and/or zinc containing particles in a biocidally effective amount. The slurry further comprises an effective amount of a dispersant having a large non-ionic component.

Abstract: A process for the production of a flowable suspension containing phthalimidoperoxyhexanoic acid by combining phthalimidoperoxyhexanoic acid in granular form with a liquid alcohol and grinding the combination to form a flowable suspension of the phthalimidoperoxyhexanoic acid in the alcohol.

Abstract: The present invention is directed to a cleaning composition comprising: (a) an enzyme in an amount effective to promote cleaning; (b) viable microorganisms in an amount effective to degrade and promote the degradation of organic materials; (c) a surfactant; and (d) an aqueous carrier; said cleaning composition maintaining at least 95% enzymatic activity at a pH range of from about 5.5 to about 13.5.

Abstract: An oral composition comprises water and a cyclic carbonate compound in a certain ratio. In this case, the ratio of the water and the cyclic carbonate compound is such that when the water and the cyclic carbonate compound are mixed together the mixture goes into a 2-phase state. Moreover, the oral composition may further comprise a polyol, and in this case the ratio of the water, the cyclic carbonate compound and the polyol is such that when the water, the cyclic carbonate compound and the polyol are mixed together the mixture goes into a 2-phase state. The oral composition has an excellent effect of removing accumulations on dental surfaces or between teeth through a physico-chemical action, rather than relying purely on a mechanical action.

Abstract: A cleaning composition for removing organic deposits from hard to reach surfaces. In its basic embodiment, the cleaning composition comprises: a) a water miscible solvent; b) an inorganic salt in crystal form; and c) water. The inorganic salt in crystal form comprises from about 30 to about 70% weight of the total composition.

Abstract: A contaminated surface polishing-washing detergent composition comprises a polishing media and a dispersion medium wherein at least a part of the polishing media is made of a fine powder of an RB ceramic and/or CRB ceramic. The composition is effective in polishing-washing the surfaces of a precision-worked base material, and after the polishing-washing, the particles of metal oxides and the particles of removed burrs and the cutting metal chips are simply separated from the composition by use of the difference in specific gravity to re-use it by recycling.

Abstract: A liquid cleanser comprises an aqueous medium, a surface active agent and a polishing material wherein the polishing material contains as at least one component thereof an RB ceramic and/or CRB ceramic powder.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: A cleaning medium for use in cleaning printing forms includes either an acid solution having a pH of from 1 to 4 or a basic solution having a pH of from 10 to 14. A dispersible abrasive agent in a concentration of from 1 to 15 grams per 100 grams of the cleaning composition, a surfactant in a concentration of from 1 to 50 grams per 100 grams of the cleaning composition, an organic solvent in a concentration of from 10 to 50 grams per 100 grams of the cleaning composition, and additional water if needed are added to the acid or basic solution to form the cleaning medium. A cleaning medium in concentrate form is also provided.

Abstract: There is provided a polishing compound for sheet metal coating comprising an polishing material and a surfactant in which a RB ceramics and/or CRB ceramics powder is used at least as a part of the polishing material, thereby shortening a stain removing process of a coated surface in reparative sheet metal coating work of cars, etc. without conducting a washing process thereafter.

Abstract: To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amount of dub-off is considerably reduced as compared with that of a conventional level, a polishing composition containing water, a polishing material (particularly alumina), a polishing accelerator, and at least one of hydroxypropyl cellulose and hydroxyalkyl alkyl cellulose is provided.

Abstract: An abrasive composition for substrates for magnetic recording disks and a process for producing a substrate for a magnetic recording disk are provided, which enable lowering of surface roughness of a substrate for a magnetic recording disk; form no nodules, polishing scratches, and minute defects such as micropits; and enable polishing at economical speeds. The abrasive composition comprises at least water, titanium oxide fine particles and an abrasion promoter, wherein 90-100% of the titanium oxide is constituted by a single crystal structure.

Abstract: An abrasive cleaning composition comprises abrasive particles, preferable of a soluble abrasive, cationic or non ionic surfactants and a quaternary ammonium antibacterial agent.

Abstract: A metal cleaner-polish in the form of a substantially homogeneous liquid slurry containing aliphatic hydrocarbons, finely divided abrasive, and isopropanol as a stabilizer/solvent.

Abstract: The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D1/D2) of a particle diameter D1 nm (as measured by dynamic light scattering method) to a mean particle diameter D2 (as measured by nitrogen absorption method) of 3 or more, wherein D1 is between 50 to 800 nm and D2 is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.

Abstract: An oil-in-water suspoemulsion system is provided for the delivery of actives for laundering, cleaning or surface treatment, in which the suspoemulsion includes a major portion of water as a continuous phase, at least one Active, and an encapsulate including an oil, and at least first and second nonionic surfactants, the first and second nonionic surfactants having a HLB of at least about 3, the encapsulate substantially completely coating the active and suspending it within the aqueous phase.

Abstract: A composition useful for removal of organic deposits from a ceramic, glass, plastic, or metal substrate, and a method of use thereof. In a preferred embodiment, the invention pertains to a composition for cleaning an organically fouled smoking apparatus such as a pipe, a cigarette holder, or a water pipe, and to a process whereby the smoking apparatus is cleaned and disinfected.

Abstract: A fabric care composition comprises an amine or amide-epichlorohydrin resin or derivative thereof, a silicone component and, optionally, a textile compatible carrier. The textile compatible carrier facilitates contact between the resin and a fabric. The composition is adapted for use in the rinse cycle of a laundering process and may be used, as part of such a process, in the treatment of fabric to reduce creasing of the fabric.

Abstract: The present invention provides a slurry composition for chemical mechanical polishing comprising spinel particles having the formula AO•xZ2O3 wherein A is at least one divalent cation, Z is at least one trivalent cation, and 0.01≦x≦100. The present invention also includes a method of chemical mechanical polishing the surface of a substrate using slurry compositions that include these spinel particles. The slurry compositions of the present invention provide the desired level of planarization and selectivity for both metal and oxide surfaces. In addition, the slurry compositions of the invention can be prepared such that they are substantially free of alpha phase alumina particles and other high hardness particles to produce a scratch-free polished surface.

Abstract: An abrasive composition for polishing glass, containing a basic salt of magnesium. Also disclosed is a method for polishing glass with the abrasive composition.

Abstract: A slurry in accordance with the invention comprises CeO2 polishing particles and sodium polyacrylate in an aqueous solution. This slurry is used to polish a glass or glass ceramic substrate. I have discovered that adding sodium polyacrylate to a CeO2 slurry improves the polishing rate without causing a major negative impact on the slurry stability or redispersibility. In addition, the addition of the sodium polyacrylate does not cause a great deal of foaming. This polishing process can be used to prepare substrates for the manufacture of magnetic disks.

Abstract: A liquid composition useful for suspending and dispensing a solid particulate comprises carbon dioxide, a surfactant, an organic co-solvent, and the solid particulate to be suspended. The composition may optionally contain water. The composition is useful as a propellant in an aerosol container for spraying the solid particulate from the container.

Abstract: The present invention relates to cleaning compositions, including laundry, dishwashing, hard surface cleaner, oral/dental cleaning compositions, comprising a proteinic substrate based oxygenase, which provide effective and efficient cleaning of proteic based stains and/or soils such as protein containing food stains/soils and everyday body soils and provide sanitisation of the treated surfaces. Furthermore, the cleaning compositions of the present invention provide fabric realistic items cleaning and whitening performance when formulated as a laundry detergent composition.

Abstract: A polishing composition for memory hard disks, which comprises water and at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, and which further contains succinic acid or its salt dissolved in the composition.

Abstract: A polishing composition for polishing a memory hard disk, which comprises water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide and which further contains an iron chelate complex dissolved in the composition, the iron chelate complex having a nitrogen-containing compound as a ligand, and the pH of the entire composition being from 6 to 10.

Abstract: This invention relates to an acid liquid crystal composition comprising a water insoluble organic compound, a nonionic surfactant, an abrasive, an anionic surfactant, a cosurfactant, a hydroxy containing organic acid, and water.

Abstract: An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided titanium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition is used for polishing a substrate for a magnetic recording disc by a process wherein the substrate is polished with a pad while the abrasive composition is supplied between the substrate and the pad, and at least one of the pad and the substrate is rotated. The contents of the finely divided titanium oxide particles, the abrasion promoter and the optional water-soluble oxidizing agent are 2-20 wt. %, 1-20 wt. % and up to 10 wt. %, respectively, based on the weight of the abrasive composition as used for polishing the substrate.

Abstract: A translucent/transparent composition capable of suspending relatively large size particles while remaining readily pourable. The composition is stable, even in presence of readily large amount of electrolyte/surfactant.

Abstract: A cleaning, polishing, and reconditioning composition of matter for internal parts of an engine, particularly suited for a cylinder of an internal combustion engine, composed of abrasive powder, chemical compositions of non-ferrous metals including nickel, sodium, cobalt, and molybdenum, and a carrier substance, which is either a dense liquid or has capacity of liquefying at temperatures existing within said engine.

Abstract: The inventive compositions are pourable aqueous bleach composition which contain abrasives, suitable for use in cleaning hard surfaces such as are found, for example, in lavatories and kitchens. The compositions of the invention show good shelf life, exhibit a high level of bleach stability and show good stain and soil removal, particularly from hard surfaces.

Abstract: This invention relates to a liquid crystal composition comprising a water insoluble organic compound, a nonionic surfactant, magnesium sulfate, a water soluble cosurfactant, an abrasive, an ethoxylated alkyl ether sulfate surfactant or alkyl sulfate surfactant, a fatty acid, a 2-alkyl alkanol and water.

Abstract: This invention relates to activation of enzymes. More specifically, the invention relates to agents capable of enhancing the activity of peroxidases or peroxidase acting compounds. The invention also relates to methods of oxidizing a substrate with a source of hydrogen peroxide in the presence of a peroxidase enzyme or a peroxidase acting compound, and an enhancing agent. More specifically, the invention relates to a method of bleaching of dye in solutions, to a method of inhibiting the transfer of a textile dye from a dyed fabric to another fabric when said fabrics are washed together in a wash liquor, to a method of bleaching of lignin-containing material, in particular bleaching of pulp for paper production, to a method of treatment of waste water from pulp manufacturing, and to a method of enzymatic polymerization and/or modification of lignin or lignin containing material.

Abstract: Compositions described herein are aqueous detergent compositions, preferably hard surface cleaning compositions, which contain alkyl aryl sulfonate surfactant, selected hydrophobic cleaning solvent, polycarboxylic acid, and aqueous solvent system in solution and/or a micellar phase, the pH being from about 2 to about 4. The have excellent soap scum removal and hard water deposit removal properties and are easy to rinse. Such compositions optionally contain additional anionic sulfate surfactant, cationic surfactant, peroxide and/or hydrophilic polymer for additional benefits.

Abstract: This invention relates to a liquid crystal composition comprising a water insoluble organic compound, a nonionic surfactant, an abrasive, an ethoxylated alkyl ether sulfate surfactant or alkyl sulfate surfactant, a fatty acid, a magnesium salt, a monoester of a C.sub.4 -C.sub.15 organic diol and water.

Abstract: This invention relates to a liquid crystal composition comprising a water insoluble organic compound, a nonionic surfactant, wood particles, an ethoxylated alkyl ether sulfate surfactant, a cosurfactant and water.

Abstract: A granular detergent composition having a density from 550 to 950 g/liter, said detergent composition comprisingi) a polymeric dye transfer inhibiting agentii) a protease having an isoelectric point below 10iii) a surfactant system which is free of alkylbenzene sulfonate surfactant.

Abstract: There is provided an enzymatic detergent composition comprising one or more surfactants and an endoglucanase which is not a Family 7 cellulase, which contains no cellulose binding domain and wherein the catalytic domain contains at least two disulphide bridges. Preferably, the endoglucanase is producible from Thermomonospora fusca, or mutants or variants thereof.

Abstract: The formulations of the invention comprise a suspension of a sanitizing composition, bacterial spores, surfactants, a thickening agent, and abrasive particles all contained in aqueous solution. These formulations can be used for cleaning and sanitizing bathroom fixtures, sinks, toilet bowls, and other dirty and contaminated surfaces, and have the advantages of being a good surface cleaning agent and a good sanitizer along with providing the long term effect of beneficial bacteria that control pathogens and degrade wastes both on the surface and in the sewage system associated with the surface being treated.

Abstract: Solutions comprising at least one polyamino disuccinic acid and one or more polyamino monosuccinic acids are useful in gas conditioning (preferably as the iron chelate). The copper chelates are also useful in electroless copper plating. Another aspect of the invention includes the use of the aminosuccinic acid mixtures in laundry detergent compositions.

Abstract: There is provided an enzymatic detergent composition comprising a surfactant and an endoglucanase producible from Thermomonospora fusca, preferably E5, or mutants or variants thereof.

Abstract: A carpet cleaning composition comprising: (a) a powder-form solid adsorbent; (b) rollable particles of porous material, each particle having a length greater than 1 mm, and a diameter equal to at least 10% of the length of the particle; and (c) water.

Abstract: This invention relates to a liquid crystal composition comprising a water insoluble organic compound, a sulfonate surfactant, an abrasive, an ethoxylated alkyl ether sulfate surfactant, a cosurfactant and water.

Abstract: Liquid crystalline aqueous surfactant compositions containing alkyl glycosides, long-chain alcohols, and, optionally, anionic surfactants; and to finished products containing them.

Abstract: Enhanced levels of viscosity reducing polymer can be stably incorporated in liquid detergent compositions of the kind comprising a structured phase containing detergent active material dispersed in an aqueous phase containing dissolved electrolyte, if the polymer is only partly dissolved in the latter phase.

Abstract: A detergent composition is disclosed. The composition comprises polymer particles having an average particle size of 50-500 .mu.m in 5% by weight sodium chloride aqueous solution and a modulus of elasticity of 1.times.10.sup.3 -5.times.10.sup.5 dyne/cm.sup.2 in said sodium chloride aqueous solution. It exhibits a superior physical or mechanical washing performance, and gives remarkably reduced irritation and minimal damage to the object being washed. When a germicide is incorporated in addition to the polymer particles, its sterilization effect is greatly enhanced.

Abstract: Physically stable, non-scratching hard surface cleaning compositions having shear thickening properties are provided and include an alkali metal silicate, an inorganic or organic compound containing an alkali metal cation or an organic compound containing at least one hydroxyl group and water.